Bromide

Bromide

SCHEMBL5084956

CCCCCCCCCCCCCCCCCC[n+]1ccn(C)c1.[Br-]

nearest known ligand 0.55

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHKACHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGHRH2OPRM1

The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM2 known ✓ P08172 1/20 0.52
CHRM4 known ✓ P08173 1/20 0.52
CHRM5 known ✓ P08912 1/20 0.52
CHRM1 known ✓ P11229 1/20 0.52
CHRM3 known ✓ P20309 1/20 0.52
ACHE known ✓ P22303 1/20 0.52
HSP90AA1 P07900 2/20 0.52
RAD52 P43351 2/20 0.52
EGFR P00533 1/20 0.52
LMNA P02545 1/20 0.52
PLA2G1B P04054 1/20 0.52
ERBB2 P04626 1/20 0.52
LCK P06239 1/20 0.52
FYN P06241 1/20 0.52
ADRA2A P08913 1/20 0.52
ADORA3 P0DMS8 1/20 0.52
TSHR P16473 1/20 0.52
ALOX12 P18054 1/20 0.52
ADRA2B P18089 1/20 0.52
ADRA2C P18825 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL3189755 1.00 HSP90AA1 (0.52) HSP90AA1RAD52EGFRLMNAPLA2G1B
Bromide SCHEMBL193063 1.00 HSP90AA1 (0.52) HSP90AA1RAD52EGFRLMNAPLA2G1B
Bromide SCHEMBL5091782 1.00 HSP90AA1 (0.52) HSP90AA1RAD52EGFRLMNAPLA2G1B
Bromide SCHEMBL5087893 1.00 HSP90AA1 (0.52) HSP90AA1RAD52EGFRLMNAPLA2G1B
Bromide SCHEMBL574727 1.00 HSP90AA1 (0.52) HSP90AA1RAD52EGFRLMNAPLA2G1B
Bromide SCHEMBL466201 1.00 HSP90AA1 (0.52) HSP90AA1RAD52EGFRLMNAPLA2G1B
Bromide SCHEMBL5091686 1.00 HSP90AA1 (0.52) HSP90AA1RAD52EGFRLMNAPLA2G1B
Bromide SCHEMBL28475500 1.00 HSP90AA1 (0.52) HSP90AA1RAD52EGFRLMNAPLA2G1B
Bromide SCHEMBL5087802 1.00 HSP90AA1 (0.52) HSP90AA1RAD52EGFRLMNAPLA2G1B
Bromide SCHEMBL2890412 1.00 HSP90AA1 (0.52) HSP90AA1RAD52EGFRLMNAPLA2G1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9932287-B2 Process for oxidation of alkyl aromatic compound to aromatic carboxylic acid RELIANCE INDUSTRIES LIMITED (IN) 2018-04-03 US claimed
US-20160347700-A1 PROCESS FOR OXIDATION OF ALKYL AROMATIC COMPOUND TO AROMATIC CARBOXYLIC ACID RELIANCE INDUSTRIES LIMITED (IN) 2016-12-01 US claimed
US-12618173-B2 High modulus gel-spun PVDF fiber thin films META PLATFORMS TECHNOLOGIES, LLC (US) 2026-05-05 US disclosed
US-12589166-B2 Compositions and methods for treating wounds RUTGERS, THE STATE UNIVERSITY OF NEW JERSEY (US) 2026-03-31 US disclosed
US-20260022311-A1 SEMICONDUCTOR SUBSTRATE CLEANING COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-01-22 US disclosed
US-20260008895-A1 PVDF THIN FILMS HAVING HIGH ELECTROMECHANICAL EFFICIENCY AND A GEL CASTING METHOD FOR FORMING SAME META PLATFORMS TECH LLC (US) 2026-01-08 US disclosed
US-20250352689-A1 Method for Preparing an Antibacterial Polyester and Method for Producing an Antibacterial Fiber Shanghai Jiecon Chemicals Hi-tech Co., Ltd. (CN) 2025-11-20 US disclosed
US-12391809-B2 PVDF thin films having high electromechanical efficiency and a gel casting method for forming same META PLATFORMS TECHNOLOGIES, LLC (US) 2025-08-19 US disclosed
EP-4564403-A1 SEMICONDUCTOR SUBSTRATE CLEANING COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-06-04 EP disclosed
