SCHEMBL3190750

SCHEMBL3190750

CCc1ccc(S(OS(=O)(=O)C(F)(F)F)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 3/20 0.43
ALDH1A1 P00352 4/20 0.41
MAPT P10636 4/20 0.41
KDM4E B2RXH2 1/20 0.41
F2 P00734 1/20 0.41
VDR P11473 1/20 0.41
CA1 P00915 1/20 0.40
TP53 P04637 1/20 0.39
PSIP1 O75475 1/20 0.39
TAS2R14 Q9NYV8 1/20 0.39
HSD11B1 P28845 3/20 0.39
CNR2 P34972 1/20 0.38
L3MBTL1 Q9Y468 2/20 0.38
NR1H3 Q13133 1/20 0.38
ATM Q13315 1/20 0.38
NPC1 O15118 1/20 0.37
LMNA P02545 1/20 0.37
MAPK1 P28482 1/20 0.37
RAB9A P51151 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3183463 0.86 CA2 (0.47) CA2ALDH1A1MAPTKDM4EF2
SCHEMBL4643446 0.86 CA2 (0.46) CA2CA1HSD11B1NR1H3LMNA
SCHEMBL37033 0.85 HTR6 (0.42) CA2ALDH1A1MAPTKDM4ECA1
SCHEMBL3182566 0.82 ALDH1A1 (0.51) CA2ALDH1A1MAPTKDM4EF2
SCHEMBL36148 0.82 HTT (0.45) CA2ALDH1A1KDM4EVDRCA1
SCHEMBL3136958 0.82 HTT (0.45) CA2ALDH1A1KDM4EVDRCA1
SCHEMBL444803 0.82 PTGS2 (0.44) HSD11B1
SCHEMBL3201041 0.81 ALDH1A1 (0.43) CA2ALDH1A1MAPTKDM4EF2
SCHEMBL503373 0.80 PKM (0.46) ALDH1A1HSD11B1NPC1MAPK1FFAR4
SCHEMBL4643793 0.80 CA1 (0.46) CA2ALDH1A1MAPTCA1HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed