SCHEMBL4071777

SCHEMBL4071777

c1ccc2c(c1)Cc1nc3ccccc3nc1-2

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.65
SMN1; SMN2 Q16637 5/20 0.65
KDM4E B2RXH2 4/20 0.65
PKM P14618 4/20 0.65
ALDH1A1 P00352 4/20 0.65
RAB9A P51151 3/20 0.65
POLB P06746 1/20 0.65
GAA P10253 1/20 0.65
TP53 P04637 3/20 0.58
CYP3A4 P08684 3/20 0.58
CYP2D6 P10635 3/20 0.58
CYP2C9 P11712 3/20 0.58
TSHR P16473 3/20 0.58
MAPK1 P28482 3/20 0.58
CYP2C19 P33261 3/20 0.58
HSD17B10 Q99714 3/20 0.58
MEN1 O00255 2/20 0.58
KMT2A Q03164 2/20 0.58
NPC1 O15118 2/20 0.58
METAP2 P50579 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5799814 0.87 METAP2 (0.59) MAPTSMN1; SMN2KDM4EPKMALDH1A1
SCHEMBL22481864 0.85 MAPT (0.69) MAPTSMN1; SMN2KDM4EPKMALDH1A1
SCHEMBL24704424 0.84 KDM4E (0.60) MAPTSMN1; SMN2KDM4EPKMALDH1A1
SCHEMBL24704131 0.84 MAPT (0.53) MAPTSMN1; SMN2KDM4EPKMALDH1A1
SCHEMBL31501268 0.84 SMN1; SMN2 (0.52) MAPTSMN1; SMN2KDM4EPKMALDH1A1
SCHEMBL31501264 0.84 ACHE (0.57) MAPTSMN1; SMN2KDM4EPKMALDH1A1
SCHEMBL18416146 0.79 RAB9A (0.82) MAPTSMN1; SMN2KDM4EPKMALDH1A1
SCHEMBL27404178 0.78 KDM4E (0.50) MAPTSMN1; SMN2KDM4EPKMALDH1A1
SCHEMBL31501263 0.78 CYP1A2 (0.61) MAPTSMN1; SMN2KDM4EPKMALDH1A1
SCHEMBL17595662 0.77 ALDH1A1 (0.49) MAPTSMN1; SMN2KDM4EPKMALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090274967-A1 QUINOXALINE CONTAINING PHOTOCONDUCTORS XEROX CORPORATION (US) 2009-11-05 US claimed
US-12065541-B2 Thermoplastic resin, optical film made therefrom, diol compound, diester compound MITSUBISHI CHEMICAL CORPORATION (JP) 2024-08-20 US disclosed
CN-113950500-B Thermoplastic resin, optical film comprising the same, diol compound, and diester compound 三菱化学株式会社 2023-11-03 CN disclosed
EP-3988599-B1 THERMOPLASTIC RESIN, OPTICAL FILM MADE THEREFROM, DIOL COMPOUND, DIESTER COMPOUND MITSUBISHI CHEM CORP (JP) 2023-10-18 EP disclosed
US-20230265058-A1 CARBOXYLIC ACID OR CARBOXYLIC ACID ESTER COMPOUND HAVING FUSED-RING STRUCTURE, METHOD FOR PRODUCING THE SAME, AND USE OF COMPOUND FUJIFILM CORPORATION (JP) 2023-08-24 US disclosed
US-20230265058-A1 CARBOXYLIC ACID OR CARBOXYLIC ACID ESTER COMPOUND HAVING FUSED-RING STRUCTURE, METHOD FOR PRODUCING THE SAME, AND USE OF COMPOUND FUJIFILM CORPORATION (JP) 2023-08-24 US disclosed
US-20230183406-A1 COMPOUND, CURABLE RESIN COMPOSITION, CURED PRODUCT, OPTICAL MEMBER, AND LENS FUJIFILM CORPORATION (JP) 2023-06-15 US disclosed
US-20230183406-A1 COMPOUND, CURABLE RESIN COMPOSITION, CURED PRODUCT, OPTICAL MEMBER, AND LENS FUJIFILM CORPORATION (JP) 2023-06-15 US disclosed
EP-3988599-A1 THERMOPLASTIC RESIN, OPTICAL FILM MADE THEREFROM, DIOL COMPOUND, DIESTER COMPOUND Mitsubishi Chemical Corporation (JP) 2022-04-27 EP disclosed
US-20220081510-A1 THERMOPLASTIC RESIN, OPTICAL FILM MADE THEREFROM, DIOL COMPOUND, DIESTER COMPOUND MITSUBISHI CHEMICAL CORPORATION (JP) 2022-03-17 US disclosed
CN-113950500-A Thermoplastic resin, optical film comprising the same, diol compound, and diester compound 三菱化学株式会社 2022-01-18 CN disclosed
US-20160106743-A1 TOPOISOMERASE II POISONS AND METHODS OF MAKING AND USING SAME THE UNIVERSITY OF ROCHESTER (US) 2016-04-21 US disclosed
US-8999522-B2 6H-indolo[2,3-b]quinoxaline derivatives and organic light emitting diode using the same NATIONAL TSING HUA UNIVERSITY (TW) 2015-04-07 US disclosed
US-20110303901-A1 6H-INDOLO[2,3-b]QUINOXALINE DERIVATIVES AND ORGANIC LIGHT EMITTING DIODE USING THE SAME NATIONAL TSING HUA UNIVERSITY (TW) 2011-12-15 US disclosed
US-20090274967-A1 QUINOXALINE CONTAINING PHOTOCONDUCTORS XEROX CORPORATION (US) 2009-11-05 US disclosed
US-20090274967-A1 QUINOXALINE CONTAINING PHOTOCONDUCTORS XEROX CORPORATION (US) 2009-11-05 US disclosed
US-20090274967-A1 QUINOXALINE CONTAINING PHOTOCONDUCTORS XEROX CORPORATION (US) 2009-11-05 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220081510-A1 THERMOPLASTIC RESIN, OPTICAL FILM MADE THEREFROM, DIOL COMPOUND, DIESTER COMPOUND RTF1, RNF10, RAD51 MAPT 1644/4885SMN1; SMN2 3641/4885KDM4E 2174/4885
US-20230183406-A1 COMPOUND, CURABLE RESIN COMPOSITION, CURED PRODUCT, OPTICAL MEMBER, AND LENS POLR1A, RAD51, POLR2A MAPT 419/4885SMN1; SMN2 587/4885KDM4E 2324/4885
US-12065541-B2 Thermoplastic resin, optical film made therefrom, diol compound, diester compound RTF1, RNF31, RNF10 MAPT 2085/4885SMN1; SMN2 3392/4885KDM4E 1758/4885
US-20110303901-A1 6H-INDOLO[2,3-b]QUINOXALINE DERIVATIVES AND ORGANIC LIGHT EMITTING DIODE USING THE SAME IDO1, IPO9, IDO2 MAPT 2821/4885SMN1; SMN2 4750/4885KDM4E 2052/4885
US-20230265058-A1 CARBOXYLIC ACID OR CARBOXYLIC ACID ESTER COMPOUND HAVING FUSED-RING STRUCTURE, METHOD FOR PRODUCING THE SAME, AND USE OF COMPOUND SPG11, HAT1, ASS1 MAPT 1976/4885SMN1; SMN2 567/4885KDM4E 4186/4885
US-20160106743-A1 TOPOISOMERASE II POISONS AND METHODS OF MAKING AND USING SAME TOP2A, TOP2B, TOP1 MAPT 3723/4885SMN1; SMN2 1196/4885KDM4E 2782/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.