US-20250154410-A1 COMPOSITION, AND SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND ETCHING METHOD USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-05-15 US disclosed
WO-2025063222-A1 COMPOSITION AND KIT, AND METHOD FOR REMOVING RESIST AND METHOD FOR MANUFACTURING ELECTRONIC SUBSTRATE EACH USING THESE 三菱瓦斯化学株式会社 2025-03-27 WO disclosed
US-20150118104-A1 CORROSION INHIBITION COMPOSITION FOR PIPELINES, PROCESS OF ELABORATION AND SYNTHESIS INSTITUTO MEXICANO DEL PETROLEO (MX) 2015-04-30 US disclosed
US-20080214386-A1 Stability; easily separated from solution; surface treatment of catalyst with Group seven compound; reacting epoxide with carbon dioxide NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2008-09-04 US disclosed
WO-2006034239-A2 ANTIMICROBIAL MESOPOROUS SILICA NANOPARTICLES IOWA STATE UNIVERSITY RESEARCH FOUNDATION, INC. (US) 2006-03-30 WO disclosed
US-6994914-B2 Macrocyclic polyester oligomers and processes for polymerizing the same CYCLICS CORPORATION (US) 2006-02-07 US disclosed
US-20060018966-A1 Antimicrobial mesoporous silica nanoparticles IOWA STATE UNIVERSITY RESEARCH FOUNDATION, INC. 2006-01-26 US disclosed
US-20050245676-A1 Macrocyclic polyester oligomers and processes for polymerizing the same CYCLICS CORPORATION (US) 2005-11-03 US disclosed
EP-1250374-A1 MACROCYCLIC POLYESTER OLIGOMERS AND PROCESSES FOR POLYMERIZING THE SAME Cyclics Corporation (US) 2002-10-23 EP disclosed
US-6420047-B2 MIXING THE MACROCYCLIC POLYESTER OLIGOMER AND POLYMERIZATION CATALYST WITH WATER AND THE SURFACTANT THEREBY FORMING A SUSPENSION; IMPREGNATING MACROCYCLIC POLYESTER OLIGOMERS FOR POLYMERIZATION CYCLICS CORPORATION 2002-07-16 US disclosed
WO-2001053379-A1 MACROCYCLIC POLYESTER OLIGOMERS AND PROCESSES FOR POLYMERIZING THE SAME CYCLICS CORPORATION (US) 2001-07-26 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12589166-B2 Compositions and methods for treating wounds CD63, CD68, TSG101 CHRM2 2025/4885CHRM4 3208/4885CHRM5 3672/4885
US-12618173-B2 High modulus gel-spun PVDF fiber thin films MACF1, EEF1D, MEF2D CHRM2 3435/4885CHRM4 3271/4885CHRM5 3859/4885
US-20260022311-A1 SEMICONDUCTOR SUBSTRATE CLEANING COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE USING SAME SFN, SEM1, VAV1 CHRM2 1982/4885CHRM4 2874/4885CHRM5 2022/4885
US-20250352689-A1 Method for Preparing an Antibacterial Polyester and Method for Producing an Antibacterial Fiber PUF60, WDR36, HACD3 CHRM2 1950/4885CHRM4 2322/4885CHRM5 2801/4885
US-20260008895-A1 PVDF THIN FILMS HAVING HIGH ELECTROMECHANICAL EFFICIENCY AND A GEL CASTING METHOD FOR FORMING SAME PEF1, CFL1, AFF2 CHRM2 4308/4885CHRM4 4217/4885CHRM5 4489/4885
US-20060018966-A1 Antimicrobial mesoporous silica nanoparticles MSN, SAAL1, MRPL21 CHRM2 4540/4885CHRM4 4465/4885CHRM5 4498/4885
US-20150118104-A1 CORROSION INHIBITION COMPOSITION FOR PIPELINES, PROCESS OF ELABORATION AND SYNTHESIS TFPI, TBK1, JAK1 CHRM2 2534/4885CHRM4 2996/4885CHRM5 1689/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.