Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 3/20 | 0.64 |
| ▸ | MAPT | P10636 | 2/20 | 0.64 |
| ▸ | FFAR4 | Q5NUL3 | 2/20 | 0.61 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.60 |
| ▸ | LMNA | P02545 | 2/20 | 0.60 |
| ▸ | TSHR | P16473 | 5/20 | 0.59 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.59 |
| ▸ | MEN1 | O00255 | 2/20 | 0.59 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.59 |
| ▸ | GMNN | O75496 | 1/20 | 0.59 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.59 |
| ▸ | BLM | P54132 | 1/20 | 0.59 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.59 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.59 |
| ▸ | TP53 | P04637 | 1/20 | 0.59 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.59 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.59 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.59 |
| ▸ | PPARG | P37231 | 6/20 | 0.59 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Myristic Acid SCHEMBL9408104 | 1.00 | MAPK1 (0.64) | MAPK1MAPTFFAR4FFAR1ALDH1A1 | |
| SCHEMBL6843599 | 1.00 | MAPK1 (0.64) | MAPK1MAPTFFAR4FFAR1ALDH1A1 | |
| SCHEMBL2154198 | 1.00 | MAPK1 (0.64) | MAPK1MAPTFFAR4FFAR1ALDH1A1 | |
| SCHEMBL23288413 | 1.00 | MAPK1 (0.64) | MAPK1MAPTFFAR4FFAR1ALDH1A1 | |
| SCHEMBL8656695 | 1.00 | MAPK1 (0.64) | MAPK1MAPTFFAR4FFAR1ALDH1A1 | |
| SCHEMBL23860683 | 1.00 | MAPK1 (0.64) | MAPK1MAPTFFAR4FFAR1ALDH1A1 | |
| SCHEMBL23565739 | 1.00 | MAPK1 (0.64) | MAPK1MAPTFFAR4FFAR1ALDH1A1 | |
| SCHEMBL25297686 | 1.00 | MAPK1 (0.64) | MAPK1MAPTFFAR4FFAR1ALDH1A1 | |
| SCHEMBL22589987 | 1.00 | MAPK1 (0.64) | MAPK1MAPTFFAR4FFAR1ALDH1A1 | |
| SCHEMBL1531726 | 1.00 | MAPK1 (0.64) | MAPK1MAPTFFAR4FFAR1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 896 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112976713-B | Women's underwear and production process thereof | 泉州市锦恒服装实业有限公司 | 2023-03-10 | — | — | CN | claimed |
| CN-103819822-B | For the formula of ethylene propylene terpolymer with of environmental protection sebific duct | WUXI SECOND RUBBER CO., LTD. (CN) | 2016-03-02 | — | — | CN | claimed |
| CN-104628985-A | Preparation method of high-wear-resistant, low-temperature-resistant, deflection-resistant and hydrolysis-resistant polyurethane coating | PUTIAN LICHENG DISTR JUHUI TECHNOLOGY CONSULTING CO LTD | 2015-05-20 | — | — | CN | claimed |
| CN-103819822-A | Formula for EPDM rubber used for environment-friendly rubber hose | WUXI NO 2 RUBBER CO LTD | 2014-05-28 | — | — | CN | claimed |
| CN-103265913-A | Adhesive containing calcined clay for packaging and preparation method thereof | QINGYANG HUADING PACKAGING CO LTD | 2013-08-28 | — | — | CN | claimed |
| CN-102286181-B | Formula of high-liquidity polyvinyl chloride alloy and preparation method | NAT ENGINEERING RES CT FOR MODIFIED POLYMER MATERIAL | 2013-06-05 | — | — | CN | claimed |
| WO-2011071674-A1 | ASYMMETRIC CYCLIC DIESTER COMPOUNDS | FERRO CORPORATION (US) | 2011-06-16 | — | — | WO | claimed |
| CN-102040928-A | Modified water-resistant anti-freezing white latex | SANVO ZHONGSHAN AEROSOL CO LTD | 2011-05-04 | — | — | CN | claimed |
| US-20100113664-A1 | Asymmetric Cyclic Diester Compounds | FERRO CORPORATION (US) | 2010-05-06 | — | — | US | claimed |
| US-7053142-B2 | Plasticized polyurethanes for use in golf balls | ACUSHNET COMPANY (US) | 2006-05-30 | — | — | US | claimed |
| US-20050137030-A1 | Plasticized polyurethanes for use in golf balls | JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT | 2005-06-23 | — | — | US | claimed |
| US-6849675-B2 | Golf ball comprising a plasticized polyurethane | ACUSHNET COMPANY (US) | 2005-02-01 | — | — | US | claimed |
| US-20040132899-A1 | Golf ball comprising a plasticized polyurethane | JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT | 2004-07-08 | — | — | US | claimed |
| US-20020164540-A1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-11-07 | — | — | US | claimed |
| US-RE36458-E | THERMOPLASTIC WELDING ROD USED TO JOIN TWO PIECES OF THERMOPLASTIC SHEETING, PARTICULARLY FLOORING, TOGETHER | ARMSTRONG WORLD INDUSTRIES, INC. (US) | 1999-12-21 | — | — | US | claimed |
| US-5635266-A | THERMOPLASTIC RODS CONTAINING PARTICLES OF VARYING COLORS(TO RESEMBLE ORIGINAL FLOORING) AND PLASTICIZER, FOR JOINING AND SEALING SEAMS | ARMSTRONG WORLD INDUSTRIES, INC. (US) | 1997-06-03 | — | — | US | claimed |
| EP-0098416-B1 | ELECTROCHROMIC DISPLAY ELEMENT | KABUSHIKI KAISHA TOSHIBA (JP) | 1992-08-12 | — | — | EP | claimed |
| US-4537826-A | TRANSITION METAL OXIDES, POLYMERIC RESINS AND INORGANIC ION-CONDUCTIVE MATERIALS | TOKYO SHIBAURA DENKI KABUSHIKI KAISHA (JP) | 1985-08-27 | — | — | US | claimed |
| EP-0098416-A2 | Electrochromic display element | KABUSHIKI KAISHA TOSHIBA (JP) | 1984-01-18 | — | — | EP | claimed |
| US-12638772-B2 | Resist underlayer film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2026-05-26 | — | — | US | disclosed |
| WO-2026105628-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 日産化学株式会社 | 2026-05-21 | — | — | WO | disclosed |
| WO-2026105630-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 日産化学株式会社 | 2026-05-21 | — | — | WO | disclosed |
| US-12631964-B2 | Resist underlayer film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2026-05-19 | — | — | US | disclosed |
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12601972-B2 | Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-14 | — | — | US | disclosed |
| US-12572074-B2 | Resist underlying film-forming composition comprising a reaction product with a glycidyl ester compound | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-10 | — | — | US | disclosed |
| CN-121586750-A | Composition for forming silicon-containing underlayer film for directional self-assembly | 日产化学株式会社 | 2026-02-27 | — | — | CN | disclosed |
| EP-4692943-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | Nissan Chemical Corporation (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4621487-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING CURCUMIN DERIVATIVE | Nissan Chemical Corporation (JP) | 2025-09-24 | — | — | EP | disclosed |
| EP-4614229-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | Nissan Chemical Corporation (JP) | 2025-09-10 | — | — | EP | disclosed |
| US-12405533-B2 | Resist underlayer film-forming composition containing substituted crosslinkable compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2025-09-02 | — | — | US | disclosed |
| EP-4606866-A1 | RESIN COMPOSITION, METHOD FOR PRODUCING RESIN PRODUCT, AND FLAME RETARDANT MASTERBATCH | Mitsubishi Chemical Corporation (JP) | 2025-08-27 | — | — | EP | disclosed |
| US-20250243329-A1 | RESIN COMPOSITION, METHOD FOR PRODUCING RESIN PRODUCT, AND FLAME RETARDANT MASTERBATCH | MITSUBISHI CHEMICAL CORPORATION (JP) | 2025-07-31 | — | — | US | disclosed |
| US-12366804-B2 | Composition containing a heterocyclic compound having a dicyanostyryl group, for forming a resist underlayer film capable of being wet etched | NISSAN CHEMICAL CORPORATION (JP) | 2025-07-22 | — | — | US | disclosed |
| US-20250231489-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-07-17 | — | — | US | disclosed |
| US-12331156-B2 | Chemical-resistant protective film forming composition containing hydroxyaryl-terminated polymer | NISSAN CHEMICAL CORPORATION (JP) | 2025-06-17 | — | — | US | disclosed |
| US-20250189896-A1 | RESIST UNDERLAYER FILM FORMATION COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-06-12 | — | — | US | disclosed |
| US-20250130497-A1 | METHOD FOR IMPROVING HARDNESS OF BAKED PRODUCT | NISSAN CHEMICAL CORPORATION (JP) | 2025-04-24 | — | — | US | disclosed |
| US-20250109242-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING HYDROXYCINNAMIC ACID DERIVATIVE | NISSAN CHEMICAL CORPORATION (JP) | 2025-04-03 | — | — | US | disclosed |
| US-20250085634-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-03-13 | — | — | US | disclosed |
| US-12242196-B2 | Resist underlayer film-forming composition containing indolocarbazole novolak resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2025-03-04 | — | — | US | disclosed |
| US-12242194-B2 | Resist underlayer film-forming composition comprising epoxy adduct having long-chain alkyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2025-03-04 | — | — | US | disclosed |
| EP-3725835-B1 | CELLULOSE RESIN COMPOSITION, MOLDED BODY AND PRODUCT USING SAME | NEC CORP (JP) | 2025-02-19 | — | — | EP | disclosed |
| US-12222651-B2 | Resist underlayer film forming composition having a disulfide structure | NISSAN CHEMICAL CORPORATION (JP) | 2025-02-11 | — | — | US | disclosed |
| US-20240427238-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2024-12-26 | — | — | US | disclosed |
| US-20240377745-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-11-14 | — | — | US | disclosed |
| US-20240301126-A1 | CHEMICAL-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CONTAINING HYDROXYARYL-TERMINATED POLYMER | NISSAN CHEMICAL CORPORATION (JP) | 2024-09-12 | — | — | US | disclosed |
| EP-4139401-B1 | REACTIVE HOT-MELT ADHESIVE COMPOSITION BASED ON ALPHA-SILANE-TERMINATED ORGANIC POLYMERS | KLEIBERIT SE & CO KG (DE) | 2024-09-11 | — | — | EP | disclosed |
| US-12077633-B2 | Chemical-resistant protective film-forming composition containing polymerization product of arylene compound having glycidyl group | NISSAN CHEMICAL CORPORATION (JP) | 2024-09-03 | — | — | US | disclosed |
| US-12072629-B2 | Resist underlayer film-forming composition containing novolac resin to which aromatic vinyl compound is added | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2024-08-27 | — | — | US | disclosed |
| CN-118543249-A | Microporous hollow fiber membrane and preparation method and application thereof | 仙居翊科新材料科技有限公司 | 2024-08-27 | — | — | CN | disclosed |
| US-20240231230-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-12025916-B2 | Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-02 | — | — | US | disclosed |
| WO-2024128647-A1 | POLYMER COMPOUND FOR FORMING RESIST UNDERLAYER FILM, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING SAME | 주식회사 동진쎄미켐 | 2024-06-20 | — | — | WO | disclosed |
| US-20240201592-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| WO-2024106454-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING CURCUMIN DERIVATIVE | 日産化学株式会社 | 2024-05-23 | — | — | WO | disclosed |
| US-11977331-B2 | Composition containing a dicyanostyryl group, for forming a resist underlayer film capable of being wet etched | NISSAN CHEMICAL CORPORATION (JP) | 2024-05-07 | — | — | US | disclosed |
| WO-2024084885-A1 | RESIN COMPOSITION, METHOD FOR PRODUCING RESIN PRODUCT, AND FLAME RETARDANT MASTERBATCH | 三菱ケミカル株式会社 | 2024-04-25 | — | — | WO | disclosed |
| US-11965059-B2 | Chemical-resistant protective film forming composition containing hydroxyaryl-terminated polymer | NISSAN CHEMICAL CORPORATION (JP) | 2024-04-23 | — | — | US | disclosed |
| US-20240103369-A1 | RESIST UNDERLAYER FILM FORMATION COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2024-03-28 | — | — | US | disclosed |
| WO-2024063044-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2024-03-28 | — | — | WO | disclosed |
| EP-4341464-A1 | RACK FOR USE IN A METHOD FOR PICKLING PLASTIC PARTS TO BE COATED WITH METAL | DELTA Engineering & Chemistry GmbH (DE) | 2024-03-27 | — | — | EP | disclosed |
| WO-2024029445-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION, AND RESIST PATTERN FORMATION METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING SAID COMPOSITION | 日産化学株式会社 | 2024-02-08 | — | — | WO | disclosed |
| WO-2024019064-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID | 日産化学株式会社 | 2024-01-25 | — | — | WO | disclosed |
| WO-2024018957-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2024-01-25 | — | — | WO | disclosed |
| WO-2024009993-A1 | METHOD OF MANUFACTURING LAMINATE AND METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT | 日産化学株式会社 | 2024-01-11 | — | — | WO | disclosed |
| US-20240006183-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING AMIDE SOLVENT | NISSAN CHEMICAL CORPORATION (JP) | 2024-01-04 | — | — | US | disclosed |
| WO-2023243426-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | 日産化学株式会社 | 2023-12-21 | — | — | WO | disclosed |
| CN-117255971-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2023-12-19 | — | — | CN | disclosed |
| US-20230359123-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-11-09 | — | — | US | disclosed |
| US-11798810-B2 | Resist underlayer film-forming composition containing amide solvent | NISSAN CHEMICAL CORPORATION (JP) | 2023-10-24 | — | — | US | disclosed |
| US-20230333474-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING FLUOROALKYL GROUP-CONTAINING ORGANIC ACID OR SALT THEREOF | NISSAN CHEMICAL CORPORATION (JP) | 2023-10-19 | — | — | US | disclosed |
| US-20230324802-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZOLE NOVOLAK RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-10-12 | — | — | US | disclosed |
| WO-2023189799-A1 | SELF CROSS-LINKABLE POLYMER AND RESIST UNDERLAYER FILM-FORMING COMPOSITION | 日産化学株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023189803-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | 日産化学株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023190807-A1 | BRUSH MATERIAL FOR SELF-ASSEMBLED FILM | 日産化学株式会社 | 2023-10-05 | — | — | WO | disclosed |
| US-11768436-B2 | Protective film forming composition having a diol structure | NISSAN CHEMICAL CORPORATION (JP) | 2023-09-26 | — | — | US | disclosed |
| WO-2023157943-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING UNSATURATED BOND AND CYCLIC STRUCTURE | 日産化学株式会社 | 2023-08-24 | — | — | WO | disclosed |
| US-20230259031-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| CN-116600994-A | Multilayer structure and packaging material using same | 株式会社可乐丽 | 2023-08-15 | — | — | CN | disclosed |
| US-11720024-B2 | Resist underlayer film-forming composition containing indolocarbazole novolak resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-08-08 | — | — | US | disclosed |
| WO-2023136250-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2023-07-20 | — | — | WO | disclosed |
| US-11674053-B2 | Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-06-13 | — | — | US | disclosed |
| US-20230159734-A1 | Resin Composition and Molded Body | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161246-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-05-25 | — | — | US | disclosed |
| WO-2023074777-A1 | ADDITIVE-CONTAINING COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2023-05-04 | — | — | WO | disclosed |
| US-20230137360-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2023-05-04 | — | — | US | disclosed |
| US-20230131253-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION WITH SUPPRESSED DEGENERATION OF CROSSLINKING AGENT | NISSAN CHEMICAL CORPORATION (JP) | 2023-04-27 | — | — | US | disclosed |
| US-11635692-B2 | Resist underlying film forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2023-04-25 | — | — | US | disclosed |
| CN-115943348-A | Resist underlayer film forming composition using diarylmethane derivative | 日产化学株式会社 | 2023-04-07 | — | — | CN | disclosed |
| WO-2023054919-A1 | POLYMER COMPOUND FOR FORMING PHOTORESIST UNDERLAYER FILM, AND PHOTORESIST UNDERLAYER FILM COMPOSITION FOR EUV CONTAINING SAME | 주식회사 동진쎄미켐 | 2023-04-06 | — | — | WO | disclosed |
| WO-2023052127-A1 | PVC MIXTURE | LEONI KABEL GMBH (DE) | 2023-04-06 | — | — | WO | disclosed |
| EP-4159804-A1 | RESIN COMPOSITION AND MOLDED BODY | Mitsubishi Chemical Corporation (JP) | 2023-04-05 | — | — | EP | disclosed |
| US-20230103242-A1 | METHOD FOR PRODUCING POLYMER | NISSAN CHEMICAL CORPORATION (JP) | 2023-03-30 | — | — | US | disclosed |
| WO-2023037979-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, MULTILAYER BODY USING SAID COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | 日産化学株式会社 | 2023-03-16 | — | — | WO | disclosed |
| CN-112976713-B | Women's underwear and production process thereof | 泉州市锦恒服装实业有限公司 | 2023-03-10 | — | — | CN | disclosed |
| US-20230060585-A1 | RESIST UNDERLYING FILM-FORMING COMPOSITION FOR NANOIMPRINTING | NISSAN CHEMICAL CORPORATION (JP) | 2023-03-02 | — | — | US | disclosed |
| US-11592747-B2 | Resist underlayer film-forming composition comprising carbonyl-containing polyhydroxy aromatic ring novolac resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-02-28 | — | — | US | disclosed |
| WO-2023008507-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2023-02-02 | — | — | WO | disclosed |
| US-20230029997-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2023-02-02 | — | — | US | disclosed |
| CN-115668464-A | Composition for forming upper layer film and method for producing phase separation pattern | 日产化学株式会社 | 2023-01-31 | — | — | CN | disclosed |
| US-20220404707-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZOLE NOVOLAK RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-12-22 | — | — | US | disclosed |
| CN-115485624-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-12-16 | — | — | CN | disclosed |
| WO-2022260154-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2022-12-15 | — | — | WO | disclosed |
| US-20220397828-A1 | COMPOSITION CONTAINING A DICYANOSTYRYL GROUP, FOR FORMING A RESIST UNDERLAYER FILM CAPABLE OF BEING WET ETCHED | NISSAN CHEMICAL CORPORATION (JP) | 2022-12-15 | — | — | US | disclosed |
| CN-115427891-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-12-02 | — | — | CN | disclosed |
| CN-115398343-A | Composition for forming resist underlayer film, modified with crosslinking agent suppressed | 日产化学株式会社 | 2022-11-25 | — | — | CN | disclosed |
| WO-2022243568-A1 | RACK FOR USE IN A METHOD FOR PICKLING PLASTIC PARTS TO BE COATED WITH METAL | DELTA ENGINEERING & CHEMISTRY GMBH (DE) | 2022-11-24 | — | — | WO | disclosed |
| US-11505681-B2 | Cellulose resin composition, molded body and product using same | NEC CORPORATION (JP) | 2022-11-22 | — | — | US | disclosed |
| US-11506980-B2 | Resist underlayer film forming composition using a fluorene compound | NISSAN CHEMICAL CORPORATION (JP) | 2022-11-22 | — | — | US | disclosed |
| WO-2022230940-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2022-11-03 | — | — | WO | disclosed |
| CN-115260650-A | Plastic composition containing at least one metal pigment, method for the production thereof and use thereof | 埃卡特有限公司 | 2022-11-01 | — | — | CN | disclosed |
| US-11479627-B2 | Film forming composition containing fluorine-containing surfactant | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-10-25 | — | — | US | disclosed |
| US-20220319839-A1 | COMPOSITION CONTAINING A HETEROCYCLIC COMPOUND HAVING A DICYANOSTYRYL GROUP, FOR FORMING A RESIST UNDERLAYER FILM CAPABLE OF BEING WET ETCHED | NISSAN CHEMICAL CORPORATION (JP) | 2022-10-06 | — | — | US | disclosed |
| WO-2022210960-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ORGANIZATION | 日産化学株式会社 | 2022-10-06 | — | — | WO | disclosed |
| WO-2022210944-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | 日産化学株式会社 | 2022-10-06 | — | — | WO | disclosed |
| WO-2022210901-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2022-10-06 | — | — | WO | disclosed |
