SCHEMBL193628

SCHEMBL193628

CCCC[n+]1ccn(C)c1.CS(=O)(=O)[O-]

nearest known ligand 0.37

Known targets — ChEMBL curated mechanism

ABL1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB2AGTR1BCL2BCL2A1BCL2L1BCL2L10BCL2L2BCRBRAFCHRM1CHRNA10CHRNA9DRD1DRD2DRD3DRD4DRD5EGFRF2FLT1FLT4GCKGHSRGNRHRGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHTR1AHTR1BHTR1DHTR2AHTR2CHTR3AIDH2KDRKITMAOBMCL1MTTPPP4HBPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PIKFYVEROCK1ROCK2SLC18A2SLC6A2SLC6A3SLC6A4TACR1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8gyrAgyrBparCparEpol

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.37
ALDH1A1 P00352 4/20 0.37
MAPT P10636 3/20 0.37
SMN1; SMN2 Q16637 3/20 0.37
HTT P42858 2/20 0.37
PABPC1 P11940 1/20 0.36
HPGD P15428 1/20 0.36
RXFP1 Q9HBX9 2/20 0.36
NPSR1 Q6W5P4 2/20 0.36
BLM P54132 1/20 0.36
APAF1 O14727 2/20 0.35
KMT2A Q03164 2/20 0.35
LMNA P02545 1/20 0.35
CASP3 P42574 1/20 0.35
SENP8 Q96LD8 1/20 0.35
SENP7 Q9BQF6 1/20 0.35
SENP6 Q9GZR1 1/20 0.35
MEN1 O00255 1/20 0.34
HSP90AA1 P07900 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15170311 0.95
Sulfuric Acid SCHEMBL28449062 0.95 KDM4E (0.37) KDM4EALDH1A1MAPTSMN1; SMN2HTT
Sulfuric Acid SCHEMBL28980889 0.95 KDM4E (0.37) KDM4EALDH1A1MAPTSMN1; SMN2HTT
Sulfuric Acid SCHEMBL4245147 0.95 KDM4E (0.37) KDM4EALDH1A1MAPTSMN1; SMN2HTT
SCHEMBL13517069 0.94 ABCB11 (0.41)
SCHEMBL2295222 0.94 ABCB11 (0.41)
SCHEMBL15170121 0.94 ABCB11 (0.41)
Sulfuric Acid SCHEMBL316621 0.93 KDM4E (0.37) KDM4EALDH1A1MAPTSMN1; SMN2HTT
SCHEMBL28652452 0.93 KDM4E (0.37) KDM4EALDH1A1MAPTSMN1; SMN2HTT
Sulfuric Acid SCHEMBL28084954 0.92 KDM4E (0.35) KDM4EALDH1A1MAPTSMN1; SMN2HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 930 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4721970-A1 BONDED STRUCTURE COMPRISING AN ELECTROCHEMICALLY DEBONDABLE ADHESIVE LAYER Henkel AG & Co. KGaA (DE) 2026-04-08 EP claimed
EP-4703496-A1 ETCHING COMPOSITION COMPRISING AT LEAST ONE IONIC LIQUID AND AT LEAST ONE LACTAMIDE AND PROCESS FOR COATING PLASTIC SURFACES WITH METALS BY USING THE SAME BASF SE (DE) 2026-03-04 EP claimed
US-20250382408-A1 EPOXY-TERMINATED ISOCYANATE PREPOLYMERS, AND PROCESS FOR THE PREPARATION THEREOF BASF SE (DE) 2025-12-18 US claimed
WO-2025242379-A1 BONDED STRUCTURE COMPRISING AN ELECTROCHEMICALLY DEBONDABLE ADHESIVE FILM HENKEL AG & CO. KGAA (DE) 2025-11-27 WO claimed
WO-2025228672-A1 TWO-COMPONENT (2K) CURABLE ADHESIVE COMPOSITION HENKEL AG & CO. KGAA (DE) 2025-11-06 WO claimed
WO-2025228674-A1 ELECTROCHEMICALLY DEBONDABLE ADHESIVE FILM HENKEL AG & CO. KGAA (DE) 2025-11-06 WO claimed
EP-4644502-A1 ELECTROCHEMICALLY DEBONDABLE ADHESIVE FILM Henkel AG & Co. KGaA (DE) 2025-11-05 EP claimed
EP-4644500-A1 TWO-COMPONENT (2K) CURABLE ADHESIVE COMPOSITION Henkel AG & Co. KGaA (DE) 2025-11-05 EP claimed
EP-3275039-B1 ELECTROLYTES AND METAL HYDRIDE BATTERIES BASF CORP (US) 2025-08-27 EP claimed
WO-2025118203-A1 BONDED STRUCTURE COMPRISING AN ELECTROCHEMICALLY DEBONDABLE FILM ADHESIVE HENKEL AG & CO. KGAA (DE) 2025-06-12 WO claimed
US-20100028684-A1 CONDUCTIVE MULTILAYER STACK PPG INDUSTRIES, INC. 2010-02-04 US claimed
US-20090300946-A1 ANTISTATIC POLYURETHANE BASF SE (DE) 2009-12-10 US claimed
EP-1789160-B1 METHOD FOR SEPARATING HYDROGEN CHLORIDE AND PHOSGENE BASF SE (DE) 2009-11-18 EP claimed
US-20090112017-A1 METHOD FOR PRODUCING POLYISOCYANATES BASF AKTIENGESSELLSCHAFT (DE) 2009-04-30 US claimed
US-20090029880-A1 Composition containing lonic liquid clay stabilizers and/or shale inhibitors and method of using the same BJ SERVICES COMPANY 2009-01-29 US claimed
US-20090014123-A1 Adhesive composition and optical member Wuxi Hengxin Optoelectronic Materials Co., Ltd. (CN) 2009-01-15 US claimed
US-20070293707-A1 Method for Separating Hydrogen Chloride and Phosgene BASF AKTIENGESELLSCHAFT (DE) 2007-12-20 US claimed
EP-1663921-B1 METHOD FOR PRODUCING HALOALKANES FROM ALCOHOLS BASF AG (DE) 2007-05-02 EP claimed
US-20070055084-A1 Method for producing haloalkanes from alcohols BASF AKTIENGESELLSCHAFT (DE) 2007-03-08 US claimed
US-6420616-B1 NITRATING NAPHTHALENE WITH NITRIC ACID BAYER AKTIENGESELLSCHAFT (DE) 2002-07-16 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090112017-A1 METHOD FOR PRODUCING POLYISOCYANATES PGLS, INMT, PNMT KDM4E 3386/4885ALDH1A1 4028/4885MAPT 1739/4885
US-20070293707-A1 Method for Separating Hydrogen Chloride and Phosgene PSPH, SLC9B2, HVCN1 KDM4E 4758/4885ALDH1A1 4716/4885MAPT 4430/4885
US-20070055084-A1 Method for producing haloalkanes from alcohols ADH1C, HDHD5, ADH5 KDM4E 2710/4885ALDH1A1 493/4885MAPT 2267/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.