Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM1A | O60341 | 11/20 | 0.40 |
| ▸ | MAOB | P27338 | 11/20 | 0.40 |
| ▸ | MAOA | P21397 | 10/20 | 0.40 |
| ▸ | OPRL1 | P41146 | 4/20 | 0.39 |
| ▸ | RORC | P51449 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8675186 | 0.92 | OPRL1 (0.35) | KDM1AMAOBMAOAOPRL1RORC | |
| SCHEMBL4333830 | 0.82 | ESR2 (0.42) | — | |
| SCHEMBL24322076 | 0.80 | SLC6A4 (0.38) | KDM1AMAOBMAOAOPRL1 | |
| SCHEMBL5244042 | 0.79 | OPRL1 (0.39) | KDM1AMAOBMAOAOPRL1 | |
| SCHEMBL17847283 | 0.77 | DPP4 (0.37) | KDM1AMAOBMAOAOPRL1 | |
| SCHEMBL8196759 | 0.76 | GAA (0.35) | — | |
| SCHEMBL11880210 | 0.76 | OPRL1 (0.37) | KDM1AMAOBMAOAOPRL1 | |
| SCHEMBL4753778 | 0.76 | OPRL1 (0.35) | KDM1AMAOBMAOAOPRL1 | |
| SCHEMBL8973167 | 0.76 | ALDH1A1 (0.35) | KDM1AMAOBMAOA | |
| SCHEMBL1248050 | 0.73 | KDM1A (0.44) | KDM1AMAOBMAOA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 170 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0144178-A1 | Cyanoacrylate adhesive composition having sustained toughness | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1985-06-12 | — | — | EP | claimed |
| CN-122094826-A | Method for producing laminate and method for separating CO2 | — | 2026-05-26 | — | — | CN | disclosed |
| CN-122094772-A | Method for producing laminated film, and method for separating CO2 | — | 2026-05-26 | — | — | CN | disclosed |
| US-12637638-B2 | Rinsing solution, method of treating substrate, and method of manufacturing semiconductor device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-26 | — | — | US | disclosed |
| US-12595564-B2 | Method of forming surface treatment film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-04-07 | — | — | US | disclosed |
| US-12575346-B2 | Method for treating surface of substrate, method for region-selectively producing film on surface of substrate, and surface treatment agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-03-10 | — | — | US | disclosed |
| US-12570860-B2 | Two-component treatment agent, treatment method for making metal surface antibacterial and antibacterial treatment agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-03-10 | — | — | US | disclosed |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | CENTRAL GLASS CO LTD (JP) | 2026-01-15 | — | — | US | disclosed |
| US-20250343040-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | CENTRAL GLASS CO LTD (JP) | 2025-11-06 | — | — | US | disclosed |
| US-20250210375-A1 | SURFACE TREATMENT COMPOSITION AND METHOD FOR PRODUCING WAFER | CENTRAL GLASS COMPANY, LIMITED (JP) | 2025-06-26 | — | — | US | disclosed |
| US-20140109941-A1 | RETENTION DEVICE AND RETENTION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-04-24 | — | — | US | disclosed |
| US-20120083561-A1 | ADHESIVE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20120031443-A1 | CLEANING DEVICE, CLEANING METHOD, AND COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-02-09 | — | — | US | disclosed |
| US-8097397-B2 | Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-01-17 | — | — | US | disclosed |
| US-8058220-B2 | Cleaning liquid for lithography and a cleaning method using it for photoexposure devices | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-11-15 | — | — | US | disclosed |
| US-20110195190-A1 | SURFACE TREATMENT LIQUID, SURFACE TREATMENT METHOD, HYDROPHOBILIZATION METHOD, AND HYDROPHOBILIZED SUBSTRATE | TOKYO OHKA KOGYO CO., LTD (JP) | 2011-08-11 | — | — | US | disclosed |
| US-20110061678-A1 | Cleaning liquid for lithography and a cleaning method using it for photoexposure devices | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20100086879-A1 | MATERIAL FOR FORMATION OF PROTECTIVE FILM, METHOD FOR FORMATION OF PHOTORESIST PATTERN, AND SOLUTION FOR WASHING/REMOVAL OF PROTECTIVE FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
| US-20100086799-A1 | Removal method, adhesive agent for substrate, and laminate including substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
| EP-1962327-A1 | WASHING LIQUID FOR PHOTOLITHOGRAPHY, AND METHOD FOR WASHING EXPOSURE DEVICE USING THE SAME | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-08-27 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12637638-B2 | Rinsing solution, method of treating substrate, and method of manufacturing semiconductor device | DSTN, CFL1, TLN1 | KDM1A 339/4885MAOB 988/4885MAOA 1193/4885 |
| US-12570860-B2 | Two-component treatment agent, treatment method for making metal surface antibacterial and antibacterial treatment agent | SARS1, ACE2, EIF2AK2 | KDM1A 1944/4885MAOB 214/4885MAOA 381/4885 |
| US-12595564-B2 | Method of forming surface treatment film | TWF2, IKZF3, HAO2 | KDM1A 1029/4885MAOB 1421/4885MAOA 847/4885 |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | ESPL1, SMS, SGMS1 | KDM1A 667/4885MAOB 945/4885MAOA 377/4885 |
| US-12575346-B2 | Method for treating surface of substrate, method for region-selectively producing film on surface of substrate, and surface treatment agent | SI, SIK1, BAK1 | KDM1A 474/4885MAOB 2680/4885MAOA 2280/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.