Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.44 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.44 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.44 |
| ▸ | KIF11 | P52732 | 1/20 | 0.42 |
| ▸ | ACHE | P22303 | 3/20 | 0.40 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.39 |
| ▸ | RXRA | P19793 | 1/20 | 0.38 |
| ▸ | RXRB | P28702 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.35 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.35 |
| ▸ | CASP3 | P42574 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5433181 | 0.84 | HDAC8 (0.45) | HDAC8HDAC4HDAC2KIF11ACHE | |
| SCHEMBL781852 | 0.82 | HDAC8 (0.44) | HDAC8HDAC4HDAC2KIF11ACHE | |
| SCHEMBL30277113 | 0.80 | TDP1 (0.54) | HDAC8HDAC4HDAC2KIF11ACHE | |
| SCHEMBL18242450 | 0.80 | TSHR (0.42) | NFE2L2TDP1FBP1 | |
| SCHEMBL29846591 | 0.80 | ALDH1A1 (0.48) | HDAC8HDAC4HDAC2KIF11ACHE | |
| SCHEMBL309484 | 0.80 | ALDH1A1 (0.48) | HDAC8HDAC4HDAC2KIF11ACHE | |
| SCHEMBL16952172 | 0.80 | HDAC8 (0.47) | HDAC8HDAC4HDAC2KIF11ACHE | |
| SCHEMBL543469 | 0.80 | NFE2L2 (0.59) | NFE2L2NPC1RAB9AL3MBTL1MEN1 | |
| SCHEMBL18302082 | 0.80 | HDAC8 (0.47) | HDAC8HDAC4HDAC2KIF11ACHE | |
| SCHEMBL28723791 | 0.80 | HDAC8 (0.42) | HDAC8HDAC4HDAC2KIF11ACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2019025153-A1 | USE OF SUBSTITUTED N-SULFONYL-N'-ARYL DIAMINOALKANES AND N-SULFONYL-N'-HETEROARYL DIAMINOALKANES OR SALTS THEREOF FOR INCREASING THE STRESS TOLERANCE IN PLANTS | BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) | 2019-02-07 | — | — | WO | disclosed |
| US-10065926-B2 | Use of substituted dihydrooxindolylsulfonamides, or the salts thereof, for increasing the stress tolerance of plants | BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) | 2018-09-04 | — | — | US | disclosed |
| US-20180199575-A1 | SUBSTITUTED OXOTETRAHYDROQUINOLINYLPHOSPHINIC ACID AND PHOSPHINIC ACID AMIDES OR SALTS THEREOF AND USE THEREOF TO INCREASE STRESS TOLERANCE IN PLANTS | BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) | 2018-07-19 | — | — | US | disclosed |
| EP-3322296-A1 | SUBSTITUTED OXO-TETRAHYDROQUINOLINYL-PHOSPHINIC ACID AND PHOSPHINIC ACID AMIDES OR SALTS THEREOF AND USE THEREOF TO INCREASE STRESS TOLERANCE IN PLANTS | Bayer CropScience Aktiengesellschaft (DE) | 2018-05-23 | — | — | EP | disclosed |
| US-20180020662-A1 | Substituted 1-cycloalkyl-2-oxotetrahydroquinolin-6-ylsulfonamides or salts thereof and use thereof to increase stress tolerance in plants | BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) | 2018-01-25 | — | — | US | disclosed |
| EP-3256448-A1 | SUBSTITUTED 1-CYCLOALKYL-2-OXOTETRAHYDROQUINOLIN-6-YL-SULFONAMIDES OR SALTS THEREOF AND USE THEREOF TO INCREASE STRESS TOLERANCE IN PLANTS | Bayer CropScience Aktiengesellschaft (DE) | 2017-12-20 | — | — | EP | disclosed |
| EP-3051946-B1 | USE OF SUBSTITUTED DIHYDROOXINDOLYLSULFONAMIDES OR THEIR SALTS FOR INCREASING STRESS TOLERANCE IN PLANTS | BAYER CROPSCIENCE AG (DE) | 2017-11-29 | — | — | EP | disclosed |
| US-20170027172-A1 | USE OF SUBSTITUTE OXO TETRAHYDROQUINOLINE SULFONAMIDES OR SALTS THEREOF FOR RAISING STRESS TOLERANCE OF PLANTS | BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) | 2017-02-02 | — | — | US | disclosed |
| WO-2017009321-A1 | SUBSTITUTED OXO-TETRAHYDROQUINOLINYL-PHOSPHINIC ACID AND PHOSPHINIC ACID AMIDES OR SALTS THEREOF AND USE THEREOF TO INCREASE STRESS TOLERANCE IN PLANTS | BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) | 2017-01-19 | — | — | WO | disclosed |
| WO-2016128365-A1 | SUBSTITUTED 1-CYCLOALKYL-2-OXOTETRAHYDROQUINOLIN-6-YL-SULFONAMIDES OR SALTS THEREOF AND USE THEREOF TO INCREASE STRESS TOLERANCE IN PLANTS | BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) | 2016-08-18 | — | — | WO | disclosed |
| US-20080096130-A1 | POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION | 2008-04-24 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-6743565-B2 | POLYSTYRENE OXY DERIVATIVES THAT DECOMPOSE UNDER AN ACID TO INCREASE THE SOLUBILITY IN AN ALKALI DEVELOPER AND AN ACID GENERATOR | FUJI PHOTO FILM CO., LTD. (JP) | 2004-06-01 | — | — | US | disclosed |
| US-20040033437-A1 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. | 2004-02-19 | — | — | US | disclosed |
| US-6692883-B2 | GENERATING ACID; ADJUSTMENT SOLUBILITY IN ALKLAINE DEVELOPER | FUJI PHOTO FILM CO., LTD. (JP) | 2004-02-17 | — | — | US | disclosed |
| EP-1367439-A1 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-12-03 | — | — | EP | disclosed |
| US-6630280-B1 | Resin and compound that generates an arylsulfonic acid when exposed to actinic radiation; sensitivity; resolution; smoothness | FUJI PHOTO FILM CO., LTD. (JP) | 2003-10-07 | — | — | US | disclosed |
| US-20030134221-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| US-20030108811-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-06-12 | — | — | US | disclosed |
| US-20020012866-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10065926-B2 | Use of substituted dihydrooxindolylsulfonamides, or the salts thereof, for increasing the stress tolerance of plants | SQOR, DHPS, QDPR | HDAC8 4017/4885HDAC4 3603/4885HDAC2 3028/4885 |
| US-20180020662-A1 | Substituted 1-cycloalkyl-2-oxotetrahydroquinolin-6-ylsulfonamides or salts thereof and use thereof to increase stress tolerance in plants | CBR3, CBR1, CBS | HDAC8 4465/4885HDAC4 4290/4885HDAC2 3040/4885 |
| US-20180199575-A1 | SUBSTITUTED OXOTETRAHYDROQUINOLINYLPHOSPHINIC ACID AND PHOSPHINIC ACID AMIDES OR SALTS THEREOF AND USE THEREOF TO INCREASE STRESS TOLERANCE IN PLANTS | PPA1, PHOSPHO1, PIP4K2C | HDAC8 3951/4885HDAC4 3460/4885HDAC2 3566/4885 |
| US-20170027172-A1 | USE OF SUBSTITUTE OXO TETRAHYDROQUINOLINE SULFONAMIDES OR SALTS THEREOF FOR RAISING STRESS TOLERANCE OF PLANTS | TST, GSS, SQOR | HDAC8 3546/4885HDAC4 2735/4885HDAC2 1990/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.