Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TBXAS1 | P24557 | 17/20 | 0.60 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.48 |
| ▸ | EGLN3 | Q9H6Z9 | 1/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL501951 | 0.88 | TBXAS1 (0.55) | TBXAS1MEN1LMNAKMT2AEGLN3 | |
| SCHEMBL501962 | 0.87 | TBXAS1 (0.54) | TBXAS1MEN1LMNAKMT2AEGLN3 | |
| SCHEMBL12304848 | 0.86 | TBXAS1 (0.52) | TBXAS1MEN1LMNAKMT2AEGLN3 | |
| SCHEMBL13402788 | 0.85 | TBXAS1 (0.64) | TBXAS1MEN1LMNAKMT2AEGLN3 | |
| SCHEMBL10072238 | 0.84 | TBXAS1 (0.59) | TBXAS1MEN1LMNAKMT2AEGLN3 | |
| SCHEMBL501640 | 0.80 | TBXAS1 (0.54) | TBXAS1MEN1LMNAKMT2AEGLN3 | |
| SCHEMBL9897520 | 0.79 | EGLN3 (0.67) | TBXAS1MEN1LMNAKMT2AEGLN3 | |
| SCHEMBL9460203 | 0.79 | TBXAS1 (0.68) | TBXAS1MEN1LMNAKMT2AEGLN3 | |
| SCHEMBL5859786 | 0.78 | TBXAS1 (0.55) | TBXAS1LMNAEGLN3KDM4EALDH1A1 | |
| SCHEMBL8032821 | 0.78 | TBXAS1 (0.50) | TBXAS1MEN1LMNAKMT2AEGLN3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2033966-B1 | Novel photoacid generators, resist compositons, and patterning processes | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| US-8945809-B2 | Fluorinated monomer, fluorinated polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-03 | — | — | US | disclosed |
| US-8933251-B2 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-01-13 | — | — | US | disclosed |
| US-8609889-B2 | Photoacid generator, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-12-17 | — | — | US | disclosed |
| US-20130231491-A1 | FLUORINATED MONOMER OF CYCLIC ACETAL STRUCTURE, POLYMER, RESIST PROTECTIVE COATING COMPOSITION, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-09-05 | — | — | US | disclosed |
| US-8431323-B2 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-30 | — | — | US | disclosed |
| US-8420292-B2 | Polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-16 | — | — | US | disclosed |
| US-8394570-B2 | Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-12 | — | — | US | disclosed |
| US-8313886-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-20 | — | — | US | disclosed |
| US-8283104-B2 | Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-09 | — | — | US | disclosed |
| US-20090274978-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-05 | — | — | US | disclosed |
| US-20090246686-A1 | POLYMER, POLYMER PREPARATION METHOD, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-01 | — | — | US | disclosed |
| US-20090143368-A1 | Use of Cinnamoyl Compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-06-04 | — | — | US | disclosed |
| EP-2033966-A2 | Movel photoacid generators, resist compositons, and patterning processes | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-03-11 | — | — | EP | disclosed |
| US-20090061358-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | PROXIMAL SYSTEMS CORPORATION | 2009-03-05 | — | — | US | disclosed |
| EP-1857104-A1 | USE OF CINNAMOYL COMPOUND | Sumitomo Chemical Company, Limited (JP) | 2007-11-21 | — | — | EP | disclosed |
| US-20070265228-A1 | Cinnamoyl compound and use of the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-11-15 | — | — | US | disclosed |
| US-20070265228-A1 | Cinnamoyl compound and use of the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-11-15 | — | — | US | disclosed |
| US-7141351-B2 | Basic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-11-28 | — | — | US | disclosed |
| US-20040234884-A1 | Basic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-11-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090061358-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | RER1, CRY1, CYP21A2 | TBXAS1 1300/4885MEN1 718/4885LMNA 3801/4885 |
| US-20090274978-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | CYP21A2, C1S, C1R | TBXAS1 1734/4885MEN1 1211/4885LMNA 4448/4885 |
| US-20070265228-A1 | Cinnamoyl compound and use of the same | NPC1, CES2, CYP51A1 | TBXAS1 2029/4885MEN1 876/4885LMNA 1109/4885 |
| US-20090143368-A1 | Use of Cinnamoyl Compound | COL2A1, COL1A1, SMAD2 | TBXAS1 2045/4885MEN1 3367/4885LMNA 1153/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.