Sugi Predict

Sugi Predict / Compounds / SCHEMBL1004631

SCHEMBL1004631

SCHEMBL1004631

[CH2]c1cc(C)cc(C)c1Cl

nearest known ligand 0.43

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ RAPGEF4 Q8WZA2 14/20 0.43
▸ CYP3A4 P08684 1/20 0.40
▸ CHRM1 P11229 1/20 0.40
▸ ALOX15 P16050 1/20 0.40
▸ MAOA P21397 1/20 0.40
▸ TBXA2R P21731 1/20 0.40
▸ ADRA1A P35348 1/20 0.40
▸ HTR2B P41595 1/20 0.40
▸ FFAR4 Q5NUL3 1/20 0.34
▸ HTT P42858 1/20 0.33
▸ TSHR P16473 1/20 0.33
▸ ALDH1A1 P00352 1/20 0.32
▸ MAPT P10636 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL234943 0.80 CYP3A4 (0.58) RAPGEF4CYP3A4CHRM1ALOX15MAOA
SCHEMBL2972493 0.77 CYP3A4 (0.55) RAPGEF4CYP3A4CHRM1ALOX15MAOA
SCHEMBL1314635 0.77 CYP3A4 (0.55) RAPGEF4CYP3A4CHRM1ALOX15MAOA
SCHEMBL27561995 0.77 CYP3A4 (0.55) RAPGEF4CYP3A4CHRM1ALOX15MAOA
SCHEMBL1005597 0.74 CYP3A4 (0.46) RAPGEF4CYP3A4CHRM1ALOX15MAOA
SCHEMBL395136 0.72 RAPGEF4 (0.39) RAPGEF4TSHRALDH1A1MAPT
SCHEMBL11876475 0.72 RAPGEF4 (0.58) RAPGEF4CYP3A4CHRM1ALOX15MAOA
Sulfur Dioxide SCHEMBL10838499 0.70 CYP3A4 (0.48) RAPGEF4CYP3A4CHRM1ALOX15MAOA
SCHEMBL28040382 0.70 RAPGEF4 (0.38) RAPGEF4TSHRALDH1A1MAPT
SCHEMBL1003475 0.69 CYP3A4 (0.46) RAPGEF4CYP3A4CHRM1ALOX15MAOA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140275463-A1 ORGANOSILICON COMPOUND AND PRODUCTION PROCESS FOR THE SAME, AND POLYSILOXANE AND PRODUCTION PROCESS FOR THE SAME CHISSO PETROCHEMICAL CORPORATION (JP) 2014-09-18 — — US disclosed
EP-1548020-B1 SILICON COMPOUND JNC CORP (JP) 2014-07-23 — — EP disclosed
US-8367792-B2 Polysiloxane compound and method of producing the same JNC CORPORATION (JP) 2013-02-05 — — US disclosed
US-20120208973-A1 POLYSILOXANE COMPOUND AND METHOD OF PRODUCING THE SAME OOTAKE NOBUMASA (JP) 2012-08-16 — — US disclosed
EP-1550664-B1 SILICON COMPOUND JNC CORP (JP) 2012-06-27 — — EP disclosed
US-8173758-B2 Polysiloxane compound and method of producing the same JNC CORPORATION (JP) 2012-05-08 — — US disclosed
US-20110178313-A1 POLYSILOXANE COMPOUND AND METHOD OF PRODUCING THE SAME OOTAKE NOBUMASA 2011-07-21 — — US disclosed
US-7964692-B2 Polymer obtained by addition-polymerization initiated by a silicon compound JNC CORPORATION (JP) 2011-06-21 — — US disclosed
US-7939617-B2 Silsesquioxane derivative; electronic material, optical material, optoelectronic material, paint, and primer. CHISSO CORPORATION (JP) 2011-05-10 — — US disclosed
US-7863396-B2 Silicon compounds CHISSO CORPORATION (JP) 2011-01-04 — — US disclosed
US-20050250925-A1 Silicon compound JNC CORPORATION (JP) 2005-11-10 — — US disclosed
US-20050215807-A1 Silsesquioxane derivative JNC CORPORATION (JP) 2005-09-29 — — US disclosed
EP-1550664-A1 SILICON COMPOUND CHISSO CORPORATION (JP) 2005-07-06 — — EP disclosed
EP-1548020-A1 SILICON COMPOUND CHISSO CORPORATION (JP) 2005-06-29 — — EP disclosed
US-20050033077-A1 Production process for silicon compound and the same JNC CORPORATION (JP) 2005-02-10 — — US disclosed
US-20040249103-A1 Silsesquioxane derivatives and process for production thereof JNC CORPORATION (JP) 2004-12-09 — — US disclosed
US-20040143081-A1 Novel silicon compounds and process for preparation thereof JNC CORPORATION (JP) 2004-07-22 — — US disclosed
EP-1428795-A1 SILSESQUIOXANE DERIVATIVES AND PROCESS FOR PRODUCTION THEREOF CHISSO CORPORATION (JP) 2004-06-16 — — EP disclosed
US-20040068074-A1 Production process for silsesquioxane derivative having functional group and silsesquioxane derivative JNC CORPORATION (JP) 2004-04-08 — — US disclosed
US-20040030084-A1 Production process for silsesquioxane derivative and silsesquioxane derivative JNC CORPORATION (JP) 2004-02-12 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110178313-A1 POLYSILOXANE COMPOUND AND METHOD OF PRODUCING THE SAME RPS4X, POLR2A, MSL1 RAPGEF4 4364/4885CYP3A4 1759/4885CHRM1 463/4885
US-20140275463-A1 ORGANOSILICON COMPOUND AND PRODUCTION PROCESS FOR THE SAME, AND POLYSILOXANE AND PRODUCTION PROCESS FOR THE SAME PIEZO1, PFAS, MCM6 RAPGEF4 4583/4885CYP3A4 1025/4885CHRM1 3739/4885
US-20050215807-A1 Silsesquioxane derivative STS, SFXN1, SULT1A1 RAPGEF4 4828/4885CYP3A4 515/4885CHRM1 3338/4885
US-20120208973-A1 POLYSILOXANE COMPOUND AND METHOD OF PRODUCING THE SAME RPS4X, POLR2A, MSL1 RAPGEF4 4364/4885CYP3A4 1759/4885CHRM1 463/4885
US-20050033077-A1 Production process for silicon compound and the same STS, SMS, SFXN1 RAPGEF4 4699/4885CYP3A4 690/4885CHRM1 214/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.