SCHEMBL421602

SCHEMBL421602

O=S(=O)([O-])CCCSSCCCS(=O)(=O)[O-].[Na+].[Na+]

nearest known ligand 0.52

Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
GMNN O75496 1/20 0.52
ALDH1A1 P00352 1/20 0.52
LMNA P02545 1/20 0.52
TP53 P04637 1/20 0.52
TSHR P16473 1/20 0.52
MAPK1 P28482 1/20 0.52
THPO P40225 1/20 0.52
HBB P68871 1/20 0.52
PMP22 Q01453 1/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
KDM4E B2RXH2 1/20 0.43
MAPT P10636 1/20 0.43
ALOX15 P16050 1/20 0.43
BBOX1 O75936 3/20 0.43
ENPEP Q07075 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Potassium Ion SCHEMBL10484570 0.94 GMNN (0.46) GMNNALDH1A1LMNATP53TSHR
SCHEMBL564573 0.92 GMNN (0.50) GMNNALDH1A1LMNATP53TSHR
Water SCHEMBL5356499 0.92 GMNN (0.44) GMNNALDH1A1LMNATP53TSHR
SCHEMBL10484654 0.90 GMNN (0.48) GMNNALDH1A1LMNATP53TSHR
SCHEMBL29623226 0.90 GMNN (0.48) GMNNALDH1A1LMNATP53TSHR
SCHEMBL565085 0.85 ALDH1A1 (0.44) GMNNALDH1A1LMNATP53TSHR
SCHEMBL17819132 0.85 ALDH1A1 (0.44) GMNNALDH1A1LMNATP53TSHR
SCHEMBL28899359 0.83 GMNN (0.52) GMNNALDH1A1LMNATP53TSHR
2,2'-Dithiodiethanesulfonic Acid SCHEMBL835029 0.82 KDM4E (0.48) GMNNALDH1A1LMNATP53TSHR
2,2'-Dithiodiethanesulfonic Acid SCHEMBL18847 0.82 KDM4E (0.48) GMNNALDH1A1LMNATP53TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 992 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4746079-A1 SECONDARY BATTERY AND PREPARATION METHOD THEREFOR, AND ELECTRIC DEVICE Contemporary Amperex Technology Co., Limited (CN) 2026-05-20 EP claimed
EP-4723250-A1 CURRENT COLLECTOR, ELECTRODE SHEET, SECONDARY BATTERY, ELECTRIC DEVICE, COPPER FOIL, AND PREPARATION METHOD FOR COPPER FOIL Contemporary Amperex Technology Co., Limited (CN) 2026-04-08 EP claimed
EP-4703500-A1 TRIVALENT CHROMIUM PLATING BATH Dr.-Ing. Max Schlötter GmbH & Co. KG (DE) 2026-03-04 EP claimed
US-12467155-B2 Copper plating solution and negative electrode composite current collector prepared using same CONTEMPORARY AMPEREX TECHNOLOGY (HONG KONG) LIMITED (CN) 2025-11-11 US claimed
EP-4611156-A1 COMPOSITE SEPARATOR, SECONDARY BATTERY, AND ELECTRICAL APPARATUS Contemporary Amperex Technology (Hong Kong) Limited (HK) 2025-09-03 EP claimed
CN-119776922-A Tinning additive 江西理工大学 2025-04-08 CN claimed
EP-4524292-A1 METHOD FOR MANUFACTURING ELECTROLYTIC COPPER FOIL Korea Zinc Co., Ltd. (KR) 2025-03-19 EP claimed
EP-4524293-A1 METHOD FOR CONTROLLING PROPERTIES OF ELECTROLYTIC COPPER FOIL, AND MANUFACTURING METHOD THEREFOR Korea Zinc Co., Ltd. (KR) 2025-03-19 EP claimed
US-20250019852-A1 METHOD OF CONTROLLING PROPERTIES OF ELECTROLYTIC COPPER FOIL AND MANUFACTURING THE SAME KZAM CORPORATION (KR) 2025-01-16 US claimed
CN-114073170-B Flexible printed wiring board and method for manufacturing the same 住友电气工业株式会社 2025-01-03 CN claimed
US-20030070934-A1 Plating bath and method for depositing a metal layer on a substrate SHIPLEY COMPANY, L.L.C. 2003-04-17 US claimed
US-20030066756-A1 Plating bath and method for depositing a metal layer on a substrate SHIPLEY COMPANY, L.L.C. 2003-04-10 US claimed
EP-1300486-A1 Plating bath and method for depositing a metal layer on a substrate Shipley Co. L.L.C. (US) 2003-04-09 EP claimed
EP-1300487-A1 Plating bath and method for depositing a metal layer on a substrate Shipley Co. L.L.C. (US) 2003-04-09 EP claimed
EP-1300488-A2 Plating path and method for depositing a metal layer on a substrate Shipley Co. L.L.C. (US) 2003-04-09 EP claimed
US-20010013472-A1 Forming copper film on insulation layer; immersion in solution of plating promoter; removing promoter from copper film leaving it on side walls and bottoms of via holes; electroplating to fill holes; improvement over planarization SHINKO ELECTRIC INDUSTRIES CO., LTD. (JP) 2001-08-16 US claimed
EP-1122989-A2 Method of plating for filling via holes SHINKO ELECTRIC INDUSTRIES CO. LTD. (JP) 2001-08-08 EP claimed
EP-0058044-B1 ELECTRODEPOSITION OF CHROMIUM W. CANNING MATERIALS LIMITED (GB) 1986-06-18 EP claimed
EP-0058044-A1 Electrodeposition of chromium W. CANNING MATERIALS LIMITED (GB) 1982-08-18 EP claimed
US-4233112-A PRINTED CIRCUITS DART INDUSTRIES INC. (US) 1980-11-11 US claimed