| WO-2022210954-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | 日産化学株式会社 | 2022-10-06 | — | — | WO | disclosed |
| US-11460771-B2 | Protective film forming composition having an acetal structure | NISSAN CHEMICAL CORPORATION (JP) | 2022-10-04 | — | — | US | disclosed |
| US-11459414-B2 | Film forming composition containing fluorine-containing surfactant | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-10-04 | — | — | US | disclosed |
| CN-115136074-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-09-30 | — | — | CN | disclosed |
| US-11440985-B2 | Underlayer film-forming composition for use in forming a microphase-separated pattern | NISSAN CHEMICAL CORPORATION (JP) | 2022-09-13 | — | — | US | disclosed |
| US-20220243033-A1 | CELLULOSE RESIN COMPOSITION, MOLDED BODY AND PRODUCT USING SAME | NEC CORPORATION (JP) | 2022-08-04 | — | — | US | disclosed |
| CN-114830298-A | Composition for forming resist underlayer film for nanoimprinting | 日产化学株式会社 | 2022-07-29 | — | — | CN | disclosed |
| US-20220235202-A1 | CELLULOSE RESIN COMPOSITION, MOLDED BODY AND PRODUCT USING SAME | NEC CORPORATION (JP) | 2022-07-28 | — | — | US | disclosed |
| US-20220229368-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2022-07-21 | — | — | US | disclosed |
| CN-110698331-B | Resist underlayer film forming composition containing substituted crosslinkable compound | 日产化学工业株式会社 | 2022-07-19 | — | — | CN | disclosed |
| CN-114761876-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-07-15 | — | — | CN | disclosed |
| CN-109643065-B | Resist underlayer film forming composition containing triaryldiamine-containing novolak resin | 日产化学株式会社 | 2022-07-12 | — | — | CN | disclosed |
| CN-114746468-A | Method for producing polymer | 日产化学株式会社 | 2022-07-12 | — | — | CN | disclosed |
| WO-2022138454-A1 | RESIST UNDERLAYER FILM FORMATION COMPOSITION | 日産化学株式会社 | 2022-06-30 | — | — | WO | disclosed |
| US-20220204686-A1 | CHEMICAL-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CONTAINING HYDROXYARYL-TERMINATED POLYMER | NISSAN CHEMICAL CORPORATION (JP) | 2022-06-30 | — | — | US | disclosed |
| US-11372330-B2 | Anti-reflective coating forming composition containing reaction product of isocyanuric acid compound with benzoic acid compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-06-28 | — | — | US | disclosed |
| CN-108292098-B | Composition for forming resist underlayer film, containing indolocarbazole novolak resin | 日产化学工业株式会社 | 2022-06-17 | — | — | CN | disclosed |
| US-20220187709-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2022-06-16 | — | — | US | disclosed |
| US-20220177653-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2022-06-09 | — | — | US | disclosed |
| WO-2022114134-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION | 日産化学株式会社 | 2022-06-02 | — | — | WO | disclosed |
| WO-2022114132-A1 | SILICON-CONTAINING RESIST UNDERLYAER FILM FORMING COMPOSITION | 日産化学株式会社 | 2022-06-02 | — | — | WO | disclosed |
| WO-2022107759-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | 日産化学株式会社 | 2022-05-27 | — | — | WO | disclosed |
| US-11339242-B2 | Method for manufacturing semiconductor substrate having group-III nitride compound layer | NISSAN CHEMICAL CORPORATION (JP) | 2022-05-24 | — | — | US | disclosed |
| US-20220155686-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2022-05-19 | — | — | US | disclosed |
| CN-114503033-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-05-13 | — | — | CN | disclosed |
| CN-114503032-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-05-13 | — | — | CN | disclosed |
| CN-114424121-A | Composition for forming resist underlayer film containing heterocyclic compound | 日产化学株式会社 | 2022-04-29 | — | — | CN | disclosed |
| WO-2022080458-A1 | MULTILAYER STRUCTURE, AND PACKAGING MATERIAL USING SAME | 株式会社クラレ | 2022-04-21 | — | — | WO | disclosed |
| EP-3985057-A1 | CELLULOSE RESIN COMPOSITION, MOLDED BODY AND PRODUCT USING SAME | NEC Corporation (JP) | 2022-04-20 | — | — | EP | disclosed |
| EP-3985058-A1 | CELLULOSE RESIN COMPOSITION, MOLDED BODY AND PRODUCT USING SAME | NEC Corporation (JP) | 2022-04-20 | — | — | EP | disclosed |
| US-11300879-B2 | Resist underlayer film forming composition containing triaryldiamine-containing novolac resin | NISSAN CHEMICAL CORPORATION (JP) | 2022-04-12 | — | — | US | disclosed |
| WO-2022065374-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING FLUOROALKYL GROUP-CONTAINING ORGANIC ACID OR SALT THEREOF | 日産化学株式会社 | 2022-03-31 | — | — | WO | disclosed |
| CN-114206605-A | Tape, article comprising tape and composite layer, and related methods | 3M创新有限公司 | 2022-03-18 | — | — | CN | disclosed |
| CN-114174926-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-03-11 | — | — | CN | disclosed |
| WO-2022030469-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2022-02-10 | — | — | WO | disclosed |
| WO-2022030468-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2022-02-10 | — | — | WO | disclosed |
| CN-113994261-A | Wet-etchable resist underlayer film forming composition containing heterocyclic compound having dicyanostyryl group | 日产化学株式会社 | 2022-01-28 | — | — | CN | disclosed |
| CN-113994263-A | Wet-etchable resist underlayer film forming composition containing dicyanostyryl group | 日产化学株式会社 | 2022-01-28 | — | — | CN | disclosed |
| CN-113906084-A | Film-forming composition | 日产化学株式会社 | 2022-01-07 | — | — | CN | disclosed |
| CN-113891906-A | Film-forming composition | 日产化学株式会社 | 2022-01-04 | — | — | CN | disclosed |
| CN-110191930-B | Composition for forming underlayer film for forming fine phase separation pattern | 日产化学株式会社 | 2022-01-04 | — | — | CN | disclosed |
| US-20210403635-A1 | CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION CONTAINING POLYMERIZATION PRODUCT OF ARYLENE COMPOUND HAVING GLYCIDYL GROUP | NISSAN CHEMICAL CORPORATION (JP) | 2021-12-30 | — | — | US | disclosed |
| WO-2021256527-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION USING DIARYLMETHANE DERIVATIVE | 日産化学株式会社 | 2021-12-23 | — | — | WO | disclosed |
| US-11199775-B2 | Resist underlayer film-forming composition containing naphthol aralkyl resin | NISSAN CHEMICAL CORPORATION (JP) | 2021-12-14 | — | — | US | disclosed |
| US-11199777-B2 | Resist underlayer film-forming composition containing novolac polymer having secondary amino group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2021-12-14 | — | — | US | disclosed |
| US-11194251-B2 | Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structure | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2021-12-07 | — | — | US | disclosed |
| WO-2021241682-A1 | RESIN COMPOSITION AND MOLDED BODY | 三菱ケミカル株式会社 | 2021-12-02 | — | — | WO | disclosed |
| CN-113646352-A | Composition for forming chemical-resistant protective film containing polymer having hydroxyaryl terminal | 日产化学株式会社 | 2021-11-12 | — | — | CN | disclosed |
| CN-113574085-A | Composition for forming chemical-resistant protective film containing polymer product having diol structure at terminal | 日产化学株式会社 | 2021-10-29 | — | — | CN | disclosed |
| CN-113574044-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2021-10-29 | — | — | CN | disclosed |
| CN-110198995-B | Composition for forming self-assembled film for forming fine phase separation pattern | 日产化学株式会社 | 2021-10-08 | — | — | CN | disclosed |
| CN-108139674-B | Composition for forming resist underlayer film containing long-chain alkyl group-containing novolak | 日产化学工业株式会社 | 2021-09-28 | — | — | CN | disclosed |
| CN-107735729-B | Resist underlayer film forming composition containing epoxy group adduct having long chain alkyl group | 日产化学工业株式会社 | 2021-09-28 | — | — | CN | disclosed |
| US-11131928-B2 | Resist underlayer film forming composition which contains compound having glycoluril skeleton as additive | NISSAN CHEMICAL CORPORATION (JP) | 2021-09-28 | — | — | US | disclosed |
| CN-113383036-A | Composition for forming resist underlayer film containing radical scavenger | 日产化学株式会社 | 2021-09-10 | — | — | CN | disclosed |
| CN-113316595-A | Composition for forming protective film having acetal structure and amide structure | 日产化学株式会社 | 2021-08-27 | — | — | CN | disclosed |
| EP-3255100-B1 | FLAME-RETARDANT POLYPROPYLENE COMPOSITION | ADEKA CORP (JP) | 2021-08-18 | — | — | EP | disclosed |
| CN-105531308-B | Recycle blends | CJ 第一制糖株式会社 | 2021-08-10 | — | — | CN | disclosed |
| CN-109265943-B | Bio-based rubber modified biodegradable polymer blends | CJ第一制糖株式会社 | 2021-08-10 | — | — | CN | disclosed |
| CN-106662819-B | Resist underlayer film forming composition containing novolak resin obtained by reaction of aromatic methylol compound | 日产化学工业株式会社 | 2021-06-25 | — | — | CN | disclosed |
| WO-2021125036-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINTING | 日産化学株式会社 | 2021-06-24 | — | — | WO | disclosed |
| CN-108602995-B | Flame-retardant polyolefin resin composition | 株式会社艾迪科 | 2021-06-22 | — | — | CN | disclosed |
| CN-112976713-A | Women's underwear and production process thereof | 泉州市锦恒服装实业有限公司 | 2021-06-18 | — | — | CN | disclosed |
| CN-112969739-A | Composition for forming chemical liquid resistant protective film containing polymer product with glycidyl group-containing arylene compound | 日产化学株式会社 | 2021-06-15 | — | — | CN | disclosed |
| WO-2021111976-A1 | METHOD FOR PRODUCING POLYMER | 日産化学株式会社 | 2021-06-10 | — | — | WO | disclosed |
| WO-2021111977-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2021-06-10 | — | — | WO | disclosed |
| CN-107966879-B | Composition for forming silicon-containing extreme ultraviolet resist underlayer film containing additive | 日产化学工业株式会社 | 2021-06-01 | — | — | CN | disclosed |
| CN-107923176-B | Self-sealing article comprising an elastic porous layer | 3M创新有限公司 | 2021-05-28 | — | — | CN | disclosed |
| CN-108026375-B | Thermally conductive resin composition | 株式会社钟化 | 2021-05-11 | — | — | CN | disclosed |
| CN-112771091-A | Composition for forming block copolymer layer for forming fine phase separation pattern | 日产化学株式会社 | 2021-05-07 | — | — | CN | disclosed |
| US-10995172-B2 | Self-organized film-forming composition for use in forming a micro-phase-separated pattern | NISSAN CHEMICAL CORPORATION (JP) | 2021-05-04 | — | — | US | disclosed |
| WO-2021070919-A1 | HETEROCYCLIC-COMPOUND-CONTAINING COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2021-04-15 | — | — | WO | disclosed |
| WO-2021070727-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | 日産化学株式会社 | 2021-04-15 | — | — | WO | disclosed |
| WO-2021070775-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2021-04-15 | — | — | WO | disclosed |
| US-20210102088-A1 | FILM FORMING COMPOSITION CONTAINING FLUORINE-CONTAINING SURFACTANT | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2021-04-08 | — | — | US | disclosed |
| CN-107922797-B | Air and water barrier article having porous layer and liner | 3M创新有限公司 | 2021-03-05 | — | — | CN | disclosed |
| US-20210063881-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING A DISULFIDE STRUCTURE | NISSAN CHEMICAL CORPORATION (JP) | 2021-03-04 | — | — | US | disclosed |
| CN-112437901-A | Resist underlayer film forming composition containing hetero atom in polymer main chain | 日产化学株式会社 | 2021-03-02 | — | — | CN | disclosed |
| CN-108473760-B | Flame-retardant thermoplastic polyurethane resin composition | 株式会社艾迪科 | 2021-02-26 | — | — | CN | disclosed |
| CN-109054254-B | Bio-based rubber modifiers for polymer blends | CJ第一制糖株式会社 | 2021-02-02 | — | — | CN | disclosed |
| CN-112313226-A | Resist underlayer film forming composition containing reaction product with glycidyl ester compound | 日产化学株式会社 | 2021-02-02 | — | — | CN | disclosed |
| WO-2021015181-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | 日産化学株式会社 | 2021-01-28 | — | — | WO | disclosed |
| CN-112236720-A | Composition for forming resist underlayer film using carbon-oxygen double bond | 日产化学株式会社 | 2021-01-15 | — | — | CN | disclosed |
| CN-112166379-A | Resist underlayer film forming composition using cyclic carbonyl compound | 日产化学株式会社 | 2021-01-01 | — | — | CN | disclosed |
| US-20200409260-A1 | PROTECTIVE FILM FORMING COMPOSITION HAVING AN ACETAL STRUCTURE | NISSAN CHEMICAL CORPORATION (JP) | 2020-12-31 | — | — | US | disclosed |
| WO-2020255984-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CAPABLE OF WET ETCHING, CONTAINING HETEROCYCLIC COMPOUND HAVING DICYANOSTYRYL GROUP | 日産化学株式会社 | 2020-12-24 | — | — | WO | disclosed |
| WO-2020251026-A1 | CELLULOSE RESIN COMPOSITION, MOLDED BODY AND PRODUCT USING SAME | 日本電気株式会社 | 2020-12-17 | — | — | WO | disclosed |
| WO-2020251025-A1 | CELLULOSE RESIN COMPOSITION, MOLDED BODY AND PRODUCT USING SAME | 日本電気株式会社 | 2020-12-17 | — | — | WO | disclosed |
| US-10865262-B2 | Upper-layer film forming composition and method for producing a phase-separated pattern | NISSAN CHEMICAL CORPORATION (JP) | 2020-12-15 | — | — | US | disclosed |
| US-20200385548-A1 | CELLULOSE RESIN COMPOSITION, MOLDED BODY AND PRODUCT USING SAME | NEC CORPORATION (JP) | 2020-12-10 | — | — | US | disclosed |
| US-20200387072-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION THAT CONTAINS TRIARYLDIAMINE-CONTAINING NOVOLAC RESIN TO WHICH AROMATIC VINYL COMPOUND IS ADDED | NISSAN CHEMICAL CORPORATION (JP) | 2020-12-10 | — | — | US | disclosed |
| US-20200379352-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SUBSTITUTED CROSSLINKABLE COMPOUND | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2020-12-03 | — | — | US | disclosed |
| US-20200379350-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION USING A FLUORENE COMPOUND | NISSAN CHEMICAL CORPORATION (JP) | 2020-12-03 | — | — | US | disclosed |
| WO-2020235427-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | 日産化学株式会社 (JP) | 2020-11-26 | — | — | WO | disclosed |
| CN-107109152-B | Air and water barrier articles | 3M创新有限公司 | 2020-11-03 | — | — | CN | disclosed |
| CN-107430343-B | Composition for forming cationically polymerizable resist underlayer film | 日产化学工业株式会社 | 2020-10-30 | — | — | CN | disclosed |
| EP-3725835-A1 | CELLULOSE-BASED RESIN COMPOSITION, MOLDED BODY, AND PRODUCT OBTAINED USING SAME | NEC Corporation (JP) | 2020-10-21 | — | — | EP | disclosed |
| CN-108350230-B | Rubber composition modifier, and vulcanizate and molded article of rubber composition to which modifier is added | 电化株式会社 | 2020-10-20 | — | — | CN | disclosed |
| US-10809619-B2 | Resist underlayer film-forming composition containing substituted crosslinkable compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2020-10-20 | — | — | US | disclosed |
| WO-2020209327-A1 | CHEMICAL-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CONTAINING HYDROXYARYL-TERMINATED POLYMER | 日産化学株式会社 | 2020-10-15 | — | — | WO | disclosed |
| CN-111758075-A | Resist underlayer film forming composition containing triaryldiamine-containing novolak resin to which aromatic vinyl compound is added | 日产化学株式会社 | 2020-10-09 | — | — | CN | disclosed |
| US-20200319561-A1 | PROTECTIVE FILM FORMING COMPOSITION HAVING A DIOL STRUCTURE | NISSAN CHEMICAL CORPORATION (JP) | 2020-10-08 | — | — | US | disclosed |
| WO-2020196563-A1 | FILM-FORMING COMPOSITION | 日産化学株式会社 | 2020-10-01 | — | — | WO | disclosed |
| WO-2020196642-A1 | FILM-FORMING COMPOSITION | 日産化学株式会社 | 2020-10-01 | — | — | WO | disclosed |
| CN-106575082-B | Composition for forming resist upper layer film and method for manufacturing semiconductor device using the same | 日产化学工业株式会社 | 2020-09-25 | — | — | CN | disclosed |
| WO-2020184642-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2020-09-17 | — | — | WO | disclosed |
| CN-109689779-B | Composition for forming upper layer film and method for producing phase separation pattern | 日产化学株式会社 | 2020-09-11 | — | — | CN | disclosed |
| CN-104246614-B | Composition for forming silicon-containing extreme ultraviolet resist underlayer film containing additive | 日产化学工业株式会社 | 2020-09-08 | — | — | CN | disclosed |
| US-20200277316-A1 | FLAME RETARDANT COMPOSITION, FLAME RETARDANT RESIN COMPOSITION CONTAINING SAID FLAME RETARDANT COMPOSITION, AND MOLDED BODY OF SAID FLAME RETARDANT RESIN COMPOSITION | ADEKA CORPORATION (JP) | 2020-09-03 | — | — | US | disclosed |
| EP-3690006-A1 | FLAME RETARDANT COMPOSITION, FLAME RETARDANT RESIN COMPOSITION CONTAINING SAID FLAME RETARDANT COMPOSITION, AND MOLDED BODY OF SAID FLAME RETARDANT RESIN COMPOSITION | Adeka Corporation (JP) | 2020-08-05 | — | — | EP | disclosed |
| CN-111492311-A | Protective film-forming composition having acetal structure | 日产化学株式会社 | 2020-08-04 | — | — | CN | disclosed |
| CN-111492312-A | Composition for forming protective film having diol structure | 日产化学株式会社 | 2020-08-04 | — | — | CN | disclosed |
| CN-109313389-B | Resist underlayer film forming composition containing compound having glycoluril skeleton as additive | 日产化学株式会社 | 2020-07-14 | — | — | CN | disclosed |
| US-20200209753-A1 | RESIST UNDERLYING FILM FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2020-07-02 | — | — | US | disclosed |
| CN-106030006-B | Easy to apply air and water barrier articles | 3M创新有限公司 | 2020-06-05 | — | — | CN | disclosed |
| CN-105209974-B | Resist underlayer film forming composition containing novolac resin using bisphenol | 日产化学工业株式会社 | 2020-05-29 | — | — | CN | disclosed |
| CN-104412163-B | Method for manufacturing semiconductor device using composition for forming organic underlayer film for solvent development lithography process | 日产化学工业株式会社 | 2020-05-22 | — | — | CN | disclosed |
| US-20200123298-A1 | SELF-ORGANIZED FILM-FORMING COMPOSITION FOR USE IN FORMING A MICRO-PHASE-SEPARATED PATTERN | NISSAN CHEMICAL CORPORATION (JP) | 2020-04-23 | — | — | US | disclosed |
| WO-2020066974-A1 | RESIN COMPOSITION, FILM, MULTILAYER BODY, BONDED STRUCTURE, METHOD FOR PRODUCING MULTILAYER BODY, AND METHOD FOR PRODUCING BONDED STRUCTURE | 富士フイルム株式会社 | 2020-04-02 | — | — | WO | disclosed |
| CN-110832397-A | Composition for forming resist underlayer film, method for forming resist pattern, and method for manufacturing semiconductor device | 日产化学株式会社 | 2020-02-21 | — | — | CN | disclosed |
| CN-105027005-B | Composition for forming resist underlayer film containing aryl sulfonate having hydroxyl group | 日产化学工业株式会社 | 2020-02-07 | — | — | CN | disclosed |
| CN-110698331-A | Resist underlayer film forming composition containing substituted crosslinkable compound | 日产化学工业株式会社 | 2020-01-17 | — | — | CN | disclosed |
| CN-105431780-B | Resist underlayer film forming composition containing polymer containing nitrogen-containing cyclic compound | 日产化学工业株式会社 | 2020-01-03 | — | — | CN | disclosed |
| CN-106133607-B | Resist underlayer film forming composition containing aromatic vinyl compound-added novolak resin | 日产化学工业株式会社 | 2020-01-03 | — | — | CN | disclosed |
| CN-105324720-B | Resist underlayer film forming composition containing substituted crosslinkable compound | 日产化学工业株式会社 | 2020-01-03 | — | — | CN | disclosed |
| CN-106233206-B | Resist underlayer film forming composition for lithography containing polymer having blocked isocyanate structure | 日产化学工业株式会社 | 2020-01-03 | — | — | CN | disclosed |
| CN-106164774-B | Resist underlayer film forming composition for lithography containing polymer containing acrylamide structure and acrylate structure | 日产化学工业株式会社 | 2019-12-13 | — | — | CN | disclosed |
