SCHEMBL412034

SCHEMBL412034

O=C(CC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.56

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.56
CA1 P00915 15/20 0.38
CA2 P00918 15/20 0.38
MMP1 P03956 4/20 0.38
MMP2 P08253 4/20 0.38
MMP9 P14780 4/20 0.38
MMP8 P22894 4/20 0.38
MMP13 P45452 4/20 0.38
GAA P10253 1/20 0.34
LMNA P02545 1/20 0.33
STS P08842 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11834156 1.00 THRB (0.56) THRBCA1CA2MMP1MMP2
SCHEMBL15271614 0.90 THRB (0.46) THRBCA1CA2MMP1MMP2
SCHEMBL2221105 0.89 THRB (0.42) THRBCA1CA2MMP1MMP2
SCHEMBL22246156 0.86 THRB (0.48) THRBCA1CA2MMP1MMP2
SCHEMBL9336454 0.86 THRB (0.48) THRBCA1CA2MMP1MMP2
SCHEMBL20690112 0.83 THRB (0.44) THRBCA1CA2MMP1MMP2
SCHEMBL6377121 0.83 THRB (0.45) THRBCA1CA2MMP1MMP2
SCHEMBL24705927 0.82 THRB (0.54) THRBCA1CA2MMP1MMP2
SCHEMBL28460008 0.82 THRB (0.54) THRBCA1CA2MMP1MMP2
SCHEMBL939341 0.82 THRB (0.37) THRBCA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 143 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9663538-B2 Aluminum compound, thin-film forming raw material, and method for producing thin film ADEKA CORPORATION (JP) 2017-05-30 US claimed
US-20240167154-A1 THIN-FILM FORMING RAW MATERIAL, WHICH IS USED IN ATOMIC LAYER DEPOSITION METHOD, THIN-FILM, METHOD OF PRODUCING THIN-FILM, AND ZINC COMPOUND ADEKA CORPORATION (JP) 2024-05-23 US disclosed
US-20240167155-A1 TIN COMPOUND, THIN-FILM FORMING RAW MATERIAL, THIN-FILM, METHOD FOR PRODUCING THIN-FILM, AND HALOGEN COMPOUND ADEKA CORPORATION (JP) 2024-05-23 US disclosed
US-20240067663-A1 YTTRIUM COMPOUND, SOURCE MATERIAL FOR FORMING YTTRIUM-CONTAINING FILM, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME ADEKA CORPORATION (JP) 2024-02-29 US disclosed
US-20240018655-A1 METHOD OF PRODUCING THIN-FILM ADEKA CORPORATION (JP) 2024-01-18 US disclosed
US-20240018654-A1 METHOD OF PRODUCING THIN-FILM ADEKA CORPORATION (JP) 2024-01-18 US disclosed
US-20230349039-A1 THIN-FILM FORMING RAW MATERIAL USED IN ATOMIC LAYER DEPOSITION METHOD, AND METHOD OF PRODUCING THIN-FILM ADEKA CORPORATION (JP) 2023-11-02 US disclosed
US-20230349048-A1 IMPROVED CR(III)-BASED PASSIVATION FOR ZINC-ALUMINUM COATED STEEL HENKEL AG & CO KGAA (DE) 2023-11-02 US disclosed
US-20230304154-A1 ALKOXIDE COMPOUND, THIN-FILM FORMING RAW MATERIAL, AND METHOD OF PRODUCING THIN-FILM ADEKA CORPORATION (JP) 2023-09-28 US disclosed
EP-4249629-A1 METHOD FOR MANUFACTURING THIN FILM ADEKA CORPORATION (JP) 2023-09-27 EP disclosed
US-20100126351-A1 METHOD FOR PRODUCING A MATERIAL FOR CHEMICAL VAPOR DEPOSITION ADEKA CORPORATION (JP) 2010-05-27 US disclosed
US-7714155-B2 Alkoxide compound, material for thin film formation, and process for thin film formation ADEKA CORPORATION (JP) 2010-05-11 US disclosed
US-7501153-B2 Alkoxide compound, thin film-forming material and method for forming thin film ADEKA CORPORATION (JP) 2009-03-10 US disclosed
US-20090035464-A1 Alkoxide compound, material for thin film formation, and process for thin film formation ADEKA CORPORATION (JP) 2009-02-05 US disclosed
US-20080085365-A1 Alkoxide Compound, Thin Film-Forming Material And Method For Forming Thin Film ADEKA CORPORATION (JP) 2008-04-10 US disclosed
US-7335783-B2 Thin film-forming material and method for producing thin film ADEKA CORPORATION (JP) 2008-02-26 US disclosed
US-20070190249-A1 Material for chemical vapor deposition and thin film forming method ADEKA CORPORATION (JP) 2007-08-16 US disclosed
US-20070178235-A1 Thin film-forming material and method for producing thin film ADEKA CORPORATION (JP) 2007-08-02 US disclosed
EP-1770187-A1 THIN FILM-FORMING MATERIAL AND METHOD FOR PRODUCING THIN FILM Adeka Corporation (JP) 2007-04-04 EP disclosed
EP-1754800-A1 MATERIAL FOR CHEMICAL VAPOR DEPOSITION AND THIN FILM FORMING METHOD Adeka Corporation (JP) 2007-02-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240067663-A1 YTTRIUM COMPOUND, SOURCE MATERIAL FOR FORMING YTTRIUM-CONTAINING FILM, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME YTHDC1, YTHDF1, YTHDF2 THRB 2919/4885CA1 2781/4885CA2 3655/4885
US-20090035464-A1 Alkoxide compound, material for thin film formation, and process for thin film formation ALKBH5, ALKBH3, ALK THRB 4534/4885CA1 2755/4885CA2 3585/4885
US-20240018655-A1 METHOD OF PRODUCING THIN-FILM RTF1, GIGYF2, HAO2 THRB 4565/4885CA1 430/4885CA2 2573/4885
US-20080085365-A1 Alkoxide Compound, Thin Film-Forming Material And Method For Forming Thin Film APOB, C9, C5 THRB 4438/4885CA1 2792/4885CA2 2099/4885
US-20240167155-A1 TIN COMPOUND, THIN-FILM FORMING RAW MATERIAL, THIN-FILM, METHOD FOR PRODUCING THIN-FILM, AND HALOGEN COMPOUND RIF1, RNF168, RNF10 THRB 1940/4885CA1 4109/4885CA2 4598/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.