Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 3/20 | 0.36 |
| ▸ | CYP17A1 | P05093 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.32 |
| ▸ | NAAA | Q02083 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17545758 | 0.89 | CYP19A1 (0.36) | CYP19A1CYP17A1MEN1KMT2ANPSR1 | |
| SCHEMBL13556146 | 0.88 | CYP19A1 (0.34) | CYP19A1CYP17A1MEN1KMT2ANPSR1 | |
| SCHEMBL17545744 | 0.87 | CYP19A1 (0.34) | CYP19A1CYP17A1MEN1KMT2ANPSR1 | |
| SCHEMBL17550599 | 0.86 | CYP19A1 (0.40) | CYP19A1CYP17A1MEN1KMT2ANPSR1 | |
| SCHEMBL2625597 | 0.83 | CYP19A1 (0.38) | CYP19A1CYP17A1MEN1KMT2ANPSR1 | |
| SCHEMBL10171138 | 0.82 | THRB (0.38) | CYP19A1CYP17A1MEN1KMT2ANPSR1 | |
| SCHEMBL10171137 | 0.80 | TSHR (0.39) | CYP19A1CYP17A1NPSR1ALDH1A1HTT | |
| SCHEMBL17548753 | 0.78 | CYP19A1 (0.34) | CYP19A1CYP17A1MEN1KMT2ANPSR1 | |
| SCHEMBL17548756 | 0.76 | CYP17A1 (0.33) | CYP19A1CYP17A1MEN1KMT2AALDH1A1 | |
| SCHEMBL13556142 | 0.76 | CYP17A1 (0.33) | CYP19A1CYP17A1MEN1KMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9760005-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9671692-B2 | Compound, resin and photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |
| US-9645490-B2 | Salt, acid generator, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-09 | — | — | US | disclosed |
| US-20160244400-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-25 | — | — | US | disclosed |
| US-20160170298-A1 | SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-06-16 | — | — | US | disclosed |
| US-20160139508-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-19 | — | — | US | disclosed |
| US-20160131971-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-12 | — | — | US | disclosed |
| US-20160062233-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160062233-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | XDH, HAX1, MLX | CYP19A1 328/4885CYP17A1 119/4885MEN1 3032/4885 |
| US-20160244400-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | C1R, KISS1R, C1S | CYP19A1 757/4885CYP17A1 1410/4885MEN1 2795/4885 |
| US-20160131971-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, RXRA, C1R | CYP19A1 923/4885CYP17A1 2057/4885MEN1 4136/4885 |
| US-20160139508-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | AFF1, AFF2, AFF4 | CYP19A1 630/4885CYP17A1 1257/4885MEN1 4160/4885 |
| US-20160170298-A1 | SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | FGFR1, PKD1, KCNA1 | CYP19A1 702/4885CYP17A1 1037/4885MEN1 1163/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.