Sugi Predict

Sugi Predict / Compounds / SCHEMBL1004985

SCHEMBL1004985

SCHEMBL1004985

[CH](OC1CCCC1)c1ccccc1

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ POLB P06746 1/20 0.41
▸ GAA P10253 1/20 0.41
▸ IDO1 P14902 4/20 0.40
▸ CHRNB4 P30926 1/20 0.37
▸ CHRNA3 P32297 1/20 0.37
▸ CHRNA7 P36544 1/20 0.37
▸ CHRNA10 Q9GZZ6 1/20 0.37
▸ CHRNA9 Q9UGM1 1/20 0.37
▸ MAPT P10636 1/20 0.36
▸ HPGD P15428 1/20 0.36
▸ HSP90AA1 P07900 2/20 0.35
▸ MAPK1 P28482 1/20 0.35
▸ SMN1; SMN2 Q16637 1/20 0.35
▸ KDM4E B2RXH2 1/20 0.35
▸ CYP3A4 P08684 1/20 0.34
▸ CYP2C9 P11712 1/20 0.34
▸ CYP2C19 P33261 1/20 0.34
▸ RECQL P46063 1/20 0.34
▸ NPSR1 Q6W5P4 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1006660 0.98 IDO1 (0.43) POLBGAAIDO1CHRNB4CHRNA3
SCHEMBL17628499 0.91 IDO1 (0.38) POLBGAAIDO1CHRNB4CHRNA3
SCHEMBL8494827 0.82 KDM1A (0.38) POLBGAAIDO1CHRNB4CHRNA3
SCHEMBL27608173 0.79 CHRNB4 (0.42) POLBGAAIDO1CHRNB4CHRNA3
SCHEMBL23244045 0.78 HSP90AA1 (0.42) IDO1CHRNB4CHRNA3CHRNA7CHRNA10
SCHEMBL1397152 0.78 HSP90AA1 (0.42) IDO1CHRNB4CHRNA3CHRNA7CHRNA10
SCHEMBL11234066 0.77 IDO1 (0.48) IDO1
SCHEMBL7428261 0.76 RAB9A (0.44) CHRNA7MAPTHPGDKDM4ECYP3A4
SCHEMBL6673084 0.75 OPRM1 (0.39) POLBGAACHRNB4CHRNA3CHRNA7
SCHEMBL9427238 0.74 KDM4C (0.38) POLBGAASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-3971804-A ACARICIDES, FUNGICIDES, INSECTICIDES BAYER AKTIENGESELLSCHAFT (DT) 1976-07-27 — — US claimed
US-20140275463-A1 ORGANOSILICON COMPOUND AND PRODUCTION PROCESS FOR THE SAME, AND POLYSILOXANE AND PRODUCTION PROCESS FOR THE SAME CHISSO PETROCHEMICAL CORPORATION (JP) 2014-09-18 — — US disclosed
EP-1548020-B1 SILICON COMPOUND JNC CORP (JP) 2014-07-23 — — EP disclosed
US-8367792-B2 Polysiloxane compound and method of producing the same JNC CORPORATION (JP) 2013-02-05 — — US disclosed
US-20120208973-A1 POLYSILOXANE COMPOUND AND METHOD OF PRODUCING THE SAME OOTAKE NOBUMASA (JP) 2012-08-16 — — US disclosed
EP-1550664-B1 SILICON COMPOUND JNC CORP (JP) 2012-06-27 — — EP disclosed
US-8173758-B2 Polysiloxane compound and method of producing the same JNC CORPORATION (JP) 2012-05-08 — — US disclosed
US-20110178313-A1 POLYSILOXANE COMPOUND AND METHOD OF PRODUCING THE SAME OOTAKE NOBUMASA 2011-07-21 — — US disclosed
US-7964692-B2 Polymer obtained by addition-polymerization initiated by a silicon compound JNC CORPORATION (JP) 2011-06-21 — — US disclosed
US-7939617-B2 Silsesquioxane derivative; electronic material, optical material, optoelectronic material, paint, and primer. CHISSO CORPORATION (JP) 2011-05-10 — — US disclosed
US-20050288468-A1 Cyclic polysilsequisiloxanes substituted with a group containing a sulfonyl halide, especially ahalosulfonylphenyl group; living radical polymerization initiators, particularly for preparing acrylic polymers JNC CORPORATION (JP) 2005-12-29 — — US disclosed
US-20050250925-A1 Silicon compound JNC CORPORATION (JP) 2005-11-10 — — US disclosed
US-20050215807-A1 Silsesquioxane derivative JNC CORPORATION (JP) 2005-09-29 — — US disclosed
EP-1550664-A1 SILICON COMPOUND CHISSO CORPORATION (JP) 2005-07-06 — — EP disclosed
EP-1548020-A1 SILICON COMPOUND CHISSO CORPORATION (JP) 2005-06-29 — — EP disclosed
US-20050033077-A1 Production process for silicon compound and the same JNC CORPORATION (JP) 2005-02-10 — — US disclosed
US-20040249103-A1 Silsesquioxane derivatives and process for production thereof JNC CORPORATION (JP) 2004-12-09 — — US disclosed
EP-1428795-A1 SILSESQUIOXANE DERIVATIVES AND PROCESS FOR PRODUCTION THEREOF CHISSO CORPORATION (JP) 2004-06-16 — — EP disclosed
US-20040068074-A1 Production process for silsesquioxane derivative having functional group and silsesquioxane derivative JNC CORPORATION (JP) 2004-04-08 — — US disclosed
US-20040030084-A1 Production process for silsesquioxane derivative and silsesquioxane derivative JNC CORPORATION (JP) 2004-02-12 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110178313-A1 POLYSILOXANE COMPOUND AND METHOD OF PRODUCING THE SAME RPS4X, POLR2A, MSL1 POLB 1376/4885GAA 3589/4885IDO1 4256/4885
US-20140275463-A1 ORGANOSILICON COMPOUND AND PRODUCTION PROCESS FOR THE SAME, AND POLYSILOXANE AND PRODUCTION PROCESS FOR THE SAME PIEZO1, PFAS, MCM6 POLB 728/4885GAA 1697/4885IDO1 4399/4885
US-20050215807-A1 Silsesquioxane derivative STS, SFXN1, SULT1A1 POLB 2890/4885GAA 701/4885IDO1 2537/4885
US-20120208973-A1 POLYSILOXANE COMPOUND AND METHOD OF PRODUCING THE SAME RPS4X, POLR2A, MSL1 POLB 1376/4885GAA 3589/4885IDO1 4256/4885
US-20050288468-A1 Cyclic polysilsequisiloxanes substituted with a group containing a sulfonyl halide, especially ahalosulfonylphenyl group; living radical polymerization initiators, particularly for preparing acrylic polymers STS, SULT1A1, SRM POLB 3056/4885GAA 1726/4885IDO1 2383/4885
US-20050033077-A1 Production process for silicon compound and the same STS, SMS, SFXN1 POLB 4130/4885GAA 490/4885IDO1 1199/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.