| CN-105874386-B | Resist underlayer film-forming composition containing novolac polymer having secondary amino group | 日产化学工业株式会社 | 2019-12-06 | — | — | CN | disclosed |
| CN-110546570-A | composition for forming resist underlayer film using fluorene compound | NISSAN CHEMICAL CORP | 2019-12-06 | — | — | CN | disclosed |
| CN-105940348-B | Composition for film formation containing fluorine-containing surfactant | 日产化学工业株式会社 | 2019-12-06 | — | — | CN | disclosed |
| US-20190354018-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING AMIDE SOLVENT | NISSAN CHEMICAL CORPORATION (JP) | 2019-11-21 | — | — | US | disclosed |
| CN-106605310-B | LED lamp for car radiator | KANEKA CORP. (JP) | 2019-11-01 | — | — | CN | disclosed |
| EP-3037502-B1 | FLAME-RETARDANT COMPOSITION AND FLAME-RETARDANT SYNTHETIC RESIN COMPOSITION | ADEKA CORP (JP) | 2019-10-16 | — | — | EP | disclosed |
| US-10437150-B2 | Composition for forming resist underlayer film with reduced outgassing | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-10-08 | — | — | US | disclosed |
| US-10437151-B2 | Cationically polymerizable resist underlayer film-forming composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-10-08 | — | — | US | disclosed |
| US-20190302616-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NAPHTHOL ARALKYL RESIN | NISSAN CHEMICAL CORPORATION (JP) | 2019-10-03 | — | — | US | disclosed |
| CN-110192152-A | Resist underlayer film forming composition containing amide solvent | 日产化学株式会社 | 2019-08-30 | — | — | CN | disclosed |
| US-10376748-B2 | Golf balls comprising a plasticized polyurethane layer | ACUSHNET COMPANY (US) | 2019-08-13 | — | — | US | disclosed |
| US-20190233559-A1 | UPPER-LAYER FILM FORMING COMPOSITION AND METHOD FOR PRODUCING A PHASE-SEPARATED PATTERN | NISSAN CHEMICAL CORPORATION (JP) | 2019-08-01 | — | — | US | disclosed |
| US-20190225731-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE HAVING GROUP-III NITRIDE COMPOUND LAYER | NISSAN CHEMICAL CORPORATION (JP) | 2019-07-25 | — | — | US | disclosed |
| US-20190212649-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING TRIARYLDIAMINE-CONTAINING NOVOLAC RESIN | NISSAN CHEMICAL CORPORATION (JP) | 2019-07-11 | — | — | US | disclosed |
| EP-2933311-B1 | FLAME RETARDANT COMPOSITION AND FLAME-RETARDANT SYNTHETIC RESIN COMPOSITION | ADEKA CORP (JP) | 2019-06-19 | — | — | EP | disclosed |
| CN-104838315-B | Resist lower layer film composition comprising polyhydroxy fragrant epoxy/phenolic varnish gum | 日产化学工业株式会社 | 2019-06-07 | — | — | CN | disclosed |
| US-10295907-B2 | Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-05-21 | — | — | US | disclosed |
| US-10289002-B2 | Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-05-14 | — | — | US | disclosed |
| US-10266673-B2 | Flame-retardant polypropylene composition | ADEKA CORPORATION (JP) | 2019-04-23 | — | — | US | disclosed |
| US-20190086806-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION WHICH CONTAINS COMPOUND HAVING GLYCOLURIL SKELETON AS ADDITIVE | NISSAN CHEMICAL CORPORATION (JP) | 2019-03-21 | — | — | US | disclosed |
| US-10195491-B2 | Golf balls comprising a plasticized polyurethane layer | ACUSHNET COMPANY (US) | 2019-02-05 | — | — | US | disclosed |
| US-10179853-B2 | Material for fused deposition modeling type three-dimensional modeling, and filament for fused deposition modeling type 3D printing device | TORAY INDUSTRIES, INC. (JP) | 2019-01-15 | — | — | US | disclosed |
| EP-3243890-B1 | FLAME RETARDANT AGENT COMPOSITION AND FLAME-RETARDANT SYNTHETIC RESIN COMPOSITION | ADEKA CORP (JP) | 2019-01-09 | — | — | EP | disclosed |
| CN-109073976-A | Composition for forming resist underlayer film having improved film density | 日产化学株式会社 | 2018-12-21 | — | — | CN | disclosed |
| US-20180356732-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZOLE NOVOLAK RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-12-13 | — | — | US | disclosed |
| CN-107078200-B | LED lamp heat sink | 株式会社钟化 | 2018-12-07 | — | — | CN | disclosed |
| CN-108885403-A | Composition for forming resist underlayer film containing naphthol aralkyl resin | 日产化学株式会社 | 2018-11-23 | — | — | CN | disclosed |
| US-20180314154-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING LONG CHAIN ALKYL GROUP-CONTAINING NOVOLAC | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-11-01 | — | — | US | disclosed |
| EP-3089472-B1 | VIBRATION DAMPING MATERIAL | KAO CORP (JP) | 2018-10-31 | — | — | EP | disclosed |
| US-10113083-B2 | Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-10-30 | — | — | US | disclosed |
| EP-2975089-B1 | POLYLACTIC ACID RESIN COMPOSITION | KAO CORP (JP) | 2018-10-17 | — | — | EP | disclosed |
| US-10042258-B2 | Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-08-07 | — | — | US | disclosed |
| US-10017664-B2 | Novolac resin-containing resist underlayer film-forming composition using bisphenol aldehyde | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-07-10 | — | — | US | disclosed |
| US-20180181001-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING EPOXY ADDUCT HAVING LONG-CHAIN ALKYL GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-06-28 | — | — | US | disclosed |
| CN-108139674-A | Composition for forming resist underlayer film containing long-chain alkyl group-containing novolak | 日产化学工业株式会社 | 2018-06-08 | — | — | CN | disclosed |
| CN-108026375-A | Heat conductive resin composition | 株式会社钟化 | 2018-05-11 | — | — | CN | disclosed |
| CN-107966879-A | Siliceous extreme ultraviolet resist lower membrane formation composition containing additive | 日产化学工业株式会社 | 2018-04-27 | — | — | CN | disclosed |
| US-20180081274-A1 | CATIONICALLY POLYMERIZABLE RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-03-22 | — | — | US | disclosed |
| EP-2902440-B1 | NATURAL RUBBER-CONTAINING THERMOPLASTIC RESIN COMPOSITION AND MOLDED ARTICLE THEREOF | TORAY INDUSTRIES (JP) | 2018-02-28 | — | — | EP | disclosed |
| CN-107735729-A | Resist lower membrane formation composition comprising the epoxy radicals addition body with chain alkyl | 日产化学工业株式会社 | 2018-02-23 | — | — | CN | disclosed |
| US-20180028874-A1 | GOLF BALLS COMPRISING A PLASTICIZED POLYURETHANE LAYER | ACUSHNET COMPANY (US) | 2018-02-01 | — | — | US | disclosed |
| EP-2471864-B1 | PROCESS FOR THE PRODUCTION OF A POLYLACTIC ACID STEREOCOMPLEX. | TORAY INDUSTRIES (JP) | 2018-01-31 | — | — | EP | disclosed |
| US-20180016419-A1 | FLAME-RETARDANT POLYPROPYLENE COMPOSITION | ADEKA CORPORATION (JP) | 2018-01-18 | — | — | US | disclosed |
| US-20170342239-A1 | FLAME RETARDANT COMPOSITION AND FLAME-RETARDANT SYNTHETIC RESIN COMPOSITION | ADEKA CORPORATION (JP) | 2017-11-30 | — | — | US | disclosed |
| EP-3243890-A1 | FLAME RETARDANT AGENT COMPOSITION AND FLAME-RETARDANT SYNTHETIC RESIN COMPOSITION | Adeka Corporation (JP) | 2017-11-15 | — | — | EP | disclosed |
| CN-103838086-B | The composition of the formation antireflection film of reaction product containing isocyanuric acid compound and benzoic acid compounds | 日产化学工业株式会社 | 2017-10-20 | — | — | CN | disclosed |
| US-9789368-B2 | Golf balls comprising a plasticized polyurethane layer | ACUSHNET COMPANY (US) | 2017-10-17 | — | — | US | disclosed |
| US-9746772-B2 | Resist underlayer film forming composition for lithography containing polyether structure-containing resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-08-29 | — | — | US | disclosed |
| CN-107078200-A | Led lamp heat sink | 株式会社钟化 | 2017-08-18 | — | — | CN | disclosed |
| US-9721555-B2 | Vibration damping material | KAO CORPORATION (JP) | 2017-08-01 | — | — | US | disclosed |
| US-20170205711-A1 | COMPOSITION FOR FORMING A RESIST UPPER-LAYER FILM AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE USING THE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-07-20 | — | — | US | disclosed |
| US-9701820-B2 | Natural rubber-containing thermoplastic resin composition and molded article thereof | TORAY INDUSTRIES, INC. (JP) | 2017-07-11 | — | — | US | disclosed |
| US-9657128-B2 | Thermosetting resin composition containing polymer having specific terminal structure | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-05-23 | — | — | US | disclosed |
| CN-106605310-A | LED lamp heat sink for vehicles | 株式会社钟化 | 2017-04-26 | — | — | CN | disclosed |
| CN-105051105-B | Heat-curable resin composition | 日产化学工业株式会社 | 2017-04-26 | — | — | CN | disclosed |
| US-9622526-B2 | Glove, and method for producing the same | SHOWA GLOVE CO. (JP) | 2017-04-18 | — | — | US | disclosed |
| US-20170095703-A1 | GOLF BALLS COMPRISING A PLASTICIZED POLYURETHANE LAYER | ACUSHNET COMPANY (US) | 2017-04-06 | — | — | US | disclosed |
| US-20170097568-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NOVOLAC RESIN TO WHICH AROMATIC VINYL COMPOUND IS ADDED | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-04-06 | — | — | US | disclosed |
| US-20170045818-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYMER HAVING BLOCKED ISOCYANATE STRUCTURE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-02-16 | — | — | US | disclosed |
| US-20170045819-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYMER HAVING ACRYLAMIDE STRUCTURE AND ACRYLIC ACID ESTER STRUCTURE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-02-16 | — | — | US | disclosed |
| US-9567435-B2 | Thermosetting resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-02-14 | — | — | US | disclosed |
| EP-3106921-A1 | FILM-FORMING COMPOSITION INCLUDING FLUORINE-CONTAINING SURFACTANT | Nissan Chemical Industries, Ltd. (JP) | 2016-12-21 | — | — | EP | disclosed |
| US-9522305-B2 | Golf balls comprising a plasticized polyurethane layer | ACUSHNET COMPANY (US) | 2016-12-20 | — | — | US | disclosed |
| US-20160363863-A1 | ELECTRON BEAM RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING LACTONE-STRUCTURE-CONTAINING POLYMER | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-12-15 | — | — | US | disclosed |
| US-9514949-B2 | Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-12-06 | — | — | US | disclosed |
| US-20160347965-A1 | FILM FORMING COMPOSITION CONTAINING FLUORINE-CONTAINING SURFACTANT | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-12-01 | — | — | US | disclosed |
| US-9505913-B2 | Polylactic acid resin composition | KAO CORPORATION (JP) | 2016-11-29 | — | — | US | disclosed |
| US-20160326396-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NOVOLAC POLYMER HAVING SECONDARY AMINO GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-11-10 | — | — | US | disclosed |
| US-20160320704-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYETHER STRUCTURE-CONTAINING RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-11-03 | — | — | US | disclosed |
| EP-3089472-A1 | VIBRATION DAMPING MATERIAL | Kao Corporation (JP) | 2016-11-02 | — | — | EP | disclosed |
| US-20160314776-A1 | VIBRATION DAMPING MATERIAL | KAO CORPORATION (JP) | 2016-10-27 | — | — | US | disclosed |
| EP-2423753-B1 | Electrophotographic photoreceptor, and image forming apparatus and process cartridge using same | RICOH CO LTD (JP) | 2016-10-19 | — | — | EP | disclosed |
| US-20160287945-A1 | GOLF BALLS COMPRISING A PLASTICIZED POLYURETHANE LAYER | ACUSHNET COMPANY (US) | 2016-10-06 | — | — | US | disclosed |
| US-20160287947-A1 | GOLF BALLS COMPRISING A PLASTICIZED POLYURETHANE LAYER | ACUSHNET COMPANY (US) | 2016-10-06 | — | — | US | disclosed |
| US-20160287946-A1 | GOLF BALLS COMPRISING A PLASTICIZED POLYURETHANE LAYER | ACUSHNET COMPANY (US) | 2016-10-06 | — | — | US | disclosed |
| US-20160272764-A1 | THERMOSETTING RESIN COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-09-22 | — | — | US | disclosed |
| CN-105940348-A | Film-forming composition including fluorine-containing surfactant | 日产化学工业株式会社 | 2016-09-14 | — | — | CN | disclosed |
| US-20160222248-A1 | FORMING UNDERLAYER FILM OF SELF-ASSEMBLED FILM INCLUDING ALIPHATIC POLYCYCLIC STRUCTURE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-08-04 | — | — | US | disclosed |
| EP-3045498-A1 | MATERIAL FOR FUSED-DEPOSITION-TYPE THREE-DIMENSIONAL MODELING, AND FILAMENT FOR FUSED-DEPOSITION-TYPE 3D PRINTING DEVICE | Toray Industries, Inc. (JP) | 2016-07-20 | — | — | EP | disclosed |
| US-9395628-B2 | Resist underlayer film-forming composition containing aryl sulfonate salt having hydroxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-07-19 | — | — | US | disclosed |
| CN-103168274-B | EUV lithography resistant upper layer film formation compositions | 日产化学工业株式会社 | 2016-07-06 | — | — | CN | disclosed |
| CN-103827159-B | diaryl amine novolac resin | 日产化学工业株式会社 | 2016-07-06 | — | — | CN | disclosed |
| US-9384977-B2 | Method of manufacturing semiconductor device using organic underlayer film forming composition for solvent development lithography process | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-07-05 | — | — | US | disclosed |
| US-20160186006-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYMER WHICH CONTAINS NITROGEN-CONTAINING RING COMPOUND | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-06-30 | — | — | US | disclosed |
| EP-3037502-A1 | FLAME-RETARDANT COMPOSITION AND FLAME-RETARDANT SYNTHETIC RESIN COMPOSITION | Adeka Corporation (JP) | 2016-06-29 | — | — | EP | disclosed |
| US-20160177078-A1 | MATERIAL FOR FUSED DEPOSITION MODELING TYPE THREE-DIMENSIONAL MODELING, AND FILAMENT FOR FUSED DEPOSITION MODELING TYPE 3D PRINTING DEVICE | TORAY INDUSTRIES, INC. (JP) | 2016-06-23 | — | — | US | disclosed |
| US-20160152798-A1 | FLAME-RETARDANT COMPOSITION AND FLAME-RETARDANT SYNTHETIC RESIN COMPOSITION | ADEKA CORPORATION (JP) | 2016-06-02 | — | — | US | disclosed |
| US-20160152759-A1 | THERMOSETTING RESIN COMPOSITION CONTAINING POLYMER HAVING SPECIFIC TERMINAL STRUCTURE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-06-02 | — | — | US | disclosed |
| US-20160147151-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTANING PYRROLE NOVOLAC RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-05-26 | — | — | US | disclosed |
| US-20160139509-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SUBSTITUTED CROSSLINKABLE COMPOUND | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-05-19 | — | — | US | disclosed |
| CN-105555888-A | Composition for forming lower layer film of self-assembled film containing aliphatic polycyclic structure | NISSAN CHEMICAL IND LTD | 2016-05-04 | — | — | CN | disclosed |
| US-20160068709-A1 | NOVOLAC RESIN-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION USING BISPHENOL ALDEHYDE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-03-10 | — | — | US | disclosed |
| CN-103819822-B | For the formula of ethylene propylene terpolymer with of environmental protection sebific duct | WUXI SECOND RUBBER CO., LTD. (CN) | 2016-03-02 | — | — | CN | disclosed |
| CN-103819822-B | For the formula of ethylene propylene terpolymer with of environmental protection sebific duct | WUXI SECOND RUBBER CO., LTD. (CN) | 2016-03-02 | — | — | CN | disclosed |
| CN-105324719-A | Resist underlayer film forming composition containing pyrrole novolac resin | NISSAN CHEMICAL IND LTD | 2016-02-10 | — | — | CN | disclosed |
| EP-2975089-A1 | POLYLACTIC ACID RESIN COMPOSITION | Kao Corporation (JP) | 2016-01-20 | — | — | EP | disclosed |
| US-9240260-B2 | Flame-retardant resin composition and electric wire using same | ADEKA CORPORATION (JP) | 2016-01-19 | — | — | US | disclosed |
| US-20160002443-A1 | POLYLACTIC ACID RESIN COMPOSITION | TOKAI CHEMICAL INDUSTRIES, LTD. (JP) | 2016-01-07 | — | — | US | disclosed |
| US-20150378260-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING ARYL SULFONATE SALT HAVING HYDROXYL GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-12-31 | — | — | US | disclosed |
| US-20150361214-A1 | POLYLACTIC ACID COMPOSITION, AND PRODUCTION METHOD AND PRODUCTION APPARATUS OF THE SAME | RICOH COMPANY, LTD. (JP) | 2015-12-17 | — | — | US | disclosed |
| EP-1199613-B1 | Method for removing deposit from image substrate and image formation apparatus using the method | RICOH CO LTD (JP) | 2015-12-09 | — | — | EP | disclosed |
| EP-2948507-A1 | POLYLACTIC ACID COMPOSITION, AND PRODUCTION METHOD AND PRODUCTION APPARATUS OF THE SAME | Ricoh Company, Ltd. (JP) | 2015-12-02 | — | — | EP | disclosed |
| US-20150337204-A1 | FLAME RETARDANT COMPOSITION AND FLAME-RETARDANT SYNTHETIC RESIN COMPOSITION | ADEKA CORPORATION (JP) | 2015-11-26 | — | — | US | disclosed |
| CN-105051105-A | Heat-curable resin composition | NISSAN CHEMICAL IND LTD | 2015-11-11 | — | — | CN | disclosed |
| US-20150316850-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING CARBONYL-CONTAINING POLYHYDROXY AROMATIC RING NOVOLAC RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-11-05 | — | — | US | disclosed |
| CN-105017661-A | Novel flame retardant XLPE insulated wire and cable and preparation method therefor | QINGDAO CABLE CO LTD | 2015-11-04 | — | — | CN | disclosed |
| EP-2933311-A1 | FLAME RETARDANT COMPOSITION AND FLAME-RETARDANT SYNTHETIC RESIN COMPOSITION | Adeka Corporation (JP) | 2015-10-21 | — | — | EP | disclosed |
| EP-2591687-B1 | Glove, and method for producing the same | SHOWA GLOVE CO (JP) | 2015-10-14 | — | — | EP | disclosed |
| CN-103044785-B | Ethylene Propylene Terpolymer heat conductive rubber | QINGDAO HUAREN TECHNOLOGY INCUBATOR CO., LTD. (CN) | 2015-09-30 | — | — | CN | disclosed |
| US-20150247026-A1 | NATURAL RUBBER-CONTAINING THERMOPLASTIC RESIN COMPOSITION AND MOLDED ARTICLE THEREOF | TORAY INDUSTRIES, INC. (JP) | 2015-09-03 | — | — | US | disclosed |
| EP-2676996-B1 | THERMOPLASTIC RESIN COMPOSITION AND MOLDED ARTICLES THEREOF | TORAY INDUSTRIES (JP) | 2015-08-12 | — | — | EP | disclosed |
| EP-2902440-A1 | NATURAL RUBBER-CONTAINING THERMOPLASTIC RESIN COMPOSITION AND MOLDED ARTICLE THEREOF | Toray Industries, Inc. (JP) | 2015-08-05 | — | — | EP | disclosed |
| EP-2343597-B1 | Use of an underlayer coating forming composition for lithography | NISSAN CHEMICAL IND LTD (JP) | 2015-08-05 | — | — | EP | disclosed |
| EP-1586945-B1 | ALKALI-SOLUBLE GAP FILLING MATERIAL FORMING COMPOSITION FOR LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2015-07-29 | — | — | EP | disclosed |
| EP-1484647-B1 | Photoreceptor, image forming method and image forming apparatus using the photoreceptor, process cartridge using the photoceptor and coating liquid for the photoceptor | RICOH CO LTD (JP) | 2015-07-29 | — | — | EP | disclosed |
| CN-104774372-A | High-performance flame-retardant cable material and preparation method thereof | ANHUI GAOGOU CABLE CO LTD | 2015-07-15 | — | — | CN | disclosed |
| CN-103044784-B | High-heat-conductivity ternary rubber | QINGDAO HUAREN INF TECH DEV CO | 2015-07-15 | — | — | CN | disclosed |
| US-20150194312-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING ORGANIC UNDERLAYER FILM FORMING COMPOSITION FOR SOLVENT DEVELOPMENT LITHOGRAPHY PROCESS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-07-09 | — | — | US | disclosed |
| US-9074020-B2 | Cellulose derivative, resin composition, molded body, method for preparation thereof, and case for electric and electronic device | FUJIFILM CORPORATION (JP) | 2015-07-07 | — | — | US | disclosed |
