Known targets — ChEMBL curated mechanism
ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB known ✓ | P10828 | 1/20 | 0.30 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.43 |
| ▸ | GPR35 | Q9HC97 | 2/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.35 |
| ▸ | ATIC | P31939 | 1/20 | 0.35 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.33 |
| ▸ | ACP1 | P24666 | 1/20 | 0.33 |
| ▸ | MPL | P40238 | 2/20 | 0.32 |
| ▸ | CTRC | Q99895 | 1/20 | 0.32 |
| ▸ | ENTPD1 | P49961 | 1/20 | 0.32 |
| ▸ | ENTPD2 | Q9Y5L3 | 1/20 | 0.32 |
| ▸ | ME2 | P23368 | 1/20 | 0.32 |
| ▸ | ME1 | P48163 | 1/20 | 0.32 |
| ▸ | ME3 | Q16798 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29723656 | 0.91 | NR1I2 (0.38) | CYP2D6GPR35HSD17B10HIF1AALDH1A1 | |
| SCHEMBL9465234 | 0.89 | CYP2D6 (0.51) | CYP2D6GPR35CYP1A2CYP2C19HSD17B10 | |
| SCHEMBL9838417 | 0.88 | CYP2D6 (0.50) | CYP2D6GPR35CYP1A2CYP2C19HSD17B10 | |
| SCHEMBL150862 | 0.79 | CYP2D6 (0.50) | CYP2D6CYP1A2CYP2C19HSD17B10CYP2C9 | |
| SCHEMBL31214973 | 0.77 | CYP2D6 (0.46) | CYP2D6CYP1A2CYP2C19HSD17B10CYP2C9 | |
| SCHEMBL2529080 | 0.75 | GPR84 (0.49) | CYP2D6ALDH1A1NR1I2ACP1KDM4E | |
| SCHEMBL1146958 | 0.74 | TLR8 (0.41) | CYP2D6CYP1A2NR1I2 | |
| SCHEMBL8157496 | 0.74 | CYP3A4 (0.45) | CYP2D6CYP1A2CYP2C19HSD17B10HIF1A | |
| SCHEMBL5182533 | 0.74 | CYP2D6 (0.49) | CYP2D6CYP1A2CYP2C19HSD17B10CYP2C9 | |
| SCHEMBL1203619 | 0.73 | HSD17B10 (0.38) | CYP1A2CYP2C19HSD17B10CYP2C9ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 175 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7767382-B2 | Method of making a photopolymer printing plate | AGFA GRAPHICS NV (BE) | 2010-08-03 | — | — | US | claimed |
| US-11633948-B2 | Method for making lithographic printing plates | EASTMAN KODAK COMPANY (US) | 2023-04-25 | — | — | US | disclosed |
| CN-113954502-B | Photosensitive negative-working lithographic printing plate precursor and method for making lithographic printing plate by using the same | 浙江康尔达新材料股份有限公司 | 2023-04-07 | — | — | CN | disclosed |
| CN-113942289-B | Imageable composition for photosensitive negative-working lithographic printing plate and plate making method thereof | 浙江康尔达新材料股份有限公司 | 2023-02-28 | — | — | CN | disclosed |
| EP-3864466-B1 | AN EFFERVESCENT DEVELOPER PRECURSOR FOR PROCESSING A LITHOGRAPHIC PRINTING PLATE PRECURSOR | AGFA OFFSET BV (BE) | 2022-11-09 | — | — | EP | disclosed |
| US-11422468-B2 | Effervescent developer precursor for processing a lithographic printing plate precursor | AGFA NV (BE) | 2022-08-23 | — | — | US | disclosed |
| EP-4018266-A1 | METHOD FOR MAKING LITHOGRAPHIC PRINTING PLATES | Eastman Kodak Company (US) | 2022-06-29 | — | — | EP | disclosed |
| CN-113954502-A | Photosensitive negative-working lithographic printing plate precursor and method for making lithographic printing plate by using the same | 浙江康尔达新材料股份有限公司 | 2022-01-21 | — | — | CN | disclosed |
| CN-113942289-A | Imageable composition for photosensitive negative-working lithographic printing plate and plate making method thereof | 浙江康尔达新材料股份有限公司 | 2022-01-18 | — | — | CN | disclosed |
| US-20210356869-A1 | AN EFFERVESCENT DEVELOPER PRECURSOR FOR PROCESSING A LITHOGRAPHIC PRINTING PLATE PRECURSOR | ECO3 BV (BE) | 2021-11-18 | — | — | US | disclosed |
| US-20050084797-A1 | Contrast layer comprises a colorant capable of providing a visible image after exposure and development, and the image recording layer is free of the colorant; improved image-contrast and reduced staining | AGFA-GEVAERT (BE) | 2005-04-21 | — | — | US | disclosed |
| EP-1524113-A2 | Method of making a heat-sensitive lithographic printing plate. | Agfa-Gevaert (BE) | 2005-04-20 | — | — | EP | disclosed |
| EP-1524112-A2 | Heat-sensitive lithographic printing plate precursor | Agfa-Gevaert (BE) | 2005-04-20 | — | — | EP | disclosed |
| US-20030170570-A1 | Inducing coalescence of the thermoplastic polymer particles at exposed areas of the coating; developing the precursor by applying a gum solution to the coating to remove non-exposed areas of the coating from the support | AGFA-GEVAERT (BE) | 2003-09-11 | — | — | US | disclosed |
| EP-1342568-A1 | Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution | AGFA-GEVAERT N.V. (BE) | 2003-09-10 | — | — | EP | disclosed |
| US-4983478-A | Burn-in gumming composition for offset printing plates | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-01-08 | — | — | US | disclosed |
| US-4885230-A | Burn-in gumming composition for offset printing plates | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-12-05 | — | — | US | disclosed |
| US-4617250-A | DIAZO RESIN, HIGH MOLECULAR WEIGHT ACID-CONTAINING COMPOUND, AROMATIC SULFONATE, AND ORGANIC DYE | FUJI PHOTO FILM CO., LTD. (JP) | 1986-10-14 | — | — | US | disclosed |
| US-4576893-A | DIAZO RESIN, PYRIDINEDICARBOXYLIC ACID | FUJI PHOTO FILM CO., LTD. (JP) | 1986-03-18 | — | — | US | disclosed |
| EP-0127893-A2 | Light-sensitive composition for use with lithographic printing plates | FUJI PHOTO FILM CO., LTD. (JP) | 1984-12-12 | — | — | EP | disclosed |