SCHEMBL553558

SCHEMBL553558

COCCC=C(C)C(N)=O

nearest known ligand 0.35

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.31
ALDH1A1 P00352 2/20 0.30
CYP3A4 P08684 1/20 0.30
CYP2D6 P10635 1/20 0.30
MAPT P10636 1/20 0.30
CYP2C19 P33261 1/20 0.30
DDAH1 O94760 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL553557 1.00 POLB (0.31) POLBALDH1A1CYP3A4CYP2D6MAPT
SCHEMBL5597586 0.88 CA2 (0.33)
SCHEMBL5597585 0.88 CA2 (0.33)
SCHEMBL8415443 0.88 ALDH1A1 (0.36) ALDH1A1CYP3A4CYP2D6MAPTCYP2C19
SCHEMBL8415444 0.88 ALDH1A1 (0.36) ALDH1A1CYP3A4CYP2D6MAPTCYP2C19
SCHEMBL528543 0.81 LMNA (0.39) POLB
SCHEMBL528542 0.81 LMNA (0.39) POLB
SCHEMBL553242 0.81 ALOX15 (0.46) POLBALDH1A1CYP3A4CYP2D6MAPT
SCHEMBL553240 0.81 ALOX15 (0.46) POLBALDH1A1CYP3A4CYP2D6MAPT
SCHEMBL621263 0.80 CD81 (0.38) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 292 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260040695-A1 A METHOD TO GENERATE CONDUCTIVE POLYMER NEWSOUTH INNOVATIONS PTY LTD (AU) 2026-02-05 US claimed
EP-4562077-A1 A METHOD TO GENERATE CONDUCTIVE POLYMER NewSouth Innovations Pty Limited (AU) 2025-06-04 EP claimed
WO-2024020649-A1 A METHOD TO GENERATE CONDUCTIVE POLYMER NEWSOUTH INNOVATIONS PTY LIMITED (AU) 2024-02-01 WO claimed
WO-2022261721-A1 HEALABLE AND REPROCESSABLE COMPOSITIONS DEAKIN UNIVERSITY (AU) 2022-12-22 WO claimed
US-12638775-B2 Methods and compositions for improved patterning of photoresist TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2026-05-26 US disclosed
US-20260140444-A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2026-05-21 US disclosed
CN-122028714-A Method for manufacturing semiconductor device and composition for coating patterned photoresist 台湾积体电路制造股份有限公司 2026-05-12 CN disclosed
US-20260130180-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND WAFER PROTECTIVE COMPOSITION TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2026-05-07 US disclosed
US-20260104643-A1 METHOD OF FORMING PHOTORESIST PATTERN TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2026-04-16 US disclosed
US-20260101726-A1 METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING TOOL TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2026-04-09 US disclosed
US-12578645-B2 Method of manufacturing a semiconductor device TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2026-03-17 US disclosed
US-20260076154-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2026-03-12 US disclosed
EP-1243967-A2 Photothermographic material, its processing method, and mask material KONICA CORPORATION (JP) 2002-09-25 EP disclosed
US-20020040976-A1 Fluorescent lamp cover and lighting fixture FUJI PHOTO FILM CO., LTD. 2002-04-11 US disclosed
EP-1178076-A1 Fluorescent lamp cover and lighting fixture Fuji Photo Film Co., Ltd. (JP) 2002-02-06 EP disclosed
EP-0343642-B1 Silver halide photographic material FUJI PHOTO FILM CO LTD (JP) 1997-01-22 EP disclosed
US-H1016-H Polyester film support coated with latex shell-core polymers FUJI PHOTO FILM CO., LTD. (JP) 1992-01-07 US disclosed
US-4977071-A CONTAINING VINYLIDENE CHLORIDE FUJI PHOTO FILM CO., LTD. (JP) 1990-12-11 US disclosed
US-4937179-A Magenta polymer coupler and hydrolyzable coupler FUJI PHOTO FILM CO., LTD. (JP) 1990-06-26 US disclosed
EP-0343642-A2 Silver halide photographic material FUJI PHOTO FILM CO., LTD. (JP) 1989-11-29 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260140444-A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE INO80C, INO80, NAT10 POLB 1031/4885ALDH1A1 2819/4885CYP3A4 2770/4885
US-20260076154-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE JUP, DSG1, ATM POLB 1965/4885ALDH1A1 2660/4885CYP3A4 2259/4885
US-12578645-B2 Method of manufacturing a semiconductor device SUN2, MYB, NONO POLB 235/4885ALDH1A1 4479/4885CYP3A4 3016/4885
US-20260101726-A1 METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING TOOL PIEZO1, MYB, MAP2K4 POLB 3676/4885ALDH1A1 4866/4885CYP3A4 2146/4885
US-20260040695-A1 A METHOD TO GENERATE CONDUCTIVE POLYMER PIEZO1, LCP1, MTCL3 POLB 2848/4885ALDH1A1 4717/4885CYP3A4 4363/4885
US-20260130180-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND WAFER PROTECTIVE COMPOSITION C9, C1S, ZKSCAN2 POLB 1587/4885ALDH1A1 566/4885CYP3A4 2438/4885
US-12638775-B2 Methods and compositions for improved patterning of photoresist DSG1, SCO2, ERCC1 POLB 1070/4885ALDH1A1 1401/4885CYP3A4 2672/4885
US-20260104643-A1 METHOD OF FORMING PHOTORESIST PATTERN DSTN, PFAS, DNTT POLB 1556/4885ALDH1A1 616/4885CYP3A4 664/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.