Known targets — ChEMBL curated mechanism
ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Congo Red Free Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB known ✓ | P10828 | 2/20 | 0.74 |
| ▸ | APP | P05067 | 2/20 | 1.00 |
| ▸ | GLB1 | P16278 | 1/20 | 1.00 |
| ▸ | CHAT | P28329 | 1/20 | 1.00 |
| ▸ | ENPP2 | Q13822 | 1/20 | 1.00 |
| ▸ | PHLPP2 | Q6ZVD8 | 1/20 | 1.00 |
| ▸ | CTRC | Q99895 | 1/20 | 1.00 |
| ▸ | SLC7A11 | Q9UPY5 | 2/20 | 0.81 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.74 |
| ▸ | HPGD | P15428 | 2/20 | 0.74 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.74 |
| ▸ | RECQL | P46063 | 2/20 | 0.74 |
| ▸ | MEN1 | O00255 | 1/20 | 0.74 |
| ▸ | MAPT | P10636 | 1/20 | 0.74 |
| ▸ | SNCA | P37840 | 1/20 | 0.74 |
| ▸ | BLM | P54132 | 1/20 | 0.74 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.74 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.74 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.71 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.71 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Congo Red Free Acid SCHEMBL25635 | 1.00 | APP (1.00) | APPGLB1CHATENPP2PHLPP2 | |
| Congo Red Free Acid SCHEMBL202229 | 1.00 | APP (1.00) | APPGLB1CHATENPP2PHLPP2 | |
| Congo Red Free Acid SCHEMBL29395841 | 1.00 | APP (1.00) | APPGLB1CHATENPP2PHLPP2 | |
| Congo Red Free Acid SCHEMBL326084 | 0.97 | APP (0.95) | APPGLB1CHATENPP2PHLPP2 | |
| Congo Red Free Acid SCHEMBL326085 | 0.97 | APP (0.95) | APPGLB1CHATENPP2PHLPP2 | |
| SCHEMBL14988500 | 0.94 | APP (0.88) | APPGLB1CHATENPP2PHLPP2 | |
| SCHEMBL14988686 | 0.92 | APP (0.85) | APPGLB1CHATENPP2PHLPP2 | |
| SCHEMBL20553442 | 0.91 | APP (0.84) | APPGLB1CHATENPP2PHLPP2 | |
| SCHEMBL14988379 | 0.90 | APP (0.80) | APPGLB1CHATENPP2PHLPP2 | |
| SCHEMBL14988623 | 0.90 | APP (0.81) | APPGLB1CHATENPP2PHLPP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122029488-A | Photosensitive coloring composition, cured product, partition wall, organic electroluminescent element, color filter, and image display device | 三菱化学株式会社 | 2026-05-12 | — | — | CN | disclosed |
| EP-4692146-A1 | LEVELING AGENT, RESIST COMPOSITION, AND POLARIZING PLATE | DIC Corporation (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4692141-A1 | COPOLYMER AND COATING COMPOSITION OR RESIST COMPOSITION CONTAINING COPOLYMER | DIC Corporation (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-20260016621-A1 | SILICONE-CONTAINING COPOLYMER, LEVELING AGENT, COATING COMPOSITION, RESIST COMPOSITION, COLOR FILTER, AND SILICONE-CONTAINING COPOLYMER PRODUCTION METHOD | DIC CORPORATION (JP) | 2026-01-15 | — | — | US | disclosed |
| EP-4620986-A1 | RANDOM COPOLYMER, COATING COMPOSITION AND RESIST COMPOSITION CONTAINING SAID COPOLYMER | DIC Corporation (JP) | 2025-09-24 | — | — | EP | disclosed |
| US-20250290249-A1 | DIRECT TO FILM TRANSFER PROCESS FOR INKJET INKS ON SUBSTRATES USING PIGMENTED POLYMER POWDERS | Prism Inks, Inc. (US) | 2025-09-18 | — | — | US | disclosed |
| EP-4617076-A1 | DIRECT TO FILM TRANSFER PROCESS FOR INKJET INKS ON SUBSTRATES USING PIGMENTED POLYMER POWDERS | Prism Inks, Inc. (US) | 2025-09-17 | — | — | EP | disclosed |
| EP-4617773-A1 | RESIST COMPOSITION AND CURED PRODUCT OF SAME | DIC Corporation (JP) | 2025-09-17 | — | — | EP | disclosed |
| US-12359081-B2 | Ink, method for producing ink, and inkjet system | RICOH COMPANY, LTD. (JP) | 2025-07-15 | — | — | US | disclosed |
| EP-4563607-A1 | SILICONE-CONTAINING COPOLYMER, LEVELING AGENT, COATING COMPOSITION, RESIST COMPOSITION, COLOR FILTER, AND METHOD FOR PRODUCING SILICONE-CONTAINING COPOLYMER | DIC Corporation (JP) | 2025-06-04 | — | — | EP | disclosed |
| EP-4083098-A1 | POLYMER AND COATING COMPOSITION CONTAINING SAID POLYMER | DIC Corporation (JP) | 2022-11-02 | — | — | EP | disclosed |
| CN-114846040-A | Polymer and coating composition containing the same | DIC株式会社 | 2022-08-02 | — | — | CN | disclosed |
| CN-108475012-B | Photosensitive coloring composition, cured product, coloring spacer and image display device | 三菱化学株式会社 | 2022-07-15 | — | — | CN | disclosed |
| US-11360386-B2 | Organic EL display device | TORAY INDUSTRIES, INC. (JP) | 2022-06-14 | — | — | US | disclosed |
| CN-114574036-A | Ink, method for manufacturing ink, and inkjet system | 株式会社理光 | 2022-06-03 | — | — | CN | disclosed |
| US-20220169877-A1 | INK, METHOD FOR PRODUCING INK, AND INKJET SYSTEM | RICOH COMPANY, LTD. (JP) | 2022-06-02 | — | — | US | disclosed |
| CN-114545737-A | Photosensitive coloring composition for colored spacer, cured product, colored spacer, and image display device | 三菱化学株式会社 | 2022-05-27 | — | — | CN | disclosed |
| CN-114450630-A | Photosensitive resin composition, cured product, partition wall, organic electroluminescent element, color filter, and image display device | 三菱化学株式会社 | 2022-05-06 | — | — | CN | disclosed |
| CN-114270263-A | Photosensitive coloring composition, cured product, image display device, and pigment dispersion liquid for image display device | 三菱化学株式会社 | 2022-04-01 | — | — | CN | disclosed |
| CN-113993922-A | Photosensitive colored resin composition, cured product, partition wall, and image display device | 三菱化学株式会社 | 2022-01-28 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260016621-A1 | SILICONE-CONTAINING COPOLYMER, LEVELING AGENT, COATING COMPOSITION, RESIST COMPOSITION, COLOR FILTER, AND SILICONE-CONTAINING COPOLYMER PRODUCTION METHOD | MSR1, STRA6, TGFBR1 | THRB 205/4885APP 2055/4885GLB1 570/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.