Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 4/20 | 0.65 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.65 |
| ▸ | TSHR | P16473 | 2/20 | 0.59 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.59 |
| ▸ | BLM | P54132 | 1/20 | 0.48 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.48 |
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | APP | P05067 | 3/20 | 0.32 |
| ▸ | CA12 | O43570 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12907797 | 1.00 | MEN1 (0.65) | MEN1KMT2ATSHRMAPK1BLM | |
| SCHEMBL1463983 | 0.97 | TSHR (0.62) | MEN1KMT2ATSHRMAPK1BLM | |
| SCHEMBL389508 | 0.95 | MEN1 (0.58) | MEN1KMT2ATSHRMAPK1BLM | |
| SCHEMBL30359262 | 0.94 | TSHR (0.59) | MEN1KMT2ATSHRMAPK1BLM | |
| SCHEMBL522377 | 0.92 | TSHR (0.56) | MEN1KMT2ATSHRMAPK1BLM | |
| SCHEMBL2593277 | 0.92 | TSHR (0.56) | MEN1KMT2ATSHRMAPK1BLM | |
| SCHEMBL19865168 | 0.90 | MEN1 (0.52) | MEN1KMT2ATSHRMAPK1BLM | |
| SCHEMBL2740833 | 0.90 | MEN1 (0.52) | MEN1KMT2ATSHRMAPK1BLM | |
| Trolamine SCHEMBL16685318 | 0.88 | MEN1 (0.65) | MEN1KMT2ATSHRMAPK1BLM | |
| SCHEMBL12646242 | 0.88 | BLM (0.48) | MEN1KMT2ATSHRMAPK1BLM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1443 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0005090-B1 | PROCESS FOR THE PREPARATION OF TRIS(8-HYDROXY-3,6-DIOXA-OCTYL)-AMINE, AND THE COMPOUND OBTAINED BY THIS PROCESS | RHONE-POULENC INDUSTRIES (FR) | 1980-10-01 | — | — | EP | claimed |
| US-20260086457-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD | TOKYO OHKA KOGYO CO LTD (JP) | 2026-03-26 | — | — | US | disclosed |
| US-20260086458-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND POLYMER COMPOUND | TOKYO OHKA KOGYO CO LTD (JP) | 2026-03-26 | — | — | US | disclosed |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| US-20260079395-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND AND ACID DIFFUSION CONTROL AGENT | TOKYO OHKA KOGYO CO LTD (JP) | 2026-03-19 | — | — | US | disclosed |
| US-20260079394-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND AND ACID DIFFUSION CONTROL AGENT | TOKYO OHKA KOGYO CO LTD (JP) | 2026-03-19 | — | — | US | disclosed |
| US-12566376-B2 | Resist composition and resist pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-03-03 | — | — | US | disclosed |
| US-20260050211-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND INTERMEDIATE THEREOF | TOKYO OHKA KOGYO CO LTD (JP) | 2026-02-19 | — | — | US | disclosed |
| US-20260003283-A1 | PHOTOSENSITIVE COMPOSITION, METHOD FOR FORMING PATTERNED SILICON-CONTAINING RESIN FILM, AND SILICON-CONTAINING RESIN | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-20260003282-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2026-01-01 | — | — | US | disclosed |
| US-6033828-A | POLYVINYLPHENOL DERIVATIVES | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-03-07 | — | — | US | disclosed |
| US-6027854-A | ACTINIC RADIATION-SENSITIVE, CROSSLINKED TERPOLYMER CONTAINING STYRENIC GROUPS RING-SUBSTITUTED WITH HYDROXYL, HYDROXYALKYLOXY, CARBOXYALKYLOXY MOIETIES AND ACID LABILE GROUPS; ETCHING AND HEAT RESISTANCE | SHIN-ETSU CHEMICAL CO., LTD. | 2000-02-22 | — | — | US | disclosed |
| US-5972560-A | A CROSSLINKED POLYSILOXANE PHOTOACID GENERATOR HAVING HIGH TRANSPARENCY, HIGH RESOLUTION, IMPROVED LATITUDE OF EXPOSURE, PROCESS ADAPTABILITY, AND FOR PRECISE MICRO-PROCESSING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-10-26 | — | — | US | disclosed |
| EP-0908783-A1 | Resist compositions, their preparation and use for patterning processes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |
| EP-0908473-A1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |
| US-4694060-A | PRECURSORS FOR CERAMICS | RHONE-POULENC SPECIALITES CHIMIQUES (FR) | 1987-09-15 | — | — | US | disclosed |
| US-4373070-A | CROSS-LINKED POLYMERS HAVING PENDANT OXYALKYL TERTIARY AMINE GROUPS | RHONE-POULENC INDUSTRIES (FR) | 1983-02-08 | — | — | US | disclosed |
| EP-0005090-B1 | PROCESS FOR THE PREPARATION OF TRIS(8-HYDROXY-3,6-DIOXA-OCTYL)-AMINE, AND THE COMPOUND OBTAINED BY THIS PROCESS | RHONE-POULENC INDUSTRIES (FR) | 1980-10-01 | — | — | EP | disclosed |
| EP-0005090-A1 | Process for the preparation of tris(8-hydroxy-3,6-dioxa-octyl)-amine, and the compound obtained by this process | RHONE-POULENC INDUSTRIES (FR) | 1979-10-31 | — | — | EP | disclosed |
| EP-0005090-A1 | Process for the preparation of tris(8-hydroxy-3,6-dioxa-octyl)-amine, and the compound obtained by this process | RHONE-POULENC INDUSTRIES (FR) | 1979-10-31 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (9 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260086458-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND POLYMER COMPOUND | RER1, ITGA1, AR | MEN1 1069/4885KMT2A 1203/4885TSHR 384/4885 |
| US-20260086457-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD | CCND2, CCNA1, CCND1 | MEN1 986/4885KMT2A 1573/4885TSHR 2754/4885 |
| US-20260003282-A1 | PHOTOSENSITIVE COMPOSITION, AND METHOD FOR PRODUCING PATTERNED CURED FILM | H1-4, H1-10, H1-0 | MEN1 709/4885KMT2A 950/4885TSHR 1049/4885 |
| US-20260079395-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND AND ACID DIFFUSION CONTROL AGENT | F9, AFF2, AFF1 | MEN1 1063/4885KMT2A 3540/4885TSHR 88/4885 |
| US-20260050211-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND INTERMEDIATE THEREOF | RARG, RXRG, IGF1R | MEN1 140/4885KMT2A 3847/4885TSHR 143/4885 |
| US-20260003283-A1 | PHOTOSENSITIVE COMPOSITION, METHOD FOR FORMING PATTERNED SILICON-CONTAINING RESIN FILM, AND SILICON-CONTAINING RESIN | RARA, COL1A1, TAS1R1 | MEN1 2485/4885KMT2A 210/4885TSHR 925/4885 |
| US-12566376-B2 | Resist composition and resist pattern forming method | RER1, REV1, GAR1 | MEN1 1187/4885KMT2A 3180/4885TSHR 419/4885 |
| US-20260079394-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND AND ACID DIFFUSION CONTROL AGENT | DRD1, DRD2, FANCD2 | MEN1 1610/4885KMT2A 1977/4885TSHR 734/4885 |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | PRDM9, ARCN1, PUF60 | MEN1 2185/4885KMT2A 537/4885TSHR 3402/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.