Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 4/20 | 0.44 |
| ▸ | THRA | P10827 | 1/20 | 0.44 |
| ▸ | TYMS | P04818 | 1/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.38 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | HPGD | P15428 | 2/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.38 |
| ▸ | FABP7 | O15540 | 3/20 | 0.34 |
| ▸ | FABP3 | P05413 | 3/20 | 0.34 |
| ▸ | FABP5 | Q01469 | 3/20 | 0.34 |
| ▸ | LIG1 | P18858 | 1/20 | 0.33 |
| ▸ | AKT1 | P31749 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | EGFR | P00533 | 1/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30007447 | 0.89 | THRB (0.51) | THRBTHRATYMSKDM4EMAPT | |
| SCHEMBL10871851 | 0.89 | THRB (0.51) | THRBTHRATYMSKDM4EMAPT | |
| SCHEMBL6251831 | 0.86 | THRB (0.49) | THRBTHRATYMSKDM4EMAPT | |
| SCHEMBL23161027 | 0.81 | FABP7 (0.48) | THRBTHRATYMSKDM4EMAPT | |
| SCHEMBL14075050 | 0.81 | THRB (0.46) | THRBTHRATYMSKDM4EMAPT | |
| SCHEMBL29413361 | 0.80 | THRB (0.56) | THRBTHRATYMSKDM4EMAPT | |
| SCHEMBL3841280 | 0.80 | THRB (0.56) | THRBTHRATYMSKDM4EMAPT | |
| SCHEMBL35121 | 0.79 | FABP3 (0.49) | THRBTHRATYMSKDM4EMAPT | |
| SCHEMBL29733244 | 0.79 | FABP3 (0.49) | THRBTHRATYMSKDM4EMAPT | |
| SCHEMBL23207832 | 0.79 | THRB (0.47) | THRBTHRATYMSKDM4EMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9221928-B2 | Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | claimed |
| US-9989847-B2 | Onium salt compound, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-05 | — | — | US | disclosed |
| US-20160259242-A1 | NOVEL ONIUM SALT COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-09-08 | — | — | US | disclosed |
| US-9221928-B2 | Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9182664-B2 | Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-11-10 | — | — | US | disclosed |
| US-9152045-B2 | Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-10-06 | — | — | US | disclosed |
| US-9024058-B2 | Ammonium fluoroalkanesulfonates and a synthesis method therefor | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-05-05 | — | — | US | disclosed |
| US-8993212-B2 | Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| US-8846966-B2 | Method for producing alkoxycarbonylfluoroalkanesulfonic acid salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-09-30 | — | — | US | disclosed |
| US-20140287359-A1 | Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method | CENTRAL GLASS CO LTD (JP) | 2014-09-25 | — | — | US | disclosed |
| US-8283106-B2 | Sulfonic acid salt and derivative thereof, photoacid generator agent, and resist material and pattern formation method using the photoacid generator agent | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-10-09 | — | — | US | disclosed |
| US-8222448-B2 | Processes for production of 2-bromo-2,2-difluoroethanol and 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-07-17 | — | — | US | disclosed |
| US-8110711-B2 | Processes for production of 2-bromo-2,2-difluoroethanol and 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-02-07 | — | — | US | disclosed |
| US-20120004447-A1 | Ammonium Fluoroalkanesulfonates and a Synthesis Method Therefor | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20110319652-A1 | Processes for Production of 2-Bromo-2,2-Difluoroethanol and 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110207954-A1 | Method for Producing Alkoxycarbonylfluoroalkanesulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20110177453-A1 | Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-07-21 | — | — | US | disclosed |
| US-20110034721-A1 | 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-02-10 | — | — | US | disclosed |
| US-20110015431-A1 | Processes for Production of 2-Bromo-2,2-Difluoroethanol and 2-(Alkylcarbonyloxy)-1,1-Difluoroethanesulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20100304303-A1 | Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110207954-A1 | Method for Producing Alkoxycarbonylfluoroalkanesulfonic Acid Salt | ARSA, SLC6A5, PFAS | THRB 4537/4885THRA 4052/4885TYMS 3626/4885 |
| US-20110319652-A1 | Processes for Production of 2-Bromo-2,2-Difluoroethanol and 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt | HAO2, SULT2A1, CYP2F1 | THRB 2720/4885THRA 2832/4885TYMS 2880/4885 |
| US-20160259242-A1 | NOVEL ONIUM SALT COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | LIFR, NHERF1, INSR | THRB 3907/4885THRA 4110/4885TYMS 4316/4885 |
| US-20110177453-A1 | Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same | WASF2, EEF2, IKZF2 | THRB 3531/4885THRA 3504/4885TYMS 3735/4885 |
| US-20110034721-A1 | 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same | PFAS, DDAH1, STS | THRB 4431/4885THRA 4172/4885TYMS 4006/4885 |
| US-20110015431-A1 | Processes for Production of 2-Bromo-2,2-Difluoroethanol and 2-(Alkylcarbonyloxy)-1,1-Difluoroethanesulfonic Acid Salt | HAO2, SULT2A1, CYP2F1 | THRB 2720/4885THRA 2832/4885TYMS 2880/4885 |
| US-20100304303-A1 | Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent | ARF1, ARF5, ARF6 | THRB 4365/4885THRA 2756/4885TYMS 3435/4885 |
| US-20120004447-A1 | Ammonium Fluoroalkanesulfonates and a Synthesis Method Therefor | NOTUM, FAR1, PFAS | THRB 4247/4885THRA 4461/4885TYMS 790/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.