Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 3/20 | 0.59 |
| ▸ | LPAR1 | Q92633 | 1/20 | 0.48 |
| ▸ | LPAR3 | Q9UBY5 | 1/20 | 0.48 |
| ▸ | FAAH | O00519 | 7/20 | 0.41 |
| ▸ | CES1 | P23141 | 5/20 | 0.41 |
| ▸ | GGPS1 | O95749 | 4/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | FDPS | P14324 | 6/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4077269 | 1.00 | CES2 (0.59) | CES2LPAR1LPAR3FAAHCES1 | |
| SCHEMBL959689 | 0.97 | CES2 (0.56) | CES2LPAR1LPAR3FAAHCES1 | |
| SCHEMBL866215 | 0.90 | CES2 (0.46) | CES2LPAR1LPAR3FAAHCES1 | |
| SCHEMBL7720150 | 0.81 | CES2 (0.46) | CES2LPAR1LPAR3FAAHCES1 | |
| SCHEMBL29259220 | 0.78 | CES2 (0.63) | CES2LPAR1LPAR3FAAHCES1 | |
| SCHEMBL10623101 | 0.76 | CES2 (0.67) | CES2LPAR1LPAR3FAAHCES1 | |
| SCHEMBL31190476 | 0.76 | CES2 (0.67) | CES2LPAR1LPAR3FAAHCES1 | |
| SCHEMBL26293737 | 0.76 | CES2 (0.67) | CES2LPAR1LPAR3FAAHCES1 | |
| SCHEMBL9498122 | 0.76 | CES2 (0.55) | CES2LPAR1LPAR3FAAHCES1 | |
| SCHEMBL14449911 | 0.76 | CES2 (0.67) | CES2LPAR1LPAR3FAAHCES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11150555-B2 | Photoacid generator and chemically amplified positive-type photoresist composition for thick film comprising the same | LG CHEM, LTD. (KR) | 2021-10-19 | — | — | US | claimed |
| US-20200033724-A1 | PHOTOACID GENERATOR AND CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THICK FILM COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2020-01-30 | — | — | US | claimed |
| US-11754920-B2 | Thermal acid generator and resist composition using same | ADEKA CORPORATION (JP) | 2023-09-12 | — | — | US | disclosed |
| WO-2023162551-A1 | METHOD FOR PRODUCING PLATED SHAPED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023162552-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD FOR SUBSTRATE WITH TEMPLATE, AND PRODUCTION METHOD FOR PLATED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| US-20230106185-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, AND ACID DIFFUSION SUPPRESSING AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-04-06 | — | — | US | disclosed |
| US-20230102353-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING PATTERNED RESIST FILM, METHOD FOR PRODUCING SUBSTRATE PROVIDED WITH TEMPLATE, AND METHOD FOR PRODUCING A PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-03-30 | — | — | US | disclosed |
| CN-109791355-B | Photoacid generator and chemically amplified positive photoresist composition for thick film comprising the same | 株式会社LG化学 | 2022-08-02 | — | — | CN | disclosed |
| US-20220197136-A1 | THERMAL ACID GENERATOR AND RESIST COMPOSITION USING SAME | ADEKA CORPORATION (JP) | 2022-06-23 | — | — | US | disclosed |
| WO-2022004290-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD FOR MANUFACTURING PLATING MOLD-ATTACHED SUBSTRATE, AND METHOD FOR MANUFACTURING PLATED OBJECT | 東京応化工業株式会社 | 2022-01-06 | — | — | WO | disclosed |
| US-11150555-B2 | Photoacid generator and chemically amplified positive-type photoresist composition for thick film comprising the same | LG CHEM, LTD. (KR) | 2021-10-19 | — | — | US | disclosed |
| US-20180086717-A1 | HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-29 | — | — | US | disclosed |
