Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.95 |
| ▸ | TSHR | P16473 | 3/20 | 0.95 |
| ▸ | THRB | P10828 | 1/20 | 0.59 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.55 |
| ▸ | LMNA | P02545 | 1/20 | 0.55 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.44 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.44 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.44 |
| ▸ | PGR | P06401 | 1/20 | 0.44 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.44 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.44 |
| ▸ | HTR1A | P08908 | 1/20 | 0.44 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.44 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.44 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.44 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.44 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.44 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1904827 | 1.00 | ALDH1A1 (0.95) | ALDH1A1TSHRTHRBHSD17B10LMNA | |
| SCHEMBL11421454 | 1.00 | ALDH1A1 (0.95) | ALDH1A1TSHRTHRBHSD17B10LMNA | |
| SCHEMBL57013 | 1.00 | ALDH1A1 (0.95) | ALDH1A1TSHRTHRBHSD17B10LMNA | |
| SCHEMBL28470629 | 1.00 | ALDH1A1 (0.95) | ALDH1A1TSHRTHRBHSD17B10LMNA | |
| SCHEMBL2702056 | 1.00 | ALDH1A1 (0.95) | ALDH1A1TSHRTHRBHSD17B10LMNA | |
| SCHEMBL23495553 | 1.00 | ALDH1A1 (0.95) | ALDH1A1TSHRTHRBHSD17B10LMNA | |
| Ether SCHEMBL28845045 | 0.98 | ALDH1A1 (0.91) | ALDH1A1TSHRTHRBHSD17B10LMNA | |
| SCHEMBL24056 | 0.97 | — | — | |
| SCHEMBL8518918 | 0.97 | ALDH1A1 (1.00) | ALDH1A1TSHRTHRBHSD17B10LMNA | |
| Alcohol SCHEMBL1844404 | 0.95 | ALDH1A1 (0.86) | ALDH1A1TSHRTHRBHSD17B10LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 712 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115895377-B | Solvent type high refractive index composition and application thereof in OLED display device | 西安思摩威新材料有限公司 | 2023-11-24 | — | — | CN | claimed |
| CN-115895377-A | Solvent type high-refractive-index composition and application thereof in OLED display device | 西安思摩威新材料有限公司 | 2023-04-04 | — | — | CN | claimed |
| CN-102453149-A | Olefin polymerization catalyst component, olefin polymerization catalyst, and olefin polymerization method | CHINA PETROLEUM & CHEMICAL | 2012-05-16 | — | — | CN | claimed |
| US-20060011584-A1 | Etchant and etching method | DAIKIN INDUSTRIES, LTD. (JP) | 2006-01-19 | — | — | US | claimed |
| EP-1538664-A1 | ETCHANT AND ETCHING METHOD | Daikin Industries, Ltd. (JP) | 2005-06-08 | — | — | EP | claimed |
| US-12630727-B2 | Photocurable inkjet printing ink composition | SAKATA INX CORPORATION (JP) | 2026-05-19 | — | — | US | disclosed |
| CN-122029488-A | Photosensitive coloring composition, cured product, partition wall, organic electroluminescent element, color filter, and image display device | 三菱化学株式会社 | 2026-05-12 | — | — | CN | disclosed |
| US-20260125594-A1 | QUANTUM DOT-CONTAINING COMPOSITION AND METHOD FOR PRODUCING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-07 | — | — | US | disclosed |
| US-12588446-B2 | Surface treatment composition and method for producing wafer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2026-03-24 | — | — | US | disclosed |
| US-12570865-B2 | Active energy ray-curable inkjet printing ink composition | SAKATA INX CORPORATION (JP) | 2026-03-10 | — | — | US | disclosed |
| EP-4700824-A1 | LOW-TEMPERATURE-SINTERING BONDING MATERIAL AND BONDED STRUCTURE | Daicel Corporation (JP) | 2026-02-25 | — | — | EP | disclosed |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | CENTRAL GLASS CO LTD (JP) | 2026-01-15 | — | — | US | disclosed |
| US-4863835-A | UNSATURATED POLYESTER, BENZYL ALCOHOL, TETRAHYDROFURFURYL ALCOHOL, ACID | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1989-09-05 | — | — | US | disclosed |
| EP-0037179-B1 | DEVELOPER COMPOSITION FOR LITHOGRAPHIC PRINTING PLATES, A METHOD OF PLATE DEVELOPMENT, AND DEVELOPED PLATES | MITSUBISHI KASEI CORPORATION (JP) | 1985-05-29 | — | — | EP | disclosed |
| EP-0013006-B1 | DEVELOPER COMPOSITION FOR LITHOGRAPHIC PRINTING PLATES | MITSUBISHI KASEI CORPORATION (JP) | 1983-06-22 | — | — | EP | disclosed |
| EP-0037179-A2 | Developer composition for lithographic printing plates, a method of plate development, and developed plates | MITSUBISHI KASEI CORPORATION (JP) | 1981-10-07 | — | — | EP | disclosed |
| US-4271261-A | PHOTOSENSITIVE POLYMER | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1981-06-02 | — | — | US | disclosed |
| US-4267260-A | Developer for lithographic printing plate | MITSUBISHI CHEMICAL INDUSTRIES, LTD. (JP) | 1981-05-12 | — | — | US | disclosed |
| EP-0013006-A1 | Developer composition for lithographic printing plates | MITSUBISHI KASEI CORPORATION (JP) | 1980-07-09 | — | — | EP | disclosed |
| US-4186122-A | POLYESTER-AMIDE-IMIDE COPOLYMERS | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1980-01-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12588446-B2 | Surface treatment composition and method for producing wafer | SGMS1, SGMS2, SMURF1 | ALDH1A1 2890/4885TSHR 2614/4885THRB 2012/4885 |
| US-12570865-B2 | Active energy ray-curable inkjet printing ink composition | ACP1, HPD, ACVRL1 | ALDH1A1 351/4885TSHR 4474/4885THRB 2496/4885 |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | ESPL1, SMS, SGMS1 | ALDH1A1 1476/4885TSHR 2961/4885THRB 2882/4885 |
| US-20260125594-A1 | QUANTUM DOT-CONTAINING COMPOSITION AND METHOD FOR PRODUCING THE SAME | ITGA6, STRA6, ILK | ALDH1A1 1562/4885TSHR 1369/4885THRB 3316/4885 |
| US-12630727-B2 | Photocurable inkjet printing ink composition | OR10J3, TAS2R20, ILK | ALDH1A1 41/4885TSHR 2979/4885THRB 1233/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.