Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 3/20 | 0.35 |
| ▸ | SSTR4 | P31391 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.33 |
| ▸ | CHRM3 | P20309 | 7/20 | 0.32 |
| ▸ | CHRM2 | P08172 | 4/20 | 0.32 |
| ▸ | CHRM4 | P08173 | 4/20 | 0.32 |
| ▸ | CHRM1 | P11229 | 4/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | CES2 | O00748 | 1/20 | 0.31 |
| ▸ | CES1 | P23141 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.31 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.31 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.31 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16684202 | 0.98 | EPHX1 (0.32) | EPHX1SSTR4GAACYP19A1CHRM3 | |
| SCHEMBL15160855 | 0.88 | DGAT1 (0.43) | EPHX1SSTR4GAACYP19A1CHRM3 | |
| SCHEMBL26173666 | 0.84 | EPHX1 (0.33) | EPHX1SSTR4GAACYP19A1CHRM3 | |
| SCHEMBL20962043 | 0.84 | PDK1 (0.36) | EPHX1SSTR4GAACYP19A1CHRM3 | |
| SCHEMBL25068217 | 0.83 | EPHX1 (0.35) | EPHX1SSTR4GAACYP19A1CHRM3 | |
| SCHEMBL15159063 | 0.82 | EPHX1 (0.33) | EPHX1SSTR4GAACYP19A1CHRM3 | |
| SCHEMBL26939568 | 0.82 | DGAT1 (0.35) | EPHX1SSTR4GAACHRM3CHRM2 | |
| SCHEMBL14470620 | 0.82 | EPHX1 (0.33) | EPHX1SSTR4GAACYP19A1CHRM3 | |
| SCHEMBL16581039 | 0.82 | — | — | |
| SCHEMBL26159906 | 0.82 | EPHX1 (0.31) | EPHX1SSTR4CHRM3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023120250-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND COMPOUND | 富士フイルム株式会社 | 2023-06-29 | — | — | WO | disclosed |
| US-20230057401-A1 | COATED UNDERLAYER FOR OVERCOATED PHOTORESIST | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-02-23 | — | — | US | disclosed |
| EP-3556783-B1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL CO (JP) | 2022-12-28 | — | — | EP | disclosed |
| US-11300877-B2 | Radiation-sensitive resin composition, resist pattern-forming method and acid diffusion control agent | JSR CORPORATION (JP) | 2022-04-12 | — | — | US | disclosed |
| EP-3581594-B1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL CO (JP) | 2021-12-29 | — | — | EP | disclosed |
| EP-3521926-B1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORP (JP) | 2021-04-21 | — | — | EP | disclosed |
| US-10781198-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-22 | — | — | US | disclosed |
| US-20200102270-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, AND COMPOUND | JSR CORPORATION (JP) | 2020-04-02 | — | — | US | disclosed |
| EP-3556783-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Sumitomo Chemical Company, Limited (JP) | 2019-10-23 | — | — | EP | disclosed |
| EP-3556781-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | Sumitomo Chemical Company, Limited (JP) | 2019-10-23 | — | — | EP | disclosed |
| US-20160237190-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-18 | — | — | US | disclosed |
| US-20160168115-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-06-16 | — | — | US | disclosed |
| US-20160139508-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-19 | — | — | US | disclosed |
| US-20160131971-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-12 | — | — | US | disclosed |
| US-20160130212-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-12 | — | — | US | disclosed |
| US-20160062234-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-03 | — | — | US | disclosed |
| US-20160062233-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-03 | — | — | US | disclosed |
| US-20160052877-A1 | SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-25 | — | — | US | disclosed |
| WO-2014104400-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2014-07-03 | — | — | WO | disclosed |
| EP-2413194-B1 | Pattern forming method | FUJIFILM CORP (JP) | 2014-05-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (10 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160062233-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | XDH, HAX1, MLX | EPHX1 1816/4885SSTR4 3216/4885GAA 2846/4885 |
| US-20160131971-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, RXRA, C1R | EPHX1 687/4885SSTR4 3524/4885GAA 2780/4885 |
| US-20160237190-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | HAX1, F11, RXRA | EPHX1 1037/4885SSTR4 2908/4885GAA 4209/4885 |
| US-10781198-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | RER1, BRIX1, NR2E3 | EPHX1 786/4885SSTR4 2365/4885GAA 3594/4885 |
| US-20160130212-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | C1R, C9, RER1 | EPHX1 787/4885SSTR4 3688/4885GAA 4219/4885 |
| US-20160168115-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | FGFR1, RER1, FRG1 | EPHX1 2374/4885SSTR4 252/4885GAA 4753/4885 |
| US-20200102270-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, AND COMPOUND | RER1, RAD51, RFT1 | EPHX1 1217/4885SSTR4 4433/4885GAA 2679/4885 |
| US-11300877-B2 | Radiation-sensitive resin composition, resist pattern-forming method and acid diffusion control agent | RER1, RAD1, POLR1A | EPHX1 2518/4885SSTR4 4417/4885GAA 2125/4885 |
| US-20160139508-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | AFF1, AFF2, AFF4 | EPHX1 923/4885SSTR4 2133/4885GAA 4761/4885 |
| US-20160052877-A1 | SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, AFF1, FRG1 | EPHX1 4157/4885SSTR4 1126/4885GAA 4651/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.