Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | MGAM | O43451 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | SI | P14410 | 1/20 | 0.33 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.33 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.32 |
| ▸ | RECQL | P46063 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL685234 | 0.83 | TSHR (0.39) | TSHRHSD17B10MGAMGAASI | |
| SCHEMBL685972 | 0.83 | TSHR (0.39) | TSHRHSD17B10MGAMGAASI | |
| SCHEMBL21576125 | 0.81 | TSHR (0.40) | TSHRHSD17B10MGAMGAASI | |
| SCHEMBL12345765 | 0.79 | TSHR (0.42) | TSHRHSD17B10MGAMGAASI | |
| SCHEMBL9312029 | 0.77 | TSHR (0.40) | TSHRHSD17B10MGAMGAASI | |
| SCHEMBL776194 | 0.75 | DGAT1 (0.42) | GAAL3MBTL1ALDH1A1LMNA | |
| SCHEMBL24360973 | 0.74 | TSHR (0.34) | TSHRHSD17B10MGAMGAASI | |
| SCHEMBL10134609 | 0.74 | CA12 (0.32) | TSHR | |
| SCHEMBL10134610 | 0.74 | CA12 (0.32) | TSHR | |
| SCHEMBL776033 | 0.74 | PKM (0.44) | TSHRHSD17B10MGAMGAASI |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9229320-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-20150301451-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-22 | — | — | US | disclosed |
| US-8993210-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| US-8900790-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-12-02 | — | — | US | disclosed |
| US-8852846-B2 | Salt and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-10-07 | — | — | US | disclosed |
| US-8574811-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-11-05 | — | — | US | disclosed |
| US-8546059-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-10-01 | — | — | US | disclosed |
| US-8530135-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8530137-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8460851-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-06-11 | — | — | US | disclosed |
| US-20120034563-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-09 | — | — | US | disclosed |
| US-20120009519-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20110318690-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110200936-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110200935-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110171576-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20110123926-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-05-26 | — | — | US | disclosed |
| US-20110076617-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20100304296-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100304296-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | C1S, H1-0, H1-2 | TSHR 1877/4885HSD17B10 3194/4885MGAM 4511/4885 |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | C1R, P4HA1, C1S | TSHR 2353/4885HSD17B10 855/4885MGAM 4552/4885 |
| US-20110200935-A1 | PHOTORESIST COMPOSITION | C1R, F12, C1S | TSHR 2611/4885HSD17B10 2060/4885MGAM 4751/4885 |
| US-20120009519-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | C1R, C1S, C9 | TSHR 2013/4885HSD17B10 1652/4885MGAM 4105/4885 |
| US-20110318690-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | RCOR1, C1R, C1S | TSHR 3451/4885HSD17B10 3256/4885MGAM 4214/4885 |
| US-20110171576-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | CLIC1, SLC10A6, APOL1 | TSHR 1498/4885HSD17B10 2371/4885MGAM 4710/4885 |
| US-20110200936-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | RER1, AFF1, FRG1 | TSHR 419/4885HSD17B10 2146/4885MGAM 4731/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.