Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR4A2 | P43354 | 1/20 | 0.52 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.47 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.47 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.43 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.43 |
| ▸ | HTR7 | P34969 | 1/20 | 0.42 |
| ▸ | CASP3 | P42574 | 2/20 | 0.41 |
| ▸ | SENP8 | Q96LD8 | 2/20 | 0.41 |
| ▸ | SENP7 | Q9BQF6 | 2/20 | 0.41 |
| ▸ | SENP6 | Q9GZR1 | 2/20 | 0.41 |
| ▸ | MAPK14 | Q16539 | 6/20 | 0.41 |
| ▸ | GCGR | P47871 | 2/20 | 0.41 |
| ▸ | HTR2C | P28335 | 1/20 | 0.40 |
| ▸ | ALDH1A3 | P47895 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | MAOB | P27338 | 1/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL1805194 | 0.82 | PTGS2 (0.46) | NR4A2PTGS2PTGS1SLC6A4SLC6A3 | |
| SCHEMBL9807036 | 0.80 | ALDH1A1 (0.33) | NR4A2PTGS2CASP3SENP8SENP7 | |
| SCHEMBL6830189 | 0.80 | ALDH1A1 (0.47) | PTGS2CASP3SENP8SENP7SENP6 | |
| SCHEMBL30451343 | 0.79 | ALDH1A1 (0.48) | PTGS2CASP3SENP8SENP7SENP6 | |
| SCHEMBL154146 | 0.79 | ALDH1A1 (0.48) | PTGS2CASP3SENP8SENP7SENP6 | |
| SCHEMBL10304866 | 0.79 | PTGS2 (0.42) | NR4A2PTGS2PTGS1SLC6A4SLC6A3 | |
| SCHEMBL7154758 | 0.78 | ALDH1A1 (0.42) | PTGS2CASP3SENP8SENP7SENP6 | |
| SCHEMBL27649740 | 0.77 | PTGS2 (0.57) | NR4A2PTGS2PTGS1SLC6A4SLC6A3 | |
| SCHEMBL15484734 | 0.77 | ALDH1A1 (0.46) | PTGS2CASP3SENP8SENP7SENP6 | |
| Phosphine SCHEMBL28589614 | 0.77 | ALDH1A1 (0.46) | PTGS2CASP3SENP8SENP7SENP6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12585186-B2 | Photoacid generator, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| US-20230384677-A1 | ONIUM SALT COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-30 | — | — | US | disclosed |
| US-20230123180-A1 | PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-20 | — | — | US | disclosed |
| US-11579526-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-02-14 | — | — | US | disclosed |
| US-11448961-B2 | Iodonium salt, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-09-20 | — | — | US | disclosed |
| US-20200301274-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-09-24 | — | — | US | disclosed |
| US-20200102271-A1 | ONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-04-02 | — | — | US | disclosed |
| US-20200081341-A1 | IODONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-03-12 | — | — | US | disclosed |
| CN-101959908-A | Radiation-sensitive composition, polymer and monomer | JSR CORP | 2011-01-26 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12585186-B2 | Photoacid generator, chemically amplified resist composition, and patterning process | LBR, LIFR, LEF1 | NR4A2 1733/4885PTGS2 4130/4885PTGS1 3423/4885 |
| US-20230384677-A1 | ONIUM SALT COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | INSR, INSRR, SLC6A5 | NR4A2 2887/4885PTGS2 4322/4885PTGS1 4197/4885 |
| US-20200102271-A1 | ONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | C1R, NHERF1, INSR | NR4A2 3505/4885PTGS2 4168/4885PTGS1 3893/4885 |
| US-20200081341-A1 | IODONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | ETV6, ELOVL5, EEF2 | NR4A2 3530/4885PTGS2 4030/4885PTGS1 4097/4885 |
| US-11448961-B2 | Iodonium salt, resist composition, and pattern forming process | ETV6, ELOVL5, EEF2 | NR4A2 3530/4885PTGS2 4030/4885PTGS1 4097/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.