SCHEMBL9743295

SCHEMBL9743295

CCCCc1c(O)cc(O)cc1O

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 2/20 0.72
MAPK1 P28482 2/20 0.72
NPC1 O15118 1/20 0.72
HPGD P15428 1/20 0.72
RAB9A P51151 1/20 0.72
NPSR1 Q6W5P4 1/20 0.72
TYR P14679 2/20 0.55
SLC28A3 Q9HAS3 1/20 0.55
KDM4E B2RXH2 2/20 0.53
PKM P14618 1/20 0.53
PTGS2 P35354 3/20 0.50
CYP3A4 P08684 2/20 0.50
CYP19A1 P11511 1/20 0.47
MEN1 O00255 2/20 0.47
KMT2A Q03164 2/20 0.47
TP53 P04637 1/20 0.47
ALOX5 P09917 1/20 0.47
MAPT P10636 1/20 0.47
ALOX15 P16050 1/20 0.47
TSHR P16473 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL168062 0.93 HTT (0.63) HTTMAPK1NPC1HPGDRAB9A
SCHEMBL19433103 0.91 PTGS2 (0.61) HTTMAPK1NPC1HPGDRAB9A
SCHEMBL19433099 0.91 PTGS2 (0.61) HTTMAPK1NPC1HPGDRAB9A
SCHEMBL19433098 0.91 PTGS2 (0.61) HTTMAPK1NPC1HPGDRAB9A
SCHEMBL16009969 0.89 HTT (0.59) HTTMAPK1NPC1HPGDRAB9A
SCHEMBL9743726 0.86 HTT (0.72) HTTMAPK1NPC1HPGDRAB9A
SCHEMBL6832976 0.85 HTT (0.52) HTTMAPK1NPC1HPGDRAB9A
SCHEMBL110236 0.85 SLC28A3 (0.71) HTTMAPK1NPC1HPGDRAB9A
SCHEMBL9744288 0.84 HTT (1.00) HTTMAPK1NPC1HPGDRAB9A
SCHEMBL27930400 0.84 NPC1 (0.91) HTTMAPK1NPC1HPGDRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102566330-B A kind of thick film photolithography glue cleaning fluid ANJI MICROELECTRONICS (SHANGHAI) CO., LTD. (CN) 2016-04-20 CN claimed
CN-102566332-B A kind of thick film photolithography glue cleaning fluid ANJI MICROELECTRONICS (SHANGHAI) CO., LTD. (CN) 2016-04-20 CN claimed
CN-102566330-A Thick film photoresist cleaning solution ANJI MICROELECTRONICS CO LTD 2012-07-11 CN claimed
CN-102566332-A Thick film photoresist cleaning solution ANJI MICROELECTRONICS CO LTD 2012-07-11 CN claimed
WO-2023116193-A1 METHOD FOR PREPARING ANTIBACTERIAL ANTIOXIDANT AND USE THEREOF 江南大学 2023-06-29 WO disclosed
US-11129781-B2 Agent for hair deforming treatment KAO CORPORATION (JP) 2021-09-28 US disclosed
US-11045402-B2 Hair cosmetic composition KAO CORPORATION (JP) 2021-06-29 US disclosed
US-10959925-B2 Hair cosmetic composition KAO CORPORATION (JP) 2021-03-30 US disclosed
EP-3228302-B1 HAIR DEFORMATION TREATMENT AGENT KAO CORP (JP) 2020-09-02 EP disclosed
CN-106999382-B Hair deforming agent 花王株式会社 2020-07-10 CN disclosed
US-20190290564-A1 HAIR COSMETIC COMPOSITION KAO CORPORATION (JP) 2019-09-26 US disclosed
US-20190254943-A1 HAIR COSMETIC COMPOSITION KAO CORPORATION (JP) 2019-08-22 US disclosed
CN-106999382-A Hair deformation process agent 花王株式会社 2017-08-01 CN disclosed
CN-102566332-B A kind of thick film photolithography glue cleaning fluid ANJI MICROELECTRONICS (SHANGHAI) CO., LTD. (CN) 2016-04-20 CN disclosed
CN-102566330-B A kind of thick film photolithography glue cleaning fluid ANJI MICROELECTRONICS (SHANGHAI) CO., LTD. (CN) 2016-04-20 CN disclosed
CN-102566330-A Thick film photoresist cleaning solution ANJI MICROELECTRONICS CO LTD 2012-07-11 CN disclosed
CN-102566332-A Thick film photoresist cleaning solution ANJI MICROELECTRONICS CO LTD 2012-07-11 CN disclosed
US-5087548-A POSITIVE TYPE RADIATION-SENSITIVE RESIN COMPOSITION JAPAN SYNTHETIC RUBBER CO., INC. (JP) 1992-02-11 US disclosed
EP-0227487-A2 Positive type radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-07-01 EP disclosed
US-4053517-A METHOD OF ACYLATION OF PHLOROGLUCINOL ATLANTIC RESEARCH INSTITUTE LIMITED (BA) 1977-10-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11045402-B2 Hair cosmetic composition CUTA, GRHPR, POLR1C HTT 46/4885MAPK1 2270/4885NPC1 3393/4885
US-10959925-B2 Hair cosmetic composition CUTA, POLR1C, GRHPR HTT 137/4885MAPK1 2285/4885NPC1 2350/4885
US-20190254943-A1 HAIR COSMETIC COMPOSITION CUTA, POLR1C, GRHPR HTT 137/4885MAPK1 2285/4885NPC1 2350/4885
US-11129781-B2 Agent for hair deforming treatment GRHPR, SLC26A4, COL1A1 HTT 208/4885MAPK1 3799/4885NPC1 2673/4885
US-20190290564-A1 HAIR COSMETIC COMPOSITION GRHPR, POLR1C, TYR HTT 136/4885MAPK1 2573/4885NPC1 2487/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.