SCHEMBL17644166

SCHEMBL17644166

[CH2]CCCC(C)OCC1CO1

nearest known ligand 0.37

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.37
TSHR P16473 2/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
TDP1 Q9NUW8 1/20 0.34
MAPK1 P28482 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8628983 0.89 ALDH1A1 (0.38) ALDH1A1TSHRSMN1; SMN2TDP1MAPK1
SCHEMBL6310703 0.84 ALDH1A1 (0.43) ALDH1A1TSHRSMN1; SMN2TDP1MAPK1
SCHEMBL10770475 0.83 ALDH1A1 (0.38) ALDH1A1TSHRSMN1; SMN2TDP1MAPK1
SCHEMBL10018374 0.83 ALDH1A1 (0.41) ALDH1A1TSHRSMN1; SMN2TDP1MAPK1
Water SCHEMBL28874655 0.81 ALDH1A1 (0.51) ALDH1A1TSHRSMN1; SMN2TDP1MAPK1
SCHEMBL998786 0.80
SCHEMBL10944509 0.80 ALDH1A1 (0.53) ALDH1A1TSHRSMN1; SMN2TDP1
SCHEMBL30686704 0.80 ALDH1A1 (0.53) ALDH1A1TSHRSMN1; SMN2TDP1
SCHEMBL21647894 0.80 ALDH1A1 (0.36) ALDH1A1TSHRSMN1; SMN2TDP1MAPK1
SCHEMBL30655699 0.80 ALDH1A1 (0.53) ALDH1A1TSHRSMN1; SMN2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109283792-B Photosensitive composition, pattern forming method, cured product and display device 东京应化工业株式会社 2024-03-22 CN disclosed
CN-108375878-B Polymerizable composition, method for producing cured film, and cured film 东京应化工业株式会社 2023-12-08 CN disclosed
CN-109426079-B Photosensitive composition, cured product forming method, cured product, panel for image display device, and image display device 东京应化工业株式会社 2023-09-19 CN disclosed
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
US-11718587-B2 Compound, epoxy curing catalyst and method for producing compound TOKYO OHKA KOGYO CO., LTD. (JP) 2023-08-08 US disclosed
US-11542397-B2 Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device TOKYO OHKA KOGYO CO., LTD. (JP) 2023-01-03 US disclosed
CN-107315318-B Photosensitive composition 东京应化工业株式会社 2022-07-01 CN disclosed
CN-107229184-B Colored photosensitive composition, colored cured product obtained therefrom, display element, and method for producing colored cured product 东京应化工业株式会社 2022-06-24 CN disclosed
EP-3998324-A1 WAVELENGTH CONVERSION FILM, WAVELENGTH CONVERSION FILM FORMING COMPOSITION, AND CLUSTER-CONTAINING QUANTUM DOT PRODUCTION METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2022-05-18 EP disclosed
CN-107229185-B Energy-sensitive composition, cured product, and method for producing cured product 东京应化工业株式会社 2022-04-15 CN disclosed
US-20180194930-A1 COMPOSITION CONTAINING MICROPARTICLES TOKYO OHKA KOGYO CO., LTD. (JP) 2018-07-12 US disclosed
US-20180181002-A1 METHOD OF PATTERN FORMATION AND METHOD OF PRODUCING POLYSILANE RESIN PRECURSOR TOKYO OHKA KOGYO CO., LTD. (JP) 2018-06-28 US disclosed
US-9981914-B2 2018-05-29 US disclosed
US-20180086717-A1 HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT TOKYO OHKA KOGYO CO., LTD. (JP) 2018-03-29 US disclosed
US-20170327631-A1 CURABLE COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2017-11-16 US disclosed
EP-3228641-A1 CURABLE COMPOSITION Tokyo Ohka Kogyo Co., Ltd. (JP) 2017-10-11 EP disclosed
EP-3002304-B1 CURABLE COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2017-08-02 EP disclosed
US-20170160636-A1 PHOTOSENSITIVE COMPOSITION AND COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2017-06-08 US disclosed
EP-3165965-A1 PHOTOSENSITIVE COMPOSITION AND COMPOUND Tokyo Ohka Kogyo Co., Ltd. (JP) 2017-05-10 EP disclosed
EP-3002304-A1 CURABLE COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2016-04-06 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180194930-A1 COMPOSITION CONTAINING MICROPARTICLES CHMP4B, EXOSC10, EXOSC9 ALDH1A1 1737/4885TSHR 4409/4885SMN1; SMN2 1444/4885
US-20180181002-A1 METHOD OF PATTERN FORMATION AND METHOD OF PRODUCING POLYSILANE RESIN PRECURSOR RTN4, RER1, CROCC ALDH1A1 2894/4885TSHR 4531/4885SMN1; SMN2 1231/4885
US-20180086717-A1 HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT SLC9A2, SLC9A1, NHERF1 ALDH1A1 3686/4885TSHR 4035/4885SMN1; SMN2 4063/4885
US-20170160636-A1 PHOTOSENSITIVE COMPOSITION AND COMPOUND C1R, CRY1, C1S ALDH1A1 1305/4885TSHR 4067/4885SMN1; SMN2 3944/4885
US-11718587-B2 Compound, epoxy curing catalyst and method for producing compound MSMO1, RIOK1, ME1 ALDH1A1 1658/4885TSHR 4428/4885SMN1; SMN2 1659/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.