SCHEMBL646183

SCHEMBL646183

CSc1ccc(C)c(N)c1N

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.42
CD44 P16070 1/20 0.37
NOS3 P29474 2/20 0.34
NOS2 P35228 2/20 0.34
ALDH1A1 P00352 6/20 0.34
MAPT P10636 3/20 0.34
LMNA P02545 2/20 0.34
HSD17B10 Q99714 2/20 0.34
KDM4E B2RXH2 1/20 0.34
GAA P10253 1/20 0.34
HPGD P15428 1/20 0.34
NPC1 O15118 2/20 0.33
RAB9A P51151 2/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
TDP1 Q9NUW8 2/20 0.32
CASP1 P29466 1/20 0.32
CYP3A4 P08684 5/20 0.32
TSHR P16473 3/20 0.32
MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31282761 0.83 POLB (0.52) POLBCD44NOS3NOS2ALDH1A1
SCHEMBL6855355 0.81 POLB (0.39) POLBCD44NOS3NOS2ALDH1A1
SCHEMBL10423683 0.78 CD44 (0.52) POLBCD44NOS3NOS2ALDH1A1
SCHEMBL30908373 0.78 CD44 (0.52) POLBCD44NOS3NOS2ALDH1A1
SCHEMBL409314 0.78 POLB (0.61) POLBCD44NOS3NOS2ALDH1A1
Hydrochloric Acid SCHEMBL8125648 0.74 POLB (0.58) POLBCD44NOS3NOS2ALDH1A1
SCHEMBL2860505 0.73 NPC1 (0.45) POLBCD44ALDH1A1HSD17B10NPC1
Methyl Alcohol SCHEMBL7119741 0.72 POLB (0.55) POLBCD44NOS3NOS2ALDH1A1
SCHEMBL10862658 0.70 MEN1 (0.38) CD44NOS3NOS2ALDH1A1MAPT
SCHEMBL7741686 0.68 ALDH1A1 (0.54) POLBALDH1A1MAPTLMNAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 129 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12544958-B2 Method of making low specific gravity polishing pads ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) 2026-02-10 US claimed
US-12528152-B2 CMP pad having ultra expanded polymer microspheres ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) 2026-01-20 US claimed
CN-119613303-A Improved method for synthesizing and separating dimethyl thiotoluene diamine 江苏湘园化工有限公司 2025-03-14 CN claimed
CN-117126359-B Anti-abrasion, anti-seepage and polyurea material for pumped storage power station and preparation method thereof 天津迈特瑞欧科技有限公司 2024-01-19 CN claimed
US-20230390970-A1 METHOD OF MAKING LOW SPECIFIC GRAVITY POLISHING PADS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-12-07 US claimed
CN-117126359-A Anti-abrasion, anti-seepage and polyurea material for pumped storage power station and preparation method thereof 天津迈特瑞欧科技有限公司 2023-11-28 CN claimed
CN-218189036-U Mixed processing equipment for methylthio toluene diamine 乐陵创利科技有限公司 2023-01-03 CN claimed
CN-113509840-B Composite nanofiltration membrane and preparation method and application thereof 中国石油化工股份有限公司 2023-01-03 CN claimed
CN-110891771-B Method for bonding metal fittings to polyurethane structures 乙烯技术公司 2022-04-15 CN claimed
EP-3161030-B1 POLYUREA COMPOSITIONS AND METHODS OF USE PRC DESOTO INT INC (US) 2021-11-17 EP claimed
CN-113509840-A Composite nanofiltration membrane and preparation method and application thereof 中国石油化工股份有限公司 2021-10-19 CN claimed
CN-111433270-A High modulus rubber compositions comprising vulcanization ultra-accelerators 米其林集团总公司 2020-07-17 CN claimed
CN-111433047-A High modulus rubber compositions comprising an effective sulfur crosslinking system 米其林集团总公司 2020-07-17 CN claimed
CN-108699203-A The nonpolluting coating manufactured by the polymer of Coating Ions species HRL实验室有限责任公司 2018-10-23 CN claimed
CN-104704016-B For preparing the polyarethane casting compounds of the wearing layer in casting application SIKA技术股份公司 2018-01-05 CN claimed
US-20260125543-A1 TIRE MICHELIN & CIE (FR) 2026-05-07 US disclosed
US-12559593-B2 Dual cure sealants PRC-DESOTO INTERNATIONAL, INC. (CA) 2026-02-24 US disclosed
US-4631298-A REACTION INJECTION MOLDING POLYURETHANES ETHYL CORPORATION (US) 1986-12-23 US disclosed
EP-0193872-A2 Di(alkylthio) diamine chain extenders for polyurethane elastomers ETHYL CORPORATION (US) 1986-09-10 EP disclosed
US-4595742-A Formed by reacting polyisocyanate, an organic active hydrogen group containing compound, and a chain extender comprising an aromatic diamine ETHYL CORPORATION (US) 1986-06-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12528152-B2 CMP pad having ultra expanded polymer microspheres SRM, SMS, PAM POLB 108/4885CD44 449/4885NOS3 103/4885
US-12559593-B2 Dual cure sealants DUOX2, DUOX1, GPX4 POLB 1171/4885CD44 429/4885NOS3 837/4885
US-20260125543-A1 TIRE HTR3E, HEATR1, SMARCE1 POLB 2884/4885CD44 229/4885NOS3 1984/4885
US-12544958-B2 Method of making low specific gravity polishing pads SRM, HMGB1, ACP1 POLB 137/4885CD44 234/4885NOS3 145/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.