Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.43 |
| ▸ | ACP3 | P15309 | 1/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | SRR | Q9GZT4 | 2/20 | 0.40 |
| ▸ | ALPI | P09923 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.39 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.39 |
| ▸ | XIAP | P98170 | 1/20 | 0.39 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.39 |
| ▸ | PPARG | P37231 | 4/20 | 0.38 |
| ▸ | PPARA | Q07869 | 3/20 | 0.38 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | NCOA1 | Q15788 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | NCOA3 | Q9Y6Q9 | 1/20 | 0.38 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.38 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.38 |
| ▸ | MDM2 | Q00987 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27560452 | 0.89 | PPARG (0.43) | PKMPPARGPPARASMN1; SMN2 | |
| SCHEMBL27560455 | 0.89 | MEN1 (0.42) | PKMPPARGPPARASMN1; SMN2 | |
| SCHEMBL11578746 | 0.85 | EPHX1 (0.42) | EPHX1ACP3CYP1A2SRRALPI | |
| SCHEMBL28980079 | 0.80 | LMNA (0.44) | ALDH1A1 | |
| SCHEMBL9052442 | 0.79 | CYP1A2 (0.45) | EPHX1CYP1A2SRRALPIPKM | |
| SCHEMBL8885808 | 0.79 | POLB (0.38) | ACP3CYP1A2PKMSMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL7378130 | 0.78 | SRR (0.44) | EPHX1CYP1A2SRRALPIPKM | |
| SCHEMBL15451165 | 0.76 | CYP1A2 (0.42) | CYP1A2SRRALPIPKMPTGS1 | |
| SCHEMBL8610252 | 0.76 | EPHX1 (0.52) | EPHX1CYP1A2SRRALPIPKM | |
| SCHEMBL29200771 | 0.76 | RIPK1 (0.39) | EPHX1SLC6A2SLC6A4SLC6A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 397 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240077802-A1 | METHOD OF FORMING PHOTORESIST PATTERN | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-03-07 | — | — | US | claimed |
| US-20230384673-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-11-30 | — | — | US | claimed |
| US-20260140444-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-05-21 | — | — | US | disclosed |
| US-20260130180-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND WAFER PROTECTIVE COMPOSITION | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-05-07 | — | — | US | disclosed |
| US-12607937-B2 | Photoresist top coating material for etching rate control | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-04-21 | — | — | US | disclosed |
| US-20260104643-A1 | METHOD OF FORMING PHOTORESIST PATTERN | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-04-16 | — | — | US | disclosed |
| US-20260079395-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND AND ACID DIFFUSION CONTROL AGENT | TOKYO OHKA KOGYO CO LTD (JP) | 2026-03-19 | — | — | US | disclosed |
| US-12578640-B2 | Photosensitive material for photoresist and lithography | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-03-17 | — | — | US | disclosed |
| US-12566374-B2 | Photoresist composition and method of manufacturing semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-03-03 | — | — | US | disclosed |
| US-12566376-B2 | Resist composition and resist pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-03-03 | — | — | US | disclosed |
| US-20260050211-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND INTERMEDIATE THEREOF | TOKYO OHKA KOGYO CO LTD (JP) | 2026-02-19 | — | — | US | disclosed |
| US-20040121316-A1 | Method and compositions for identifying anti-HIV therapeutic compounds | GILEAD SCIENCES, INC. | 2004-06-24 | — | — | US | disclosed |
| US-20040023163-A1 | Positive-working chemical-amplification photoresist composition | YUKAWA HIROTO (JP) | 2004-02-05 | — | — | US | disclosed |
| WO-2003090691-A2 | METHOD AND COMPOSITIONS FOR IDENTIFYING ANTI-HIV THERAPEUTIC COMPOUNDS | GILEAD SCIENCES, INC. (US) | 2003-11-06 | — | — | WO | disclosed |
| WO-2003091264-A2 | NON NUCLEOSIDE REVERSE TRANSCRIPTASE INHIBITORS | GILEAD SCIENCES, INC. (US) | 2003-11-06 | — | — | WO | disclosed |
| EP-0985975-B1 | Positive-working chemical-amplification photoresist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2003-03-19 | — | — | EP | disclosed |
| US-20020119393-A1 | Positive-working chemical-amplification photoresist composition | YUKAWA HIROTO (JP) | 2002-08-29 | — | — | US | disclosed |
| EP-0985975-A1 | Positive-working chemical-amplification photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-03-15 | — | — | EP | disclosed |
| EP-0815103-A1 | TRYPSIN AND THROMBIN INHIBITORS | Novartis AG (CH) | 1998-01-07 | — | — | EP | disclosed |
| WO-1996029327-A1 | TRYPSIN AND THROMBIN INHIBITORS | NOVARTIS AG (CH) | 1996-09-26 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (10 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260140444-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | INO80C, INO80, NAT10 | EPHX1 4283/4885ACP3 3091/4885CYP1A2 3269/4885 |
| US-20040121316-A1 | Method and compositions for identifying anti-HIV therapeutic compounds | CES1, PNP, PGLS | EPHX1 297/4885ACP3 192/4885CYP1A2 2040/4885 |
| US-12607937-B2 | Photoresist top coating material for etching rate control | ERCC1, ERCC2, RAD23B | EPHX1 1709/4885ACP3 2106/4885CYP1A2 3800/4885 |
| US-20260079395-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND AND ACID DIFFUSION CONTROL AGENT | F9, AFF2, AFF1 | EPHX1 3391/4885ACP3 4831/4885CYP1A2 1364/4885 |
| US-12566374-B2 | Photoresist composition and method of manufacturing semiconductor device | INO80C, INO80, PI4K2B | EPHX1 4119/4885ACP3 3153/4885CYP1A2 3418/4885 |
| US-20260050211-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND INTERMEDIATE THEREOF | RARG, RXRG, IGF1R | EPHX1 4015/4885ACP3 3204/4885CYP1A2 523/4885 |
| US-12578640-B2 | Photosensitive material for photoresist and lithography | CDH1, ALG3, TRPA1 | EPHX1 2955/4885ACP3 2457/4885CYP1A2 1454/4885 |
| US-12566376-B2 | Resist composition and resist pattern forming method | RER1, REV1, GAR1 | EPHX1 1581/4885ACP3 3328/4885CYP1A2 381/4885 |
| US-20260130180-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND WAFER PROTECTIVE COMPOSITION | C9, C1S, ZKSCAN2 | EPHX1 1231/4885ACP3 2565/4885CYP1A2 2686/4885 |
| US-20260104643-A1 | METHOD OF FORMING PHOTORESIST PATTERN | DSTN, PFAS, DNTT | EPHX1 1694/4885ACP3 4488/4885CYP1A2 1011/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.