Known targets — ChEMBL curated mechanism
ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.44 |
| ▸ | GMNN | O75496 | 1/20 | 0.44 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | THPO | P40225 | 1/20 | 0.44 |
| ▸ | HBB | P68871 | 1/20 | 0.44 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.44 |
| ▸ | BBOX1 | O75936 | 3/20 | 0.42 |
| ▸ | HPGD | P15428 | 3/20 | 0.38 |
| ▸ | RECQL | P46063 | 2/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.38 |
| ▸ | GLA | P06280 | 1/20 | 0.38 |
| ▸ | BLM | P54132 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.37 |
| ▸ | MAPT | P10636 | 2/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19640303 | 0.85 | TSHR (0.52) | TSHRALDH1A1MAPK1LMNASMN1; SMN2 | |
| SCHEMBL6730611 | 0.84 | TSHR (0.45) | TSHRALDH1A1MAPK1LMNASMN1; SMN2 | |
| Potassium Ion SCHEMBL31075019 | 0.80 | GMNN (0.46) | TSHRALDH1A1MAPK1LMNASMN1; SMN2 | |
| SCHEMBL28448153 | 0.78 | TSHR (0.48) | TSHRALDH1A1MAPK1LMNASMN1; SMN2 | |
| SCHEMBL27038942 | 0.78 | ALDH1A1 (0.38) | TSHRALDH1A1LMNASMN1; SMN2HPGD | |
| SCHEMBL1009169 | 0.78 | TSHR (0.50) | TSHRALDH1A1MAPK1LMNASMN1; SMN2 | |
| Tetrabuthylammonium SCHEMBL1111618 | 0.78 | RECQL (0.41) | TSHRMAPK1BBOX1HPGDRECQL | |
| SCHEMBL28077320 | 0.77 | RECQL (0.57) | TSHRALDH1A1MAPK1LMNASMN1; SMN2 | |
| SCHEMBL123320 | 0.77 | TSHR (0.47) | TSHRALDH1A1MAPK1LMNASMN1; SMN2 | |
| SCHEMBL126016 | 0.77 | TSHR (0.47) | TSHRALDH1A1MAPK1LMNASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024237073-A1 | SILICA FINE PARTICLE DISPERSION FOR POLISHING, COMPOSITION FOR POLISHING, AND METHOD FOR PRODUCING SILICA FINE PARTICLE DISPERSION FOR POLISHING | 日揮触媒化成株式会社 | 2024-11-21 | — | — | WO | disclosed |
| US-11891307-B2 | Silica-based particle dispersion and production method therefor | JGC CATALYSTS AND CHEMICALS LTD. (JP) | 2024-02-06 | — | — | US | disclosed |
| CN-109155246-B | Silica-based composite microparticle dispersion and process for producing the same | 日挥触媒化成株式会社 | 2024-01-05 | — | — | CN | disclosed |
| EP-3539926-B1 | CERIA COMPOSITE PARTICLE DISPERSION, METHOD FOR PRODUCING SAME, AND POLISHING ABRASIVE GRAIN DISPERSION COMPRISING CERIA COMPOSITE PARTICLE DISPERSION | JGC CATALYSTS & CHEMICALS LTD (JP) | 2023-07-12 | — | — | EP | disclosed |
| EP-3447790-B1 | SILICA-BASED COMPOSITE FINE PARTICLE DISPERSION AND METHOD FOR MANUFACTURING SAME | JGC CATALYSTS & CHEMICALS LTD (JP) | 2023-05-24 | — | — | EP | disclosed |
| CN-109937187-B | Cerium oxide-based composite microparticle dispersion, method for producing same, and abrasive particle dispersion for polishing containing cerium oxide-based composite microparticle dispersion | 日挥触媒化成株式会社 | 2022-08-09 | — | — | CN | disclosed |
| US-20220055908-A1 | SILICA-BASED PARTICLE DISPERSION AND PRODUCTION METHOD THEREFOR | JGC CATALYSTS AND CHEMICALS LTD. (JP) | 2022-02-24 | — | — | US | disclosed |
| US-11059997-B2 | Polishing composition | JGC CATALYSTS AND CHEMICALS LTD. (JP) | 2021-07-13 | — | — | US | disclosed |
| US-10920120-B2 | Ceria composite particle dispersion, method for producing same, and polishing abrasive grain dispersion comprising ceria composite particle dispersion | JGC CATALYSTS AND CHEMICALS LTD. (JP) | 2021-02-16 | — | — | US | disclosed |
| EP-3279142-B1 | SILICA-BASED COMPOSITE FINE-PARTICLE DISPERSION, METHOD FOR PRODUCING SAME, AND POLISHING SLURRY INCLUDING SILICA-BASED COMPOSITE FINE-PARTICLE DISPERSION | JGC CATALYSTS & CHEMICALS LTD (JP) | 2021-01-06 | — | — | EP | disclosed |
| US-20060000808-A1 | Polishing solution of metal and chemical mechanical polishing method | FUJI PHOTO FILM CO., LTD. | 2006-01-05 | — | — | US | disclosed |
| EP-1612249-A1 | Polishing solution of metal and chemical mechanical polishing method | FUJI PHOTO FILM CO., LTD. (JP) | 2006-01-04 | — | — | EP | disclosed |
| US-20050191823-A1 | Polishing composition and polishing method | FUJIMI INCORPORATED (JP) | 2005-09-01 | — | — | US | disclosed |
| EP-1568746-A1 | Polishing composition and polishing method | FUJIMI INCORPORATED (JP) | 2005-08-31 | — | — | EP | disclosed |
| US-6899821-B2 | Abrasive liquid for metal and method for polishing | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2005-05-31 | — | — | US | disclosed |
| US-6896825-B1 | Abrasive liquid for metal and method for polishing | HITACHI CHEMICAL COMPANY, LTD (JP) | 2005-05-24 | — | — | US | disclosed |
| US-20050095860-A1 | Abrasive liquid for metal and method for polishing | RENESAS ELECTRONICS CORPORATION (JP) | 2005-05-05 | — | — | US | disclosed |
| US-20020017630-A1 | Abrasive liquid for metal and method for polishing | RENESAS ELECTRONICS CORPORATION (JP) | 2002-02-14 | — | — | US | disclosed |
| EP-1150341-A1 | MATERIALS FOR POLISHING LIQUID FOR METAL, POLISHING LIQUID FOR METAL, METHOD FOR PREPARATION THEREOF AND POLISHING METHOD USING THE SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2001-10-31 | — | — | EP | disclosed |
| EP-1137056-A1 | ABRASIVE LIQUID FOR METAL AND METHOD FOR POLISHING | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2001-09-26 | — | — | EP | disclosed |