| US-20180079724-A1 | SULFONIC ACID DERIVATIVE COMPOUND, PHOTOACID GENERATOR, RESIST COMPOSITION, CATIONIC POLYMERIZATION INITIATOR, AND CATIONICALLY POLYMERIZABLE COMPOSITION | ADEKA CORPORATION (JP) | 2018-03-22 | — | — | US | disclosed |
| EP-3272737-A1 | SULFONIC ACID DERIVATIVE COMPOUND, PHOTOACID GENERATOR, RESIST COMPOSITION, CATIONIC POLYMERIZATION INITIATOR, AND CATIONICALLY POLYMERIZABLE COMPOSITION | Adeka Corporation (JP) | 2018-01-24 | — | — | EP | disclosed |
| CN-102712599-B | Novel sulfonic acid compound and novel naphthalene dicarboxylic acid derivant compound | 株式会社ADEKA | 2016-08-10 | — | — | CN | disclosed |
| US-20150315153-A1 | NOVEL SULFONIC ACID DERIVATIVE COMPOUND, PHOTOACID GENERATOR, CATIONIC POLYMERIZATION INITIATOR, RESIST COMPOSITION, AND CATIONICALLY POLYMERIZABLE COMPOSITION | ADEKA CORPORATION (JP) | 2015-11-05 | — | — | US | disclosed |
| EP-2927216-A1 | NOVEL SULFONIC ACID DERIVATIVE COMPOUND, PHOTOACID GENERATOR, CATIONIC POLYMERIZATION INITIATOR, RESIST COMPOSITION, AND CATIONICALLY POLYMERIZABLE COMPOSITION | Adeka Corporation (JP) | 2015-10-07 | — | — | EP | disclosed |
| US-8680268-B2 | Sulfonic acid derivative compound and novel naphthalic acid derivative compound | ADEKA CORPORATION (JP) | 2014-03-25 | — | — | US | disclosed |
| EP-2524914-A1 | NOVEL SULFONIC ACID DERIVATIVE COMPOUND AND NOVEL NAPHTHALIC ACID DERIVATIVE COMPOUND | Adeka Corporation (JP) | 2012-11-21 | — | — | EP | disclosed |
| US-20120289697-A1 | NOVEL SULFONIC ACID DERIVATIVE COMPOUND AND NOVEL NAPHTHALIC ACID DERIVATIVE COMPOUND | ADEKA CORPORATION (JP) | 2012-11-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120289697-A1 | NOVEL SULFONIC ACID DERIVATIVE COMPOUND AND NOVEL NAPHTHALIC ACID DERIVATIVE COMPOUND | TPD52L2, TST, SULT1A1 | CES2 3135/4885LPAR1 1480/4885LPAR3 857/4885 |
| US-20200033724-A1 | PHOTOACID GENERATOR AND CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THICK FILM COMPRISING THE SAME | ASIC1, PPA1, ATP6AP1 | CES2 4274/4885LPAR1 2806/4885LPAR3 3526/4885 |
| US-20180079724-A1 | SULFONIC ACID DERIVATIVE COMPOUND, PHOTOACID GENERATOR, RESIST COMPOSITION, CATIONIC POLYMERIZATION INITIATOR, AND CATIONICALLY POLYMERIZABLE COMPOSITION | ALAD, ADSL, ACSL3 | CES2 1756/4885LPAR1 300/4885LPAR3 636/4885 |
| US-11754920-B2 | Thermal acid generator and resist composition using same | ACSL1, LRBA, GAR1 | CES2 2245/4885LPAR1 287/4885LPAR3 1155/4885 |
| US-20180086717-A1 | HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT | SLC9A2, SLC9A1, NHERF1 | CES2 3673/4885LPAR1 4045/4885LPAR3 4379/4885 |
| US-11150555-B2 | Photoacid generator and chemically amplified positive-type photoresist composition for thick film comprising the same | ASIC1, PPA1, ATP6AP1 | CES2 4274/4885LPAR1 2806/4885LPAR3 3526/4885 |
| US-20220197136-A1 | THERMAL ACID GENERATOR AND RESIST COMPOSITION USING SAME | ACSL1, LRBA, GAR1 | CES2 2245/4885LPAR1 287/4885LPAR3 1155/4885 |
| US-20150315153-A1 | NOVEL SULFONIC ACID DERIVATIVE COMPOUND, PHOTOACID GENERATOR, CATIONIC POLYMERIZATION INITIATOR, RESIST COMPOSITION, AND CATIONICALLY POLYMERIZABLE COMPOSITION | ALAD, ARSA, AHR | CES2 670/4885LPAR1 457/4885LPAR3 696/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.