| US-9074021-B2 | Cellulose derivative, thermo-molding material, molded body and method for preparation thereof, and case for electric and electronic devices | FUJIFILM CORPORATION (JP) | 2015-07-07 | — | — | US | disclosed |
| CN-104744800-A | Nano flame-retardant cable material for cable outer sheath and preparation method of nano flame-retardant cable material | ANHUI GAOGOU CABLE CO LTD | 2015-07-01 | — | — | CN | disclosed |
| CN-104744801-A | Mesoporous-silica nano composite flame-retardant sheath material and preparation method thereof | ANHUI GAOGOU CABLE CO LTD | 2015-07-01 | — | — | CN | disclosed |
| CN-104744802-A | Flame-retardant nano sheath material for cables and preparation method of flame-retardant nano sheath material | ANHUI GAOGOU CABLE CO LTD | 2015-07-01 | — | — | CN | disclosed |
| CN-104710682-A | Method for preparing nano fire-retardant material for cable wrapping | ANHUI GAOGOU CABLE CO LTD | 2015-06-17 | — | — | CN | disclosed |
| CN-104710683-A | Nano flame-retardant cable material | ANHUI GAOGOU CABLE CO LTD | 2015-06-17 | — | — | CN | disclosed |
| CN-104693588-A | Raw material set for preparing nanometer flame retardant cable material and method application thereof | QINGDAO HENGBO INSTR CO LTD | 2015-06-10 | — | — | CN | disclosed |
| CN-104693587-A | Flame-resistant nano-material for external wrapping of cable | QINGDAO HENGBO INSTR CO LTD | 2015-06-10 | — | — | CN | disclosed |
| CN-104672603-A | Preparation method of nano flame-retardant cable material | QINGDAO HENGBO INSTR CO LTD | 2015-06-03 | — | — | CN | disclosed |
| US-9045635-B2 | Polylactic acid stereocomplex, method for production thereof, and nucleating agent for polylactic acid resin | TORAY INDUSTRIES, INC. (JP) | 2015-06-02 | — | — | US | disclosed |
| CN-103012973-B | Nano high heat-conducting composite rubber | ZHAO YUMEI | 2015-05-27 | — | — | CN | disclosed |
| US-9040215-B2 | Amine compound, electrophotographic photoconductor, image forming method, image forming apparatus, and process cartridge | RICOH COMPANY, LTD. (JP) | 2015-05-26 | — | — | US | disclosed |
| CN-104628985-A | Preparation method of high-wear-resistant, low-temperature-resistant, deflection-resistant and hydrolysis-resistant polyurethane coating | PUTIAN LICHENG DISTR JUHUI TECHNOLOGY CONSULTING CO LTD | 2015-05-20 | — | — | CN | disclosed |
| US-9031491-B2 | Image forming apparatus and process cartridge | RICOH COMPANY, LTD. (JP) | 2015-05-12 | — | — | US | disclosed |
| US-9023588-B2 | Resist underlayer film forming composition containing silicon having nitrogen-containing ring | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-05-05 | — | — | US | disclosed |
| EP-2727962-B1 | THERMOPLASTIC RESIN COMPOSITION AND MOLDED ARTICLE COMPRISING SAME | TORAY INDUSTRIES (JP) | 2015-04-15 | — | — | EP | disclosed |
| US-8993215-B2 | Resist underlayer film forming composition containing phenylindole-containing novolac resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-03-31 | — | — | US | disclosed |
| EP-1911807-B1 | RESIN COMPOSITION AND MOLDED ARTICLE COMPRISING THE SAME | TORAY INDUSTRIES (JP) | 2015-03-04 | — | — | EP | disclosed |
| EP-2465874-B1 | CELLULOSE DERIVATIVE, RESIN COMPOSITION, MOLDED ARTICLE AND PROCESS FOR PRODUCTION THEREOF, AND HOUSING FOR ELECTRIC AND ELECTRONIC DEVICE | FUJIFILM CORP (JP) | 2015-02-25 | — | — | EP | disclosed |
| US-20150044876-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING PHENYLINDOLE-CONTAINING NOVOLAC RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-02-12 | — | — | US | disclosed |
| US-8938814-B2 | Glove, and method for producing the same | SHOWA GLOVE CO. (JP) | 2015-01-27 | — | — | US | disclosed |
| EP-2633771-B1 | Glove and method for producing the same | SHOWA GLOVE CO (JP) | 2014-12-24 | — | — | EP | disclosed |
| US-8916327-B2 | Underlayer coating forming composition containing dextrin ester compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-12-23 | — | — | US | disclosed |
| US-8906836-B2 | Lubricating oil composition | SAMSUNG ELECTRO-MACHANICS CO., LTD. (KR) | 2014-12-09 | — | — | US | disclosed |
| EP-2469338-B1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING RESIN HAVING ALIPHATIC RING AND AROMATIC RING | NISSAN CHEMICAL IND LTD (JP) | 2014-11-19 | — | — | EP | disclosed |
| EP-2568509-B1 | BACKSIDE PROTECTIVE FILM FOR SOLAR CELL, METHOD FOR PRODUCING SAME, AND SOLAR CELL MODULE | TECHNO POLYMER CO LTD (JP) | 2014-11-19 | — | — | EP | disclosed |
| US-8889324-B2 | Image bearing member, image forming method, image forming apparatus, and process cartridge | RICOH COMPANY, LTD. (JP) | 2014-11-18 | — | — | US | disclosed |
| EP-2465899-B1 | CELLULOSE DERIVATIVE, THERMOFORMED MATERIAL, MOLDED BODY, PRODUCTION METHOD THEREFOR, AND CASING FOR ELECTRICAL AND ELECTRONIC EQUIPMENT | FUJIFILM CORP (JP) | 2014-11-05 | — | — | EP | disclosed |
| US-8871849-B2 | Thermoplastic resin composition and molded product thereof | TORAY INDUSTRIES, INC. (JP) | 2014-10-28 | — | — | US | disclosed |
| EP-2789653-A1 | FLAME RETARDANT POLYOLEFIN RESIN COMPOSITION | Adeka Corporation (JP) | 2014-10-15 | — | — | EP | disclosed |
| US-20140288217-A1 | FLAME RETARDANT POLYOLEFIN RESIN COMPOSITION | ADEKA CORPORATION (JP) | 2014-09-25 | — | — | US | disclosed |
| US-8831467-B2 | Image-forming apparatus | RICOH COMPANY, LTD. (JP) | 2014-09-09 | — | — | US | disclosed |
| US-8822138-B2 | Composition for forming resist underlayer film for lithography including resin containing alicyclic ring and aromatic ring | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-09-02 | — | — | US | disclosed |
| US-20140235767-A1 | FLAME-RETARDANT RESIN COMPOSITION AND ELECTRIC WIRE USING SAME | ADEKA CORPORATION (JP) | 2014-08-21 | — | — | US | disclosed |
| US-8809543-B2 | Electrophotographic photoreceptor, electrophotographic image forming method, electrophotographic image forming apparatus, and process cartridge for electrophotographic image forming apparatus | RICOH COMPANY, LTD. (JP) | 2014-08-19 | — | — | US | disclosed |
| EP-2762532-A1 | FLAME-RETARDANT RESIN COMPOSITION AND ELECTRIC WIRE USING SAME | Adeka Corporation (JP) | 2014-08-06 | — | — | EP | disclosed |
| WO-2014115486-A1 | POLYLACTIC ACID COMPOSITION, AND PRODUCTION METHOD AND PRODUCTION APPARATUS OF THE SAME | RICOH COMPANY, LTD. (JP) | 2014-07-31 | — | — | WO | disclosed |
| EP-2535774-B1 | Image bearing drum, image forming apparatus, image forming method, and process cartridge | RICOH CO LTD (JP) | 2014-07-30 | — | — | EP | disclosed |
| EP-2295470-B1 | CELLULOSE DERIVATIVE AND PROCESS FOR PRODUCTION THEREOF, CELLULOSE RESIN COMPOSITION, MOLDED ARTICLE AND METHOD FOR PRODUCTION THEREOF, AND HOUSING FOR ELECTROCHEMICAL DEVICE | FUJIFILM CORP (JP) | 2014-06-18 | — | — | EP | disclosed |
| US-20140155528-A1 | THERMOPLASTIC RESIN COMPOSITION AND MOLDED PRODUCT MADE THEREOF | TORAY INDUSTRIES, INC. (JP) | 2014-06-05 | — | — | US | disclosed |
| CN-103842444-A | Flame-retardant resin composition and electric wire using same | ADEKA CORP | 2014-06-04 | — | — | CN | disclosed |
| CN-103827752-A | Composition for forming silicon-containing EUV resist underlayer film | NISSAN CHEMICAL IND LTD | 2014-05-28 | — | — | CN | disclosed |
| CN-101809050-B | Rubbery polymer having low compression set | ELIOKEM | 2014-05-28 | — | — | CN | disclosed |
| CN-103819822-A | Formula for EPDM rubber used for environment-friendly rubber hose | WUXI NO 2 RUBBER CO LTD | 2014-05-28 | — | — | CN | disclosed |
| CN-103827159-A | Diarylamine novolac resin | NISSAN CHEMICAL IND LTD | 2014-05-28 | — | — | CN | disclosed |
| US-8728614-B2 | Backside protective film for solar cell, method for producing same, and solar cell module | TECHNO POLYMER CO., LTD. (JP) | 2014-05-20 | — | — | US | disclosed |
| EP-1757986-B1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER AND METHOD FOR FORMING PHOTORESIST PATTERN | NISSAN CHEMICAL IND LTD (JP) | 2014-05-14 | — | — | EP | disclosed |
| EP-2727962-A1 | THERMOPLASTIC RESIN COMPOSITION AND MOLDED ARTICLE COMPRISING SAME | Toray Industries, Inc. (JP) | 2014-05-07 | — | — | EP | disclosed |
| US-8709701-B2 | Resist underlayer film forming composition for lithography, containing aromatic fused ring-containing resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-04-29 | — | — | US | disclosed |
| CN-103649835-A | Resist underlayer film-forming composition for EUV lithography containing condensation polymer | NISSAN CHEMICAL IND LTD | 2014-03-19 | — | — | CN | disclosed |
| CN-103635858-A | Resist underlayer film forming composition containing alicyclic skeleton-containing carbazole resin | NISSAN CHEMICAL IND LTD | 2014-03-12 | — | — | CN | disclosed |
| US-8664334-B2 | Resin composition and molded article made thereof | TORAY INDUSTRIES, INC. (JP) | 2014-03-04 | — | — | US | disclosed |
| EP-1780600-B1 | LOWER LAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY INCLUDING NAPHTHALENE RING HAVING HALOGEN ATOM | NISSAN CHEMICAL IND LTD (JP) | 2014-02-26 | — | — | EP | disclosed |
| US-8603731-B2 | Resist underlayer film forming composition for electron beam lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-12-10 | — | — | US | disclosed |
| EP-1921515-B1 | Image forming apparatus, image forming method, and process cartridge | RICOH CO LTD (JP) | 2013-12-04 | — | — | EP | disclosed |
| US-8598336-B2 | Cellulose derivative, process of preparing cellulose derivative, resin composition, molded article, method of making molded article, and housing for electronic equipment | FUJIFILM CORPORATION (JP) | 2013-12-03 | — | — | US | disclosed |
| US-20130305430-A1 | GLOVE, AND METHOD FOR PRODUCING THE SAME | SHOWA GLOVE CO. (JP) | 2013-11-21 | — | — | US | disclosed |
| US-20130251401-A1 | IMAGE FORMING APPARATUS AND PROCESS CARTRIDGE | RICOH COMPANY, LTD. (JP) | 2013-09-26 | — | — | US | disclosed |
| US-8535863-B2 | Electrophotographic photoreceptor, and image forming apparatus and process cartridge using same | RICOH COMPANY, LTD. (JP) | 2013-09-17 | — | — | US | disclosed |
| EP-2633771-A1 | Glove and method for producing the same | Showa Glove Co. (JP) | 2013-09-04 | — | — | EP | disclosed |
| US-20130219588-A1 | GLOVE, AND METHOD FOR PRODUCING THE SAME | SHOWA GLOVE CO. (JP) | 2013-08-29 | — | — | US | disclosed |
| CN-103265913-A | Adhesive containing calcined clay for packaging and preparation method thereof | QINGYANG HUADING PACKAGING CO LTD | 2013-08-28 | — | — | CN | disclosed |
| US-8507163-B2 | Method of manufacturing image bearing member, image bearing member, and image forming apparatus | RICOH COMPANY, LTD. (JP) | 2013-08-13 | — | — | US | disclosed |
| US-20130202994-A1 | AMINE COMPOUND, ELECTROPHOTOGRAPHIC PHOTOCONDUCTOR, IMAGE FORMING METHOD, IMAGE FORMING APPARATUS, AND PROCESS CARTRIDGE | RICOH COMPANY, LTD. (JP) | 2013-08-08 | — | — | US | disclosed |
| US-20130189533-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYETHER STRUCTURE-CONTAINING RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-07-25 | — | — | US | disclosed |
| EP-2617766-A1 | Resin composition and molded article made therof | TORAY INDUSTRIES, INC. (JP) | 2013-07-24 | — | — | EP | disclosed |
| US-8486595-B2 | Image bearing member, image forming apparatus, and process cartridge | RICOH COMPANY, LTD. (JP) | 2013-07-16 | — | — | US | disclosed |
| CN-101506736-B | Composition containing liquid additive for forming resist underlayer film, underlayer film forming method and semiconductor device manufacture method | NISSAN CHEMICAL IND LTD | 2013-07-10 | — | — | CN | disclosed |
| US-8481247-B2 | Resist underlayer film forming composition containing liquid additive | NISSAN CHEMICAL INDUSTRIES, LTD. | 2013-07-09 | — | — | US | disclosed |
| EP-2078988-B1 | Image forming apparatus and image forming method | RICOH CO LTD (JP) | 2013-06-26 | — | — | EP | disclosed |
| US-8460855-B2 | Composition for forming underlayer coating for litography containing epoxy compound and carboxylic acid compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-06-11 | — | — | US | disclosed |
| US-8445593-B2 | Resin composition and molded article comprising the same | TORAY INDUSTRIES, INC. (JP) | 2013-05-21 | — | — | US | disclosed |
| EP-2591687-A1 | Glove, and method for producing the same | Showa Glove Co. (JP) | 2013-05-15 | — | — | EP | disclosed |
| EP-2120095-B1 | USE OF A COMPOSITION FOR FORMING A RESIST LOWER LAYER FILM FOR ELECTRON LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2013-04-24 | — | — | EP | disclosed |
| CN-103044784-A | High-heat-conductivity ternary rubber | QINGDAO HUAREN INF TECH DEV CO | 2013-04-17 | — | — | CN | disclosed |
| CN-103044785-A | Ethylene propylene diene monomer heat-conducting rubber | QINGDAO HUAREN INF TECH DEV CO | 2013-04-17 | — | — | CN | disclosed |
| EP-2579328-A1 | BACKSIDE PROTECTIVE FILM FOR SOLAR CELL, METHOD FOR PRODUCING SAME, AND SOLAR CELL MODULE | Techno Polymer Co., Ltd. (JP) | 2013-04-10 | — | — | EP | disclosed |
| CN-103012973-A | Nano high heat-conducting composite rubber | ZENG JING | 2013-04-03 | — | — | CN | disclosed |
| EP-2295501-B1 | NON-HALOGEN FLAME-RETARDANT SYNTHETIC RESIN COMPOSITION | ADEKA CORP (JP) | 2013-03-27 | — | — | EP | disclosed |
| US-20130061906-A1 | BACKSIDE PROTECTIVE FILM FOR SOLAR CELL, METHOD FOR PRODUCING SAME, AND SOLAR CELL MODULE | Techo Polymer Co., Ltd (JO) | 2013-03-14 | — | — | US | disclosed |
| EP-2568509-A1 | BACKSIDE PROTECTIVE FILM FOR SOLAR CELL, METHOD FOR PRODUCING SAME, AND SOLAR CELL MODULE | Techno Polymer Co., Ltd. (JP) | 2013-03-13 | — | — | EP | disclosed |
| CN-102964706-A | Calcium sulfate crystal whisker modified chlorosulfonated polyethylene rubber cable material | ANHUI CHUNHUI INSTR CABLE GROUP CO LTD | 2013-03-13 | — | — | CN | disclosed |
| US-20130056064-A1 | BACKSIDE PROTECTIVE FILM FOR SOLAR CELL, METHOD FOR PRODUCING SAME, AND SOLAR CELL MODULE | TECHNO POLYMER CO., LTD. (JP) | 2013-03-07 | — | — | US | disclosed |
| EP-1510879-B1 | Image forming apparatus and process cartridge including lubricant application | RICOH CO LTD (JP) | 2013-01-23 | — | — | EP | disclosed |
| EP-2085823-B1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING QUADRUPLE-LAYER LAMINATE | NISSAN CHEMICAL IND LTD (JP) | 2013-01-16 | — | — | EP | disclosed |
| US-20130011147-A1 | DEGRADATION LEVEL ESTIMATING DEVICE AND IMAGE FORMING APPARATUS | RICOH COMPANY, LTD. (JP) | 2013-01-10 | — | — | US | disclosed |
| EP-2538276-A1 | COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM CONTAINING SILICON HAVING NITROGEN-CONTAINING RING | Nissan Chemical Industries, Ltd. (JP) | 2012-12-26 | — | — | EP | disclosed |
| US-20120321348-A1 | IMAGE BEARING DRUM, IMAGE FORMING APPARATUS, IMAGE FORMING METHOD, AND PROCESS CARTRIDGE | RICOH COMPANY, LTD. (JP) | 2012-12-20 | — | — | US | disclosed |
| EP-2535774-A1 | Image bearing drum, image forming apparatus, image forming method, and process cartridge | Ricoh Company, Ltd. (JP) | 2012-12-19 | — | — | EP | disclosed |
| US-20120315765-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING NITROGEN-CONTAINING RING | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-12-13 | — | — | US | disclosed |
| US-8324296-B2 | Non-halogen flame-retardant synthetic resin composition | ADEKA CORPORATION (JP) | 2012-12-04 | — | — | US | disclosed |
| CN-101605828-B | Method for producing polymer for oil-resistant rubber, polymer for oil-resistant rubber, composition for oil-resistant weather-resistant rubber, and rubber molded body | JSR CORP JP | 2012-11-28 | — | — | CN | disclosed |
| US-20120283161-A1 | LUBRICATING OIL COMPOSITION | SAMSUNG ELECTRO-MECHANICS CO., LTD. (KR) | 2012-11-08 | — | — | US | disclosed |
| US-8304153-B2 | Electrophotographic photoreceptor, electrophotographic image forming method, electrophotographic image forming apparatus, electrophotographic process cartridge | RICOH COMPANY, LTD. (JP) | 2012-11-06 | — | — | US | disclosed |
| US-8298734-B2 | Electrophotographic photoreceptor, image forming method, image forming apparatus, and process cartridge | RICOH COMPANY, LTD. (JP) | 2012-10-30 | — | — | US | disclosed |
| US-8273513-B2 | Image forming apparatus, process cartridge, and image bearing member | RICOH COMPANY, LIMITED (JP) | 2012-09-25 | — | — | US | disclosed |
| US-20120237250-A1 | IMAGE-FORMING APPARATUS | RICOH COMPANY, LTD. (JP) | 2012-09-20 | — | — | US | disclosed |
| EP-1315045-B1 | LITHOGRAPHIC GAP-FILLER FORMING COMPOSITION | NISSAN CHEMICAL IND LTD (JP) | 2012-09-05 | — | — | EP | disclosed |
| US-8257908-B2 | Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-09-04 | — | — | US | disclosed |
| US-20120202944-A1 | POLYLACTIC ACID STEREOCOMPLEX, METHOD FOR PRODUCTION THEREOF, AND NUCLEATING AGENT FOR POLYLACTIC ACID RESIN | TORAY INDUSTRIES, INC. (JP) | 2012-08-09 | — | — | US | disclosed |
| US-8232031-B2 | Naphthalenetetracarboxylic acid diimide derivative and electrophotographic photoconductor having the same | RICOH COMPANY, LTD. (JP) | 2012-07-31 | — | — | US | disclosed |
| US-8227172-B2 | Method of producing semiconductor device using resist underlayer film by photo-crosslinking curing | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-07-24 | — | — | US | disclosed |
| EP-2471864-A1 | POLYLACTIC ACID STEREOCOMPLEX, PROCESS FOR PRODUCTION THEREOF, AND NUCLEATING AGENT FOR POLYLACTIC ACID RESIN | Toray Industries, Inc. (JP) | 2012-07-04 | — | — | EP | disclosed |
| US-20120165517-A1 | CELLULOSE DERIVATIVE, THERMO-MOLDING MATERIAL, MOLDED BODY AND METHOD FOR PREPARATION THEREOF, AND CASE FOR ELECTRIC AND ELECTRONIC DEVICES | FUJIFILM CORPORATION (JP) | 2012-06-28 | — | — | US | disclosed |
| EP-2469338-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING RESIN HAVING ALIPHATIC RING AND AROMATIC RING | Nissan Chemical Industries, Ltd. (JP) | 2012-06-27 | — | — | EP | disclosed |
| EP-2465899-A1 | CELLULOSE DERIVATIVE, THERMOFORMED MATERIAL, MOLDED BODY, PRODUCTION METHOD THEREFOR, AND CASING FOR ELECTRICAL AND ELECTRONIC EQUIPMENT | FUJIFILM Corporation (JP) | 2012-06-20 | — | — | EP | disclosed |
| EP-2465874-A1 | CELLULOSE DERIVATIVE, RESIN COMPOSITION, MOLDED ARTICLE AND PROCESS FOR PRODUCTION THEREOF, AND HOUSING FOR ELECTRIC AND ELECTRONIC DEVICE | FUJIFILM Corporation (JP) | 2012-06-20 | — | — | EP | disclosed |
| US-20120146468-A1 | CELLULOSE DERIVATIVE, RESIN COMPOSITION, MOLDED BODY, METHOD FOR PREPARATION THEREOF, AND CASE FOR ELECTRIC AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20120142195-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR LITHOGRAPHY INCLUDING RESIN CONTAINING ALICYCLIC RING AND AROMATIC RING | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-06-07 | — | — | US | disclosed |
| EP-2201852-B1 | Chemical resistant glove | SHOWA GLOVE CO (JP) | 2012-05-16 | — | — | EP | disclosed |
| US-8173343-B2 | Electrophotographic photoconductor, image forming apparatus using the same, and process cartridge | RICOH COMPANY, LTD. (JP) | 2012-05-08 | — | — | US | disclosed |
| US-20120108805-A1 | CELLULOSE-BASED RESIN COMPOSITION, MOLDED BODY AND CASE FOR ELECTRIC AND ELECTRONIC DEVICES | FUJIFILM CORPORATION (JP) | 2012-05-03 | — | — | US | disclosed |
