SCHEMBL3281214

SCHEMBL3281214

c1ccc(Sc2ccc3ccccc3c2)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
MAOA P21397 3/20 0.50
MAOB P27338 3/20 0.50
HAO1 Q9UJM8 1/20 0.48
MAP2K2 P36507 1/20 0.48
MAP2K1 Q02750 1/20 0.48
SIRT2 Q8IXJ6 1/20 0.46
SIRT1 Q96EB6 1/20 0.46
SIRT3 Q9NTG7 1/20 0.46
MCL1 Q07820 2/20 0.45
KDM4E B2RXH2 1/20 0.45
MAPT P10636 1/20 0.45
PKM P14618 1/20 0.45
MAPK1 P28482 1/20 0.45
KMT2A Q03164 1/20 0.45
NPSR1 Q6W5P4 1/20 0.45
BCL2 P10415 1/20 0.44
HTR2C P28335 1/20 0.44
HTR6 P50406 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7708311 0.93 MAOA (0.48) LMNASMN1; SMN2MAOAMAOBHAO1
SCHEMBL30832956 0.92 LMNA (0.57) LMNASMN1; SMN2HAO1MAP2K2MAP2K1
SCHEMBL761802 0.92 LMNA (0.57) LMNASMN1; SMN2HAO1MAP2K2MAP2K1
SCHEMBL8514752 0.89 LMNA (0.47) LMNASMN1; SMN2MAOAMAOBHAO1
SCHEMBL11300299 0.84 ALDH1A1 (0.50) LMNASMN1; SMN2MAOAMAOBHAO1
SCHEMBL12952450 0.84 LMNA (0.47) LMNASMN1; SMN2MAOAMAOBHAO1
SCHEMBL14176682 0.84 CYP2A6 (0.60) LMNASMN1; SMN2HAO1MAP2K2MAP2K1
SCHEMBL8563632 0.84 CYP3A4 (0.61) LMNASMN1; SMN2HAO1MAP2K2MAP2K1
SCHEMBL8561255 0.82 MAP2K2 (0.47) LMNASMN1; SMN2MAOAMAOBHAO1
SCHEMBL6403168 0.82 SIRT2 (0.53) SMN1; SMN2SIRT2SIRT1SIRT3KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111902738-A Naphthyl-based high refractive index hydrophobic liquids and transmittance restoration agents for liquid lens formulations 康宁股份有限公司 2020-11-06 CN claimed
US-9469604-B2 Method of manufacturing sulfonium salt TOYO GOSEI CO., LTD. (JP) 2016-10-18 US claimed
CN-116657163-A Method for dithioating o-dihalogenated aromatic hydrocarbon 河南大学 2023-08-29 CN disclosed
US-11204492-B2 Naphtyl based high index hydrophobic liquids and transmission recovery agents for liquid lens formulations CORNING INCORPORATED (US) 2021-12-21 US disclosed
CN-109293538-B Preparation method of aryl sulfone compound, catalyst used for extraction and extraction method of aryl sulfone compound 温州大学 2020-12-08 CN disclosed
US-20200142180-A1 NAPHTYL BASED HIGH INDEX HYDROPHOBIC LIQUIDS AND TRANSMISSION RECOVERY AGENTS FOR LIQUID LENS FORMULATIONS CORNING INC (US) 2020-05-07 US disclosed
US-10558031-B2 Naphtyl based high index hydrophobic liquids and transmission recovery agents for liquid lens formulations CORNING INCORPORATED (US) 2020-02-11 US disclosed
US-20190293920-A1 NAPHTYL BASED HIGH INDEX HYDROPHOBIC LIQUIDS AND TRANSMISSION RECOVERY AGENTS FOR LIQUID LENS FORMULATIONS CORNING INC (US) 2019-09-26 US disclosed
US-10295819-B1 Naphtyl based high index hydrophobic liquids and transmission recovery agents for liquid lens formulations CORNING INCORPORATED (US) 2019-05-21 US disclosed
WO-2018038464-A1 ORGANIC COMPOUND AND ORGANIC ELECTROLUMINESCENT DEVICE COMPRISING SAME 주식회사 두산 2018-03-01 WO disclosed
EP-3168207-A1 MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2017-05-17 EP disclosed
EP-1350789-B1 PROCESS FOR PRODUCING SULFONIUM SALT SAN APRO LTD (JP) 2008-06-25 EP disclosed
US-20080108720-A1 Method for manufacturing monosulfonium salt, cationic polymerization initiator, curable composition, and cured product DATE MASASHI 2008-05-08 US disclosed
EP-1640363-B1 PROCESS FOR PRODUCTION OF MONOSULFONIUM SALTS, CATIONIC POLYMERIZATION INITIATORS, CURABLE COMPOSITIONS, AND PRODUCTS OF CURING SAN APRO LTD (JP) 2008-01-16 EP disclosed
US-20060247401-A1 Process for production of monosulfonium salts, cationic polymerization initiators, curable compositions, and products of curing SAN-APRO LIMITED (JP) 2006-11-02 US disclosed
US-7060858-B2 Method for manufacturing sulfonium salts SAN-APRO LIMITED (JP) 2006-06-13 US disclosed
EP-1640363-A1 PROCESS FOR PRODUCTION OF MONOSULFONIUM SALTS, CATIONIC POLYMERIZATION INITIATORS, CURABLE COMPOSITIONS, AND PRODUCTS OF CURING San-Apro Limited (JP) 2006-03-29 EP disclosed
US-20040030158-A1 Method for manufacturing sulfonium salts SAN-APRO LIMITED (JP) 2004-02-12 US disclosed
EP-1350789-A1 PROCESS FOR PRODUCING SULFONIUM SALT San-Apro Limited (JP) 2003-10-08 EP disclosed
US-4044056-A Symmetrical aromatic sulfide production PHILLIPS PETROLEUM COMPANY (US) 1977-08-23 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060247401-A1 Process for production of monosulfonium salts, cationic polymerization initiators, curable compositions, and products of curing RPS6, SPIN4, SRM LMNA 4180/4885SMN1; SMN2 1345/4885MAOA 3278/4885
US-20040030158-A1 Method for manufacturing sulfonium salts MLX, STS, SULT1A1 LMNA 4171/4885SMN1; SMN2 113/4885MAOA 831/4885
US-20080108720-A1 Method for manufacturing monosulfonium salt, cationic polymerization initiator, curable composition, and cured product SPIN4, RPS6, SRM LMNA 3894/4885SMN1; SMN2 978/4885MAOA 3349/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.