Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.52 |
| ▸ | TYR | P14679 | 1/20 | 0.52 |
| ▸ | TSHR | P16473 | 2/20 | 0.48 |
| ▸ | ELANE | P08246 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.44 |
| ▸ | NR1H4 | Q96RI1 | 2/20 | 0.42 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.41 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.41 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.41 |
| ▸ | SLC22A3 | O75751 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | GRIA4 | P48058 | 2/20 | 0.40 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.40 |
| ▸ | GRIN2D | O15399 | 2/20 | 0.39 |
| ▸ | GRIN3B | O60391 | 2/20 | 0.39 |
| ▸ | GRIN1 | Q05586 | 2/20 | 0.39 |
| ▸ | GRIN2A | Q12879 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10708786 | 1.00 | LMNA (0.52) | LMNATYRTSHRELANEALDH1A1 | |
| SCHEMBL477443 | 0.91 | LMNA (0.44) | LMNATYRTDP1 | |
| SCHEMBL477635 | 0.91 | LMNA (0.44) | LMNATYRTDP1 | |
| SCHEMBL28973554 | 0.91 | LMNA (0.44) | LMNATYRTDP1 | |
| SCHEMBL11642416 | 0.85 | CA12 (0.46) | KIF11FFAR1 | |
| SCHEMBL3692155 | 0.84 | LMNA (0.52) | LMNATYRTSHRALDH1A1HSD17B10 | |
| SCHEMBL20752299 | 0.84 | LMNA (0.52) | LMNATYRTSHRALDH1A1HSD17B10 | |
| SCHEMBL18282984 | 0.82 | LMNA (0.50) | LMNATYRTSHRALDH1A1HSD17B10 | |
| SCHEMBL2644008 | 0.82 | LMNA (0.50) | LMNATYRTSHRALDH1A1HSD17B10 | |
| SCHEMBL30010731 | 0.82 | LMNA (0.50) | LMNATYRTSHRALDH1A1HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0136381-B1 | POLYOLEFIN COMPOSITIONS | MILLIKEN RESEARCH CORPORATION (US) | 1988-06-08 | — | — | EP | claimed |
| US-4431497-A | CARBO ALCOHOLS, ETHERS AND ESTERS AS STABILIZERS; STERILIZATION OF FOOD AND MEDICAL EQUIPMENT PACKAGES; DISCOLORATION INHIBITION | MILLIKEN RESEARCH CORPORATION (US) | 1984-02-14 | — | — | US | claimed |
| CN-119823190-A | Preparation method of diimine nickel catalyst containing rigid trityl group and application of diimine nickel catalyst in olefin polymerization | 安徽大学 | 2025-04-15 | — | — | CN | disclosed |
| CN-118530272-A | Heteroatom-containing non-metallocene complex and preparation method and application thereof | 联泓惠生(江苏)新材料有限公司 | 2024-08-23 | — | — | CN | disclosed |
| US-20220287919-A1 | PHOTOCURABLE COMPOSITION EXCELLENT IN CURING DEPTH | SHOFU INC. (JP) | 2022-09-15 | — | — | US | disclosed |
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | TOKYO ELECTRON LIMITED (JP) | 2018-07-17 | — | — | US | disclosed |
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | TOKYO ELECTRON LIMITED (JP) | 2018-07-17 | — | — | US | disclosed |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-10 | — | — | US | disclosed |
| US-9971247-B2 | Pattern-forming method | OSAKA UNIVERSITY (JP) | 2018-05-15 | — | — | US | disclosed |
| US-9971247-B2 | Pattern-forming method | OSAKA UNIVERSITY (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20170131633-A1 | CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-05-11 | — | — | US | disclosed |
| EP-1706205-B1 | A CATALYTICAL ASYMMETRIC EPOXIDATION | UNIV CHICAGO (US) | 2008-10-29 | — | — | EP | disclosed |
| US-20070203347-A1 | Catalytic asymmetric epoxidation | THE UNIVERSITY OF CHICAGO (US) | 2007-08-30 | — | — | US | disclosed |
| US-20070203347-A1 | Catalytic asymmetric epoxidation | THE UNIVERSITY OF CHICAGO (US) | 2007-08-30 | — | — | US | disclosed |
| US-20070203347-A1 | Catalytic asymmetric epoxidation | THE UNIVERSITY OF CHICAGO (US) | 2007-08-30 | — | — | US | disclosed |
| US-7202371-B2 | Catalytic asymmetric epoxidation | THE UNIVERSITY OF CHICAGO (US) | 2007-04-10 | — | — | US | disclosed |
| US-7202371-B2 | Catalytic asymmetric epoxidation | THE UNIVERSITY OF CHICAGO (US) | 2007-04-10 | — | — | US | disclosed |
| US-7202371-B2 | Catalytic asymmetric epoxidation | THE UNIVERSITY OF CHICAGO (US) | 2007-04-10 | — | — | US | disclosed |
| US-20050159607-A1 | Catalytic asymmetric epoxidation | JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) | 2005-07-21 | — | — | US | disclosed |
| US-4431497-A | CARBO ALCOHOLS, ETHERS AND ESTERS AS STABILIZERS; STERILIZATION OF FOOD AND MEDICAL EQUIPMENT PACKAGES; DISCOLORATION INHIBITION | MILLIKEN RESEARCH CORPORATION (US) | 1984-02-14 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | ASIC1, ASIC3, CLTA | LMNA 293/4885TYR 2070/4885TSHR 4284/4885 |
| US-20070203347-A1 | Catalytic asymmetric epoxidation | DUOX1, DUOX2, EPHX2 | LMNA 4683/4885TYR 2315/4885TSHR 3517/4885 |
| US-20220287919-A1 | PHOTOCURABLE COMPOSITION EXCELLENT IN CURING DEPTH | ODC1, AOC2, CCNT1 | LMNA 896/4885TYR 44/4885TSHR 4012/4885 |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | SLC11A2, XRCC5, RAD54L | LMNA 1379/4885TYR 4614/4885TSHR 2793/4885 |
| US-20050159607-A1 | Catalytic asymmetric epoxidation | DUOX1, DUOX2, EPHX2 | LMNA 4683/4885TYR 2315/4885TSHR 3517/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.