| US-20120064443-A1 | ELECTROPHOTOGRAPHIC PHOTORECEPTOR, ELECTROPHOTOGRAPHIC IMAGE FORMING METHOD, ELECTROPHOTOGRAPHIC IMAGE FORMING APPARATUS, AND PROCESS CARTRIDGE FOR ELECTROPHOTOGRAPHIC IMAGE FORMING APPARATUS | RICOH COMPANY, LTD. (JP) | 2012-03-15 | — | — | US | disclosed |
| US-20120052424-A1 | ELECTROPHOTOGRAPHIC PHOTORECEPTOR, AND IMAGE FORMING APPARATUS AND PROCESS CARTRIDGE USING SAME | RICOH COMPANY, LTD. (JP) | 2012-03-01 | — | — | US | disclosed |
| EP-2423753-A1 | Electrophotographic photoreceptor, and image forming apparatus and process cartridge using same | Ricoh Company, Ltd. (JP) | 2012-02-29 | — | — | EP | disclosed |
| EP-2146251-B1 | Electrophotographic photoconductor, image forming apparatus using the same, and process cartridge | RICOH CO LTD (JP) | 2012-02-08 | — | — | EP | disclosed |
| US-8110326-B2 | Electrophotographic photoreceptor, image forming apparatus, and process cartridge | RICOH COMPANY LIMITED (JP) | 2012-02-07 | — | — | US | disclosed |
| US-8088546-B2 | Underlayer coating forming composition for lithography containing naphthalene ring having halogen atom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| CN-102271914-A | Back sheet for solar cell and solar cell module provided with same | — | 2011-12-07 | — | — | CN | disclosed |
| US-20110269907-A1 | RESIN COMPOSITION AND MOLDED ARTICLE MADE THEREOF | TORAY INDUSTRIES, INC. (JP) | 2011-11-03 | — | — | US | disclosed |
| EP-2383116-A1 | BACK SHEET FOR SOLAR BATTERY, AND SOLAR BATTERY MODULE COMPRISING SAME | Techno Polymer Co., Ltd. (JP) | 2011-11-02 | — | — | EP | disclosed |
| US-20110247683-A1 | BACK SHEET FOR SOLAR BATTERY, AND SOLAR BATTERY MODULE COMPRISING SAME | TECHNO POLYMER CO., LTD. (JP) | 2011-10-13 | — | — | US | disclosed |
| US-20110230058-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM WITH REDUCED OUTGASSING | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-09-22 | — | — | US | disclosed |
| US-20110215496-A1 | INJECTION MOLDING METHOD | FUJIFILM CORPORATION (JP) | 2011-09-08 | — | — | US | disclosed |
| US-8007979-B2 | Acrylic polymer-containing gap fill material forming composition for lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-08-30 | — | — | US | disclosed |
| US-20110203643-A1 | SOLAR CELL BACKSHEET AND SOLAR CELL MODULE PROVIDED WITH SAME | TECHNO POLYMER CO., LTD. (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20110207331-A1 | Resist underlayer film forming composition for lithography, containing aromatic fused ring-containing resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-08-25 | — | — | US | disclosed |
| EP-2360738-A1 | SOLAR CELL BACKSHEET AND SOLAR CELL MODULE PROVIDED WITH SAME | Techno Polymer Co., Ltd. (JP) | 2011-08-24 | — | — | EP | disclosed |
| US-20110200925-A1 | IMAGE BEARING MEMBER, IMAGE FORMING METHOD, IMAGE FORMING APPARATUS, AND PROCESS CARTRIDGE | RICOH COMPANY, LTD. (JP) | 2011-08-18 | — | — | US | disclosed |
| US-7999021-B2 | Resin composition and molded article made thereof | TORAY INDUSTRIES, INC. (JP) | 2011-08-16 | — | — | US | disclosed |
| US-20110183090-A1 | CELLULOSE DERIVATIVE, PROCESS OF PREPARING CELLULOSE DERIVATIVE, RESIN COMPOSITION, MOLDED ARTICLE, METHOD OF MAKING MOLDED ARTICLE, AND HOUSING FOR ELECTRONIC EQUIPMENT | FUJIFILM CORPORATION (JP) | 2011-07-28 | — | — | US | disclosed |
| US-20110174356-A1 | SOLAR CELL BACK SURFACE PROTECTIVE FILM, AND SOLAR CELL MODULE PROVIDED WITH SAME | TECHNO POLYMER CO., LTD. (JP) | 2011-07-21 | — | — | US | disclosed |
| EP-1876495-B1 | COMPOSITION COMPRISING POLYMER HAVING ETHYLENE-DICARBONYL STRUCTURE FOR USE IN FORMING ANTI-REFLECTIVE COATING FOR LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2011-07-20 | — | — | EP | disclosed |
| EP-2343597-A2 | Composition for forming underlayer coating for lithography containing epoxy compound and carboxylic acid compound | Nissan Chemical Industries, Ltd. (JP) | 2011-07-13 | — | — | EP | disclosed |
| US-7964327-B2 | Electrophotographic photoreceptor and method of preparing the photoreceptor, and image forming apparatus, image forming method and process cartridge using the photoreceptor | RICOH COMPANY LTD. (JP) | 2011-06-21 | — | — | US | disclosed |
| WO-2011071674-A1 | ASYMMETRIC CYCLIC DIESTER COMPOUNDS | FERRO CORPORATION (US) | 2011-06-16 | — | — | WO | disclosed |
| EP-2333842-A1 | SOLAR CELL BACK SURFACE PROTECTIVE FILM, AND SOLAR CELL MODULE PROVIDED WITH SAME | Techno Polymer Co., Ltd. (JP) | 2011-06-15 | — | — | EP | disclosed |
| US-7955768-B2 | Electrophotographic photoconductor and method for producing the same, image forming apparatus, and process cartridge | RICOH COMPANY, LTD. (JP) | 2011-06-07 | — | — | US | disclosed |
| US-20110123918-A1 | COLORING MATERIAL AND METHOD FOR PRODUCING COLORING MATERIAL | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2011-05-26 | — | — | US | disclosed |
| US-7947424-B2 | urea compound substituted by hydroxyalkyl group or alkoxyalkyl group for forming urea-formaldehyde resin protective coatings; adjusting refractive index with light absorbers or crosslink-forming resin; semiconductor device, integrated circuits; light-absorption, dry etching rate | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-05-24 | — | — | US | disclosed |
| EP-1792941-B1 | RESIN COMPOSITION AND MOLDED ARTICLE COMPRISING THE SAME | TORAY INDUSTRIES (JP) | 2011-05-18 | — | — | EP | disclosed |
| CN-102040928-A | Modified water-resistant anti-freezing white latex | SANVO ZHONGSHAN AEROSOL CO LTD | 2011-05-04 | — | — | CN | disclosed |
| US-20110098463-A1 | CELLULOSE DERIVATIVE AND METHOD FOR PRODUCING THE SAME, CELLULOSE RESIN COMPOSITION, MOLDED MATTER AND METHOD FOR MAKING THE SAME, AND ELECTRICAL AND ELECTRONIC EQUIPMENT HOUSING | FUJIFILM CORPORATION (JP) | 2011-04-28 | — | — | US | disclosed |
| US-20110092622-A1 | NON-HALOGEN FLAME-RETARDANT SYNTHETIC RESIN COMPOSITION | ADEKA CORPORATION (JP) | 2011-04-21 | — | — | US | disclosed |
| EP-1921507-B1 | Image forming apparatus, image forming method, and process cartridge | RICOH CO LTD (JP) | 2011-04-13 | — | — | EP | disclosed |
| CN-101624506-B | Preparation method of adhesive mixture | HUNAN ZHONGTAI SPECIAL EQUIP | 2011-03-30 | — | — | CN | disclosed |
| US-20110071247-A1 | RESIN COMPOSITION AND MOLDED ARTICLE COMPRISING THE SAME | TORAY INDUSTRIES, INC. (JP) | 2011-03-24 | — | — | US | disclosed |
| EP-2033961-B1 | Naphthalenetetracarboxylic acid diimide derivative and electrophotographic photoconductor having the same | RICOH CO LTD (JP) | 2011-03-23 | — | — | EP | disclosed |
| EP-2295470-A1 | CELLULOSE DERIVATIVE AND PROCESS FOR PRODUCTION THEREOF, CELLULOSE RESIN COMPOSITION, MOLDED ARTICLE AND METHOD FOR PRODUCTION THEREOF, AND HOUSING FOR ELECTROCHEMICAL DEVICE | FUJIFILM Corporation (JP) | 2011-03-16 | — | — | EP | disclosed |
| EP-2295501-A1 | NON-HALOGEN FLAME-RETARDANT SYNTHETIC RESIN COMPOSITION | Adeka Corporation (JP) | 2011-03-16 | — | — | EP | disclosed |
| EP-1291723-B1 | Electrophotographic photoreceptor, and image forming method, image forming apparatus and process cartridge therefor using the photoreceptor | RICOH CO LTD (JP) | 2011-03-16 | — | — | EP | disclosed |
| US-20110059393-A1 | IMAGE BEARING MEMBER, IMAGE FORMING APPARATUS, AND PROCESS CARTRIDGE | RICOH COMPANY, LTD. (JP) | 2011-03-10 | — | — | US | disclosed |
| US-20110059392-A1 | ELECTROPHOTOGRAPHIC PHOTORECEPTOR, ELECTROPHOTOGRAPHIC IMAGE FORMING METHOD, ELECTROPHOTOGRAPHIC IMAGE FORMING APPARATUS, AND ELECTROPHOTOGRAPHIC PROCESS CARTRIDGE | RICOH COMPANY, LTD. (JP) | 2011-03-10 | — | — | US | disclosed |
| EP-2000856-B1 | Electrophotographic photoreceptor, image forming apparatus, and process cartridge | RICOH CO LTD (JP) | 2011-02-02 | — | — | EP | disclosed |
| US-7863382-B2 | Resin composition and molded article comprising the same | Toray Industriés, Inc. (JP) | 2011-01-04 | — | — | US | disclosed |
| US-7861590-B2 | Method of determining sublimate in thermoset film with QCM sensor | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-01-04 | — | — | US | disclosed |
| US-20100330475-A1 | IMAGE FORMING APPARATUS, PROCESS CARTRIDGE, AND IMAGE BEARING MEMBER | RICOH COMPANY LIMITED (JP) | 2010-12-30 | — | — | US | disclosed |
| US-7858278-B2 | Electrophotographic photoreceptor, and image forming apparatus and process cartridge using the electrophotographic photoreceptor | RICOH COMPANY LIMITED (JP) | 2010-12-28 | — | — | US | disclosed |
| US-7846638-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-07 | — | — | US | disclosed |
| US-7842620-B2 | Method for manufacturing semiconductor device using quadruple-layer laminate | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-30 | — | — | US | disclosed |
| EP-1591483-B1 | FLAME-RETARDANT RUBBER COMPOSITION, RUBBER ARTICLES AND WIRE COVERING MATERIALS | JSR CORP (JP) | 2010-11-24 | — | — | EP | disclosed |
| US-20100279227-A1 | Composition for forming underlayer coating for litography containing epoxy compound and carboxylic acid compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-04 | — | — | US | disclosed |
| US-7816067-B2 | Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-10-19 | — | — | US | disclosed |
| US-7794919-B2 | Composition for forming underlayer coating for lithography containing epoxy compound and carboxylic acid compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-09-14 | — | — | US | disclosed |
| US-7790356-B2 | Condensation type polymer-containing anti-reflective coating for semiconductor | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-09-07 | — | — | US | disclosed |
| CN-101809050-A | Rubbery polymer having low compression set | ELIOKEM | 2010-08-18 | — | — | CN | disclosed |
| US-7756447-B2 | Image forming apparatus and method of preparing toner for use in image forming apparatus | RICOH COMPANY LIMITED (JP) | 2010-07-13 | — | — | US | disclosed |
| EP-2201852-A1 | Chemical resistant glove | SHOWA GLOVE Co. (JP) | 2010-06-30 | — | — | EP | disclosed |
| US-20100160505-A1 | Resin composition and molded article made thereof | TORAY INDUSTRIES, INC. (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20100150606-A1 | METHOD OF MANUFACTURING IMAGE BEARING MEMBER, IMAGE BEARING MEMBER, AND IMAGE FORMING APPARATUS | RICOH COMPANY, LTD. (JP) | 2010-06-17 | — | — | US | disclosed |
| US-7736822-B2 | Resist underlayer coating forming composition for mask blank, mask blank and mask | HOYA CORPORATION (JP) | 2010-06-15 | — | — | US | disclosed |
| US-20100138978-A1 | CHEMICAL RESISTANT GLOVE | SHOWA GLOVE CO. (JP) | 2010-06-10 | — | — | US | disclosed |
| US-7729634-B2 | Image forming apparatus, image forming method, and process cartridge | RICOH COMPANY, LTD. (JP) | 2010-06-01 | — | — | US | disclosed |
| US-7727902-B2 | Composition for forming nitride coating film for hard mask | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-06-01 | — | — | US | disclosed |
| US-20100119964-A1 | Electrophotographic photoreceptor, image forming method, image forming apparatus, and process cartridge | RICOH COMPANY, LTD. | 2010-05-13 | — | — | US | disclosed |
| US-20100113664-A1 | Asymmetric Cyclic Diester Compounds | FERRO CORPORATION (US) | 2010-05-06 | — | — | US | disclosed |
| US-7702257-B2 | Image forming apparatus with image bearing member having a lubricant | RICOH COMPANY LIMITED (JP) | 2010-04-20 | — | — | US | disclosed |
| EP-1703328-B1 | COMPOSITION FOR FORMING NITRIDE COATING FILM FOR HARD MASK | NISSAN CHEMICAL IND LTD (JP) | 2010-04-14 | — | — | EP | disclosed |
| US-20100081081-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR ELECTRON BEAM LITHOGRAPHY | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-04-01 | — | — | US | disclosed |
| US-20100072416-A1 | HEAT-DISSIPATING RESIN COMPOSITION, SUBSTRATE FOR LED MOUNTING, REFLECTOR, AND SUBSTRATE FOR LED MOUNTING HAVING REFLECTOR PORTION | TECHNO POLYMER CO. LTD (JP) | 2010-03-25 | — | — | US | disclosed |
| EP-1205808-B1 | Electrophotographic photoreceptor and method of preparation thereof and image forming method and apparatus using the photoreceptor | RICOH KK (JP) | 2010-03-17 | — | — | EP | disclosed |
| US-20100022090-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, CONTAINING AROMATIC FUSED RING-CONTAINING RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-01-28 | — | — | US | disclosed |
| US-20100022089-A1 | Method for manufacturing semiconductor device using quadruple-layer laminate | NISSIAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-01-28 | — | — | US | disclosed |
| US-20100022092-A1 | Method of producing semiconductor device using resist underlayer film by photo-crosslinking curing | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-01-28 | — | — | US | disclosed |
| US-20100015538-A1 | ELECTROPHOTOGRAPHIC PHOTOCONDUCTOR, IMAGE FORMING APPARATUS USING THE SAME, AND PROCESS CARTRIDGE | RICOH COMPANY, LTD. (JP) | 2010-01-21 | — | — | US | disclosed |
| EP-2146251-A1 | Electrophotographic photoconductor, image forming apparatus using the same, and process cartridge | Ricoh Company, Ltd. (JP) | 2010-01-20 | — | — | EP | disclosed |
| CN-101624506-A | Preparation method of adhesive mixture | HUNAN ZHONGTAI SPECIAL EQUIPME | 2010-01-13 | — | — | CN | disclosed |
| EP-1560070-B1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2009-12-30 | — | — | EP | disclosed |
| EP-1898262-B1 | Electrophotographic photoconductor and method for producing the same, image forming apparatus, and process cartridge | RICOH KK (JP) | 2009-12-30 | — | — | EP | disclosed |
| US-20090311624-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LIQUID ADDITIVE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-12-17 | — | — | US | disclosed |
| US-20090312470-A1 | Asymmetric Cyclic Diester Compounds | FERRO CORPORATION (US) | 2009-12-17 | — | — | US | disclosed |
| CN-101605828-A | Oil-proofness rubber with the method for making of polymkeric substance, oil-proofness rubber with polymkeric substance, oil-resistant weather-resistant rubber with composition and rubber-moulding body | JSR CORP (JP) | 2009-12-16 | — | — | CN | disclosed |
| US-7632626-B2 | a polyester copolymer of fumaric acid and a diglycidyl ether with backbone of groups selected from substituted or unsubstituted alkylene, phenylene, napthylene, anthrylene, phthalic acid, triazinetrione etc. 1,3,4,6-tetrakis(methtoxymethyl)glycoluril crosslinker, a sulfonium or iodonium acid generator | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-12-15 | — | — | US | disclosed |
| EP-1398352-B1 | MODIFIER FOR THERMOPLASTIC RESIN AND THERMOPLASTIC RESIN COMPOSITION CONTAINING THE SAME | MITSUBISHI RAYON CO (JP) | 2009-12-02 | — | — | EP | disclosed |
| EP-2120095-A1 | RESIST LOWER LAYER FILM FORMING COMPOSITION FOR ELECTRON LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2009-11-18 | — | — | EP | disclosed |
| US-7608139-B2 | Erasable image forming material | KABUSHIKI KAISHA TOSHIBA (JP) | 2009-10-27 | — | — | US | disclosed |
| US-20090253076-A1 | Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-10-08 | — | — | US | disclosed |
| US-20090247705-A1 | RUBBER COMPOSITION, CROSSLINKED RUBBER AND MOLDED ARTICLE | JSR CORPORATION (JP) | 2009-10-01 | — | — | US | disclosed |
| US-20090217759-A1 | Method of Determining Sublimate in Thermoset Film with Qcm Sensor | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-09-03 | — | — | US | disclosed |
| CN-101506736-A | Resist underlayer film forming composition containing liquid additive | NISSAN CHEMICAL IND LTD (JP) | 2009-08-12 | — | — | CN | disclosed |
| EP-2085823-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING QUADRUPLE-LAYER LAMINATE | Nissan Chemical Industries, Ltd. (JP) | 2009-08-05 | — | — | EP | disclosed |
| EP-2085822-A1 | PROCESS FOR SEMICONDUCTOR DEVICE PRODUCTION USING UNDER-RESIST FILM CURED BY PHOTOCROSSLINKING | NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) | 2009-08-05 | — | — | EP | disclosed |
| EP-1211565-B1 | Electrophotographic photoconductor, method of manufacturing same and image forming method, image forming apparatus and process cartridge using same | RICOH KK (JP) | 2009-07-29 | — | — | EP | disclosed |
| US-20090180788-A1 | Image forming apparatus, and image forming method | RICOH COMPANY, LTD. (JP) | 2009-07-16 | — | — | US | disclosed |
| EP-2078988-A2 | Image forming apparatus and image forming method | Ricoh Company, Ltd. (JP) | 2009-07-15 | — | — | EP | disclosed |
| EP-2078736-A1 | HEAT-DISSIPATING RESIN COMPOSITION, SUBSTRATE FOR LED MOUNTING, REFLECTOR, AND SUBSTRATE FOR LED MOUNTING HAVING REFLECTOR PORTION | Techno Polymer Co., Ltd. (JP) | 2009-07-15 | — | — | EP | disclosed |
| US-7550536-B2 | Acrylic rubber, process for its production, and rubber compositions, oil-and weather-resistant rubber compositions, and oil-and weather -resistant rubbers, containing the same | JSR CORPORATION (JP) | 2009-06-23 | — | — | US | disclosed |
| US-7550541-B2 | Resin composition and molded article, film and fiber each comprising the same | TORAY INDUSTRIES, INC. (JP) | 2009-06-23 | — | — | US | disclosed |
| EP-1469018-B1 | ACRYLIC RUBBER, PROCESS FOR ITS PRODUCTION, AND RUBBER COMPOSITIONS, OIL- AND WEATHER-RESISTANT RUBBER COMPOSITIONS, AND OIL- AND WEATHER-RESISTANT RUBBERS, CONTAINING THE SAME | JSR CORP (JP) | 2009-06-10 | — | — | EP | disclosed |
| US-20090142101-A1 | IMAGE FORMING APPARATUS HAVING A LUBRICANT | KOSUGE AKIO | 2009-06-04 | — | — | US | disclosed |
| US-7534174-B2 | Rubber compositions comprising high levels of oily substance and the use thereof in golf balls | ACUSHNET COMPANY (US) | 2009-05-19 | — | — | US | disclosed |
| EP-1681594-B1 | COMPOSITION FOR FORMING UNDERLYING FILM CONTAINING DEXTRIN ESTER COMPOUND | NISSAN CHEMICAL IND LTD (JP) | 2009-05-13 | — | — | EP | disclosed |
| US-7531586-B2 | Plasticized polyurethanes for use in golf balls | ACUSHNET COMPANY (US) | 2009-05-12 | — | — | US | disclosed |
| US-20090117493-A1 | Anti-Reflective Coating Forming Composition Containing Reaction Product of Isocyanuric Acid Compound with Benzoic Acid Compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-05-07 | — | — | US | disclosed |
| CN-101415767-A | Rubber composition, crosslinked rubber and molded article | JSR CORP (JP) | 2009-04-22 | — | — | CN | disclosed |
| US-7517633-B2 | Composition for forming gap-filling material for lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-04-14 | — | — | US | disclosed |
| EP-1426822-B1 | COMPOSITION FOR FORMING ANTIREFLECTIVE FILM FOR USE IN LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2009-04-08 | — | — | EP | disclosed |
| US-20090068577-A1 | NAPHTHALENETETRACARBOXYLIC ACID DIIMIDE DERIVATIVE AND ELECTROPHOTOGRAPHIC PHOTOCONDUCTOR HAVING THE SAME | RICOH COMPANY, LTD. (JP) | 2009-03-12 | — | — | US | disclosed |
| EP-2033961-A1 | Naphthalenetetracarboxylic acid diimide derivative and electrophotographic photoconductor having the same | Ricoh Company, Ltd. (JP) | 2009-03-11 | — | — | EP | disclosed |
| US-7501229-B2 | Anti-reflective coating containing sulfur atom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-03-10 | — | — | US | disclosed |
| US-20090053647-A1 | Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-02-26 | — | — | US | disclosed |
| US-7496324-B2 | Lubricant applying unit and image forming apparatus | RICOH COMPANY, LTD. (JP) | 2009-02-24 | — | — | US | disclosed |
| US-20090035017-A1 | ELECTROPHOTOGRAPHIC PHOTOCONDUCTOR AND METHOD FOR PRODUCING THE SAME, IMAGE FORMING APPARATUS, AND PROCESS CARTRIDGE | RICOH COMPANY, LTD. (JP) | 2009-02-05 | — | — | US | disclosed |
| EP-2000856-A1 | Electrophotographic photoreceptor, image forming apparatus, and process cartridge | Ricoh Company, Ltd. (JP) | 2008-12-10 | — | — | EP | disclosed |
| US-20080298840-A1 | ELECTROPHOTOGRAPHIC PHOTORECEPTOR, IMAGE FORMING APPARATUS, AND PROCESS CARTRIDGE | RICOH COMPANY LIMITED (JP) | 2008-12-04 | — | — | US | disclosed |
| EP-1256850-B1 | Electrophotographic photoreceptor, method for manufacturing the electrophotographic photoreceptor and image forming apparatus using the electrophotographic photoreceptor | RICOH KK (JP) | 2008-11-26 | — | — | EP | disclosed |
| EP-1990361-A1 | RUBBER COMPOSITION, CROSSLINKED RUBBER AND MOLDED ARTICLE | JSR Corporation (JP) | 2008-11-12 | — | — | EP | disclosed |
| US-20080268379-A1 | a polyester copolymer of fumaric acid and a diglycidyl ether with backbone of groups selected from substituted or unsubstituted alkylene, phenylene, napthylene, anthrylene, phthalic acid, triazinetrione etc. 1,3,4,6-tetrakis(methtoxymethyl)glycoluril crosslinker, a sulfonium or iodonium acid generator | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-10-30 | — | — | US | disclosed |
| US-20080262151-A1 | Resin Composition and Molded Article Comprising the Same | TORAY INDUSTRIES, INC. (JP) | 2008-10-23 | — | — | US | disclosed |
| EP-1521124-B1 | Electrophotographic photoreceptor, method of manufacturing electrophotographic photoreceptor, and electrophotographic apparatus and process cartridge using electrophotographic photoreceptor | RICOH KK (JP) | 2008-10-08 | — | — | EP | disclosed |
| US-20080227007-A1 | Image forming apparatus and process cartridge | RICOH COMPANY, LTD. | 2008-09-18 | — | — | US | disclosed |
| US-7425403-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-09-16 | — | — | US | disclosed |
| US-7425347-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD (JP) | 2008-09-16 | — | — | US | disclosed |
| US-7425399-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-09-16 | — | — | US | disclosed |
| US-20080219694-A1 | IMAGE FORMING APPARATUS, IMAGE FORMING METHOD, AND PROCESS CARTRIDGE | RICOH COMPANY, LTD. (JP) | 2008-09-11 | — | — | US | disclosed |
| US-20080206680-A1 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20080199217-A1 | ELECTROPHOTOGRAPHIC PHOTOCONDUCTOR, ELECTROPHOTOGRAPHIC PROCESS CARTRIDGE INCORPORATING THE SAME, AND IMAGE FORMING APPARATUS INCORPORATING THE SAME | RICOH COMPANY, LTD. (JP) | 2008-08-21 | — | — | US | disclosed |
| US-20080167142-A1 | Rubber Compositions Comprising High Levels of Oily Substance and the Use Thereof in Golf Balls | JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT | 2008-07-10 | — | — | US | disclosed |
| EP-1939688-A1 | COMPOSITION FOR ANTIREFLECTION FILM FORMATION, COMPRISING PRODUCT OF REACTION BETWEEN ISOCYANURIC ACID COMPOUND AND BENZOIC ACID COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2008-07-02 | — | — | EP | disclosed |
| US-7381511-B2 | Photoreceptor, image forming method and image forming apparatus using the photoreceptor, process cartridge using the photoreceptor and coating liquid for the photoreceptor | RICOH COMPANY, LTD. (JP) | 2008-06-03 | — | — | US | disclosed |
| US-20080112742-A1 | IMAGE FORMING APPARATUS, IMAGE FORMING METHOD, AND PROCESS CARTRIDGE | RICOH COMPANY, LTD. (JP) | 2008-05-15 | — | — | US | disclosed |
| US-20080113285-A1 | IMAGE FORMING APPARATUS, IMAGE FORMING METHOD, AND PROCESS CARTRIDGE | RICOH COMPANY, LTD. (JP) | 2008-05-15 | — | — | US | disclosed |
| EP-1921515-A1 | Image forming apparatus, image forming method, and process cartridge | RICOH Co., Ltd. (JP) | 2008-05-14 | — | — | EP | disclosed |
| EP-1921507-A2 | Image forming apparatus, image forming method, and process cartridge | Ricoh Company, Ltd. (JP) | 2008-05-14 | — | — | EP | disclosed |
| US-20080107997-A1 | Anti-Reflective Coating Containing Sulfur Atom | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 2008-05-08 | — | — | US | disclosed |
| US-7369807-B2 | Cleaner, and process cartridge and image forming apparatus using the cleaner | RICOH COMPANY, LIMITED (JP) | 2008-05-06 | — | — | US | disclosed |
| US-7365023-B2 | Porous underlayer coating and underlayer coating forming composition for forming porous underlayer coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-04-29 | — | — | US | disclosed |
| US-7361718-B2 | Alkali-soluble gap fill material forming composition for lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-04-22 | — | — | US | disclosed |
| EP-1911807-A1 | RESIN COMPOSITION AND MOLDED ARTICLE COMPRISING THE SAME | TORAY INDUSTRIES, INC. (JP) | 2008-04-16 | — | — | EP | disclosed |
| CN-100381496-C | Oil-resistant and weather-resistant rubber composition and molded article using same | JSR CORP (JP) | 2008-04-16 | — | — | CN | disclosed |
| EP-1556896-B1 | ANTI-REFLECTIVE COMPOSITIONS COMPRISING TRIAZINE COMPOUNDS | BREWER SCIENCE INC (US) | 2008-04-09 | — | — | EP | disclosed |
| US-7351165-B2 | Rubber compositions comprising high levels of oily substance and the use thereof in golf balls | ACUSHNET COMPANY (US) | 2008-04-01 | — | — | US | disclosed |
| EP-1902852-A1 | Erasable image forming material | Kabushiki Kaisha Toshiba (JP) | 2008-03-26 | — | — | EP | disclosed |
| US-20080070781-A1 | Erasable image forming material | KABUSHIKI KAISHA TOSHIBA | 2008-03-20 | — | — | US | disclosed |
| EP-1898262-A1 | Electrophotographic photoconductor and method for producing the same, image forming apparatus, and process cartridge | Ricoh Company, Ltd. (JP) | 2008-03-12 | — | — | EP | disclosed |
| US-7341810-B2 | Electrophotographic photoreceptor method of manufacturing electrophotographic photoreceptor, and electrophotographic apparatus and process cartridge using electrophotographic photoreceptor | RICOH COMPANY, LTD. (JP) | 2008-03-11 | — | — | US | disclosed |
| US-7341814-B2 | Electrophotographic photoconductor, preparation method thereof, electrophotographic apparatus and process cartridge | RICOH COMPANY, LTD. (JP) | 2008-03-11 | — | — | US | disclosed |
| US-7332266-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-02-19 | — | — | US | disclosed |
| US-20080038678-A1 | Condensation Type Polymer-Containing Anti-Reflective Coating For Semiconductor | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 2008-02-14 | — | — | US | disclosed |
| US-7326509-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-02-05 | — | — | US | disclosed |
| US-20080013986-A1 | IMAGE FORMING APPARATUS HAVING A DETACHABLE PROCESS CARTRIDGE AND A LUBRICANT | KOSUGE AKIO | 2008-01-17 | — | — | US | disclosed |
| EP-1876495-A1 | COMPOSITION COMPRISING POLYMER HAVING ETHYLENE-DICARBONYL STRUCTURE FOR USE IN FORMING ANTI-REFLECTIVE COATING FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2008-01-09 | — | — | EP | disclosed |
| EP-1204004-B1 | Electrophotographic photoreceptor, method for manufacturing the photoreceptor, and image forming method and apparatus using the photoreceptor | RICOH KK (JP) | 2008-01-02 | — | — | EP | disclosed |
| US-7309560-B2 | Composition for forming anti-reflective coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-12-18 | — | — | US | disclosed |
| US-20070287083-A1 | ELECTROPHOTOGRAPHIC PHOTORECEPTOR AND METHOD OF PREPARING THE PHOTORECEPTOR, AND IMAGE FORMING APPARATUS, IMAGE FORMING METHOD AND PROCESS CARTRIDGE USING THE PHOTORECEPTOR | RICOH COMPANY LTD. (JP) | 2007-12-13 | — | — | US | disclosed |
| US-20070276092-A1 | Thermoplastic Elastomer Composition, Method for Producing Same and Formed Article | JSR CORPORATION (JP) | 2007-11-29 | — | — | US | disclosed |
| US-7302197-B2 | Image forming apparatus having a detachable process cartridge and a lubricant | RICOH COMPANY LIMITED (JP) | 2007-11-27 | — | — | US | disclosed |
| US-20070270241-A1 | Rubber Compositions Comprising High Levels of Oily Substance and the Use Thereof in Golf Balls | JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT | 2007-11-22 | — | — | US | disclosed |
| US-20070269729-A1 | ELECTROPHOTOGRAPHIC PHOTORECEPTOR, AND IMAGE FORMING APPARATUS AND PROCESS CARTRIDGE USING THE ELECTROPHOTOGRAPHIC PHOTORECEPTOR | RICOH COMPANY, LTD. (JP) | 2007-11-22 | — | — | US | disclosed |
| US-20070270239-A1 | Rubber Compositions Comprising High Levels of Oily Substance and the Use Thereof in Golf Balls | ACUSHNET COMPANY | 2007-11-22 | — | — | US | disclosed |
| US-20070260019-A1 | Resin composition and molded article, film and fiber each comprising the same | TORAY INDUSTRIES, INC. (JP) | 2007-11-08 | — | — | US | disclosed |
| EP-1535960-B1 | Oil resistant and weather resistant rubber composition and molded product using the same | JSR CORP (JP) | 2007-10-24 | — | — | EP | disclosed |
| US-7282529-B2 | Coating liquid for an electrographic photoreceptor and a method of preparation using a ball mill | RICOH COMPANY LIMITED (JP) | 2007-10-16 | — | — | US | disclosed |
| US-20070238029-A1 | Underlayer Coating Forming Composition for Lithography Containing Naphthalene Ring Having Halogen Atom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-10-11 | — | — | US | disclosed |
| CN-100339434-C | Flame-retardant rubber composition, rubber product, and wire covering material | JSR CORP (JP) | 2007-09-26 | — | — | CN | disclosed |
| US-7270924-B2 | Electrophotographic photoreceptor, method for manufacturing the electrophotographic photoreceptor, and image forming apparatus and process cartridge using the electrophotographic photoreceptor | RICOH COMPANY LIMITED (JP) | 2007-09-18 | — | — | US | disclosed |
| US-7270610-B1 | Rubber compositions comprising high levels of oily substance and the use thereof in golf balls | ACUSHNET COMPANY (US) | 2007-09-18 | — | — | US | disclosed |
| US-7268190-B2 | Resin composition comprising polylactic acid and polyacetal and a molded article, film, and fiber each comprising the same | TORAY INDUSTRIES, INC. (JP) | 2007-09-11 | — | — | US | disclosed |
| US-20070190459-A1 | Resist underlayer coating forming composition for mask blank, mask blank and mask | HOYA CORPORATION (JP) | 2007-08-16 | — | — | US | disclosed |
| US-20070148557-A1 | Composition for forming nitride coating film for hard mask | NISSAN CHEMICAL INDUSTRIES, LT. (JP) | 2007-06-28 | — | — | US | disclosed |
| US-20070135581-A1 | Underlayer coating forming composition containing dextrin ester compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-06-14 | — | — | US | disclosed |
| CN-1321157-C | Modifier for thermoplastic resin and thermoplastic resin composition containing the same | MITSUBISHI RAYON CO (JP) | 2007-06-13 | — | — | CN | disclosed |
| EP-1792941-A1 | RESIN COMPOSITION AND MOLDED ARTICLE COMPRISING THE SAME | TORAY INDUSTRIES, INC. (JP) | 2007-06-06 | — | — | EP | disclosed |
| US-7226721-B2 | Underlayer coating forming composition for lithography containing compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-06-05 | — | — | US | disclosed |
| US-7220522-B2 | Electrophotographic photoreceptor, method for manufacturing the electrophotographic photoreceptor, and image forming method, image forming apparatus and process cartridge using the electrophotographic photoreceptor | RICOH COMPANY LIMITED (JP) | 2007-05-22 | — | — | US | disclosed |
| EP-1556896-A4 | ANTI-REFLECTIVE COMPOSITIONS COMPRISING TRIAZINE COMPOUNDS | BREWER SCIENCE INC (US) | 2007-05-09 | — | — | EP | disclosed |
| EP-1780600-A1 | LOWER LAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY INCLUDING NAPHTHALENE RING HAVING HALOGEN ATOM | Nissan Chemical Industries, Ltd. (JP) | 2007-05-02 | — | — | EP | disclosed |
| CN-1312200-C | Sheet-like window member and window structure | TEIJIN CHEMICALS LTD (JP) | 2007-04-25 | — | — | CN | disclosed |
| US-20070088113-A1 | Resin composite material and electronic device component | FUJIFILM CORPORATION | 2007-04-19 | — | — | US | disclosed |
| US-7189487-B2 | Electrophotographic photoreceptor, and electrophotographic apparatus, process cartridge and method using the photoreceptor | RICOH COMPANY, LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-7186490-B1 | Photosensitive material, electrophotographic photoreceptor using the material, and electrophotographic image forming method and apparatus using the photoreceptor | RICOH COMPANY, LTD. (JP) | 2007-03-06 | — | — | US | disclosed |
| EP-1757985-A1 | ANTIREFLECTIVE FILM CONTAINING SULFUR ATOM | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| EP-1757986-A1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| CN-1906246-A | Thermoplastic elastomer composition, method for producing same and formed article | JSR CORP (JP) | 2007-01-31 | — | — | CN | disclosed |
| US-20060290429-A1 | Composition form forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-12-28 | — | — | US | disclosed |
| US-20060287433-A1 | Thermoplastic elastomer composition and molding thereof | JSR CORPORATION (JP) | 2006-12-21 | — | — | US | disclosed |
| US-20060276582-A1 | Member for electronic device | FUJI PHOTO FILM CO., LTD. | 2006-12-07 | — | — | US | disclosed |
| US-20060270779-A1 | Transparent member for electronic device | FUJI PHOTO FILM CO., LTD. | 2006-11-30 | — | — | US | disclosed |
| US-7139517-B2 | Developing method for an image forming apparatus and developing device using the same | RICOH COMPANY, LTD. (JP) | 2006-11-21 | — | — | US | disclosed |
| US-7127196-B2 | Electrophotographic photoreceptor, method for manufacturing the electrophotographic photoreceptor and image forming apparatus using the electrophotographic photoreceptor | RICOH COMPANY, LTD. (JP) | 2006-10-24 | — | — | US | disclosed |
| US-20060234156-A1 | Composition for formation of underlayer film for lithography containing epoxy compound and carboxylic acid compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20060216652-A1 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-28 | — | — | US | disclosed |
| US-7112392-B2 | Electrophotographic photoreceptor, and image forming method, image forming apparatus and process cartridge for image forming apparatus using the electrophotographic photoreceptor | RICOH COMPANY, LTD. (JP) | 2006-09-26 | — | — | US | disclosed |
| US-20060211256-A1 | Porous underlayer film and underlayer film forming composition used for forming the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| US-20060210915-A1 | Composition for forming lower layer film for lithography comprising compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| US-20060210908-A1 | Image forming method, image forming apparatus, and process cartridge | RICOH COMPANY, LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-1703328-A1 | COMPOSITION FOR FORMING NITRIDE COATING FILM FOR HARD MASK | Nissan Chemical Industries, Ltd. (JP) | 2006-09-20 | — | — | EP | disclosed |
| EP-1698661-A1 | THERMOPLASTIC ELASTOMER COMPOSITION, METHOD FOR PRODUCING SAME AND FORMED ARTICLE | JSR Corporation (JP) | 2006-09-06 | — | — | EP | disclosed |
| EP-1683832-A1 | THERMOPLASTIC ELASTOMER COMPOSITION AND MOLDING THEREOF | JSR Corporation (JP) | 2006-07-26 | — | — | EP | disclosed |
| US-20060160936-A1 | PLASTICIZED POLYURETHANES FOR USE IN GOLF BALLS | JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT | 2006-07-20 | — | — | US | disclosed |
| EP-1681594-A1 | COMPOSITION FOR FORMING UNDERLYING FILM CONTAINING DEXTRIN ESTER COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2006-07-19 | — | — | EP | disclosed |
| US-20060133872-A1 | Lubricant applying unit and image forming apparatus | RICOH COMPANY, LTD. (JP) | 2006-06-22 | — | — | US | disclosed |
| EP-1184736-B1 | Electrophotographic image forming apparatus with a proximity charging roller | RICOH KK (JP) | 2006-06-21 | — | — | EP | disclosed |
| US-7060404-B2 | Electrophotographic photoreceptor, method for manufacturing the electrophotographic photoreceptor and image forming apparatus using the electrophotographic photoreceptor | RICOH COMPANY, LTD. (JP) | 2006-06-13 | — | — | US | disclosed |
| EP-1662769-A1 | COMPOSITION FOR FORMING LOWER LAYER FILM FOR LITHOGRAPHY COMPRISING COMPOUND HAVING PROTECTED CARBOXYL GROUP | Nissan Chemical Industries, Ltd. (JP) | 2006-05-31 | — | — | EP | disclosed |
| US-7053142-B2 | Plasticized polyurethanes for use in golf balls | ACUSHNET COMPANY (US) | 2006-05-30 | — | — | US | disclosed |
| US-20060111504-A1 | Flame retardant rubber composition, rubber articles and wire covering materials | JSR CORPORATION (JP) | 2006-05-25 | — | — | US | disclosed |
| US-7038328-B2 | Anti-reflective compositions comprising triazine compounds | BREWER SCIENCE INC. (US) | 2006-05-02 | — | — | US | disclosed |
| US-7027760-B2 | Developing method for an image forming apparatus and developing device using the same | RICOH COMPANY, LTD. (JP) | 2006-04-11 | — | — | US | disclosed |
| US-20060068526-A1 | Acrylic polymer-containing gap filler forming composition for lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-03-30 | — | — | US | disclosed |
| US-7018755-B2 | Electrophotographic photoconductor, electrophotography method using the same, electrophotographic apparatus, electrographic apparatus process cartridge and electrophotographic photoconductor outermost surface layer coating solution | RICOH COMPANY, LTD. (JP) | 2006-03-28 | — | — | US | disclosed |
| CN-1747999-A | Flame-retardant rubber composition, rubber product, and wire covering material | JSR CORP (JP) | 2006-03-15 | — | — | CN | disclosed |
| US-20060040192-A1 | Producing high quality images without producing ozone and nitrogen oxides when charged, and which is uniformly charged and has an efficient charge transport. | IKUNO HIROSHI | 2006-02-23 | — | — | US | disclosed |
| US-20060041078-A1 | Alkali-soluble gap filling material forming composition for lithography | NISSAN CHEMICAL INDUSTRIES, LTD | 2006-02-23 | — | — | US | disclosed |
| US-6998209-B2 | Electrophotographic photoreceptor, and electrophotographic apparatus, process cartridge and method using the photoreceptor | RICOH COMPANY, LTD. (JP) | 2006-02-14 | — | — | US | disclosed |
| EP-1619555-A1 | POROUS UNDERLAYER FILM AND UNDERLAYER FILM FORMING COMPOSITION USED FOR FORMING THE SAME | Nissan Chemical Industries, Ltd. (JP) | 2006-01-25 | — | — | EP | disclosed |
| EP-1617289-A1 | COMPOSITION FOR FORMATION OF UNDERLAYER FILM FOR LITHOGRAPHY CONTAINING EPOXY COMPOUND AND CARBOXYLIC ACID COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2006-01-18 | — | — | EP | disclosed |
| US-20050271427-A1 | Developing method for an image forming apparatus and developing device using the same | ENOKI SHIGEKAZU | 2005-12-08 | — | — | US | disclosed |
| US-20050272843-A1 | Aliphatic polyester resin composition | 3M INNOVATIVE PROEPRTIES COMPANY | 2005-12-08 | — | — | US | disclosed |
| EP-1598703-A1 | ACRYLIC POLYMER-CONTAINING GAP FILLER FORMING COMPOSITION FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2005-11-23 | — | — | EP | disclosed |
| CN-1701088-A | Sheet-like window member and window structure | TEIJIN CHEMICALS LTD (JP) | 2005-11-23 | — | — | CN | disclosed |
