SCHEMBL670698

SCHEMBL670698

CC(C)(C(=O)[O-])C(C(=O)[O-])S(=O)(=O)O.[Na+].[Na+]

nearest known ligand 0.33

Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.32
TSHR P16473 1/20 0.32
NFKB1 P19838 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2992792 0.75 CYP3A4 (0.30) CYP3A4TSHRNFKB1NPSR1
SCHEMBL33345 0.74 CYP3A4 (0.38) CYP3A4TSHRNFKB1NPSR1
SCHEMBL29561601 0.70 CYP3A4 (0.34) CYP3A4TSHRNFKB1NPSR1
Potassium Ion SCHEMBL11701015 0.70
Lithium Ion SCHEMBL5013317 0.69 CYP3A4 (0.34) CYP3A4TSHRNFKB1NPSR1
Potassium Ion SCHEMBL31105848 0.69 CYP3A4 (0.34) CYP3A4TSHRNFKB1NPSR1
SCHEMBL4665221 0.69 CA2 (0.31)
SCHEMBL7100292 0.69 CYP3A4 (0.46) CYP3A4TSHRNFKB1NPSR1
SCHEMBL7186179 0.69 NFKB1 (0.37) CYP3A4TSHRNFKB1NPSR1
SCHEMBL587191 0.67 CA1 (0.40) CYP3A4TSHRNFKB1NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8779087-B2 Method for producing aliphatic polycarbonate SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2014-07-15 US claimed
US-20120123066-A1 METHOD FOR PRODUCING ALIPHATIC POLYCARBONATE SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2012-05-17 US claimed
EP-2433976-A1 METHOD FOR PRODUCING ALIPHATIC POLYCARBONATE Sumitomo Seika Chemicals CO. LTD. (JP) 2012-03-28 EP claimed
US-4551382-A POLYESTERURETHANE AND ACRYLIC OR VINYL POLYMER RHONE-POULENC SPECIALITES CHIMIQUES (FR) 1985-11-05 US claimed
US-4539366-A POLYESTERURETHANE COPOLYMER AND ACRYLIC AND/OR VINYL POLYMER BLEND RHONE-POULENC SPECIALITES CHIMIQUES (FR) 1985-09-03 US claimed
US-4150946-A ABRASION RESISTANT TEXTILES RHONE-POULENC INDUSTRIES (FR) 1979-04-24 US claimed
JP-3118185-A None JP disclosed
EP-4702842-A1 COMPOSITION, ANT CONTROL AGENT, AND CONTROL METHOD FOR ANTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-03-04 EP disclosed
US-20250000088-A1 ANT CONTROL AGENT AND ANT CONTROL METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-01-02 US disclosed
EP-4424164-A1 ANT CONTROL AGENT AND ANT CONTROL METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-09-04 EP disclosed
WO-2023074396-A1 ANT CONTROL AGENT AND ANT CONTROL METHOD 信越化学工業株式会社 2023-05-04 WO disclosed
US-8779087-B2 Method for producing aliphatic polycarbonate SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2014-07-15 US disclosed
US-20120123066-A1 METHOD FOR PRODUCING ALIPHATIC POLYCARBONATE SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2012-05-17 US disclosed
US-20040113961-A1 Image forming method, printed matter and image recording apparatus KONICA MINOLTA HOLDINGS, INC. (JP) 2004-06-17 US disclosed
US-6685311-B2 YELLOW, CYAN, MAGENTA OR BLACK COLORS COMPRISING BINDERS AND PIGMENTS, USED FOR HIGH SPEED THERMAL RECORDING OF PRINTS HAVING STABILITY AND WEAR RESISTANCE KONICA CORPORATION (JP) 2004-02-03 US disclosed
US-20030128264-A1 Ink-jet ink, ink-jet ink cartridge, ink-jet recording unit and ink-jet recording apparatus KONICA CORPORATION (JP) 2003-07-10 US disclosed
US-5283296-A Modified polymers based on graft polyester and their preparation process RHONE-POULENC CHIMIE (FR) 1994-02-01 US disclosed
JP-H03118185-A TWO-COLOR THERMAL RECORDING MATERIAL KANZAKI PAPER MFG CO LTD 1991-05-20 JP disclosed
US-4150946-A ABRASION RESISTANT TEXTILES RHONE-POULENC INDUSTRIES (FR) 1979-04-24 US disclosed
US-4110284-A Polyurethane latexes from sulfonate prepolymer, aqueous chain extension process, and coated support RHONE-PROGIL (FR) 1978-08-29 US disclosed