Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.68 |
| ▸ | MEN1 | O00255 | 1/20 | 0.65 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.65 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.64 |
| ▸ | CA1 | P00915 | 1/20 | 0.61 |
| ▸ | CA2 | P00918 | 1/20 | 0.61 |
| ▸ | CA4 | P22748 | 1/20 | 0.61 |
| ▸ | CA6 | P23280 | 1/20 | 0.61 |
| ▸ | SNCA | P37840 | 3/20 | 0.56 |
| ▸ | TYR | P14679 | 2/20 | 0.54 |
| ▸ | IDH1 | O75874 | 1/20 | 0.52 |
| ▸ | IGF1R | P08069 | 1/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4055779 | 0.87 | MAPT (0.81) | MAPTMEN1KMT2AALOX5TYR | |
| SCHEMBL18121258 | 0.87 | MAPT (0.61) | MAPTMEN1KMT2AALOX5CA1 | |
| SCHEMBL278523 | 0.85 | MAPT (0.78) | MAPTMEN1KMT2AALOX5TYR | |
| SCHEMBL278274 | 0.82 | ALOX5 (0.66) | MAPTMEN1KMT2AALOX5TYR | |
| SCHEMBL4056986 | 0.82 | MAPT (0.72) | MAPTMEN1KMT2AALOX5TYR | |
| SCHEMBL12682352 | 0.81 | MAPT (1.00) | MAPTALOX5CA1CA2CA4 | |
| SCHEMBL21360632 | 0.80 | MAPT (0.62) | MAPTMEN1KMT2AALOX5CA1 | |
| SCHEMBL51397 | 0.80 | TYR (0.71) | MAPTMEN1KMT2AALOX5TYR | |
| SCHEMBL10335338 | 0.79 | ALOX15 (0.70) | MAPTMEN1KMT2AALOX5TYR | |
| SCHEMBL278775 | 0.79 | TYR (0.68) | MAPTMEN1KMT2AALOX5TYR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9567433-B2 | Methods for forming a polycarbonate with a hydrophilic surface | GM Global Technology Operations LLC (US) | 2017-02-14 | — | — | US | disclosed |
| US-20160264729-A1 | METHODS FOR FORMING A POLYCARBONATE WITH A HYDROPHILIC SURFACE | GM GLOBAL TECHNOLOGY OPERATIONS LLC. | 2016-09-15 | — | — | US | disclosed |
| US-8530003-B2 | Polybenzoxazole precursor, photosensitive resin composition using the same, and manufacturing method of semiconductor device | FUJIFILM CORPORATION (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8530003-B2 | Polybenzoxazole precursor, photosensitive resin composition using the same, and manufacturing method of semiconductor device | FUJIFILM CORPORATION (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8269358-B2 | Bis(aminophenol) derivative, process for producing same, polyamide resin, positive photosensitive resin composition, protective film, interlayer dielectric film, semiconductor device, and display element | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 2012-09-18 | — | — | US | disclosed |
| US-8269358-B2 | Bis(aminophenol) derivative, process for producing same, polyamide resin, positive photosensitive resin composition, protective film, interlayer dielectric film, semiconductor device, and display element | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 2012-09-18 | — | — | US | disclosed |
| US-8198006-B2 | Process for producing semiconductor device | SUMITOMO BAKELITE CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-8198006-B2 | Process for producing semiconductor device | SUMITOMO BAKELITE CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20120115333-A1 | POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2012-05-10 | — | — | US | disclosed |
| US-20120115333-A1 | POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2012-05-10 | — | — | US | disclosed |
| US-20100044888-A1 | BIS(AMINOPHENOL) DERIVATIVE, PROCESS FOR PRODUCING SAME, POLYAMIDE RESIN, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM, INTERLAYER DIELECTRIC FILM, SEMICONDUCTOR DEVICE, AND DISPLAY ELEMENT | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20100044888-A1 | BIS(AMINOPHENOL) DERIVATIVE, PROCESS FOR PRODUCING SAME, POLYAMIDE RESIN, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM, INTERLAYER DIELECTRIC FILM, SEMICONDUCTOR DEVICE, AND DISPLAY ELEMENT | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 2010-02-25 | — | — | US | disclosed |
| US-7368205-B2 | Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device | SUMITOMO BAKELITE CO., LTD. (JP) | 2008-05-06 | — | — | US | disclosed |
| US-7368205-B2 | Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device | SUMITOMO BAKELITE CO., LTD. (JP) | 2008-05-06 | — | — | US | disclosed |
| US-7361445-B2 | Mixture of alkali soluble resin, quinonediazide compound and alcohol | SUMITOMO BAKELITE COMPANY (JP) | 2008-04-22 | — | — | US | disclosed |
| US-7361445-B2 | Mixture of alkali soluble resin, quinonediazide compound and alcohol | SUMITOMO BAKELITE COMPANY (JP) | 2008-04-22 | — | — | US | disclosed |
| US-20080076849-A1 | POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080076849-A1 | POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |
| US-7238455-B2 | Mixture of alkali soluble resin, quinonediazide compound and alcohol | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2007-07-03 | — | — | US | disclosed |
| US-7238455-B2 | Mixture of alkali soluble resin, quinonediazide compound and alcohol | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2007-07-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100044888-A1 | BIS(AMINOPHENOL) DERIVATIVE, PROCESS FOR PRODUCING SAME, POLYAMIDE RESIN, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM, INTERLAYER DIELECTRIC FILM, SEMICONDUCTOR DEVICE, AND DISPLAY ELEMENT | RARA, AASDHPPT, GABRP | MAPT 1103/4885MEN1 4464/4885KMT2A 434/4885 |
| US-20120115333-A1 | POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | CD79B, BRIX1, SMARCB1 | MAPT 1292/4885MEN1 1019/4885KMT2A 82/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.