Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FPR2 | P25090 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.38 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.38 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.38 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | MMP2 | P08253 | 1/20 | 0.36 |
| ▸ | MMP9 | P14780 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3140883 | 0.85 | CYP1A2 (0.40) | CYP1A2ALOX5MMP2MMP9 | |
| SCHEMBL3139482 | 0.82 | ALDH1A1 (0.41) | SLC6A2SLC6A3ALDH1A1 | |
| SCHEMBL3139379 | 0.82 | SLC6A3 (0.38) | SLC6A2SLC6A4SLC6A3MMP2MMP9 | |
| SCHEMBL6938342 | 0.82 | LMNA (0.41) | ALDH1A1SMN1; SMN2MMP2MMP9CA1 | |
| SCHEMBL3129710 | 0.82 | MMP2 (0.48) | KMT2ASLC6A2SLC6A4SLC6A3MEN1 | |
| SCHEMBL3141262 | 0.81 | SRC (0.50) | KMT2ASLC6A3ALDH1A1SMN1; SMN2CA1 | |
| SCHEMBL29136114 | 0.79 | PLCG1 (0.38) | KMT2ACYP1A2MMP2MMP9CA1 | |
| SCHEMBL9650409 | 0.79 | CHRM1 (0.33) | SLC6A3SMN1; SMN2MMP2MMP9CA1 | |
| SCHEMBL11873684 | 0.78 | SLC6A4 (0.32) | SLC6A2SLC6A4SLC6A3MMP2MMP9 | |
| SCHEMBL6431027 | 0.73 | KMT2A (0.50) | FPR2KMT2ACYP1A2SLC6A2SLC6A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250020997-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-01-16 | — | — | US | disclosed |
| EP-1676835-B1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | WAKO PURE CHEM IND LTD (JP) | 2014-12-10 | — | — | EP | disclosed |
| US-8669375-B2 | Process for producing ester compound | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2014-03-11 | — | — | US | disclosed |
| US-20130066070-A1 | PROCESS FOR PRODUCING ESTER COMPOUND | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2013-03-14 | — | — | US | disclosed |
| US-8318964-B2 | Process for producing ester compound | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-11-27 | — | — | US | disclosed |
| US-20100324314-A1 | PROCESS FOR PRODUCING ESTER COMPOUND | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-23 | — | — | US | disclosed |
| US-7833691-B2 | Heterocycle-bearing onium salts | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-16 | — | — | US | disclosed |
| EP-1953149-B1 | A heterocycle-containing onium salt | WAKO PURE CHEM IND LTD (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-7642368-B2 | for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2010-01-05 | — | — | US | disclosed |
| EP-1690685-B1 | Planographic printing plate precursor | FUJIFILM CORP (JP) | 2009-04-15 | — | — | EP | disclosed |
| EP-1481973-B1 | HETEROCYCLE-BEARING ONIUM SALTS | WAKO PURE CHEM IND LTD (JP) | 2008-12-31 | — | — | EP | disclosed |
| EP-1953149-A2 | A heterocycle-containing onium salt | Wako Pure Chemical Industries, Ltd. (JP) | 2008-08-06 | — | — | EP | disclosed |
| US-20080161520-A1 | Heterocycle-bearing onium salts | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2008-07-03 | — | — | US | disclosed |
| US-7318991-B2 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2008-01-15 | — | — | US | disclosed |
| US-20070083060-A1 | for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2007-04-12 | — | — | US | disclosed |
| EP-1690685-A2 | Planographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-16 | — | — | EP | disclosed |
| EP-1676835-A1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2006-07-05 | — | — | EP | disclosed |
| US-20050233253-A1 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 2005-10-20 | — | — | US | disclosed |
| EP-1481973-A1 | HETEROCYCLE-BEARING ONIUM SALTS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-12-01 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130066070-A1 | PROCESS FOR PRODUCING ESTER COMPOUND | ADH1C, ADH5, ADH1A | FPR2 4368/4885KMT2A 2021/4885CYP1A2 440/4885 |
| US-20070083060-A1 | for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid | ARSA, HAO2, HAO1 | FPR2 2918/4885KMT2A 833/4885CYP1A2 378/4885 |
| US-20050233253-A1 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | NOX4, CBR1, CBR3 | FPR2 1148/4885KMT2A 3769/4885CYP1A2 276/4885 |
| US-20100324314-A1 | PROCESS FOR PRODUCING ESTER COMPOUND | ADH1C, ADH5, ADH1A | FPR2 4548/4885KMT2A 2032/4885CYP1A2 376/4885 |
| US-20080161520-A1 | Heterocycle-bearing onium salts | MCM5, NIT2, PCNA | FPR2 1972/4885KMT2A 366/4885CYP1A2 3239/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.