SCHEMBL93541

SCHEMBL93541

CCCCC(CC)COC(=O)OOOOC(=O)OCC(CC)CCCC

nearest known ligand 0.62

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 5/20 0.62
TSHR P16473 3/20 0.62
TDP1 Q9NUW8 2/20 0.62
ATM Q13315 1/20 0.62
ALDH1A1 P00352 6/20 0.54
CA2 P00918 5/20 0.54
RECQL P46063 1/20 0.51
LMNA P02545 3/20 0.49
L3MBTL1 Q9Y468 1/20 0.49
MAPK1 P28482 3/20 0.48
HSD17B10 Q99714 1/20 0.48
PRSS1 P07477 1/20 0.48
PRSS2 P07478 1/20 0.48
PRSS3 P35030 1/20 0.48
MMP9 P14780 1/20 0.42
MMP8 P22894 1/20 0.42
MMP14 P50281 1/20 0.42
CA1 P00915 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6420451 0.94 CYP3A4 (0.55) CYP3A4TSHRTDP1ATMALDH1A1
SCHEMBL35431 0.93 CYP3A4 (0.66) CYP3A4TSHRTDP1ATMALDH1A1
SCHEMBL19348249 0.89 CYP3A4 (0.51) CYP3A4TSHRTDP1ATMALDH1A1
SCHEMBL3478363 0.89 CYP3A4 (0.54) CYP3A4TSHRTDP1ATMALDH1A1
SCHEMBL94797 0.89 CYP3A4 (0.70) CYP3A4TSHRTDP1ATMALDH1A1
SCHEMBL584511 0.88 CYP3A4 (0.60) CYP3A4TSHRTDP1ATMALDH1A1
SCHEMBL1501810 0.88 CYP3A4 (0.60) CYP3A4TSHRTDP1ATMALDH1A1
SCHEMBL11765553 0.88 CYP3A4 (0.60) CYP3A4TSHRTDP1ATMALDH1A1
SCHEMBL29777945 0.88 CYP3A4 (0.60) CYP3A4TSHRTDP1ATMALDH1A1
SCHEMBL14844216 0.88 CYP3A4 (0.53) CYP3A4TSHRTDP1ATMALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 140 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7214812-B2 stabilized with at least one alpha-unsaturated ketone PEROXID-CHEMIE GMBH & CO. KG (DE) 2007-05-08 US claimed
US-20260109105-A1 METHOD FOR PRODUCING STRETCHED FILM KANEKA CORPORATION (JP) 2026-04-23 US disclosed
US-20260092135-A1 POLYMER ELECTROLYTE COMPRISING A POLYACRYLAMIDE AND METHODS FOR THE PRODUCTION THEREOF UMICORE NV (BE) 2026-04-02 US disclosed
US-20260088289-A1 ELECTROCHEMICAL CELL COMPRISING A POLYMER ELECTROLYTE AND A NICKEL-BASED CATHODE ACTIVE MATERIAL UMICORE NV (BE) 2026-03-26 US disclosed
US-20260088336-A1 ELECTROCHEMICAL CELL COMPRISING A POLYMER ELECTROLYTE AND A NICKEL BASED CATHODE ACTIVE MATERIAL UMICORE NV (BE) 2026-03-26 US disclosed
US-20260088348-A1 POLYMER ELECTROLYTE COMPRISING A POLYACRYLAMIDE AND METHODS FOR THE PRODUCTION THEREOF UMICORE NV (BE) 2026-03-26 US disclosed
US-20260003210-A1 DIFFRACTIVE CONTACT LENSES ALCON INC (CH) 2026-01-01 US disclosed
US-20250388748-A1 THERMOPLASTIC RESIN COMPOSITION KANEKA CORPORATION (JP) 2025-12-25 US disclosed
US-20250361400-A1 REACTIVE HEVL-ABSORBING DYES ALCON INC (CH) 2025-11-27 US disclosed
WO-2025235267-A1 TRANSPARENT ARTICLES INCLUDING A LAYER FORMED FROM AN AMMONIUM (METH)ACRYLATE MONOMER VITRO FLAT GLASS LLC (US) 2025-11-13 WO disclosed
EP-0187676-B1 A PROCESS FOR PRODUCING VINYL CHLORIDE RESIN KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1991-08-07 EP disclosed
US-5021490-A Using reactive polyester THE B. F. GOODRICH COMPANY (US) 1991-06-04 US disclosed
EP-0193952-B1 A PROCESS FOR PRODUCING VINYL CHLORIDE RESIN KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1990-08-01 EP disclosed
US-4849482-A BULK DENSITY, SMOOTHNESS Kanegafuchi Kagaki Kogyo Kabushiki Kaisha (JP) 1989-07-18 US disclosed
US-4771114-A HIGH BULK DENSITY, NO FISH EYES KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1988-09-13 US disclosed
EP-0200181-A2 Process for shortstopping free radical polymerization The B.F. GOODRICH Company (US) 1986-11-05 EP disclosed
EP-0193952-A2 A process for producing vinyl chloride resin KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1986-09-10 EP disclosed
EP-0187676-A2 A process for producing vinyl chloride resin KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1986-07-16 EP disclosed
EP-0167188-A1 Process for preparing aqueous dispersions of acrylic-urethane graft copolymers Polyvinyl Chemie Holland B.V. (NL) 1986-01-08 EP disclosed
EP-0030104-B1 PROCESS FOR PREPARING ORGANIC DISPERSION OF ACID-TYPE FLUORINATED POLYMER ASAHI GLASS COMPANY LTD. (JP) 1984-08-22 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260092135-A1 POLYMER ELECTROLYTE COMPRISING A POLYACRYLAMIDE AND METHODS FOR THE PRODUCTION THEREOF RPL6, EFNA1, HCN1 CYP3A4 3997/4885TSHR 4139/4885TDP1 411/4885
US-20260109105-A1 METHOD FOR PRODUCING STRETCHED FILM TPM3, TPM4, HACD3 CYP3A4 3819/4885TSHR 527/4885TDP1 637/4885
US-20260003210-A1 DIFFRACTIVE CONTACT LENSES LBR, CRYZ, CRYAA CYP3A4 4327/4885TSHR 1437/4885TDP1 2489/4885
US-20260088336-A1 ELECTROCHEMICAL CELL COMPRISING A POLYMER ELECTROLYTE AND A NICKEL BASED CATHODE ACTIVE MATERIAL NES, HCN2, CDH1 CYP3A4 3196/4885TSHR 4452/4885TDP1 2708/4885
US-20260088348-A1 POLYMER ELECTROLYTE COMPRISING A POLYACRYLAMIDE AND METHODS FOR THE PRODUCTION THEREOF HCN1, GJA1, HCN2 CYP3A4 2784/4885TSHR 3625/4885TDP1 663/4885
US-20250388748-A1 THERMOPLASTIC RESIN COMPOSITION HSPA4L, HSP90AA1, HACD3 CYP3A4 1851/4885TSHR 3777/4885TDP1 672/4885
US-20260088289-A1 ELECTROCHEMICAL CELL COMPRISING A POLYMER ELECTROLYTE AND A NICKEL-BASED CATHODE ACTIVE MATERIAL NES, CDH1, EMC1 CYP3A4 3569/4885TSHR 4227/4885TDP1 2048/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.