SCHEMBL218750

SCHEMBL218750

Oc1ccc(C2(c3ccc(O)c(-c4ccccc4)c3)c3ccccc3-c3ccccc32)cc1-c1ccccc1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.63
ESR2 Q92731 1/20 0.63
BACE1 P56817 2/20 0.50
ALDH1A1 P00352 2/20 0.48
HPGD P15428 1/20 0.48
BCL2L1 Q07817 1/20 0.48
HSD17B10 Q99714 1/20 0.48
MEN1 O00255 4/20 0.46
KMT2A Q03164 4/20 0.46
MAPT P10636 4/20 0.46
LMNA P02545 3/20 0.46
SMN1; SMN2 Q16637 3/20 0.46
KDM4E B2RXH2 1/20 0.46
OPRK1 P41145 1/20 0.46
PELI1 Q96FA3 1/20 0.41
MAOA P21397 1/20 0.41
MAOB P27338 1/20 0.41
HSD17B1 P14061 1/20 0.41
HSD17B2 P37059 1/20 0.41
ALOX5 P09917 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29837106 1.00 ESR1 (0.63) ESR1ESR2BACE1ALDH1A1HPGD
SCHEMBL29389637 1.00 ESR1 (0.63) ESR1ESR2BACE1ALDH1A1HPGD
SCHEMBL17352704 0.93 ESR1 (0.59) ESR1ESR2BACE1ALDH1A1HPGD
SCHEMBL17352706 0.89 ESR2 (0.54) ESR1ESR2BACE1ALDH1A1HPGD
SCHEMBL22187696 0.89 ESR1 (0.50) ESR1ESR2BACE1ALDH1A1HPGD
SCHEMBL23878247 0.88 ESR2 (0.60) ESR1ESR2BACE1ALDH1A1HPGD
SCHEMBL30314614 0.88 ESR2 (0.60) ESR1ESR2BACE1ALDH1A1HPGD
SCHEMBL14199332 0.87 ESR1 (0.56) ESR1ESR2BACE1ALDH1A1HPGD
SCHEMBL22187643 0.85 ESR2 (0.46) ESR1ESR2BACE1ALDH1A1HPGD
SCHEMBL22187652 0.85 HSD17B1 (0.48) ESR1ESR2BACE1ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 680 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7303855-B2 Photoresist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-12-04 US claimed
US-20060019195-A1 Photoresist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-01-26 US claimed
US-20260146124-A1 RESIN COMPOSITION AND USES OF THE SAME TAIWAN UNION TECHNOLOGY CORPORATION (TW) 2026-05-28 US disclosed
EP-3677614-B1 THERMOPLASTIC RESIN AND OPTICAL MEMBER TEIJIN LTD (JP) 2026-05-27 EP disclosed
US-12637540-B2 Resin produced by polycondensation, and resin composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-05-26 US disclosed
US-20260139096-A1 THERMOPLASTIC RESIN AND OPTICAL MEMBER TEIJIN LIMITED (JP) 2026-05-21 US disclosed
EP-4184248-B1 COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND AND POLYMER FOR FORMING ORGANIC FILM SHINETSU CHEMICAL CO (JP) 2026-04-15 EP disclosed
US-12590173-B2 Composition, pattern forming method, semiconductor device, and method for manufacturing semiconductor device KIOXIA CORPORATION (JP) 2026-03-31 US disclosed
US-20260085154-A1 POLYMER, COMPOSITION, CURED PRODUCT, LAMINATED BODY, AND ELECTRONIC COMPONENT JSR CORPORATION (JP) 2026-03-26 US disclosed
US-12584023-B2 Composition for forming organic film, patterning process, and compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-03-24 US disclosed
EP-3909744-B1 ANTIREFLECTION FILM AND MULTILAYER FILM HAVING ANTIREFLECTION FILM MITSUBISHI GAS CHEMICAL CO (JP) 2026-03-11 EP disclosed
EP-1178068-A1 PROCESSES FOR PRODUCING RAW POLYCARBONATE RESIN MATERIAL AND PRODUCING POLYCARBONATE RESIN IDEMITSU PETROCHEMICAL CO., LTD. (JP) 2002-02-06 EP disclosed
US-6340737-B2 COPOLYCARBONATE OF A 9,9-BIS(HYDROXYPHENYL)FLUORENE COMPOUND, A POLYSILOXANE ENDCAPPED WITH A HYDROXYPHENYL GROUP, AND A PHENOLIC DIOL SUCH AS BISPHENOL A; REDUCED OBLIQUE INCIDENCE BIREFRINGENCE, MOLDABILITY, GOOD TRANSPARENCY MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2002-01-22 US disclosed
US-20010039313-A1 Polycarbonate resin and optical article used the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-11-08 US disclosed
US-6136521-A POLYORGANOSILOXANE-CONTAINING POLYCARBONATE IDEMITSU KOSAN CO., LTD. (JP) 2000-10-24 US disclosed
US-6051294-A RETORT-STERILIZABLE PACKAGING MATERIALS EXHIBITING HIGH BARRIER TO OXYGEN THE DOW CHEMICAL COMPANY (US) 2000-04-18 US disclosed
EP-0896975-A1 POLYCARBONATE, AND MOLDING AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR PREPARED THEREFROM IDEMITSU KOSAN COMPANY LIMITED (JP) 1999-02-17 EP disclosed
US-5814373-A PACKAGING OF OXYGEN SENSITIVE MATERIALS INSIDE A CONTAINER COMPRISING A THERMOPLASTIC POLYMER DOW CHEMICAL COMPANY (US) 1998-09-29 US disclosed
EP-0837085-A1 POLYCARBONATE-BASE POLYMER, PRODUCTION PROCESS, RESIN COATING FLUID PREPARED THEREFROM, AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR PREPARED THEREFROM IDEMITSU KOSAN COMPANY LIMITED (JP) 1998-04-22 EP disclosed
WO-1996029365-A1 VEHICLE EXTERIOR BODY PANELS PREPARED FROM DIARYL FLUORENE CARBONATE POLYMERS THE DOW CHEMICAL COMPANY (US) 1996-09-26 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260139096-A1 THERMOPLASTIC RESIN AND OPTICAL MEMBER HEATR1, HSF1, WHR1 ESR1 1274/4885ESR2 1717/4885BACE1 1998/4885
US-12584023-B2 Composition for forming organic film, patterning process, and compound F12, MLX, F11 ESR1 1891/4885ESR2 2260/4885BACE1 2147/4885
US-20260146124-A1 RESIN COMPOSITION AND USES OF THE SAME ARCN1, ASH2L, ITGA1 ESR1 201/4885ESR2 188/4885BACE1 2646/4885
US-12637540-B2 Resin produced by polycondensation, and resin composition TAF1, TAF5, PUF60 ESR1 758/4885ESR2 520/4885BACE1 4326/4885
US-12590173-B2 Composition, pattern forming method, semiconductor device, and method for manufacturing semiconductor device TET2, SDC2, TST ESR1 1651/4885ESR2 2468/4885BACE1 4241/4885
US-20260085154-A1 POLYMER, COMPOSITION, CURED PRODUCT, LAMINATED BODY, AND ELECTRONIC COMPONENT RER1, COL1A1, SMC1A ESR1 606/4885ESR2 507/4885BACE1 3609/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.