Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 5/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.38 |
| ▸ | POLB | P06746 | 2/20 | 0.36 |
| ▸ | MAPT | P10636 | 2/20 | 0.36 |
| ▸ | PKM | P14618 | 1/20 | 0.36 |
| ▸ | BCHE | P06276 | 1/20 | 0.36 |
| ▸ | ESR1 | P03372 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | PPARA | Q07869 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13683049 | 0.89 | CYP3A4 (0.43) | LMNAKMT2AL3MBTL1MAPTALDH1A1 | |
| SCHEMBL13683046 | 0.86 | CHRM2 (0.41) | ELANELMNABCHEESR1ALDH1A1 | |
| SCHEMBL13683037 | 0.86 | MEN1 (0.47) | LMNAKMT2AL3MBTL1MAPTALDH1A1 | |
| SCHEMBL13683041 | 0.85 | TDP1 (0.44) | PPARATSHR | |
| SCHEMBL13683053 | 0.83 | PTGS2 (0.38) | LMNAESR1HSD17B10ALDH1A1PPARA | |
| SCHEMBL13683058 | 0.83 | NPC1 (0.46) | LMNAMAPT | |
| SCHEMBL13683066 | 0.81 | PPARG (0.47) | KMT2APOLBMAPTALDH1A1PPARA | |
| SCHEMBL13563645 | 0.79 | ELANE (0.58) | ELANELMNAKMT2APOLBMAPT | |
| SCHEMBL13683043 | 0.79 | CHRNB2 (0.43) | KMT2AL3MBTL1ALDH1A1TSHRMAPK1 | |
| SCHEMBL13683039 | 0.78 | L3MBTL1 (0.50) | LMNAKMT2AL3MBTL1POLBGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7592118-B2 | Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |
| US-20080241743-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |