Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SCN9A | Q15858 | 4/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18467219 | 1.00 | SCN9A (0.39) | SCN9AMAPTHPGDALDH1A1THRB | |
| SCHEMBL16106774 | 0.99 | SCN9A (0.39) | SCN9AMAPTHPGDALDH1A1THRB | |
| SCHEMBL14294661 | 0.92 | ALDH1A1 (0.37) | SCN9AALDH1A1THRBMEN1KMT2A | |
| SCHEMBL686181 | 0.92 | SCN9A (0.37) | SCN9AMAPTHPGDALDH1A1THRB | |
| SCHEMBL12094575 | 0.91 | SCN9A (0.35) | SCN9AMAPTHPGD | |
| SCHEMBL12094576 | 0.91 | SCN9A (0.36) | SCN9AMAPTHPGDALDH1A1THRB | |
| SCHEMBL15463187 | 0.90 | SCN9A (0.37) | SCN9AMAPTHPGDALDH1A1THRB | |
| SCHEMBL12094571 | 0.89 | SCN9A (0.34) | SCN9AMAPTHPGD | |
| SCHEMBL787195 | 0.88 | MAPT (0.30) | SCN9AMAPTHPGD | |
| SCHEMBL22399834 | 0.88 | MAPT (0.30) | SCN9AMAPTHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 710 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12638775-B2 | Methods and compositions for improved patterning of photoresist | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-05-26 | — | — | US | claimed |
| CN-119165732-B | Photoresist bottom anti-reflection coating polymer, preparation method, composition and application | 中节能万润股份有限公司 | 2025-01-28 | — | — | CN | claimed |
| CN-119165732-A | Photoresist bottom anti-reflection coating polymer, preparation method, composition and application | 中节能万润股份有限公司 | 2024-12-20 | — | — | CN | claimed |
| CN-117447885-B | Photoresist top layer coating polymer, preparation method, composition and application | 中节能万润股份有限公司 | 2024-04-09 | — | — | CN | claimed |
| US-12638775-B2 | Methods and compositions for improved patterning of photoresist | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-05-26 | — | — | US | disclosed |
| CN-119165732-B | Photoresist bottom anti-reflection coating polymer, preparation method, composition and application | 中节能万润股份有限公司 | 2025-01-28 | — | — | CN | disclosed |
| CN-119165732-A | Photoresist bottom anti-reflection coating polymer, preparation method, composition and application | 中节能万润股份有限公司 | 2024-12-20 | — | — | CN | disclosed |
| US-20240241440-A1 | POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-07-18 | — | — | US | disclosed |
| US-20240241441-A1 | POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-07-18 | — | — | US | disclosed |
| US-20240241441-A1 | POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-07-18 | — | — | US | disclosed |
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20080086014-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-04-10 | — | — | US | disclosed |
| US-20080081293-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-04-03 | — | — | US | disclosed |
| US-7304175-B2 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-12-04 | — | — | US | disclosed |
| US-7304175-B2 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-12-04 | — | — | US | disclosed |
| US-7304175-B2 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-12-04 | — | — | US | disclosed |
| US-20070149702-A1 | Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED | 2007-06-28 | — | — | US | disclosed |
| US-20070149702-A1 | Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED | 2007-06-28 | — | — | US | disclosed |
| US-20060194982-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-08-31 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060194982-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | ASIC1, SLC9A1, NHERF1 | SCN9A 39/4885MAPT 4186/4885HPGD 1733/4885 |
| US-20080081293-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | HCN3, HCN1, NHERF1 | SCN9A 475/4885MAPT 4878/4885HPGD 2994/4885 |
| US-20080086014-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | HCN3, SLC26A3, KCNN4 | SCN9A 310/4885MAPT 4834/4885HPGD 3185/4885 |
| US-12638775-B2 | Methods and compositions for improved patterning of photoresist | DSG1, SCO2, ERCC1 | SCN9A 3203/4885MAPT 1537/4885HPGD 3019/4885 |
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-0, HCN3, RER1 | SCN9A 60/4885MAPT 4576/4885HPGD 1188/4885 |
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, COL1A1, RAD51 | SCN9A 2749/4885MAPT 736/4885HPGD 4208/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.