| US-20050254868-A1 | Cleaner, and process cartridge and image forming apparatus using the cleaner | RICOH COMPANY LIMITED (JP) | 2005-11-17 | — | — | US | disclosed |
| EP-1237042-B1 | Bottom anti-reflective coat forming composition for lithography | NISSAN CHEMICAL IND LTD (JP) | 2005-11-09 | — | — | EP | disclosed |
| EP-1591483-A1 | FLAME-RETARDANT RUBBER COMPOSITION, RUBBER ARTICLES AND WIRE COVERING MATERIALS | JSR Corporation (JP) | 2005-11-02 | — | — | EP | disclosed |
| EP-1586945-A1 | ALKALI-SOLUBLE GAP FILLING MATERIAL FORMING COMPOSITION FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2005-10-19 | — | — | EP | disclosed |
| US-20050227786-A1 | Golf ball with velocity reduced layer | ACUSHNET COMPANY | 2005-10-13 | — | — | US | disclosed |
| EP-1572795-A1 | ALIPHATIC POLYESTER RESIN COMPOSITION | 3M Innovative Properties Company (US) | 2005-09-14 | — | — | EP | disclosed |
| US-20050181291-A1 | Electrophotographic photoconductor, preparation method thereof, electrophotographic apparatus and process cartridge | RICOH COMPANY, LTD. (JP) | 2005-08-18 | — | — | US | disclosed |
| US-20050175927-A1 | Composition for antireflection film formation | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-08-11 | — | — | US | disclosed |
| US-6927266-B2 | Bottom anti-reflective coat forming composition for lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-08-09 | — | — | US | disclosed |
| EP-1560070-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2005-08-03 | — | — | EP | disclosed |
| EP-1403722-B1 | Electrophotographic photoconductor, electrophotography method, electrophotographic apparatus, eletrophotographic apparatus process cartridge using a specific outermost surface layer coating solution for the photoconductor | RICOH KK (JP) | 2005-08-03 | — | — | EP | disclosed |
| US-20050165191-A1 | Acrylic rubber, process for its production, and rubber compositions, oil-and weather-resistant rubber compositions, and oil-and weather -resistant rubbers, containing the same | JSR CORPORATION (JP) | 2005-07-28 | — | — | US | disclosed |
| EP-1556896-A2 | ANTI-REFLECTIVE COMPOSITIONS COMPRISING TRIAZINE COMPOUNDS | Brewer Science, Inc. (US) | 2005-07-27 | — | — | EP | disclosed |
| CN-1637065-A | Oil-resistant and weather-resistant rubber composition and molded article using same | JSR CORP (JP) | 2005-07-13 | — | — | CN | disclosed |
| US-20050137030-A1 | Plasticized polyurethanes for use in golf balls | JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT | 2005-06-23 | — | — | US | disclosed |
| US-20050131156-A1 | Oil resistant and weather resistant rubber composition and molded product using the same | JSR CORPORATION (JP) | 2005-06-16 | — | — | US | disclosed |
| EP-1542075-A1 | COMPOSITION FOR ANTIREFLECTION FILM FORMATION | Nissan Chemical Industries, Ltd. (JP) | 2005-06-15 | — | — | EP | disclosed |
| US-6902858-B2 | Image formation apparatus using a dry two-component developer for development | RICOH COMPANY, LTD. (JP) | 2005-06-07 | — | — | US | disclosed |
| US-6902857-B2 | Method for forming electrophotographic image and electrographic device | RICOH COMPANY, LTD. (JP) | 2005-06-07 | — | — | US | disclosed |
| US-20050118749-A1 | Composition for forming anti-reflective coating | NISSAN CHEMICAL INDUSTRIES (JP) | 2005-06-02 | — | — | US | disclosed |
| EP-1535960-A1 | Oil resistant and weather resistant rubber composition and molded product using the same | JSR Corporation (JP) | 2005-06-01 | — | — | EP | disclosed |
| US-6899983-B2 | Electrophotographic photoconductor, electrophotographic apparatus and process cartridge | RICOH COMPANY, LTD. (JP) | 2005-05-31 | — | — | US | disclosed |
| US-20050106482-A1 | Electrophotographic photoreceptor, method for manufacturing the electrophotographic photoreceptor and image forming apparatus using the electrophotographic photoreceptor | KAMI HIDETOSHI (JP) | 2005-05-19 | — | — | US | disclosed |
| US-20050100804-A1 | Durable photoreceptor; accuract images; stable potentials; multilayer; electroconductive substrate overcoated with photosensitive layer and protective coatings; mixture of fillers, acid compound, binder resin in solvent | TAMOTO NOZOMU (JP) | 2005-05-12 | — | — | US | disclosed |
| EP-1195648-B1 | Electrophotographic photoreceptor, and image forming method and apparatus using the photoreceptor | RICOH KK (JP) | 2005-04-13 | — | — | EP | disclosed |
| EP-1521124-A1 | Electrophotographic photoreceptor, method of manufacturing electrophotographic photoreceptor, and electrophotographic apparatus and process cartridge using electrophotographic photoreceptor | Ricoh Company, Ltd. (JP) | 2005-04-06 | — | — | EP | disclosed |
| US-20050058918-A1 | Electrophotographic photoreceptor method of manufacturing electrophotographic photoreceptor, and electrophotographic apparatus and process cartridge using electrophotographic photoreceptor | RICOH COMPANY, LIMITED (JP) | 2005-03-17 | — | — | US | disclosed |
| US-20050047804-A1 | Image forming apparatus and process cartridge | RICOH COMPANY LIMITED (JP) | 2005-03-03 | — | — | US | disclosed |
| EP-1510879-A1 | Image forming apparatus and process cartridge | Ricoh Company (JP) | 2005-03-02 | — | — | EP | disclosed |
| US-6861188-B2 | Electrophotographic photoreceptor, and image forming method, image forming apparatus and process cartridge therefor using the photoreceptor | RICOH COMPANY LIMITED (JP) | 2005-03-01 | — | — | US | disclosed |
| US-6858362-B2 | Electrophotographic photoreceptor, and image forming method and apparatus using the photoreceptor | RICOH COMPANY, LTD. (JP) | 2005-02-22 | — | — | US | disclosed |
| US-6853823-B2 | Electrophotographic photoreceptor and image forming apparatus using the photoreceptor | RICOH COMPANY LTD. (JP) | 2005-02-08 | — | — | US | disclosed |
| US-20050026058-A1 | Electrophotographic photoreceptor, and electrophotographic image forming apparatus and process cartridge using the electrophotographic photoreceptor | RICOH COMPANY, LIMITED (JP) | 2005-02-03 | — | — | US | disclosed |
| US-6849675-B2 | Golf ball comprising a plasticized polyurethane | ACUSHNET COMPANY (US) | 2005-02-01 | — | — | US | disclosed |
| US-6844124-B2 | Electrophotographic photoreceptor, method for manufacturing the photoreceptor, and image forming method and apparatus using the photoreceptor | RICOH COMPANY LIMITED (JP) | 2005-01-18 | — | — | US | disclosed |
| US-20050008957-A1 | Photoreceptor, image forming method and image forming apparatus using the photoreceptor, process cartridge using the photoreceptor and coating liquid for the photoreceptor | RICOH COMPANY LTD. (JP) | 2005-01-13 | — | — | US | disclosed |
| US-20050008964-A1 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-01-13 | — | — | US | disclosed |
| EP-1484647-A2 | Photoreceptor, image forming method and image forming apparatus using the photoreceptor, process cartridge using the photoceptor and coating liquid for the photoceptor | Ricoh Company (JP) | 2004-12-08 | — | — | EP | disclosed |
| EP-1484645-A1 | COMPOSITION FOR FORMING ANTI-REFLECTION COATING | Nissan Chemical Industries, Ltd. (JP) | 2004-12-08 | — | — | EP | disclosed |
| US-20040242803-A1 | Resin composition and molded article, film, and fiber each comprising the same | TORAY INDUSTRIES, INC. (JP) | 2004-12-02 | — | — | US | disclosed |
| EP-0814125-B1 | Resin composition | KURARAY CO (JP) | 2004-11-24 | — | — | EP | disclosed |
| US-6818388-B2 | Silver halide color photographic photosensitive material and process for forming color image | FUJI PHOTO FILM CO., LTD. (JP) | 2004-11-16 | — | — | US | disclosed |
| US-6815041-B2 | Three dimensional welding rod and surface covering | AWI LICENSING COMPANY | 2004-11-09 | — | — | US | disclosed |
| EP-1469018-A1 | ACRYLIC RUBBER, PROCESS FOR ITS PRODUCTION, AND RUBBER COMPOSITIONS, OIL- AND WEATHER-RESISTANT RUBBER COMPOSITIONS, AND OIL- AND WEATHER-RESISTANT RUBBERS, CONTAINING THE SAME | JSR Corporation (JP) | 2004-10-20 | — | — | EP | disclosed |
| US-6803162-B2 | ROTATING MEMBER FORMING GAP CONTACTING CHARGING ROLLS FOR PHOTORECEPTOR; PHOTOSENSITIVER OVERCOATING ELECTROCONDUCTIVE SUBSTRATE | RICOH COMPANY, LTD. (JP) | 2004-10-12 | — | — | US | disclosed |
| US-20040197709-A1 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-10-07 | — | — | US | disclosed |
| US-20040197688-A1 | Electrophotographic photoreceptor, and image forming method and apparatus using the photoreceptor | TAMOTO NOZOMU (JP) | 2004-10-07 | — | — | US | disclosed |
| US-20040185358-A1 | Electrophotographic photoreceptor, method for manufacturing the electrophotographic photoreceptor, and image forming apparatus and process cartridge using the electrophotographic photoreceptor | RICOH COMPANY LIMITED (JP) | 2004-09-23 | — | — | US | disclosed |
| US-20040180280-A1 | Electrophotographic photoreceptor, method for manufacturing the electrophotographic photoreceptor, and image forming method, image forming apparatus and process cartridge using the electrophotographic photoreceptor | RICOH COMPANY LIMITED (JP) | 2004-09-16 | — | — | US | disclosed |
| US-20040179861-A1 | Image formation apparatus using a dry two-component developer for development | MOCHIZUKI SATOSHI (JP) | 2004-09-16 | — | — | US | disclosed |
| US-6790572-B2 | DURABLE PHOTORECEPTOR WHICH CAN STABLY PRODUCE HIGH QUALITY IMAGES WITHOUT BLURRING WHILE PREVENTING INCREASE OF RESIDUAL POTENTIAL EVEN WHEN REPEATEDLY USED FOR A LONG PERIOD OF TIME | RICOH COMPANY LIMITED (JP) | 2004-09-14 | — | — | US | disclosed |
| US-20040170911-A1 | Electrophotographic photoreceptor, and image forming method, image forming apparatus and process cartridge for image forming apparatus using the electrophotographic photoreceptor | RICOH COMPANY, LTD. (JP) | 2004-09-02 | — | — | US | disclosed |
| EP-1445282-A1 | RESIN COMPOSITION AND MOLDED ARTICLE FILM AND FIBER EACH COMPRISING THE SAME | TORAY INDUSTRIES, INC. (JP) | 2004-08-11 | — | — | EP | disclosed |
| US-20040143068-A1 | Modifier for thermoplastic resin and thermoplastic resin composition using the same | MITSUBISHI RAYON CO., LTD. (JP) | 2004-07-22 | — | — | US | disclosed |
| US-20040129388-A1 | Non-marring tire lever | BRAZIL BILL THOMAS (US) | 2004-07-08 | — | — | US | disclosed |
| US-20040132899-A1 | Golf ball comprising a plasticized polyurethane | JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT | 2004-07-08 | — | — | US | disclosed |
| WO-2004055104-A1 | ALIPHATIC POLYESTER RESIN COMPOSITION | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2004-07-01 | — | — | WO | disclosed |
| US-20040126689-A1 | Electrophotographic photoreceptor, and image forming method and apparatus using the photoreceptor | TAMOTO NOZOMU (JP) | 2004-07-01 | — | — | US | disclosed |
| US-20040126687-A1 | Electrophotographic photoconductor, electrophotography method using the same, electrophotographic apparatus, electrophotographic apparatus process cartridge and electrophotographic photoconductor outermost surface layer coating solution | RICOH COMPANY, LTD. (JP) | 2004-07-01 | — | — | US | disclosed |
| US-6757507-B2 | RIGID QUANTITY CONTROLLER FACING THE MAGNETIC BODY; DOCTOR GAP | RICOH COMPANY, LTD. (JP) | 2004-06-29 | — | — | US | disclosed |
| CN-1507470-A | Modifier for thermoplastic resin and thermoplastic resin composition using same | 三菱丽阳株式会社 | 2004-06-23 | — | — | CN | disclosed |
| US-20040110096-A1 | Composition for forming antireflection film for lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-06-10 | — | — | US | disclosed |
| EP-1426822-A1 | COMPOSITION FOR FORMING ANTIREFLECTIVE FILM FOR USE IN LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2004-06-09 | — | — | EP | disclosed |
| US-6730741-B1 | VINYL CHLORIDE BASED RESIN COMPOSITION IS PROPOSED IN WHICH A COPOLYMER COMPRISING METHYL METHACRYLATE AND SPECIFIC METHACRYLATE IS BLENDED AS A PROCESSING AID | MITSUBISHI RAYON CO., LTD. (JP) | 2004-05-04 | — | — | US | disclosed |
| WO-2004036311-A2 | ANTI-REFLECTIVE COMPOSITIONS COMPRISING TRIAZINE COMPOUNDS | BREWER SCIENCE, INC. (US) | 2004-04-29 | — | — | WO | disclosed |
| US-20040072420-A1 | Anti-reflective compositions comprising triazine compounds | BREWER SCIENCE, INC | 2004-04-15 | — | — | US | disclosed |
| EP-1403722-A1 | Electrophotographic photoconductor, electrophotography method, electrophotographic apparatus, eletrophotographic apparatus process cartridge using a specific outermost surface layer coating solution for the photoconductor | Ricoh Company (JP) | 2004-03-31 | — | — | EP | disclosed |
| EP-1398352-A1 | MODIFIER FOR THERMOPLASTIC RESIN AND THERMOPLASTIC RESIN COMPOSITION CONTAINING THE SAME | Mitsubishi Rayon Co., Ltd. (JP) | 2004-03-17 | — | — | EP | disclosed |
| US-20040048177-A1 | Electrophotographic photoconductor, electrophotographic apparatus and process cartridge | RICOH COMPANY, LTD. (JP) | 2004-03-11 | — | — | US | disclosed |
| US-20040048178-A1 | Electrophotographic photoreceptor, method for manufacturing the photoreceptor, and image forming method and apparatus using the photoreceptor | IKUNO HIROSHI (JP) | 2004-03-11 | — | — | US | disclosed |
| US-20040048986-A1 | Ethylene-vinyl alcohol copolymer; polyamide; and hydrophobic plasticizer; can form films with gas barrier properties by heat stretching without cracking and local thickness variation. | KURARAY, CO., LTD. (JP) | 2004-03-11 | — | — | US | disclosed |
| EP-1378796-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2004-01-07 | — | — | EP | disclosed |
| US-20030224268-A1 | Electrophotographic photoreceptor, and electrophotographic apparatus, process cartridge and method using the photoreceptor | RICOH COMPANY, LTD. (JP) | 2003-12-04 | — | — | US | disclosed |
| US-6653033-B1 | Multilayers comprising undercoatings, alumina fillers, charge generating and transfer compounds on electroconductive supports used in photo apparatus, copiers, facsimiles or thermal printing | RICOH COMPANY, LTD. (JP) | 2003-11-25 | — | — | US | disclosed |
| US-20030215726-A1 | Electrophotographic photoreceptor and image forming apparatus using the photoreceptor | RICOH COMPANY, LTD. (JP) | 2003-11-20 | — | — | US | disclosed |
| US-6649333-B2 | Whiteness, production stability, performance stability with respect to long-term storage in an unexposed state | FUJI PHOTO FILM CO., LTD. (JP) | 2003-11-18 | — | — | US | disclosed |
| US-6641964-B2 | Surface layer including a filler and a binder resin and the photosensitive layer have a continuous structure; spray coating | RICOH COMPANY LIMITED (JP) | 2003-11-04 | — | — | US | disclosed |
| US-20030194627-A1 | Electrophotographic photoreceptor, and image forming method, image forming apparatus and process cartridge therefor using the photoreceptor | RICOH COMPANY LIMITED (JP) | 2003-10-16 | — | — | US | disclosed |
| US-20030190539-A1 | Electrophotographic image forming apparatus, photoreceptor therefor and method for manufacturing the photoreceptor | RICOH COMPANY, LTD. (JP) | 2003-10-09 | — | — | US | disclosed |
| US-20030185599-A1 | Developing method for an image forming apparatus and developing device using the same | RICOH COMPANY, LTD. (JP) | 2003-10-02 | — | — | US | disclosed |
| US-20030146416-A1 | Lithographic gap-filler forming composition | NISSAN CHEMICAL INDUSTRIES LTD (JP) | 2003-08-07 | — | — | US | disclosed |
| EP-1333335-A2 | Developing method for an image forming apparatus and developing device using the same | Ricoh Company, Ltd. (JP) | 2003-08-06 | — | — | EP | disclosed |
| US-20030138718-A1 | Method for forming electrophotographic image and electrographic device | RICOH COMPANY, LTD. (JP) | 2003-07-24 | — | — | US | disclosed |
| US-6592695-B1 | Binder system for ceramic arc discharge lamp | GENERAL ELECTRIC COMPANY | 2003-07-15 | — | — | US | disclosed |
| US-20030113642-A1 | Electrophotographic photoreceptor, method for manufacturing the electrophotographic photoreceptor and image forming apparatus using the electrophotographic photoreceptor | RICOH COMPANY, LTD. (JP) | 2003-06-19 | — | — | US | disclosed |
| US-6576388-B2 | Multilayer electrophotographic photoreceptor, and image forming method, image forming apparatus and process cartridge using the photoreceptor | RICOH COMPANY LIMITED (JP) | 2003-06-10 | — | — | US | disclosed |
| US-6573016-B2 | Photoconductive layer includes a charge transporting material, a charge generating material and an inorganic filler including alumina | RICOH COMPANY, LTD. (JP) | 2003-06-03 | — | — | US | disclosed |
| EP-1315045-A1 | LITHOGRAPHIC GAP-FILLER FORMING COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2003-05-28 | — | — | EP | disclosed |
| CN-1109704-C | Polymerizable unsaturated compound, curable resin compositions containing the same, and products of curing thereof | VANTIKO AG (CH) | 2003-05-28 | — | — | CN | disclosed |
| WO-2002042238-A9 | BINDER SYSTEM FOR CERAMIC ARC DISCHARGE LAMP | GEN ELECTRIC (US) | 2003-05-15 | — | — | WO | disclosed |
| US-6562531-B2 | Comprises polycarbonate resins which improve electrostatics; abrasion resistance | RICOH COMPANY, LTD. (JP) | 2003-05-13 | — | — | US | disclosed |
| US-6558863-B2 | Photosensitive layer comprises charge generation material comprising organic pigment and at least one water soluble ion; sensitivity, good charging properties | RICOH COMPANY LIMITED (JP) | 2003-05-06 | — | — | US | disclosed |
| US-6560438-B2 | Method for removing deposit from image substrate and image formation apparatus using the method | RICOH COMPANY, LTD. (JP) | 2003-05-06 | — | — | US | disclosed |
| US-20030073015-A1 | Electrophotographic photoreceptor, and image forming method and apparatus using the photoreceptor | RICOH COMPANY LIMITED (JP) | 2003-04-17 | — | — | US | disclosed |
| US-20030072936-A1 | Three dimensional welding rod and surface covering | AFI LICENSING LLC | 2003-04-17 | — | — | US | disclosed |
| EP-1291723-A2 | Electrophotographic photoreceptor, and image forming method, image forming apparatus and process cartridge therefor using the photoreceptor | Ricoh Company, Ltd. (JP) | 2003-03-12 | — | — | EP | disclosed |
| US-20030026974-A1 | Resilient surface covering | ARMSTRONG WORLD INDUSTRIES, INC. | 2003-02-06 | — | — | US | disclosed |
| US-6516169-B2 | Electrophotographic image forming apparatus having a gap between photoreceptor and charger, and process cartridge therefor | RICOH COMPANY LIMITED (JP) | 2003-02-04 | — | — | US | disclosed |
| US-20020197549-A1 | Multilayer electrophotographic photoreceptor, and image forming method, image forming apparatus and process cartridge using the photoreceptor | RICOH COMPANY LIMITED (JP) | 2002-12-26 | — | — | US | disclosed |
| US-20020181971-A1 | Image formation apparatus using a dry two-component developer for development | RICOH COMPANY, LTD. (JP) | 2002-12-05 | — | — | US | disclosed |
| EP-1256850-A1 | Electrophotographic photoreceptor, method for manufacturing the electrophotographic photoreceptor and image forming apparatus using the electrophotographic photoreceptor | Ricoh Company, Ltd. (JP) | 2002-11-13 | — | — | EP | disclosed |
| US-20020164540-A1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-11-07 | — | — | US | disclosed |
