Known targets — ChEMBL curated mechanism
AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA
The experimentally established mechanism targets of Isophthalic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 11/20 | 0.59 |
| ▸ | CA4 | P22748 | 1/20 | 0.59 |
| ▸ | ATM | Q13315 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.50 |
| ▸ | USP2 | O75604 | 1/20 | 0.45 |
| ▸ | CA1 | P00915 | 10/20 | 0.44 |
| ▸ | P4HTM | Q9NXG6 | 1/20 | 0.42 |
| ▸ | CES2 | O00748 | 2/20 | 0.41 |
| ▸ | CES1 | P23141 | 2/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | CA6 | P23280 | 1/20 | 0.41 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.40 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Isophthalic Acid SCHEMBL9930681 | 0.97 | CA2 (0.56) | CA2CA4ATMTDP1L3MBTL1 | |
| Isophthalic Acid SCHEMBL4450604 | 0.94 | CA2 (0.59) | CA2CA4ATMTDP1L3MBTL1 | |
| Isophthalic Acid SCHEMBL11292198 | 0.94 | CA2 (0.59) | CA2CA4ATMTDP1L3MBTL1 | |
| Isophthalic Acid SCHEMBL106980 | 0.94 | CA2 (0.67) | CA2CA4ATMTDP1L3MBTL1 | |
| Isophthalic Acid SCHEMBL23035004 | 0.94 | CA2 (0.59) | CA2CA4ATMTDP1L3MBTL1 | |
| Isophthalic Acid SCHEMBL25202017 | 0.94 | CA2 (0.59) | CA2CA4ATMTDP1L3MBTL1 | |
| Isophthalic Acid SCHEMBL3684094 | 0.94 | CA2 (0.59) | CA2CA4ATMTDP1L3MBTL1 | |
| Isophthalic Acid SCHEMBL23035003 | 0.94 | CA2 (0.59) | CA2CA4ATMTDP1L3MBTL1 | |
| Isophthalic Acid SCHEMBL161261 | 0.94 | CA2 (0.59) | CA2CA4ATMTDP1L3MBTL1 | |
| Isophthalic Acid SCHEMBL6264265 | 0.94 | CA2 (0.59) | CA2CA4ATMTDP1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 221 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114621059-B | Method for producing m-diphenol by neutralizing alkali molten material with sulfonated material | 山东创蓝垚石环保技术有限公司 | 2024-07-02 | — | — | CN | claimed |
| CN-116082615-A | Preparation method of low-viscosity flame-retardant anti-dripping polyester material | 湖北山特莱新材料有限公司 | 2023-05-09 | — | — | CN | claimed |
| CN-106928694-B | Low-gloss thermoplastic polyurethane composition and preparation method and application thereof | 万华化学集团股份有限公司 | 2020-04-10 | — | — | CN | claimed |
| US-20080260948-A1 | INK AND INK JET RECORDING METHOD | CANON KABUSHIKI KAISHA (JP) | 2008-10-23 | — | — | US | claimed |
| US-5756635-A | DRAWING FIBERS FROM SOLVENTS, REMOVAL AND DRYING | RHONE-POULENC FIBRES (FR) | 1998-05-26 | — | — | US | claimed |
| US-4200586-A | Inhibiting the carbon-carbon double bond isomerization of substituted or unsubstituted hydrocarbon compounds | PHILLIPS PETROLEUM COMPANY (US) | 1980-04-29 | — | — | US | claimed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4621486-A2 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-24 | — | — | EP | disclosed |
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-18 | — | — | US | disclosed |
| EP-4592299-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-30 | — | — | EP | disclosed |
| US-20250237953-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-24 | — | — | US | disclosed |
| US-4625056-A | Process for producing benzene carboxylic acids from aromatic material utilizing an aliphatic organic acid agent | OCCIDENTAL RESEARCH CORPORATION (US) | 1986-11-25 | — | — | US | disclosed |
| EP-0194058-A2 | Process of preparing polyamides and/or polyimides | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1986-09-10 | — | — | EP | disclosed |
| US-4490522-A | REACTING POLYHALOGENATED AROMATIC COMPOUND WITH ALKALI METAL SULFIDE IN PRESENCE OF OXYALKYLENE COMPOUND | DAINIPPON INK & CHEMICALS, INC. (JP) | 1984-12-25 | — | — | US | disclosed |
| US-4375553-A | FREE FROM HUMEC ACID SALTS | OCCIDENTAL RESEARCH CORPORATION (US) | 1983-03-01 | — | — | US | disclosed |
| US-4345098-A | HYDROLYSIS, OXIDATION, ISOMERIZATION | OCCIDENTAL RESEARCH CORPORATION (US) | 1982-08-17 | — | — | US | disclosed |
| US-4200586-A | Inhibiting the carbon-carbon double bond isomerization of substituted or unsubstituted hydrocarbon compounds | PHILLIPS PETROLEUM COMPANY (US) | 1980-04-29 | — | — | US | disclosed |
| US-3943164-A | IMPROVE DYEABILITY OF OLEFIN POLYMERS | PHILLIPS PETROLEUM COMPANY (US) | 1976-03-09 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | ASH2L, PUF60, IDUA | CA2 1064/4885CA4 749/4885ATM 2105/4885 |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | CA2 2902/4885CA4 281/4885ATM 4121/4885 |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SMC1A, SPOUT1, LBR | CA2 2105/4885CA4 1681/4885ATM 2902/4885 |
| US-20250237953-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SMURF1, OSR1, SIK1 | CA2 972/4885CA4 440/4885ATM 1583/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.