Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX15 | P16050 | 2/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.50 |
| ▸ | HTT | P42858 | 1/20 | 0.50 |
| ▸ | ESR1 | P03372 | 9/20 | 0.48 |
| ▸ | ESR2 | Q92731 | 8/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.48 |
| ▸ | HPGD | P15428 | 2/20 | 0.48 |
| ▸ | TSHR | P16473 | 2/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.48 |
| ▸ | AR | P10275 | 1/20 | 0.48 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.48 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.48 |
| ▸ | HTR6 | P50406 | 1/20 | 0.48 |
| ▸ | ESRRG | P62508 | 1/20 | 0.48 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.48 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | KLF10 | Q13118 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4062280 | 0.91 | ESR1 (0.44) | ALOX15MAPK1HTTESR1ESR2 | |
| SCHEMBL10445776 | 0.91 | ESR1 (0.48) | ALOX15MAPK1HTTESR1ESR2 | |
| SCHEMBL4057123 | 0.89 | CYP2C19 (0.50) | ESR1ESR2CYP3A4HPGDTSHR | |
| SCHEMBL23919660 | 0.86 | MEN1 (0.53) | ESR1ESR2CYP3A4HPGDTSHR | |
| SCHEMBL10446216 | 0.86 | MEN1 (0.53) | ESR1ESR2CYP3A4HPGDTSHR | |
| SCHEMBL20905242 | 0.85 | ESR1 (0.43) | ALOX15MAPK1HTTESR1ESR2 | |
| SCHEMBL10907301 | 0.85 | BCL2 (0.52) | ALOX15MAPK1HTT | |
| SCHEMBL25804093 | 0.82 | KLF10 (0.61) | ALOX15ESR1ESR2CYP3A4HPGD | |
| SCHEMBL21232493 | 0.82 | MEN1 (0.40) | ALOX15MAPK1HTTESR1ESR2 | |
| SCHEMBL8459894 | 0.81 | ESR1 (0.52) | ALOX15ESR1ESR2CYP3A4HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10444628-B2 | Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-10-15 | — | — | US | disclosed |
| US-10429739-B2 | Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-10-01 | — | — | US | disclosed |
| US-10416563-B2 | Resist underlayer film composition, patterning process, and method for forming resist underlayer film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-09-17 | — | — | US | disclosed |
| US-10241412-B2 | Resist underlayer film composition, patterning process, and method for forming resist underlayer film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-26 | — | — | US | disclosed |
| US-20170184968-A1 | COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170183531-A1 | COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170183531-A1 | COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170184968-A1 | COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-29 | — | — | US | disclosed |
| US-7534547-B2 | Optically active compound and photosensitive resin composition | OSAKA GAS COMPANY LIMITED (JP) | 2009-05-19 | — | — | US | disclosed |
| EP-1375463-A1 | OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION | Kansai Research Institute, Inc. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | KRI, INC. (JP) | 2003-11-13 | — | — | US | disclosed |
| EP-0644460-B1 | Positive working photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 1999-12-08 | — | — | EP | disclosed |
| US-5554481-A | NAPHTHOQUINONEDIAZIDE SULFONATE OF A POLYARYL POLYHYDROXY COMPOUND, ALKALI SOLUBILE RESIN | FUJI PHOTO FILM CO., LTD. (JP) | 1996-09-10 | — | — | US | disclosed |
| US-5534382-A | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-07-09 | — | — | US | disclosed |
| EP-0644460-A1 | Positive working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1995-03-22 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10416563-B2 | Resist underlayer film composition, patterning process, and method for forming resist underlayer film | PRDX1, PRDX4, QSOX1 | ALOX15 742/4885MAPK1 1855/4885HTT 4515/4885 |
| US-10444628-B2 | Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process | CHRM1, OR10J3, MYB | ALOX15 906/4885MAPK1 731/4885HTT 4505/4885 |
| US-20170184968-A1 | COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | CHRM1, MLX, OR10J3 | ALOX15 663/4885MAPK1 984/4885HTT 4608/4885 |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | ARCN1, RAD51, PAM | ALOX15 336/4885MAPK1 428/4885HTT 1421/4885 |
| US-10241412-B2 | Resist underlayer film composition, patterning process, and method for forming resist underlayer film | GPX4, PLOD1, AQP1 | ALOX15 312/4885MAPK1 1822/4885HTT 3449/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.