SCHEMBL3631389

SCHEMBL3631389

CCOCCOc1ccc(Br)cc1

nearest known ligand 0.58

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.50
ALDH1A1 P00352 1/20 0.50
THRA P10827 1/20 0.49
DRD4 P21917 2/20 0.49
DRD2 P14416 1/20 0.49
DRD3 P35462 1/20 0.49
NQO1 P15559 1/20 0.48
NCF1 P14598 2/20 0.47
TSHR P16473 1/20 0.47
CHRNA7 P36544 1/20 0.47
MAOB P27338 2/20 0.47
RECQL P46063 1/20 0.47
L3MBTL1 Q9Y468 2/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
MAPT P10636 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4064818 0.94 HRH2 (0.48) KDM4EALDH1A1THRADRD4DRD2
SCHEMBL7928194 0.92 DRD4 (0.50) KDM4EALDH1A1THRADRD4DRD2
SCHEMBL4061378 0.91 NQO1 (0.57) KDM4EALDH1A1THRANQO1NCF1
SCHEMBL9150174 0.89 KDM4E (0.56) KDM4EALDH1A1THRANQO1NCF1
SCHEMBL8218168 0.86 NQO1 (0.67) KDM4EALDH1A1THRANQO1NCF1
SCHEMBL16561565 0.86 MAPT (0.57) KDM4ETHRAMAOBL3MBTL1MAPT
SCHEMBL14031270 0.86 TSHR (0.58) KDM4EALDH1A1DRD4DRD2DRD3
SCHEMBL6557649 0.86 MAOB (0.57) KDM4EALDH1A1DRD4DRD2DRD3
SCHEMBL4063865 0.85 NCF1 (0.57) KDM4ENCF1CHRNA7MAOBL3MBTL1
SCHEMBL7254241 0.85 MAPT (0.51) KDM4EALDH1A1DRD4DRD2DRD3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250221979-A1 NOVEL HETEROCYCLIC COMPOUND SHOUYAO HOLDINGS BEIJING CO LTD (CN) 2025-07-10 US disclosed
EP-4501912-A1 NOVEL HETEROCYCLIC COMPOUND Shouyao Holdings (Beijing) Co., Ltd. (CN) 2025-02-05 EP disclosed
WO-2022039212-A1 POLYMER, RESIST COMPOSITION CONTAINING SAID POLYMER, METHOD FOR MANUFACTURING MEMBER USING SAME, PATTERN FORMATION METHOD, AND METHOD FOR FORMING REVERSAL PATTERN 東洋合成工業株式会社 2022-02-24 WO disclosed
US-10781276-B2 Polymer, resist composition containing polymer, and method for manufacturing device using same TOYO GOSEI CO., LTD. (JP) 2020-09-22 US disclosed
US-20180273664-A1 POLYMER, RESIST COMPOSITION CONTAINING POLYMER, AND METHOD FOR MANUFACTURING DEVICE USING SAME TOYO GOSEI CO., LTD. (JP) 2018-09-27 US disclosed
US-7786165-B2 Aminophenylpropanoic acid derivative TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) 2010-08-31 US disclosed
US-7534547-B2 Optically active compound and photosensitive resin composition OSAKA GAS COMPANY LIMITED (JP) 2009-05-19 US disclosed
US-20080269220-A1 Aminophenylpropanoic Acid Derivative TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) 2008-10-30 US disclosed
EP-1726580-A1 AMINOPHENYLPROPANOIC ACID DERIVATIVE Takeda Pharmaceutical Company Limited (JP) 2006-11-29 EP disclosed
US-20060074243-A1 Hydroxamic acid and amide compounds and their use as protease inhibitors PHARMACIA CORPORATION 2006-04-06 US disclosed
EP-1515951-A1 ARYLSULFONYLHYDROXAMIC ACID AND AMIDE DERIVATIVES AND THEIR USE AS PROTEASE INHIBITORS Pharmacia Corporation (US) 2005-03-23 EP disclosed
US-20040167182-A1 Hydroxamic acid and amide compounds and their use as protease inhibitors PHARMACIA CORPORATION 2004-08-26 US disclosed
EP-1375463-A1 OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION Kansai Research Institute, Inc. (JP) 2004-01-02 EP disclosed
WO-2004000811-A1 ARYLSULFONYLHYDROXAMIC ACID AND AMIDE DERIVATIVES AND THEIR USE AS PROTEASE INHIBITORS PHARMACIA CORPORATION (US) 2003-12-31 WO disclosed
US-20030211421-A1 Optically active compound and photosensitive resin composition KRI, INC. (JP) 2003-11-13 US disclosed
US-20030064320-A1 Active components and photosensitive resin composition containing the same KRI, INC. (JP) 2003-04-03 US disclosed
EP-1265103-A1 ACTIVE COMPONENTS AND PHOTOSENSITIVE RESIN COMPOSITIONS CONTAINING THE SAME Kansai Research Institute, Inc. (JP) 2002-12-11 EP disclosed
EP-1140896-A1 BENZOTHIEPIN-ANILIDE DERIVATIVES, THEIR PRODUCTION AND THEIR USE FOR ANTAGONIZING CCR-5 Takeda Chemical Industries, Ltd. (JP) 2001-10-10 EP disclosed
US-6235771-B1 AIDS THERPAY TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 2001-05-22 US disclosed
WO-2000037455-A1 BENZOTHIEPIN-ANILIDE DERIVATIVES, THEIR PRODUCTION AND THEIR USE FOR ANTAGONIZING CCR-5 TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 2000-06-29 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040167182-A1 Hydroxamic acid and amide compounds and their use as protease inhibitors MMP1, MMP3, MMP13 KDM4E 679/4885ALDH1A1 293/4885THRA 2433/4885
US-20060074243-A1 Hydroxamic acid and amide compounds and their use as protease inhibitors MMP3, MMP13, MMP1 KDM4E 1511/4885ALDH1A1 303/4885THRA 1712/4885
US-20250221979-A1 NOVEL HETEROCYCLIC COMPOUND MAPT, MNAT1, MAT2A KDM4E 3698/4885ALDH1A1 996/4885THRA 596/4885
US-20080269220-A1 Aminophenylpropanoic Acid Derivative GPR119, GPR55, GPR65 KDM4E 1965/4885ALDH1A1 495/4885THRA 1042/4885
US-20030211421-A1 Optically active compound and photosensitive resin composition ARCN1, RAD51, PAM KDM4E 1317/4885ALDH1A1 1552/4885THRA 2663/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.