Triethylene Glycol

Triethylene Glycol

SCHEMBL649130

COOC(C)=O.OCCOCCOCCO

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.50
KMT2A Q03164 2/20 0.50
TSHR P16473 3/20 0.46
MAPK1 P28482 1/20 0.46
THRB P10828 1/20 0.40
HTT P42858 1/20 0.40
MAPT P10636 1/20 0.40
ALDH1A1 P00352 3/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Di(Hydroxyethyl)Ether SCHEMBL3698560 0.98 TSHR (0.48) MEN1KMT2ATSHRMAPK1THRB
Triethylene Glycol SCHEMBL11270224 0.83 MEN1 (0.58) MEN1KMT2ATSHRMAPK1THRB
Ethylene Glycol SCHEMBL4817329 0.83 ALDH1A1 (0.42) TSHRALDH1A1
SCHEMBL20425437 0.82 MEN1 (0.50) MEN1KMT2ATSHRMAPK1THRB
Di(Hydroxyethyl)Ether SCHEMBL11211981 0.81 TSHR (0.50) MEN1KMT2ATSHRMAPK1THRB
Di(Hydroxyethyl)Ether SCHEMBL721175 0.80 ALDH1A1 (0.56) MEN1KMT2ATSHRMAPK1THRB
Triethylene Glycol SCHEMBL11233077 0.80 MEN1 (0.69) MEN1KMT2ATSHRMAPK1THRB
Tetraethylene Glycol SCHEMBL1831944 0.79 THRB (0.44) MEN1KMT2ATSHRMAPK1THRB
Triethylene Glycol SCHEMBL135537 0.79 THRB (0.44) MEN1KMT2ATSHRMAPK1THRB
Triethylene Glycol SCHEMBL273034 0.78 MEN1 (0.58) MEN1KMT2ATSHRMAPK1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 351 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6334886-B1 Removal of corrosive contaminants from alkanolamine absorbent process AIR PRODUCTS AND CHEMICALS, INC. 2002-01-01 US claimed
EP-4749682-A1 CURABLE COMPOSITION, FILM FORMING METHOD, AND METHOD FOR PRODUCING ARTICLE Canon Kabushiki Kaisha (JP) 2026-05-27 EP disclosed
US-20260140442-A1 RADIATION SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD JSR CORPORATION (JP) 2026-05-21 US disclosed
US-20260140445-A1 CURABLE COMPOSITION AND METHODS FOR FORMING FILM AND MANUFACTURING ARTICLE CANON KK (JP) 2026-05-21 US disclosed
US-12629718-B2 Film forming method and article manufacturing method CANON KABUSHIKI KAISHA (JP) 2026-05-19 US disclosed
US-20260133488-A1 RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT JSR CORPORATION (JP) 2026-05-14 US disclosed
US-20260126725-A1 CURABLE COMPOSITION AND METHODS FOR FORMING FILM AND MANUFACTURING ARTICLE CANON KK (JP) 2026-05-07 US disclosed
EP-4738008-A1 CURABLE COMPOSITION AND METHODS FOR FORMING FILM AND MANUFACTURING ARTICLE Canon Kabushiki Kaisha (JP) 2026-05-06 EP disclosed
US-20260117010-A1 CURABLE COMPOSITION, FILM FORMING METHOD AND ARTICLE MANUFACTURING METHOD CANON KABUSHIKI KAISHA (JP) 2026-04-30 US disclosed
US-20260077385-A1 FILM FORMING METHOD, CURABLE COMPOSITION, AND ARTICLE MANUFACTURING METHOD CANON KABUSHIKI KAISHA (JP) 2026-03-19 US disclosed
US-4383863-A 2-[2-Hydroxy-3,5-di-tert-octylphenyl]-2H-benzotriazole in stabilized photographic compositions CIBA-GEIGY CORPORATION (US) 1983-05-17 US disclosed
US-4345918-A Process for purification of gas streams INSTITUTE OF GAS TECHNOLOGY (US) 1982-08-24 US disclosed
US-4289847-A 2-EQUIVALENT YELLOW COUPLER KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1981-09-15 US disclosed
US-4127413-A PYRROLIDINONES KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1978-11-28 US disclosed
US-4080424-A ABSORBING CARBON DIOXIDE AND HYDROGEN SULFIDE USING A SOLVENT INSTITUTE OF GAS TECHNOLOGY (US) 1978-03-21 US disclosed
US-4040835-A Two-equivalent magenta couplers with amido coupling-off groups FUJI PHOTO FILM CO., LTD. (JA) 1977-08-09 US disclosed
US-3954795-A SALT MILLING USING FERRIC CHLORIDE E. I. DU PONT DE NEMOURS AND COMPANY (US) 1976-05-04 US disclosed
US-3948960-A ADDITION, HYDROGEN PEROXIDE, INTRAPHASE PONY INDUSTRIES, INC., A CORP. OF DE 1976-04-06 US disclosed
US-3945940-A CURING OF POLYESTER RESINS ARGUS CHEMICAL CORPORATION (US) 1976-03-23 US disclosed
US-3930862-A DYE DEVELOPER TRANSFER PHOTOSENSITIVE MATERIAL WITH SUBSTITUTED CATECHOL AUXILIARY DEVELOPER FUJI PHOTO FILM CO., LTD. (JA) 1976-01-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260077385-A1 FILM FORMING METHOD, CURABLE COMPOSITION, AND ARTICLE MANUFACTURING METHOD EEF1D, RHOA, YWHAH MEN1 748/4885KMT2A 1496/4885TSHR 4527/4885
US-20260140442-A1 RADIATION SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD RER1, RAD51, RFT1 MEN1 2082/4885KMT2A 2631/4885TSHR 2250/4885
US-20260126725-A1 CURABLE COMPOSITION AND METHODS FOR FORMING FILM AND MANUFACTURING ARTICLE ATM, ATR, PIEZO1 MEN1 111/4885KMT2A 1269/4885TSHR 4373/4885
US-12629718-B2 Film forming method and article manufacturing method AUP1, VCL, RHOA MEN1 2357/4885KMT2A 2710/4885TSHR 3103/4885
US-20260117010-A1 CURABLE COMPOSITION, FILM FORMING METHOD AND ARTICLE MANUFACTURING METHOD CCT4, ATM, CCT7 MEN1 416/4885KMT2A 2960/4885TSHR 4153/4885
US-20260133488-A1 RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT AFF1, ARSA, FXR1 MEN1 1190/4885KMT2A 3315/4885TSHR 556/4885
US-20260140445-A1 CURABLE COMPOSITION AND METHODS FOR FORMING FILM AND MANUFACTURING ARTICLE CFL1, ATM, PSPC1 MEN1 116/4885KMT2A 2108/4885TSHR 3425/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.