Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | ELANE | P08246 | 3/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | PRKCA | P17252 | 1/20 | 0.31 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.31 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.31 |
| ▸ | FDPS | P14324 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16344283 | 0.86 | CA1 (0.35) | ALDH1A1CYP4F2CYP4A11FDPS | |
| SCHEMBL10304389 | 0.82 | ELANE (0.36) | LMNAHSD17B10ELANEALDH1A1GAA | |
| SCHEMBL20071062 | 0.82 | CES2 (0.39) | LMNAHSD17B10ELANEALDH1A1GAA | |
| SCHEMBL12457206 | 0.81 | LMNA (0.38) | LMNAHSD17B10ELANEALDH1A1GAA | |
| SCHEMBL27968459 | 0.81 | PRKCA (0.35) | ELANEGAAPRKCACYP4F2CYP4A11 | |
| SCHEMBL4234148 | 0.80 | ALDH1A1 (0.39) | ELANEALDH1A1GAAPRKCA | |
| SCHEMBL213107 | 0.80 | LMNA (0.40) | LMNAHSD17B10ELANEALDH1A1GAA | |
| SCHEMBL609524 | 0.80 | LMNA (0.40) | LMNAHSD17B10ELANEALDH1A1GAA | |
| SCHEMBL24413146 | 0.79 | ELANE (0.34) | LMNAHSD17B10ELANECYP4F2CYP4A11 | |
| SCHEMBL1579162 | 0.78 | GAA (0.50) | LMNAHSD17B10ELANEALDH1A1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12577395-B2 | Resin composition and article manufactured using the same | Elite Material Co., Ltd. (TW) | 2026-03-17 | — | — | US | disclosed |
| US-12486397-B2 | Resin composition and article manufactured using the same | Elite Material Co., Ltd. (TW) | 2025-12-02 | — | — | US | disclosed |
| US-20250051566-A1 | RESIN COMPOSITION AND ARTICLE MANUFACTURED USING THE SAME | Elite Material Co., Ltd. (TW) | 2025-02-13 | — | — | US | disclosed |
| US-20240352251-A1 | RESIN COMPOSITION AND ARTICLE MANUFACTURED USING THE SAME | Elite Material Co., Ltd. (TW) | 2024-10-24 | — | — | US | disclosed |
| CN-115195217-B | Transparent laminated board based on glued membrane | 卡里福热师私人有限公司 | 2024-07-30 | — | — | CN | disclosed |
| CN-118202007-A | Molded body | 积水化学工业株式会社 | 2024-06-14 | — | — | CN | disclosed |
| CN-115232585-B | Single-component epoxy resin composition resistant to wet-hot hydrolysis, and preparation method and application thereof | 同济大学 | 2023-11-24 | — | — | CN | disclosed |
| CN-116648476-A | Thermally expandable microcapsule, expandable master batch, and foam molded article | 积水化学工业株式会社 | 2023-08-25 | — | — | CN | disclosed |
| CN-109564319-B | Laminate for flexible image display device and flexible image display device | 日东电工株式会社 | 2023-04-18 | — | — | CN | disclosed |
| US-20170329223-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-16 | — | — | US | disclosed |
| US-9638996-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-02 | — | — | US | disclosed |
| US-9580402-B2 | Salt, acid generator, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-28 | — | — | US | disclosed |
| US-20160237190-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-18 | — | — | US | disclosed |
| US-20160168115-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-06-16 | — | — | US | disclosed |
| US-20160139508-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-19 | — | — | US | disclosed |
| US-20160130212-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-12 | — | — | US | disclosed |
| US-20160131971-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-12 | — | — | US | disclosed |
| US-20160062234-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-03 | — | — | US | disclosed |
| US-20160062233-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-03 | — | — | US | disclosed |
| US-20160052877-A1 | SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160062233-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | XDH, HAX1, MLX | LMNA 1673/4885HSD17B10 322/4885ELANE 851/4885 |
| US-20160131971-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, RXRA, C1R | LMNA 2332/4885HSD17B10 1147/4885ELANE 2154/4885 |
| US-20160237190-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | HAX1, F11, RXRA | LMNA 2466/4885HSD17B10 2642/4885ELANE 1620/4885 |
| US-20160130212-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | C1R, C9, RER1 | LMNA 1660/4885HSD17B10 1842/4885ELANE 2624/4885 |
| US-20160168115-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | FGFR1, RER1, FRG1 | LMNA 2972/4885HSD17B10 800/4885ELANE 3621/4885 |
| US-12577395-B2 | Resin composition and article manufactured using the same | DAZAP1, RCOR1, AFF1 | LMNA 983/4885HSD17B10 4089/4885ELANE 3434/4885 |
| US-20160139508-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | AFF1, AFF2, AFF4 | LMNA 1481/4885HSD17B10 788/4885ELANE 2852/4885 |
| US-20160052877-A1 | SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, AFF1, FRG1 | LMNA 2292/4885HSD17B10 2001/4885ELANE 2244/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.