SCHEMBL453090

SCHEMBL453090

O=C(O)C=CC(F)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.42

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.42
TP53 P04637 1/20 0.42
EGLN1 Q9GZT9 1/20 0.42
EGLN3 Q9H6Z9 1/20 0.42
LMNA P02545 2/20 0.33
GABRR1 P24046 2/20 0.31
GABRR2 P28476 2/20 0.31
BLM P54132 2/20 0.31
GABRR3 A8MPY1 1/20 0.31
APEX1 P27695 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7821073 1.00 TSHR (0.42) TSHRTP53EGLN1EGLN3LMNA
SCHEMBL7812907 0.87 TSHR (0.36) TSHRTP53EGLN1EGLN3LMNA
SCHEMBL5704732 0.87 TSHR (0.36) TSHRTP53EGLN1EGLN3LMNA
SCHEMBL899318 0.80 TSHR (0.44) TSHRTP53EGLN1EGLN3LMNA
SCHEMBL899316 0.80 TSHR (0.44) TSHRTP53EGLN1EGLN3LMNA
SCHEMBL9187017 0.78 TSHR (0.42) TSHRTP53EGLN1EGLN3LMNA
SCHEMBL17186622 0.77
SCHEMBL408424 0.77
SCHEMBL239930 0.77
SCHEMBL15754827 0.76 TSHR (0.40) TSHRTP53EGLN1EGLN3LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025106778-A1 POLYMERS FOR THE REMOVAL OF PFAS FROM AQUEOUS COMPOSITIONS, AND METHODS OF MAKING AND USING THE SAME LUTUM TECHNOLOGY, LLC (US) 2025-05-22 WO claimed
US-20250161911-A1 POLYMERS FOR THE REMOVAL OF PFAS FROM AQUEOUS COMPOSITIONS, AND METHODS OF MAKING AND USING THE SAME GULF COAST ENVIRONMENTAL SYSTEMS LLC (DBA CONIFER SYSTEMS) 2025-05-22 US claimed
CN-122010275-A Degradation method of fluorine-containing organic compound 西湖大学 2026-05-12 CN disclosed
US-20250276924-A1 CHEMICAL AND BIOLOGICAL DEGRADATION OF ETHER PER- AND POLYFLUOROALKYL SUBSTANCES THE REGENTS OF THE UNIVERSITY OF CALIFORNIA 2025-09-04 US disclosed
US-20250161911-A1 POLYMERS FOR THE REMOVAL OF PFAS FROM AQUEOUS COMPOSITIONS, AND METHODS OF MAKING AND USING THE SAME GULF COAST ENVIRONMENTAL SYSTEMS LLC (DBA CONIFER SYSTEMS) 2025-05-22 US disclosed
WO-2025106778-A1 POLYMERS FOR THE REMOVAL OF PFAS FROM AQUEOUS COMPOSITIONS, AND METHODS OF MAKING AND USING THE SAME LUTUM TECHNOLOGY, LLC (US) 2025-05-22 WO disclosed
US-20250110101-A1 PER AND POLYFLUOROALKYL SUBSTANCE MEASUREMENT DEXSIL CORPORATION (US) 2025-04-03 US disclosed
US-20240059860-A1 METHODS AND SYSTEMS FOR DESTRUCTION OF SYNTHETIC PER- AND POLYFLUORO COMPOUNDS CHZ TECHNOLOGIES, LLC 2024-02-22 US disclosed
US-9951164-B2 Non-ionic aryl ketone based polymeric photo-acid generators INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2018-04-24 US disclosed
US-20180044459-A1 NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS CENTRAL GLASS CO., LTD. (JP) 2018-02-15 US disclosed
US-9488914-B2 Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same CENTRAL GLASS COMPANY, LIMITED (JP) 2016-11-08 US disclosed
US-20110275823-A1 PHENYLIMIDAZOLE COMPOUNDS OTSUKA PHARMACEUTICAL FACTORY, INC. (JP) 2011-11-10 US disclosed
US-20110212390-A1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-09-01 US disclosed
US-20110212391-A1 POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-09-01 US disclosed
EP-2362267-A1 Chemically amplified negative resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2011-08-31 EP disclosed
EP-2362268-A1 Polymer, chemically amplified positive resist composition and pattern forming process Shin-Etsu Chemical Co., Ltd. (JP) 2011-08-31 EP disclosed
US-20110177453-A1 Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2011-07-21 US disclosed
EP-1091958-A1 SALTS OF PAROXETINE SMITHKLINE BEECHAM PLC (GB) 2001-04-18 EP disclosed
WO-2000001692-A1 SALTS OF PAROXETINE SMITHKLINE BEECHAM PLC (GB) 2000-01-13 WO disclosed
EP-0103436-A2 Process for preparing 5-perfluoroalkyl-5,6-dihydrouracil derivatives and compounds for use therein SAGAMI CHEMICAL RESEARCH CENTER (JP) 1984-03-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180044459-A1 NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS PPARG, PPARA, PPARD TSHR 1168/4885TP53 2083/4885EGLN1 662/4885
US-20110177453-A1 Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same WASF2, EEF2, IKZF2 TSHR 2715/4885TP53 3149/4885EGLN1 1905/4885
US-20110275823-A1 PHENYLIMIDAZOLE COMPOUNDS GPR119, PNLIP, LPL TSHR 294/4885TP53 1514/4885EGLN1 254/4885
US-20250276924-A1 CHEMICAL AND BIOLOGICAL DEGRADATION OF ETHER PER- AND POLYFLUOROALKYL SUBSTANCES PFAS, FGB, PFKFB1 TSHR 2263/4885TP53 2375/4885EGLN1 456/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.