Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1004034 | 0.98 | GAA (0.33) | CYP1A2GAA | |
| SCHEMBL1005386 | 0.98 | GAA (0.33) | CYP1A2GAA | |
| SCHEMBL18242328 | 0.94 | CYP1A2 (0.31) | CYP1A2 | |
| SCHEMBL18243533 | 0.85 | CYP1A2 (0.32) | CYP1A2 | |
| SCHEMBL18378594 | 0.80 | NR1H2 (0.32) | CYP1A2 | |
| SCHEMBL673282 | 0.79 | LMNA (0.43) | — | |
| SCHEMBL21066247 | 0.79 | ALDH1A1 (0.46) | CYP1A2 | |
| SCHEMBL18243584 | 0.79 | PDE2A (0.31) | CYP1A2 | |
| SCHEMBL8383958 | 0.78 | ALDH1A1 (0.44) | CYP1A2 | |
| SCHEMBL13410410 | 0.78 | CYP2A6 (0.37) | CYP1A2GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10451967-B2 | Acid- and radical-generating agent and method for generating acid and radical | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-22 | — | — | US | disclosed |
| US-20160342084-A1 | ACID- AND RADICAL-GENERATING AGENT AND METHOD FOR GENERATING ACID AND RADICAL | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2016-11-24 | — | — | US | disclosed |
| US-20140275463-A1 | ORGANOSILICON COMPOUND AND PRODUCTION PROCESS FOR THE SAME, AND POLYSILOXANE AND PRODUCTION PROCESS FOR THE SAME | CHISSO PETROCHEMICAL CORPORATION (JP) | 2014-09-18 | — | — | US | disclosed |
| EP-1548020-B1 | SILICON COMPOUND | JNC CORP (JP) | 2014-07-23 | — | — | EP | disclosed |
| US-8367792-B2 | Polysiloxane compound and method of producing the same | JNC CORPORATION (JP) | 2013-02-05 | — | — | US | disclosed |
| US-20120208973-A1 | POLYSILOXANE COMPOUND AND METHOD OF PRODUCING THE SAME | OOTAKE NOBUMASA (JP) | 2012-08-16 | — | — | US | disclosed |
| EP-1550664-B1 | SILICON COMPOUND | JNC CORP (JP) | 2012-06-27 | — | — | EP | disclosed |
| US-8173758-B2 | Polysiloxane compound and method of producing the same | JNC CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| US-20110178313-A1 | POLYSILOXANE COMPOUND AND METHOD OF PRODUCING THE SAME | OOTAKE NOBUMASA | 2011-07-21 | — | — | US | disclosed |
| US-7964692-B2 | Polymer obtained by addition-polymerization initiated by a silicon compound | JNC CORPORATION (JP) | 2011-06-21 | — | — | US | disclosed |
| US-20050250925-A1 | Silicon compound | JNC CORPORATION (JP) | 2005-11-10 | — | — | US | disclosed |
| US-20050215807-A1 | Silsesquioxane derivative | JNC CORPORATION (JP) | 2005-09-29 | — | — | US | disclosed |
| EP-1550664-A1 | SILICON COMPOUND | CHISSO CORPORATION (JP) | 2005-07-06 | — | — | EP | disclosed |
| EP-1548020-A1 | SILICON COMPOUND | CHISSO CORPORATION (JP) | 2005-06-29 | — | — | EP | disclosed |
| US-20050033077-A1 | Production process for silicon compound and the same | JNC CORPORATION (JP) | 2005-02-10 | — | — | US | disclosed |
| US-20040249103-A1 | Silsesquioxane derivatives and process for production thereof | JNC CORPORATION (JP) | 2004-12-09 | — | — | US | disclosed |
| US-20040143081-A1 | Novel silicon compounds and process for preparation thereof | JNC CORPORATION (JP) | 2004-07-22 | — | — | US | disclosed |
| EP-1428795-A1 | SILSESQUIOXANE DERIVATIVES AND PROCESS FOR PRODUCTION THEREOF | CHISSO CORPORATION (JP) | 2004-06-16 | — | — | EP | disclosed |
| US-20040068074-A1 | Production process for silsesquioxane derivative having functional group and silsesquioxane derivative | JNC CORPORATION (JP) | 2004-04-08 | — | — | US | disclosed |
| US-20040030084-A1 | Production process for silsesquioxane derivative and silsesquioxane derivative | JNC CORPORATION (JP) | 2004-02-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110178313-A1 | POLYSILOXANE COMPOUND AND METHOD OF PRODUCING THE SAME | RPS4X, POLR2A, MSL1 | CYP1A2 1088/4885GAA 3589/4885 |
| US-20140275463-A1 | ORGANOSILICON COMPOUND AND PRODUCTION PROCESS FOR THE SAME, AND POLYSILOXANE AND PRODUCTION PROCESS FOR THE SAME | PIEZO1, PFAS, MCM6 | CYP1A2 2073/4885GAA 1697/4885 |
| US-20050215807-A1 | Silsesquioxane derivative | STS, SFXN1, SULT1A1 | CYP1A2 423/4885GAA 701/4885 |
| US-10451967-B2 | Acid- and radical-generating agent and method for generating acid and radical | CBR1, HAO2, CBR3 | CYP1A2 360/4885GAA 2093/4885 |
| US-20160342084-A1 | ACID- AND RADICAL-GENERATING AGENT AND METHOD FOR GENERATING ACID AND RADICAL | CBR1, HAO2, CBR3 | CYP1A2 360/4885GAA 2093/4885 |
| US-20120208973-A1 | POLYSILOXANE COMPOUND AND METHOD OF PRODUCING THE SAME | RPS4X, POLR2A, MSL1 | CYP1A2 1088/4885GAA 3589/4885 |
| US-20050033077-A1 | Production process for silicon compound and the same | STS, SMS, SFXN1 | CYP1A2 112/4885GAA 490/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.