SCHEMBL8990145

SCHEMBL8990145

Cc1cc(Cc2ccc(O)c3ccccc23)cc(C)c1O

nearest known ligand 0.64

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.50
HTT P42858 1/20 0.50
SHBG P04278 1/20 0.47
ALK Q9UM73 1/20 0.45
IDO1 P14902 2/20 0.43
ESR1 P03372 1/20 0.43
ESR2 Q92731 1/20 0.43
PAX8 Q06710 1/20 0.42
NR3C1 P04150 1/20 0.40
PGR P06401 1/20 0.40
NR3C2 P08235 1/20 0.40
PKM P14618 1/20 0.40
BCL2 P10415 1/20 0.39
BCL2L1 Q07817 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8772267 0.83 LMNA (0.53) LMNAHTTSHBGALKPKM
SCHEMBL8963168 0.82 DHFR (0.42) IDO1PAX8
SCHEMBL8772220 0.80 CYP3A4 (0.55) SHBG
SCHEMBL11488508 0.79 PAX8 (0.68) LMNAHTTPAX8
SCHEMBL771058 0.79 SHBG (0.48) SHBGESR1ESR2
SCHEMBL29831656 0.79 SHBG (0.48) SHBGESR1ESR2
SCHEMBL4065746 0.79 HSPA5 (0.56) HTTSHBGALKESR1ESR2
SCHEMBL20414570 0.79 IDO1 (0.50) LMNAHTTIDO1NR3C1PGR
SCHEMBL3165277 0.78 PAX8 (0.62) IDO1PAX8BCL2BCL2L1
SCHEMBL218662 0.78 SHBG (0.55) SHBGALKESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0509740-B1 Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material CANON KK (JP) 1996-06-26 EP disclosed
US-5262295-A Biphenyldihydroxide reducing agent for silver halide emulsion layers CANON KABUSHIKI KAISHA (JP) 1993-11-16 US disclosed
EP-0509740-A1 Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material CANON KABUSHIKI KAISHA (JP) 1992-10-21 EP disclosed
EP-0505155-A1 Heat-developable masking layer CANON KABUSHIKI KAISHA (JP) 1992-09-23 EP disclosed