SCHEMBL646184

SCHEMBL646184

CSc1cc(N)cc(N)c1C

nearest known ligand 0.42

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.42
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
ALDH1A1 P00352 1/20 0.38
TSHR P16473 1/20 0.38
CASP1 P29466 1/20 0.36
NPC1 O15118 1/20 0.32
RAB9A P51151 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7219276 0.87 ALDH1A1 (0.43) KDM4EMEN1KMT2ATDP1ALDH1A1
SCHEMBL6855352 0.79 NPC1 (0.31) NPC1RAB9A
SCHEMBL64498 0.76 TDP1 (0.54) KDM4EMEN1KMT2ATDP1ALDH1A1
SCHEMBL28716249 0.76 NPC1 (0.41) MEN1KMT2ATDP1ALDH1A1TSHR
SCHEMBL9578919 0.76 KDM4E (0.38) KDM4EMEN1KMT2ATDP1ALDH1A1
SCHEMBL8446954 0.74 ALDH1A1 (0.38) ALDH1A1TSHR
Hydrochloric Acid SCHEMBL10454907 0.73 TDP1 (0.52) KDM4EMEN1KMT2ATDP1ALDH1A1
Hydrochloric Acid SCHEMBL1483037 0.73 TDP1 (0.52) KDM4EMEN1KMT2ATDP1ALDH1A1
SCHEMBL8535525 0.71 PTK2 (0.41) TSHRNPC1RAB9A
SCHEMBL10391132 0.71 NPC1 (0.38) TSHRNPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 177 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12544958-B2 Method of making low specific gravity polishing pads ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) 2026-02-10 US claimed
US-12528152-B2 CMP pad having ultra expanded polymer microspheres ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) 2026-01-20 US claimed
CN-119613303-A Improved method for synthesizing and separating dimethyl thiotoluene diamine 江苏湘园化工有限公司 2025-03-14 CN claimed
US-20230390970-A1 METHOD OF MAKING LOW SPECIFIC GRAVITY POLISHING PADS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-12-07 US claimed
CN-218189036-U Mixed processing equipment for methylthio toluene diamine 乐陵创利科技有限公司 2023-01-03 CN claimed
CN-110891771-B Method for bonding metal fittings to polyurethane structures 乙烯技术公司 2022-04-15 CN claimed
EP-3161030-B1 POLYUREA COMPOSITIONS AND METHODS OF USE PRC DESOTO INT INC (US) 2021-11-17 EP claimed
CN-107636039-B Curing agent for thermosetting epoxy resins and method for producing insulation systems for electronic engineering 亨斯迈先进材料许可(瑞士)有限公司 2020-11-24 CN claimed
CN-111433047-A High modulus rubber compositions comprising an effective sulfur crosslinking system 米其林集团总公司 2020-07-17 CN claimed
CN-111433270-A High modulus rubber compositions comprising vulcanization ultra-accelerators 米其林集团总公司 2020-07-17 CN claimed
CN-106103523-B Polymer dispersions with nanoscale polyurea particles dispersed in polyethers 陶氏环球技术有限责任公司 2020-03-10 CN claimed
US-4869400-A Composition dispensing system 3M INNOVATIVE PROPERTIES COMPANY 1989-09-26 US claimed
EP-0329821-A2 Polyhydroxyalkane/aromatic diamine chain extenders ETHYL CORPORATION (US) 1989-08-30 EP claimed
US-20260125543-A1 TIRE MICHELIN & CIE (FR) 2026-05-07 US disclosed
US-12559593-B2 Dual cure sealants PRC-DESOTO INTERNATIONAL, INC. (CA) 2026-02-24 US disclosed
US-12544958-B2 Method of making low specific gravity polishing pads ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) 2026-02-10 US disclosed
EP-0228190-A2 RIM polyurethanes comprising mixed diamine chain extenders and process and composition for their production ETHYL CORPORATION (US) 1987-07-08 EP disclosed
US-4631298-A REACTION INJECTION MOLDING POLYURETHANES ETHYL CORPORATION (US) 1986-12-23 US disclosed
EP-0193872-A2 Di(alkylthio) diamine chain extenders for polyurethane elastomers ETHYL CORPORATION (US) 1986-09-10 EP disclosed
US-4595742-A Formed by reacting polyisocyanate, an organic active hydrogen group containing compound, and a chain extender comprising an aromatic diamine ETHYL CORPORATION (US) 1986-06-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12528152-B2 CMP pad having ultra expanded polymer microspheres SRM, SMS, PAM KDM4E 216/4885MEN1 264/4885KMT2A 1250/4885
US-12559593-B2 Dual cure sealants DUOX2, DUOX1, GPX4 KDM4E 518/4885MEN1 4712/4885KMT2A 2458/4885
US-20260125543-A1 TIRE HTR3E, HEATR1, SMARCE1 KDM4E 279/4885MEN1 4745/4885KMT2A 3517/4885
US-12544958-B2 Method of making low specific gravity polishing pads SRM, HMGB1, ACP1 KDM4E 338/4885MEN1 47/4885KMT2A 2528/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.