Known targets — ChEMBL curated mechanism
ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB known ✓ | P10828 | 3/20 | 0.44 |
| ▸ | P2RY2 known ✓ | P41231 | 2/20 | 0.40 |
| ▸ | P2RY4 known ✓ | P51582 | 2/20 | 0.40 |
| ▸ | CA12 known ✓ | O43570 | 1/20 | 0.35 |
| ▸ | CA2 known ✓ | P00918 | 1/20 | 0.35 |
| ▸ | P2RY12 known ✓ | Q9H244 | 1/20 | 0.35 |
| ▸ | SNCA | P37840 | 2/20 | 0.45 |
| ▸ | MEN1 | O00255 | 3/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.44 |
| ▸ | GLO1 | Q04760 | 3/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.41 |
| ▸ | SENP3 | Q9H4L4 | 2/20 | 0.41 |
| ▸ | SENP2 | Q9HC62 | 2/20 | 0.41 |
| ▸ | SENP1 | Q9P0U3 | 2/20 | 0.41 |
| ▸ | POLB | P06746 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | SUMO2 | P61956 | 1/20 | 0.41 |
| ▸ | SUMO1 | P63165 | 1/20 | 0.41 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2862763 | 1.00 | SNCA (0.45) | SNCAMEN1KMT2ATHRBGLO1 | |
| SCHEMBL2858719 | 0.92 | KMT2A (0.52) | SNCAMEN1KMT2ATHRBGLO1 | |
| SCHEMBL29356356 | 0.92 | KMT2A (0.52) | SNCAMEN1KMT2ATHRBGLO1 | |
| SCHEMBL19322475 | 0.86 | KMT2A (0.61) | SNCAMEN1KMT2ATHRBGLO1 | |
| SCHEMBL15276044 | 0.86 | KMT2A (0.61) | SNCAMEN1KMT2ATHRBGLO1 | |
| SCHEMBL26460771 | 0.86 | KMT2A (0.61) | SNCAMEN1KMT2ATHRBGLO1 | |
| SCHEMBL28467677 | 0.86 | THRB (0.61) | SNCAMEN1KMT2ATHRBGLO1 | |
| SCHEMBL591337 | 0.79 | THRB (0.53) | SNCAMEN1KMT2ATHRBMAPK1 | |
| SCHEMBL2862964 | 0.79 | THRB (0.53) | SNCAMEN1KMT2ATHRBMAPK1 | |
| SCHEMBL29353590 | 0.79 | THRB (0.53) | SNCAMEN1KMT2ATHRBMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250290249-A1 | DIRECT TO FILM TRANSFER PROCESS FOR INKJET INKS ON SUBSTRATES USING PIGMENTED POLYMER POWDERS | Prism Inks, Inc. (US) | 2025-09-18 | — | — | US | disclosed |
| EP-4617076-A1 | DIRECT TO FILM TRANSFER PROCESS FOR INKJET INKS ON SUBSTRATES USING PIGMENTED POLYMER POWDERS | Prism Inks, Inc. (US) | 2025-09-17 | — | — | EP | disclosed |
| WO-2025123135-A1 | ASSAY FOR DETECTION AND QUANTIFICATION OF PFAS COMPOUNDS | FREDSENSE TECHNOLOGIES CORP. (CA) | 2025-06-19 | — | — | WO | disclosed |
| US-20250092273-A1 | WAX-BASED DRY ERASE INK | CRAYOLA LLC (US) | 2025-03-20 | — | — | US | disclosed |
| WO-2025014926-A1 | COMPOSITIONS AND METHODS FOR PERMANENTLY OR REVERSIBLY COLORING FIBERS AND TEXTILES | TANDEM REPEAT TECHNOLOGIES, INC. (US) | 2025-01-16 | — | — | WO | disclosed |
| US-20250011682-A1 | COLORED PLANAR WICK | LUMETIQUE, INC. (US) | 2025-01-09 | — | — | US | disclosed |
| WO-2024262330-A1 | METHOD FOR MANUFACTURING OPTICAL LAMINATE | 日東電工株式会社 | 2024-12-26 | — | — | WO | disclosed |
| WO-2024247803-A1 | METHOD FOR MANUFACTURING OPTICAL FILM PIECES, AND METHOD FOR CUTTING OPTICAL FILM | 日東電工株式会社 | 2024-12-05 | — | — | WO | disclosed |
| CN-119013606-A | Optical laminate, lens unit, and display method | 日东电工株式会社 | 2024-11-22 | — | — | CN | disclosed |
| EP-4437272-A1 | COLORED PLANAR WICK | Lumetique, Inc. (US) | 2024-10-02 | — | — | EP | disclosed |
| US-20230323595-A1 | WATER-SOLUBLE FILM BASED DELIVERY SYSTEMS FOR COLORANTS, GLITTER, AND OTHER CHEMISTRIES | CRAYOLA LLC (US) | 2023-10-12 | — | — | US | disclosed |
| WO-2023176632-A1 | OPTICAL LAMINATE, LENS, AND DISPLAY METHOD | 日東電工株式会社 | 2023-09-21 | — | — | WO | disclosed |
| CN-116577861-A | Polarizing material, polarizing plate, and method for producing polarizing material | 日东电工株式会社 | 2023-08-11 | — | — | CN | disclosed |
| CN-116577860-A | Optical laminate | 日东电工株式会社 | 2023-08-11 | — | — | CN | disclosed |
| WO-2023112533-A1 | POLARIZING SHEET | 三菱瓦斯化学株式会社 | 2023-06-22 | — | — | WO | disclosed |
| WO-2023091774-A1 | COLORED PLANAR WICK | LUMETIQUE, INC. (US) | 2023-05-25 | — | — | WO | disclosed |
| EP-2950122-B1 | COLORED LOW-POLARIZATION FILM, COLORED LOW-POLARIZATION SHEET, LENS AND METHOD FOR MANUFACTURING SAME | MITSUBISHI GAS CHEMICAL CO (JP) | 2023-04-26 | — | — | EP | disclosed |
| WO-2023063280-A1 | FILM UNDERFILL MATERIAL, RESIN COMPOSITION FOR FILM UNDERFILL MATERIAL, METHOD FOR MANUFACTURING SEMICONDUCTOR CHIP WITH RESIN COMPOSITION LAYER USING FILM UNDERFILL MATERIAL, METHOD FOR MANUFACTURING SUBSTRATE FOR MOUNTING SEMICONDUCTOR CHIP WITH RESIN COMPOSITION LAYER, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 三菱瓦斯化学株式会社 | 2023-04-20 | — | — | WO | disclosed |
| CN-111094474-B | Near-infrared-curable ink composition, near-infrared-curable film, method for producing near-infrared-curable film, and method for photo-molding | 住友金属矿山株式会社 | 2022-06-07 | — | — | CN | disclosed |
| EP-3964554-A1 | COMPOSITON SENSITIVE TO UV-C RADIATION AND UV-C STERILIZATION OR DISINFECTION DOSIMETER | Terragene LLC (US) | 2022-03-09 | — | — | EP | disclosed |