Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 5/20 | 0.39 |
| ▸ | CES1 | P23141 | 5/20 | 0.39 |
| ▸ | ERN1 | O75460 | 1/20 | 0.37 |
| ▸ | CA12 | O43570 | 2/20 | 0.36 |
| ▸ | CA1 | P00915 | 2/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | CA7 | P43166 | 1/20 | 0.36 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.36 |
| ▸ | SPR | P35270 | 1/20 | 0.36 |
| ▸ | FABP3 | P05413 | 1/20 | 0.35 |
| ▸ | FABP4 | P15090 | 1/20 | 0.35 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.35 |
| ▸ | TGM2 | P21980 | 1/20 | 0.34 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | PTGES2 | Q9H7Z7 | 1/20 | 0.32 |
| ▸ | DAO | P14920 | 1/20 | 0.31 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.31 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL27308697 | 0.97 | CES2 (0.38) | CES2CES1ERN1CA12CA1 | |
| SCHEMBL18373564 | 0.86 | CES2 (0.34) | CES2CES1ERN1CA12CA1 | |
| SCHEMBL4635957 | 0.84 | AGTR1 (0.45) | CES2CES1ERN1CA12CA1 | |
| SCHEMBL3422434 | 0.84 | ALDH1A1 (0.37) | CES2CES1ERN1CA12CA1 | |
| SCHEMBL16990203 | 0.81 | SPR (0.34) | SPRDAO | |
| Formic Acid SCHEMBL2167003 | 0.80 | ERN1 (0.33) | ERN1 | |
| Acetic Acid SCHEMBL2167709 | 0.78 | CYP4F2 (0.31) | CES2CES1 | |
| SCHEMBL14509406 | 0.78 | TGM2 (0.41) | CES2CES1ERN1CA12CA1 | |
| SCHEMBL776252 | 0.78 | CA12 (0.39) | CES2CES1ERN1CA12CA1 | |
| SCHEMBL11152080 | 0.76 | CA1 (0.37) | CES2CES1ERN1CA12CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 142 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3306732-B1 | NONAQUEOUS ELECTROLYTE SOLUTION FOR BATTERIES AND LITHIUM SECONDARY BATTERY | MITSUI CHEMICALS INC (JP) | 2025-06-25 | — | — | EP | disclosed |
| US-20250020997-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-01-16 | — | — | US | disclosed |
| US-11718758-B2 | Aqueous dispersion of colored particles | MITSUBISHI PENCIL COMPANY, LIMITED (JP) | 2023-08-08 | — | — | US | disclosed |
| US-11718758-B2 | Aqueous dispersion of colored particles | MITSUBISHI PENCIL COMPANY, LIMITED (JP) | 2023-08-08 | — | — | US | disclosed |
| US-20230176481-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-08 | — | — | US | disclosed |
| US-20230013430-A1 | SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING DEVICE | TOYO GOSEI CO., LTD. (JP) | 2023-01-19 | — | — | US | disclosed |
| WO-2021241484-A1 | WRITING IMPLEMENT | 三菱鉛筆株式会社 | 2021-12-02 | — | — | WO | disclosed |
| US-20210071006-A1 | AQUEOUS DISPERSION OF COLORED PARTICLES | MITSUBISHI PENCIL COMPANY, LIMITED (JP) | 2021-03-11 | — | — | US | disclosed |
| US-10913855-B2 | Silicon-containing heterocyclic compound, and quencher | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2021-02-09 | — | — | US | disclosed |
| US-10450462-B2 | Colored composition | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-22 | — | — | US | disclosed |
| EP-1481973-A1 | HETEROCYCLE-BEARING ONIUM SALTS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-12-01 | — | — | EP | disclosed |
| EP-1443042-A1 | HYBRID ONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2004-08-04 | — | — | EP | disclosed |
| US-20030235779-A1 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-25 | — | — | US | disclosed |
| US-20030207201-A1 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-11-06 | — | — | US | disclosed |
| US-20030113659-A1 | Resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-06-19 | — | — | US | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
| US-20010036591-A1 | Iodonium salts as latent acid donors | IGM GROUP B.V. (NL) | 2001-11-01 | — | — | US | disclosed |
| US-6306555-B1 | RADIATION-SENSITIVE COMPOSITION COMPRISING CATIONICALLY OR ACID-CATALYTICALLY POLYMERISABLE OR CROSSLINKABLE COMPOUND OR COMPOUND THAT INCREASES ITS SOLUBILITY IN DEVELOPER UNDER ACTION OF ACID, AND AT LEAST ONE DIARYLIODONIUM SALT | CIBA SPECIALTY CHEMICALS CORP. | 2001-10-23 | — | — | US | disclosed |
| WO-1988005034-A1 | REMOVAL OF POLYNUCLEAR AROMATICS FROM HYDROCARBON MIXTURES | EXXON CHEMICAL PATENTS, INC. (US) | 1988-07-14 | — | — | WO | disclosed |
| EP-0274432-A1 | Process for the removal of polynuclear aromatic compounds from hydrocarbon streams | EXXON CHEMICAL PATENTS INC. (US) | 1988-07-13 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10450462-B2 | Colored composition | IK, HEATR6, CYBA | CES2 1011/4885CES1 2311/4885ERN1 709/4885 |
| US-20230013430-A1 | SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING DEVICE | ARSA, SULT1A1, RER1 | CES2 2884/4885CES1 1098/4885ERN1 690/4885 |
| US-20030207201-A1 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | ASIC1, PARG, EEF1A2 | CES2 3936/4885CES1 4664/4885ERN1 686/4885 |
| US-10913855-B2 | Silicon-containing heterocyclic compound, and quencher | ANXA11, ANXA1, ORAI2 | CES2 1673/4885CES1 2198/4885ERN1 251/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.