Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL197373

CCCCCCNC(CC)CC.N

nearest known ligand 0.46

Full drug profile on Sugi Atlas →

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 8/20 0.46
TSHR P16473 2/20 0.43
ALDH1A1 P00352 2/20 0.43
LMNA P02545 2/20 0.42
KDM4E B2RXH2 2/20 0.42
CNR1 P21554 1/20 0.42
ADRA1A P35348 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
ABCC3 O15438 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
ADH1B P00325 1/20 0.41
ADH1C P00326 1/20 0.41
ADH1A P07327 1/20 0.41
ADH4 P08319 1/20 0.41
ADH7 P40394 1/20 0.41
THRB P10828 1/20 0.40
PPARA Q07869 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL198005 1.00 EPHX1 (0.46) EPHX1TSHRALDH1A1LMNAKDM4E
SCHEMBL7776968 0.97 EPHX1 (0.48) EPHX1TSHRALDH1A1LMNAKDM4E
SCHEMBL20033727 0.97 EPHX1 (0.48) EPHX1TSHRALDH1A1LMNAKDM4E
SCHEMBL10879682 0.97 EPHX1 (0.48) EPHX1TSHRALDH1A1LMNAKDM4E
SCHEMBL27599073 0.97 EPHX1 (0.48) EPHX1TSHRALDH1A1LMNAKDM4E
SCHEMBL25132260 0.97 EPHX1 (0.48) EPHX1TSHRALDH1A1LMNAKDM4E
SCHEMBL1237101 0.97 EPHX1 (0.48) EPHX1TSHRALDH1A1LMNAKDM4E
SCHEMBL10393993 0.97 EPHX1 (0.48) EPHX1TSHRALDH1A1LMNAKDM4E
Hydrochloric Acid SCHEMBL27579875 0.95 ABCC3 (0.46) EPHX1TSHRALDH1A1LMNAKDM4E
Bromide SCHEMBL10874058 0.95 EPHX1 (0.46) EPHX1TSHRALDH1A1LMNAKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 83 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118480173-B Cationic polyester and preparation method and application thereof 深圳市信必递生物科技有限公司 2025-02-07 CN disclosed
CN-118480173-A Cationic polyester and preparation method and application thereof 深圳市信必递生物科技有限公司 2024-08-13 CN disclosed
US-11518736-B2 Blocking agent for amines, latent hardeners and polyurethane compositions SIKA TECHNOLOGY AG (CH) 2022-12-06 US disclosed
CN-115368824-A Fast curing migration-free compositions based on organic polymers containing silane groups SIKA技术股份公司 2022-11-22 CN disclosed
EP-3394132-B1 TWO-COMPONENT POLYURETHANE COMPOSITION SIKA TECH AG (CH) 2022-11-09 EP disclosed
EP-3394139-B1 POLYURETHANE COMPOSITION WITH LOW PLASTICIZER MIGRATION SIKA TECH AG (CH) 2022-07-20 EP disclosed
US-20220144746-A1 PROCESS FOR PRODUCING 2,2-DIALKYL-3-ACYLOXYPROPANALS SIKA TECHNOLOGY AG (CH) 2022-05-12 US disclosed
CN-110753711-B Amine blocking agent, latent curing agent and polyurethane composition SIKA技术股份公司 2022-04-05 CN disclosed
EP-3969435-A1 PROCESS FOR PRODUCING 2,2-DIALKYL-3-ACYLOXYPROPANALS Sika Technology AG (CH) 2022-03-23 EP disclosed
CN-108368233-B Two-component polyurethane composition SIKA技术股份公司 2022-02-08 CN disclosed
US-20100130674-A1 METHOD FOR THE PRODUCTION OF POLYURETHANE COMPOSITIONS WITH A LOW ISOCYANATE MONOMER CONTENT SIKA TECHNOLOGY AG (CH) 2010-05-27 US disclosed
US-20100101455-A1 ALDIMINES AND COMPOSITIONS COMPRISING ALDIMINE SIKA TECHNOLOGY AG (CH) 2010-04-29 US disclosed
US-20100006221-A1 Amorphous polyurethane polymer and its use in hotmelt adhesives SIKA TECHNOLOGY AG (CH) 2010-01-14 US disclosed
US-20100003526-A1 Polyurethane composition with good initial strength SIKA TECHNOLOGY AG (CH) 2010-01-07 US disclosed
US-7629433-B2 Odor-less during hydrolytic deblocking, separation; for use as source for aldehydes; crosslinking agents SIKA TECHNOLOGY AG (CH) 2009-12-08 US disclosed
US-20090176944-A1 Aldimines Comprising Reactive Groups Containing Active Hydrogen, and Use Thereof SIKA TECHNOLOGY AG (CH) 2009-07-09 US disclosed
US-20090159204-A1 Moisture-Hardened Polyurethane Compositions Containing Compounds Comprising Aldimine SIKA TECHNOLOGY AG 2009-06-25 US disclosed
US-20090099333-A1 Compounds Containing Aldimine SIKA TECHNOLOGY AG (CH) 2009-04-16 US disclosed
US-20080280145-A1 moisture-reactive hot-melt adhesive which comprises at least one aldimine and at least one polyurethane polymer ( polyesterurethane copolymer, polyetherurethane copolymer)which contains isocyanate groups and is solid at room temperature; bonded assembly is notable for improved adhesive SIKA TECHNOLOGY AG (CH) 2008-11-13 US disclosed
US-20080251204-A1 Reactive Polyurethane-Hot Melt Adhesive Having a Low Isocyanate-Monomer Content SIKA TECHNOLOGY AG (CH) 2008-10-16 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11518736-B2 Blocking agent for amines, latent hardeners and polyurethane compositions ODC1, KDM2B, ALKBH2 EPHX1 1288/4885TSHR 4857/4885ALDH1A1 20/4885
US-20100101455-A1 ALDIMINES AND COMPOSITIONS COMPRISING ALDIMINE ALDH7A1, ILK, ALDH3A1 EPHX1 559/4885TSHR 4884/4885ALDH1A1 5/4885
US-20090176944-A1 Aldimines Comprising Reactive Groups Containing Active Hydrogen, and Use Thereof ADH5, ADH1C, ADH1A EPHX1 371/4885TSHR 4062/4885ALDH1A1 5/4885
US-20220144746-A1 PROCESS FOR PRODUCING 2,2-DIALKYL-3-ACYLOXYPROPANALS ADCY4, ADCY1, ADCY2 EPHX1 357/4885TSHR 3940/4885ALDH1A1 19/4885
US-20090099333-A1 Compounds Containing Aldimine ALDH7A1, ALDH3A1, ALDH1A1 EPHX1 291/4885TSHR 4769/4885ALDH1A1 3/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.