Methacrylic Acid

Methacrylic Acid

SCHEMBL998378

C=C(C)C(=O)O.CC(O)COC(C)CO

nearest known ligand 0.39

Full drug profile on Sugi Atlas →

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.39
TSHR P16473 1/20 0.37
TGFBR1 P36897 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL5172662 1.00 TDP1 (0.39) TDP1TSHRTGFBR1
Methacrylic Acid SCHEMBL28929329 1.00 TDP1 (0.39) TDP1TSHRTGFBR1
Methacrylic Acid SCHEMBL26672381 1.00 TDP1 (0.39) TDP1TSHRTGFBR1
Methacrylic Acid SCHEMBL41276 1.00 TDP1 (0.39) TDP1TSHRTGFBR1
Methacrylic Acid SCHEMBL11683975 0.98 TDP1 (0.38) TDP1TSHRTGFBR1
Methacrylic Acid SCHEMBL28421563 0.98 TDP1 (0.38) TDP1TSHRTGFBR1
Methacrylic Acid SCHEMBL25256637 0.96 TDP1 (0.41) TDP1TSHRTGFBR1
Methacrylic Acid SCHEMBL5029016 0.96 TDP1 (0.41) TDP1TSHRTGFBR1
Methacrylic Acid SCHEMBL21670809 0.96 TDP1 (0.41) TDP1TSHRTGFBR1
Methacrylic Acid SCHEMBL672402 0.96 TDP1 (0.41) TDP1TSHRTGFBR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 367 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260040695-A1 A METHOD TO GENERATE CONDUCTIVE POLYMER NEWSOUTH INNOVATIONS PTY LTD (AU) 2026-02-05 US claimed
EP-4562077-A1 A METHOD TO GENERATE CONDUCTIVE POLYMER NewSouth Innovations Pty Limited (AU) 2025-06-04 EP claimed
US-12036312-B2 Non-aqueous topical compositions comprising a halogenated salicylanilide UNION therapeutics A/S (DK) 2024-07-16 US claimed
CN-112313577-B Radiation curable composition for additive manufacturing 斯特拉塔西斯公司 2024-07-09 CN claimed
CN-117567979-A High-temperature-resistant reversible self-repairing UV and moisture dual-curing three-proofing adhesive 信泰永合(烟台)新材料有限公司 2024-02-20 CN claimed
WO-2024020649-A1 A METHOD TO GENERATE CONDUCTIVE POLYMER NEWSOUTH INNOVATIONS PTY LIMITED (AU) 2024-02-01 WO claimed
US-20230407132-A1 (METH)ACRYLATE-FUNCTIONAL RADIATION CURABLE COMPOSITIONS FOR ADDITIVE FABRICATION COVESTRO (NETHERLANDS) B.V. (NL) 2023-12-21 US claimed
EP-4237175-A1 (METH)ACRYLATE-FUNCTIONAL RADIATION CURABLE COMPOSITIONS FOR ADDITIVE FABRICATION Covestro (Netherlands) B.V. (NL) 2023-09-06 EP claimed
WO-2022261721-A1 HEALABLE AND REPROCESSABLE COMPOSITIONS DEAKIN UNIVERSITY (AU) 2022-12-22 WO claimed
US-11485818-B2 Radiation curable compositions for additive fabrication COVESTRO (NETHERLANDS) B.V. (NL) 2022-11-01 US claimed
US-7906564-B2 Self etch all purpose dental cement composition, method of manufacture, and method of use thereof PENTRON CLINICAL TECHNOLOGIES, LLC (US) 2011-03-15 US claimed
CN-101720239-A Implant device release agent and method of use thereof ENDO PHARMACEUTICALS SOLUTIONS 2010-06-02 CN claimed
EP-2139533-A2 IMPLANT DEVICE RELEASE AGENTS AND METHODS OF USING SAME Endo Pharmaceuticals Solutions Inc. (US) 2010-01-06 EP claimed
US-20080311170-A1 IMPLANT DEVICE RELEASE AGENTS AND METHODS OF USING SAME INDEVUS PHARMACEUTICALS, INC. 2008-12-18 US claimed
WO-2008134475-A2 IMPLANT DEVICE RELEASE AGENTS AND METHODS OF USING SAME ENDO PHARMACEUTICALS SOLUTIONS INC., 33 (US) 2008-11-06 WO claimed
EP-1986588-A2 SELF ETCH ALL PURPOSE DENTAL COMPOSITION Pentron Clinical Technologies, LLC (US) 2008-11-05 EP claimed
US-20080242761-A1 One part acrylated monomer with aromatic carboxylic anhydride functionality, multifunctional acrylate resin, diluent monomer and curing system; one step restorative dentistry; self and light curable JIA WEITAO 2008-10-02 US claimed
WO-2007100569-A2 SELF ETCH ALL PURPOSE DENTAL COMPOSITION PENTRON CLINICAL TECHNOLOGIES LLC (US) 2007-09-07 WO claimed
US-20070197683-A1 SELF ETCH ALL PURPOSE DENTAL COMPOSITIONS, METHOD OF MANUFACTURE, AND METHOD OF USE THEREOF PENTRON CLINICAL TECHNOLOGIES, INC (US) 2007-08-23 US claimed
US-20070197682-A1 Self etch all purpose dental cement composition, method of manufacture, and method of use thereof PENTRON CORPORATION 2007-08-23 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070197682-A1 Self etch all purpose dental cement composition, method of manufacture, and method of use thereof FHIT, COPE, ASH2L TDP1 2404/4885TSHR 4848/4885TGFBR1 4506/4885
US-20080311170-A1 IMPLANT DEVICE RELEASE AGENTS AND METHODS OF USING SAME PTGES, VDR, HPGDS TDP1 2445/4885TSHR 476/4885TGFBR1 830/4885
US-20260040695-A1 A METHOD TO GENERATE CONDUCTIVE POLYMER PIEZO1, LCP1, MTCL3 TDP1 2457/4885TSHR 4571/4885TGFBR1 1771/4885
US-12036312-B2 Non-aqueous topical compositions comprising a halogenated salicylanilide CUTA, PTPN21, ABL2 TDP1 1830/4885TSHR 3500/4885TGFBR1 4142/4885
US-20070197683-A1 SELF ETCH ALL PURPOSE DENTAL COMPOSITIONS, METHOD OF MANUFACTURE, AND METHOD OF USE THEREOF CAD, FHIT, ACR TDP1 1797/4885TSHR 4432/4885TGFBR1 4533/4885
US-20080242761-A1 One part acrylated monomer with aromatic carboxylic anhydride functionality, multifunctional acrylate resin, diluent monomer and curing system; one step restorative dentistry; self and light curable CAD, TAS2R42, ACR TDP1 967/4885TSHR 3760/4885TGFBR1 1059/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.