| US-20020156148-A1 | Bottom anti-reflective coat forming composition for lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2002-10-24 | — | — | US | disclosed |
| CN-1091786-C | Plastisol composition | GOODYEAR TIRE & RUBBER (US) | 2002-10-02 | — | — | CN | disclosed |
| EP-1237042-A2 | Bottom anti-reflective coat forming composition for lithography | Nissan Chemical Industries, Ltd. (JP) | 2002-09-04 | — | — | EP | disclosed |
| US-20020115005-A1 | Electrophotographic photoreceptor, method for manufacturing the photoreceptor, and image forming method and apparatus using the photoreceptor | RICOH COMPANY LIMITED (JP) | 2002-08-22 | — | — | US | disclosed |
| US-20020106570-A1 | Electrophotographic photoconductor, method of manufacturing same and image forming method, image forming apparatus and process cartridge using same | RICOH COMPANY, LTD. (JP) | 2002-08-08 | — | — | US | disclosed |
| US-20020076633-A1 | Electrophotographic photoreceptor, and image forming method and apparatus using the photoreceptor | RICOH COMPANY, LTD. (JP) | 2002-06-20 | — | — | US | disclosed |
| EP-1211565-A1 | Electrophotographic photoconductor, method of manufacturing same and image forming method, image forming apparatus and process cartridge using same | Ricoh Company, Ltd. (JP) | 2002-06-05 | — | — | EP | disclosed |
| WO-2002042238-A2 | BINDER SYSTEM FOR CERAMIC ARC DISCHARGE LAMP | GENERAL ELECTRIC COMPANY (US) | 2002-05-30 | — | — | WO | disclosed |
| US-6391328-B1 | DELIVERING TO TERRESTRIAL ENVIRONMENT COMPOSITION COMPRISING BIOACTIVE AGENT FOR TREATING POPULATION OF TERRESTRIAL ORGANISMS, CARRIER, AND COATING COMPONENT FOR REGULATING CONTROLLED RELEASE RATE AND RELEASE PROFILE OF BIOACTIVE AGENT | LEE COUNTY MOSQUITO CONTROL DISTRICT | 2002-05-21 | — | — | US | disclosed |
| EP-1205808-A1 | Electrophotographic photoreceptor and image forming method and apparatus using the photoreceptor | Ricoh Company, Ltd. (JP) | 2002-05-15 | — | — | EP | disclosed |
| US-6387386-B1 | Controlled delivery compositions and processes for treating organisms in a column of water or on land | LEE COUNTY MOSQUITO CONTROL DISTRICT | 2002-05-14 | — | — | US | disclosed |
| EP-1204004-A1 | Electrophotographic photoreceptor, method for manufacturing the photoreceptor, and image forming method and apparatus using the photoreceptor | Ricoh Company, Ltd. (JP) | 2002-05-08 | — | — | EP | disclosed |
| US-20020051654-A1 | Electrophotographic image forming apparatus and process cartridge therefor | RICOH COMPANY LIMITED (JP) | 2002-05-02 | — | — | US | disclosed |
| EP-1199613-A2 | Method for removing deposit from image substrate and image formation apparatus using the method | Ricoh Company, Ltd. (JP) | 2002-04-24 | — | — | EP | disclosed |
| EP-1197524-A1 | PROCESSING AID, VINYL CHLORIDE RESIN COMPOSITION CONTAINING THE SAME, AND PROCESS FOR PRODUCING MOLDED ARTICLE WITH THE SAME | Mitsubishi Rayon Co., Ltd. (JP) | 2002-04-17 | — | — | EP | disclosed |
| EP-1195648-A1 | Electrophotographic photoreceptor, and image forming method and apparatus using the photoreceptor | Ricoh Company, Ltd. (JP) | 2002-04-10 | — | — | EP | disclosed |
| US-20020037189-A1 | Method for removing deposit from image substrate and image formation apparatus using the method | RICOH COMPANY, LTD. (JP) | 2002-03-28 | — | — | US | disclosed |
| EP-1184736-A1 | Electrophotographic image forming apparatus and process cartridge therefor | Ricoh Company, Ltd. (JP) | 2002-03-06 | — | — | EP | disclosed |
| EP-0775563-B1 | Patterned heat welding rod for seaming resilient flooring | ARMSTRONG WORLD IND INC (US) | 2002-02-27 | — | — | EP | disclosed |
| US-6350461-B1 | POROUS, DEGRADABLE OR SOLUBLE CONTAINER WITH COMPLEX FOR TREATING POPULATION OF MORE TERRESTRIAL ORGANISMS CONSISTING OF CONTROLLED DELIVERY SYSTEM INCLUDING MIXTURE OF CARRIER COMPONENT, BIOACTIVE AGENT, ORGANIC PLASTICIZER COATING | LEE COUNTY MOSQUITO CONTROL DISTRICT | 2002-02-26 | — | — | US | disclosed |
| US-6346262-B1 | DELIVERY SYSTEM WITH CARRIERS, SILICA, CELLULOSE FIBERS AND OTHER CARRIERS | LEE COUNTY MOSQUITO CONTROL DISTRICT | 2002-02-12 | — | — | US | disclosed |
| US-6337078-B1 | DELIVERING TO A PREFLOOD OR FLOOD AREA CONTROLLED DELIVERY SYSTEM FOR TREATING A POPULATION OF ONE OR MORE AQUATIC ORGANISMS IN A COLUMN OF WATER CONSISTING ESSENTIALLY OF AN ADMIXTURE OF A CARRIER AND BIOACTIVE AGENT | LEE COUNTY MOSQUITO CONTROL DISTRICT | 2002-01-08 | — | — | US | disclosed |
| US-6335027-B1 | BIOACTIVE AGENT, CARRIERS, COATINGS THAT PERMEATE COMPLEXES IN WATER COLUMN; WATER TREATMENT | LEE COUNTY MOSQUITO CONTROL DISTRICT | 2002-01-01 | — | — | US | disclosed |
| US-20010016613-A1 | Resin composition | KURARAY, CO., LTD. (JP) | 2001-08-23 | — | — | US | disclosed |
| US-20010016296-A1 | Electrophotographic photoreceptor, electrophotographic image forming method and apparatus using the photoreceptor | RICOH COMPANY LIMITED | 2001-08-23 | — | — | US | disclosed |
| US-6248793-B1 | MIXTURE OF WATER, PLASTICIZER AND SURFACTANTS | NALCO CHEMICAL COMPANY | 2001-06-19 | — | — | US | disclosed |
| US-6171702-B1 | Coated substrates | XEROX CORPORATION | 2001-01-09 | — | — | US | disclosed |
| US-6151468-A | Electrophotographic photoconductor | RICOH COMPANY, LTD. (JP) | 2000-11-21 | — | — | US | disclosed |
| CN-1248985-A | Polymerizable unsaturated compound, curable resin composition containing the same, and molded article cured therefrom | CIBA SC HOLDING AG (CH) | 2000-03-29 | — | — | CN | disclosed |
| US-6030733-A | Electrophotographic photoconductor with water vapor permeability | RICOH COMPANY, LTD. (JP) | 2000-02-29 | — | — | US | disclosed |
| US-RE36458-E | THERMOPLASTIC WELDING ROD USED TO JOIN TWO PIECES OF THERMOPLASTIC SHEETING, PARTICULARLY FLOORING, TOGETHER | ARMSTRONG WORLD INDUSTRIES, INC. (US) | 1999-12-21 | — | — | US | disclosed |
| US-6001382-A | COMPRISING COMPLEXES FOR TREATING A POPULATION OF ONE OR MORE AQUATIC ORGANISMS IN A COLUMN OF WATER, THE COMPLEXES COMPRISE AT LEAST ONE SYSTEM WHEREIN THE SYSTEM COMPRISES AT LEAST ONE BIOACTIVE AGENT, A CARRIER, AN ORGANIC PLASTICIZER | LEE COUNTY MOSQUITO CONTROL DISTRICT (US) | 1999-12-14 | — | — | US | disclosed |
| EP-0661346-B1 | Heat-resistant molded article of lactic acid-base polymer | MITSUI CHEMICALS INC (JP) | 1999-09-15 | — | — | EP | disclosed |
| US-5932345-A | Thermally fusible adhesive copolymer, articles made therefrom, and method for producing the same | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1999-08-03 | — | — | US | disclosed |
| EP-0775716-B1 | NOVEL HEAT-FUSIBLE COPOLYMER, AND POWDER, FILM, LAMINATED HEAT INSULATOR, ELECTRONIC MODULE, AND CAPACITOR PRODUCED FROM SAID COPOLYMER, AND PROCESS FOR PRODUCING THE SAME | KANEGAFUCHI CHEMICAL IND (JP) | 1999-07-28 | — | — | EP | disclosed |
| US-5795695-A | PHOTO-QUALITY RECORDING | XEROX CORPORATION (US) | 1998-08-18 | — | — | US | disclosed |
| EP-0545312-B1 | Heat shrinkable film and multilayered film | KURARAY CO (JP) | 1998-07-15 | — | — | EP | disclosed |
| CN-1184136-A | Plastisol composition | GOODYEAR TIRE & RUBBER (US) | 1998-06-10 | — | — | CN | disclosed |
| US-5716900-A | FOR TEXTILES | KIMBERLY-CLARK WORLDWIDE, INC. (US) | 1998-02-10 | — | — | US | disclosed |
| US-5712032-A | Patterned heat welding rod for seaming resilient flooring | ARMSTRONG WORLD INDUSTRIES, INC. (US) | 1998-01-27 | — | — | US | disclosed |
| EP-0814125-A2 | Resin composition | KURARAY CO., LTD. (JP) | 1997-12-29 | — | — | EP | disclosed |
| US-5691424-A | COPOLYMERS WITH HYDROXYCAPROIC ACID AND SILICA AS NUCLEATION AGENT | MITSUI TOATSU CHEMICALS, INC. (JP) | 1997-11-25 | — | — | US | disclosed |
| US-5635266-A | THERMOPLASTIC RODS CONTAINING PARTICLES OF VARYING COLORS(TO RESEMBLE ORIGINAL FLOORING) AND PLASTICIZER, FOR JOINING AND SEALING SEAMS | ARMSTRONG WORLD INDUSTRIES, INC. (US) | 1997-06-03 | — | — | US | disclosed |
| EP-0775716-A1 | NOVEL HEAT-FUSIBLE COPOLYMER, AND POWDER, FILM, LAMINATED HEAT INSULATOR, ELECTRONIC MODULE, AND CAPACITOR PRODUCED FROM SAID COPOLYMER, AND PROCESS FOR PRODUCING THE SAME | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1997-05-28 | — | — | EP | disclosed |
| EP-0775563-A2 | Patterned heat welding rod for seaming resilient flooring | Armstrong World Industries, Inc. (US) | 1997-05-28 | — | — | EP | disclosed |
| EP-0561343-B1 | Binder system for use in the injection molding of sinterable powders and molding compound containing the binder system | KAWASAKI STEEL CO (JP) | 1997-01-08 | — | — | EP | disclosed |
| EP-0534847-B1 | Plastisol compositions | SARTOMER CO INC (US) | 1996-12-27 | — | — | EP | disclosed |
| WO-1996034769-A1 | HEAT TRANSFER MATERIAL FOR DYE DIFFUSION THERMAL TRANSFER PRINTING | KIMBERLY-CLARK WORLDWIDE, INC. (US) | 1996-11-07 | — | — | WO | disclosed |
| EP-0661346-A2 | Heat-resistant molded article of lactic acid-base polymer | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1995-07-05 | — | — | EP | disclosed |
| EP-0435564-B1 | Solid imaging system | DU PONT (US) | 1995-04-26 | — | — | EP | disclosed |
| EP-0414215-B1 | Solid imaging method utilizing compositions comprising thermally coalescible materials | DU PONT (US) | 1995-03-01 | — | — | EP | disclosed |
| US-5380179-A | Glycidyl acrylate or methacrylate polymer, improved wetting, nondeforming during debinding | KAWASAKI STEEL CORPORATION (JP) | 1995-01-10 | — | — | US | disclosed |
| US-5344715-A | Heat shrinkable film and multilayered film | KURARAY CO., LTD. (JP) | 1994-09-06 | — | — | US | disclosed |
| EP-0436352-B1 | Solid imaging method and apparatus | DU PONT (US) | 1994-08-10 | — | — | EP | disclosed |
| EP-0561343-A1 | Binder system for use in the injection molding of sinterable powders and molding compound containing the binder system | KAWASAKI STEEL CORPORATION (JP) | 1993-09-22 | — | — | EP | disclosed |
| US-5236812-A | Solid imaging method and apparatus | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-08-17 | — | — | US | disclosed |
| EP-0545312-A1 | Heat shrinkable film and multilayered film | KURARAY CO., LTD. (JP) | 1993-06-09 | — | — | EP | disclosed |
| EP-0534847-A1 | Plastisol compositions | SARTOMER COMPANY, INC. (US) | 1993-03-31 | — | — | EP | disclosed |
| US-5143817-A | SOLID IMAGING SYSTEM | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-09-01 | — | — | US | disclosed |
| EP-0098416-B1 | ELECTROCHROMIC DISPLAY ELEMENT | KABUSHIKI KAISHA TOSHIBA (JP) | 1992-08-12 | — | — | EP | disclosed |
| US-5137952-A | Vinyl chloride polymer, plasticizer, free radical-generating compound and crosslinking-effective copolymer | SARTOMER COMPANY, INC. (US) | 1992-08-11 | — | — | US | disclosed |
| US-RE33754-E | Cyclic Olefin | CASCHEM, INC. (US) | 1991-11-26 | — | — | US | disclosed |
| CN-1053843-A | SOLID IMAGING SYSTEM | DU PONT (US) | 1991-08-14 | — | — | CN | disclosed |
| EP-0436352-A2 | Solid imaging method and apparatus | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-07-10 | — | — | EP | disclosed |
| EP-0435564-A2 | Solid imaging system | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-07-03 | — | — | EP | disclosed |
| US-5021490-A | Using reactive polyester | THE B. F. GOODRICH COMPANY (US) | 1991-06-04 | — | — | US | disclosed |
| US-5006364-A | Accurate, three-dimensional models; cycles of applying liquid, exposure to actinic radiation | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-04-09 | — | — | US | disclosed |
| EP-0414215-A2 | Solid imaging method utilizing compositions comprising thermally coalescible materials | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-02-27 | — | — | EP | disclosed |
| EP-0411514-A2 | Internally plasticized polyvinyl-halide compositions and articles prepared therefrom | The Geon Company (US) | 1991-02-06 | — | — | EP | disclosed |
| EP-0194351-B1 | ARYLOXY-ALKOXY-ALKENYLPHENOXY-SUBSTITUTED POLYPHOSPHAZENES | ETHYL CORPORATION (US) | 1990-12-05 | — | — | EP | disclosed |
| EP-0182912-B1 | TIRE TREAD RUBBER COMPOSITION | SUMITOMO RUBBER INDUSTRIES LTD. (JP) | 1990-02-07 | — | — | EP | disclosed |
| US-4870113-A | MASTICATING, PRECURING, FOAMING, HEATING TO COMPLETE CURE | ETHYL CORPORATION (US) | 1989-09-26 | — | — | US | disclosed |
| EP-0184823-B1 | POLYPHOSPHAZENE COMPOUNDING PROCESS | ETHYL CORPORATION (US) | 1989-03-08 | — | — | EP | disclosed |
| EP-0185318-B1 | ARYLOXY-ALKOXY SUBSTITUTED POLPHOSPHAZENES | ETHYL CORPORATION (US) | 1989-02-01 | — | — | EP | disclosed |
| US-4742112-A | Ricinoleate modified hydrocarbon polyols | CASCHEM, INC. (US) | 1988-05-03 | — | — | US | disclosed |
| US-4737535-A | CONTAINING TRI-OR TETRAFUNCTIONAL COUPLING AGENT-LOW TEMPERATURE RESISTANCE | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 1988-04-12 | — | — | US | disclosed |
| EP-0246329-A1 | SAFETY-GLASS INTERLAYER | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1987-11-25 | — | — | EP | disclosed |
| US-4686057-A | HYDRAULIC DAMPING DEVICES; SILICONE OIL AND INORGANIC PARITCLES | AROS HYDRAULIK GMBH (DE) | 1987-08-11 | — | — | US | disclosed |
| EP-0194351-A1 | Aryloxy-alkoxy-alkenylphenoxy-substituted polyphosphazenes | ETHYL CORPORATION (US) | 1986-09-17 | — | — | EP | disclosed |
| US-4602048-A | Aryloxy-alkoxy-allylphenoxy substituted polyphosphazenes | ETHYL CORPORATION (US) | 1986-07-22 | — | — | US | disclosed |
| EP-0185318-A1 | Aryloxy-alkoxy substituted polphosphazenes | ETHYL CORPORATION (US) | 1986-06-25 | — | — | EP | disclosed |
| US-4596743-A | Reaction product of polyisocyanate with polyol in the presence of liquid cyclic olefin, plasticizer | CASCHEM, INC. (US) | 1986-06-24 | — | — | US | disclosed |
| EP-0184823-A1 | Polyphosphazene compounding process | ETHYL CORPORATION (US) | 1986-06-18 | — | — | EP | disclosed |
| EP-0182912-A1 | TIRE TREAD RUBBER COMPOSITION | SUMITOMO RUBBER INDUSTRIES LTD. (JP) | 1986-06-04 | — | — | EP | disclosed |
| US-4567229-A | LOW-SMOKE | ETHYL CORPORATION (US) | 1986-01-28 | — | — | US | disclosed |
| US-4555476-A | Heat development process with stabilizer | FUJI PHOTO FILM CO., LTD. (JP) | 1985-11-26 | — | — | US | disclosed |
| US-4537826-A | TRANSITION METAL OXIDES, POLYMERIC RESINS AND INORGANIC ION-CONDUCTIVE MATERIALS | TOKYO SHIBAURA DENKI KABUSHIKI KAISHA (JP) | 1985-08-27 | — | — | US | disclosed |
| US-4536520-A | PRECURING, SHAPING AND HEATING TO ACTIVATE BLOWING AGENT | ETHYL CORPORATION (US) | 1985-08-20 | — | — | US | disclosed |
| US-4535095-A | BLENDING A CURABLE MIXTURE | ETHYL CORPORATION (US) | 1985-08-13 | — | — | US | disclosed |
| US-4533598-A | FOR ELECTRICAL OR TELEPHONE CABLES | CASCHEM, INC. (US) | 1985-08-06 | — | — | US | disclosed |
| US-4518513-A | POLYGLYCOLS, ESTERS, STABILIZERS, ANTIOXIDANTS, WETTING AGENTS | SCHIEDEL GMBH & CO. (DE) | 1985-05-21 | — | — | US | disclosed |
| EP-0098416-A2 | Electrochromic display element | KABUSHIKI KAISHA TOSHIBA (JP) | 1984-01-18 | — | — | EP | disclosed |
| US-4416790-A | MIXING LIQUID PHASE WITH SOLIDS, WETTING AGENTS, ANTIOXIDANTS, VISCOSITY STABILIZERS, AND ALLOWING TO SWELL | SCHIEDEL GMBH & CO. (DE) | 1983-11-22 | — | — | US | disclosed |
| US-4375521-A | Vegetable oil extended polyurethane systems | COMMUNICATIONS TECHNOLOGY CORPORATION (US) | 1983-03-01 | — | — | US | disclosed |
| US-4355130-A | POLYDECENE, DIELECTRICS, ENCAPSULATION | COMMUNICATIONS TECHNOLOGY CORPORATION (US) | 1982-10-19 | — | — | US | disclosed |
| EP-0046063-A1 | Extended polyurethanes | COMMUNICATIONS TECHNOLOGY CORPORATION (US) | 1982-02-17 | — | — | EP | disclosed |
| US-4305855-A | Flow-modifying agents for plastic materials | THE LUBRIZOL CORPORATION (US) | 1981-12-15 | — | — | US | disclosed |
| US-4251381-A | Pasty damping agent dispersion | LOCHNER KASPAR | 1981-02-17 | — | — | US | disclosed |
| US-4230586-A | Aqueous well-drilling fluids | THE LUBRIZOL CORPORATION (US) | 1980-10-28 | — | — | US | disclosed |
| US-4226943-A | PLASTICIZER, SYNTHETIC HYDROCARBON WAX, ALKALI METAL-ZINC STABILIZER | OTSUKA KAGAKU YAKUHIN KABUSHIKI KAISHA (JP) | 1980-10-07 | — | — | US | disclosed |
| US-4226943-A | PLASTICIZER, SYNTHETIC HYDROCARBON WAX, ALKALI METAL-ZINC STABILIZER | OTSUKA KAGAKU YAKUHIN KABUSHIKI KAISHA (JP) | 1980-10-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (17 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12638772-B2 | Resist underlayer film-forming composition | RFC2, RFC1, RFC4 | MAPK1 3955/4885MAPT 2939/4885FFAR4 2590/4885 |
| US-20090312470-A1 | Asymmetric Cyclic Diester Compounds | DDT, PCNA, AADAC | MAPK1 4135/4885MAPT 4011/4885FFAR4 1366/4885 |
| US-10809619-B2 | Resist underlayer film-forming composition containing substituted crosslinkable compound | ASH1L, KDM2B, KDM7A | MAPK1 1893/4885MAPT 2478/4885FFAR4 3395/4885 |
| US-20090068577-A1 | NAPHTHALENETETRACARBOXYLIC ACID DIIMIDE DERIVATIVE AND ELECTROPHOTOGRAPHIC PHOTOCONDUCTOR HAVING THE SAME | PAH, AHR, DECR1 | MAPK1 1293/4885MAPT 4054/4885FFAR4 551/4885 |
| US-20200379352-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SUBSTITUTED CROSSLINKABLE COMPOUND | RAD51, RER1, ADH1A | MAPK1 3179/4885MAPT 1701/4885FFAR4 2307/4885 |
| US-20120315765-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING NITROGEN-CONTAINING RING | SRSF1, SRSF7, SRRM2 | MAPK1 4354/4885MAPT 4750/4885FFAR4 3435/4885 |
| US-20160139509-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SUBSTITUTED CROSSLINKABLE COMPOUND | ASH1L, KDM2B, KDM7A | MAPK1 1893/4885MAPT 2478/4885FFAR4 3395/4885 |
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | SRSF1, MACF1, SRPK1 | MAPK1 2597/4885MAPT 965/4885FFAR4 3528/4885 |
| US-12631964-B2 | Resist underlayer film-forming composition | TET1, OGG1, TET3 | MAPK1 4341/4885MAPT 3946/4885FFAR4 2296/4885 |
| US-20220319839-A1 | COMPOSITION CONTAINING A HETEROCYCLIC COMPOUND HAVING A DICYANOSTYRYL GROUP, FOR FORMING A RESIST UNDERLAYER FILM CAPABLE OF BEING WET ETCHED | DKC1, KDM4C, EZH2 | MAPK1 2261/4885MAPT 4030/4885FFAR4 788/4885 |
| US-12366804-B2 | Composition containing a heterocyclic compound having a dicyanostyryl group, for forming a resist underlayer film capable of being wet etched | DKC1, KDM4C, EZH2 | MAPK1 2261/4885MAPT 4030/4885FFAR4 788/4885 |
| US-20130202994-A1 | AMINE COMPOUND, ELECTROPHOTOGRAPHIC PHOTOCONDUCTOR, IMAGE FORMING METHOD, IMAGE FORMING APPARATUS, AND PROCESS CARTRIDGE | ARL1, ATXN2L, AHR | MAPK1 1034/4885MAPT 2185/4885FFAR4 1520/4885 |
| US-12572074-B2 | Resist underlying film-forming composition comprising a reaction product with a glycidyl ester compound | ALKBH1, ALKBH2, ALKBH3 | MAPK1 3174/4885MAPT 4194/4885FFAR4 1871/4885 |
| US-20200277316-A1 | FLAME RETARDANT COMPOSITION, FLAME RETARDANT RESIN COMPOSITION CONTAINING SAID FLAME RETARDANT COMPOSITION, AND MOLDED BODY OF SAID FLAME RETARDANT RESIN COMPOSITION | RER1, FFAR1, AFF1 | MAPK1 1954/4885MAPT 1962/4885FFAR4 9/4885 |
| US-20120283161-A1 | LUBRICATING OIL COMPOSITION | POLD1, POLD3, DNAH12 | MAPK1 3198/4885MAPT 1003/4885FFAR4 2083/4885 |
| US-12601972-B2 | Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent | BHMT, AADAT, PNMT | MAPK1 2523/4885MAPT 1633/4885FFAR4 3448/4885 |
| US-12405533-B2 | Resist underlayer film-forming composition containing substituted crosslinkable compound | RAD51, RER1, ADH1A | MAPK1 3179/4885MAPT 1701/4885FFAR4 2307/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.